JP2016148024A5 - - Google Patents

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JP2016148024A5
JP2016148024A5 JP2015241149A JP2015241149A JP2016148024A5 JP 2016148024 A5 JP2016148024 A5 JP 2016148024A5 JP 2015241149 A JP2015241149 A JP 2015241149A JP 2015241149 A JP2015241149 A JP 2015241149A JP 2016148024 A5 JP2016148024 A5 JP 2016148024A5
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hydrogen
formula
carbon atoms
alkyl radical
alkyl
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JP2016148024A (ja
JP6377600B2 (ja
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Claims (1)

  1. 前記エチレン性不飽和モノマーが、
    式（２）：
    Figure 2016148024
     （式中、Ｒ１ は、水素または１〜１０個の炭素原子を有するアルキル基である。）によって、
    式（３）：
    Figure 2016148024
     （式中、Ｒ１ は、水素または１〜１０個の炭素原子を有するアルキル基であり、Ｒ２ は、Ｃ１−１０アルキル、Ｃ３−１０シクロアルキル、またはＣ７−１０アラルキル基である。）によって、
    または式（４）：
    Figure 2016148024
     （式中、Ｒ１ は、水素または１〜１０個の炭素原子を有するアルキル基であり、Ｒ３ は、Ｃ２−１０フルオロアルキル基である。）によって表わされる、請求項７に記載の前記方法。
JP2015241149A 2014-12-30 2015-12-10 誘導自己組織化のためのコポリマー調合物、その製造方法、及びそれを含む物品 Active JP6377600B2 (ja)

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US201462097682P 2014-12-30 2014-12-30
US62/097,682 2014-12-30

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JP2016148024A JP2016148024A (ja) 2016-08-18
JP2016148024A5 true JP2016148024A5 (ja) 2017-08-03
JP6377600B2 JP6377600B2 (ja) 2018-08-22

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US (1) US11021630B2 (ja)
JP (1) JP6377600B2 (ja)
KR (1) KR20160081807A (ja)
CN (1) CN105742161B (ja)
TW (1) TWI583735B (ja)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI509695B (zh) 2010-06-10 2015-11-21 Asm Int 使膜選擇性沈積於基板上的方法
US9112003B2 (en) 2011-12-09 2015-08-18 Asm International N.V. Selective formation of metallic films on metallic surfaces
TWI661072B (zh) 2014-02-04 2019-06-01 荷蘭商Ａｓｍ Ｉｐ控股公司 金屬、金屬氧化物與介電質的選擇性沈積
US10047435B2 (en) 2014-04-16 2018-08-14 Asm Ip Holding B.V. Dual selective deposition
US10011713B2 (en) 2014-12-30 2018-07-03 Dow Global Technologies Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US10294359B2 (en) 2014-12-30 2019-05-21 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US9490145B2 (en) 2015-02-23 2016-11-08 Asm Ip Holding B.V. Removal of surface passivation
TWI612379B (zh) 2015-02-26 2018-01-21 Rohm And Haas Electronic Materials Llc 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI627219B (zh) 2015-02-26 2018-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI669337B (zh) 2015-02-26 2019-08-21 美商羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI588200B (zh) 2015-02-26 2017-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
US10428421B2 (en) 2015-08-03 2019-10-01 Asm Ip Holding B.V. Selective deposition on metal or metallic surfaces relative to dielectric surfaces
US10566185B2 (en) 2015-08-05 2020-02-18 Asm Ip Holding B.V. Selective deposition of aluminum and nitrogen containing material
US10121699B2 (en) 2015-08-05 2018-11-06 Asm Ip Holding B.V. Selective deposition of aluminum and nitrogen containing material
US10695794B2 (en) 2015-10-09 2020-06-30 Asm Ip Holding B.V. Vapor phase deposition of organic films
US10814349B2 (en) 2015-10-09 2020-10-27 Asm Ip Holding B.V. Vapor phase deposition of organic films
US10343186B2 (en) 2015-10-09 2019-07-09 Asm Ip Holding B.V. Vapor phase deposition of organic films
US9981286B2 (en) 2016-03-08 2018-05-29 Asm Ip Holding B.V. Selective formation of metal silicides
US10551741B2 (en) 2016-04-18 2020-02-04 Asm Ip Holding B.V. Method of forming a directed self-assembled layer on a substrate
US10204782B2 (en) * 2016-04-18 2019-02-12 Imec Vzw Combined anneal and selective deposition process
US11081342B2 (en) 2016-05-05 2021-08-03 Asm Ip Holding B.V. Selective deposition using hydrophobic precursors
US10453701B2 (en) 2016-06-01 2019-10-22 Asm Ip Holding B.V. Deposition of organic films
US10373820B2 (en) 2016-06-01 2019-08-06 Asm Ip Holding B.V. Deposition of organic films
US10014212B2 (en) 2016-06-08 2018-07-03 Asm Ip Holding B.V. Selective deposition of metallic films
US9803277B1 (en) 2016-06-08 2017-10-31 Asm Ip Holding B.V. Reaction chamber passivation and selective deposition of metallic films
WO2018062157A1 (ja) * 2016-09-28 2018-04-05 東京応化工業株式会社 相分離構造を含む構造体の製造方法
US11430656B2 (en) 2016-11-29 2022-08-30 Asm Ip Holding B.V. Deposition of oxide thin films
US11094535B2 (en) 2017-02-14 2021-08-17 Asm Ip Holding B.V. Selective passivation and selective deposition
US11501965B2 (en) 2017-05-05 2022-11-15 Asm Ip Holding B.V. Plasma enhanced deposition processes for controlled formation of metal oxide thin films
US11170993B2 (en) 2017-05-16 2021-11-09 Asm Ip Holding B.V. Selective PEALD of oxide on dielectric
US10900120B2 (en) 2017-07-14 2021-01-26 Asm Ip Holding B.V. Passivation against vapor deposition
SG11202000664YA (en) * 2017-07-25 2020-02-27 Terapore Tech Inc Porous materials from complex block copolymer architectures
TWI805617B (zh) 2017-09-15 2023-06-21 南韓商Ｌｇ化學股份有限公司 層壓板
CN108329443B (zh) * 2017-12-19 2020-10-09 北京科华微电子材料有限公司 用于定向自组装的高弗洛里赫金斯参数嵌段聚合物及无规聚合物及其制备方法和自组装方法
JP7146690B2 (ja) 2018-05-02 2022-10-04 エーエスエム アイピー ホールディング ビー．ブイ． 堆積および除去を使用した選択的層形成
JP2020056104A (ja) 2018-10-02 2020-04-09 エーエスエム アイピー ホールディング ビー．ブイ． 選択的パッシベーションおよび選択的堆積
US11965238B2 (en) 2019-04-12 2024-04-23 Asm Ip Holding B.V. Selective deposition of metal oxides on metal surfaces
US11139163B2 (en) 2019-10-31 2021-10-05 Asm Ip Holding B.V. Selective deposition of SiOC thin films
TW202204658A (zh) 2020-03-30 2022-02-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 在兩不同表面上同時選擇性沉積兩不同材料
TW202140832A (zh) 2020-03-30 2021-11-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 氧化矽在金屬表面上之選擇性沉積
TW202140833A (zh) 2020-03-30 2021-11-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 相對於金屬表面在介電表面上之氧化矽的選擇性沉積
US20220236639A1 (en) * 2021-01-22 2022-07-28 Tokyo Electron Limited Directed self-assembly

