CN106019425B - 光学部件的制备方法、光学部件和光学器件 - Google Patents

光学部件的制备方法、光学部件和光学器件 Download PDF

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Publication number
CN106019425B
CN106019425B CN201610195665.1A CN201610195665A CN106019425B CN 106019425 B CN106019425 B CN 106019425B CN 201610195665 A CN201610195665 A CN 201610195665A CN 106019425 B CN106019425 B CN 106019425B
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CN
China
Prior art keywords
layer
substrate
film
optical component
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201610195665.1A
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English (en)
Chinese (zh)
Other versions
CN106019425A (zh
Inventor
水野祐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN106019425A publication Critical patent/CN106019425A/zh
Application granted granted Critical
Publication of CN106019425B publication Critical patent/CN106019425B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/40Optical elements or arrangements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/804Containers or encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/806Optical elements or arrangements associated with the image sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/50Encapsulations or containers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Laminated Bodies (AREA)
  • Engineering & Computer Science (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
CN201610195665.1A 2015-03-31 2016-03-31 光学部件的制备方法、光学部件和光学器件 Expired - Fee Related CN106019425B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015074498A JP2016195185A (ja) 2015-03-31 2015-03-31 光学部品の製造方法、光学部品、光学装置
JP2015-074498 2015-03-31

Publications (2)

Publication Number Publication Date
CN106019425A CN106019425A (zh) 2016-10-12
CN106019425B true CN106019425B (zh) 2019-01-08

Family

ID=57017090

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610195665.1A Expired - Fee Related CN106019425B (zh) 2015-03-31 2016-03-31 光学部件的制备方法、光学部件和光学器件

Country Status (3)

Country Link
US (1) US10074756B2 (enExample)
JP (1) JP2016195185A (enExample)
CN (1) CN106019425B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020030247A (ja) * 2018-08-20 2020-02-27 株式会社タムロン 防汚層付光学素子
CN119960558A (zh) * 2019-11-11 2025-05-09 苹果公司 计算设备
US11113494B2 (en) * 2019-11-11 2021-09-07 Apple Inc. Biometric key including a textured ceramic cover
KR102801003B1 (ko) * 2021-01-07 2025-04-29 현대모비스 주식회사 적층체 및 이의 제조방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6531341B1 (en) * 2000-05-16 2003-03-11 Sandia Corporation Method of fabricating a microelectronic device package with an integral window
US7033855B2 (en) * 2001-09-25 2006-04-25 Fuji Photo Film Co., Ltd. Optical component and method of manufacturing the same
JP2006177740A (ja) * 2004-12-22 2006-07-06 Nikon Corp 多層膜反射鏡及びeuv露光装置
JP2008034502A (ja) * 2006-07-27 2008-02-14 Epson Toyocom Corp 固体撮像素子カバー及び固体撮像装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7042662B2 (en) * 2002-12-26 2006-05-09 Canon Kabushiki Kaisha Light amount adjusting device, and optical device using the light amount adjusting device
WO2005001526A1 (ja) 2003-06-26 2005-01-06 Nikon Corporation 多層膜光学素子の製造方法
JP2005098930A (ja) 2003-09-26 2005-04-14 Nikon Corp 多層膜反射鏡、その再生方法及び露光装置
JP2007101349A (ja) 2005-10-04 2007-04-19 Nikon Corp 多層膜反射鏡、その再生方法および露光装置
JP2007127698A (ja) 2005-11-01 2007-05-24 Nikon Corp 多層膜反射鏡、その再生方法および露光装置
JP2007187987A (ja) 2006-01-16 2007-07-26 Nikon Corp 多層膜反射鏡、及びeuv露光装置
KR102221907B1 (ko) * 2013-07-11 2021-03-04 삼성디스플레이 주식회사 광학필름 어셈블리, 이를 갖는 표시장치 및 그 제조방법
US9581733B2 (en) * 2013-08-23 2017-02-28 Ricoh Imaging Company, Ltd. Anti-reflection coating and optical member comprising same
JP6299772B2 (ja) * 2013-12-27 2018-03-28 株式会社ニコン 撮像ユニット及び撮像装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6531341B1 (en) * 2000-05-16 2003-03-11 Sandia Corporation Method of fabricating a microelectronic device package with an integral window
US7033855B2 (en) * 2001-09-25 2006-04-25 Fuji Photo Film Co., Ltd. Optical component and method of manufacturing the same
JP2006177740A (ja) * 2004-12-22 2006-07-06 Nikon Corp 多層膜反射鏡及びeuv露光装置
JP2008034502A (ja) * 2006-07-27 2008-02-14 Epson Toyocom Corp 固体撮像素子カバー及び固体撮像装置

Also Published As

Publication number Publication date
US10074756B2 (en) 2018-09-11
CN106019425A (zh) 2016-10-12
US20160293780A1 (en) 2016-10-06
JP2016195185A (ja) 2016-11-17

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