JP2016195185A - 光学部品の製造方法、光学部品、光学装置 - Google Patents

光学部品の製造方法、光学部品、光学装置 Download PDF

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Publication number
JP2016195185A
JP2016195185A JP2015074498A JP2015074498A JP2016195185A JP 2016195185 A JP2016195185 A JP 2016195185A JP 2015074498 A JP2015074498 A JP 2015074498A JP 2015074498 A JP2015074498 A JP 2015074498A JP 2016195185 A JP2016195185 A JP 2016195185A
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Japan
Prior art keywords
layer
film
optical component
substrate
component according
Prior art date
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JP2015074498A
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English (en)
Japanese (ja)
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JP2016195185A5 (enExample
Inventor
祐 水野
Yu Mizuno
祐 水野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2015074498A priority Critical patent/JP2016195185A/ja
Priority to US15/081,662 priority patent/US10074756B2/en
Priority to CN201610195665.1A priority patent/CN106019425B/zh
Publication of JP2016195185A publication Critical patent/JP2016195185A/ja
Publication of JP2016195185A5 publication Critical patent/JP2016195185A5/ja
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/40—Optical elements or arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/804—Containers or encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/806—Optical elements or arrangements associated with the image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/50—Encapsulations or containers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Laminated Bodies (AREA)
  • Engineering & Computer Science (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
JP2015074498A 2015-03-31 2015-03-31 光学部品の製造方法、光学部品、光学装置 Withdrawn JP2016195185A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2015074498A JP2016195185A (ja) 2015-03-31 2015-03-31 光学部品の製造方法、光学部品、光学装置
US15/081,662 US10074756B2 (en) 2015-03-31 2016-03-25 Method for producing optical component, optical component, and optical device
CN201610195665.1A CN106019425B (zh) 2015-03-31 2016-03-31 光学部件的制备方法、光学部件和光学器件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015074498A JP2016195185A (ja) 2015-03-31 2015-03-31 光学部品の製造方法、光学部品、光学装置

Publications (2)

Publication Number Publication Date
JP2016195185A true JP2016195185A (ja) 2016-11-17
JP2016195185A5 JP2016195185A5 (enExample) 2018-05-10

Family

ID=57017090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015074498A Withdrawn JP2016195185A (ja) 2015-03-31 2015-03-31 光学部品の製造方法、光学部品、光学装置

Country Status (3)

Country Link
US (1) US10074756B2 (enExample)
JP (1) JP2016195185A (enExample)
CN (1) CN106019425B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020030247A (ja) * 2018-08-20 2020-02-27 株式会社タムロン 防汚層付光学素子

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119960558A (zh) * 2019-11-11 2025-05-09 苹果公司 计算设备
US11113494B2 (en) * 2019-11-11 2021-09-07 Apple Inc. Biometric key including a textured ceramic cover
KR102801003B1 (ko) * 2021-01-07 2025-04-29 현대모비스 주식회사 적층체 및 이의 제조방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6531341B1 (en) * 2000-05-16 2003-03-11 Sandia Corporation Method of fabricating a microelectronic device package with an integral window
US6833600B2 (en) * 2001-09-25 2004-12-21 Fuji Photo Film Co., Ltd. Optical component and method manufacturing the same
US7042662B2 (en) * 2002-12-26 2006-05-09 Canon Kabushiki Kaisha Light amount adjusting device, and optical device using the light amount adjusting device
WO2005001526A1 (ja) 2003-06-26 2005-01-06 Nikon Corporation 多層膜光学素子の製造方法
JP2005098930A (ja) 2003-09-26 2005-04-14 Nikon Corp 多層膜反射鏡、その再生方法及び露光装置
JP2006177740A (ja) 2004-12-22 2006-07-06 Nikon Corp 多層膜反射鏡及びｅｕｖ露光装置
JP2007101349A (ja) 2005-10-04 2007-04-19 Nikon Corp 多層膜反射鏡、その再生方法および露光装置
JP2007127698A (ja) 2005-11-01 2007-05-24 Nikon Corp 多層膜反射鏡、その再生方法および露光装置
JP2007187987A (ja) 2006-01-16 2007-07-26 Nikon Corp 多層膜反射鏡、及びｅｕｖ露光装置
JP4848876B2 (ja) 2006-07-27 2011-12-28 セイコーエプソン株式会社 固体撮像素子カバー及び固体撮像装置
KR102221907B1 (ko) * 2013-07-11 2021-03-04 삼성디스플레이 주식회사 광학필름 어셈블리, 이를 갖는 표시장치 및 그 제조방법
US9581733B2 (en) * 2013-08-23 2017-02-28 Ricoh Imaging Company, Ltd. Anti-reflection coating and optical member comprising same
JP6299772B2 (ja) * 2013-12-27 2018-03-28 株式会社ニコン 撮像ユニット及び撮像装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020030247A (ja) * 2018-08-20 2020-02-27 株式会社タムロン 防汚層付光学素子

Also Published As

Publication number Publication date
US10074756B2 (en) 2018-09-11
CN106019425B (zh) 2019-01-08
CN106019425A (zh) 2016-10-12
US20160293780A1 (en) 2016-10-06

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