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW576864B (en) 2001-12-28 2004-02-21 Toshiba Corp Method for manufacturing a light-emitting device
JP2005041931A (ja) 2003-07-23 2005-02-17 Jsr Corp 重合体組成物及びナノオーダーパターン形成方法
US8287957B2 (en) 2004-11-22 2012-10-16 Wisconsin Alumni Research Foundation Methods and compositions for forming aperiodic patterned copolymer films
US8168284B2 (en) 2005-10-06 2012-05-01 Wisconsin Alumni Research Foundation Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates
US7347953B2 (en) 2006-02-02 2008-03-25 International Business Machines Corporation Methods for forming improved self-assembled patterns of block copolymers
US8343578B2 (en) 2006-10-30 2013-01-01 International Business Machines Corporation Self-assembled lamellar microdomains and method of alignment
US7959975B2 (en) 2007-04-18 2011-06-14 Micron Technology, Inc. Methods of patterning a substrate
US8147914B2 (en) 2007-06-12 2012-04-03 Massachusetts Institute Of Technology Orientation-controlled self-assembled nanolithography using a block copolymer
US7763319B2 (en) * 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
US7989026B2 (en) 2008-01-12 2011-08-02 International Business Machines Corporation Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
US7521094B1 (en) 2008-01-14 2009-04-21 International Business Machines Corporation Method of forming polymer features by directed self-assembly of block copolymers
US8101261B2 (en) 2008-02-13 2012-01-24 Micron Technology, Inc. One-dimensional arrays of block copolymer cylinders and applications thereof
US8426313B2 (en) * 2008-03-21 2013-04-23 Micron Technology, Inc. Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
US8133341B2 (en) 2008-04-01 2012-03-13 Wisconsin Alumni Research Foundation Molecular transfer printing using block copolymers
KR101384111B1 (ko) 2009-01-09 2014-04-10 주식회사 에스앤에스텍 블랭크 마스크, 이를 이용하는 포토 마스크 및 이를 제조하는 방법
US8834956B2 (en) 2009-06-22 2014-09-16 Micron Technology, Inc. Methods of utilizing block copolymer to form patterns
KR20110018678A (ko) 2009-08-18 2011-02-24 연세대학교 산학협력단 기능성 말단기를 가진 폴리스티렌을 이용한 실린더 나노구조체의 수직배향 조절법
US8059350B2 (en) 2009-10-22 2011-11-15 Hitachi Global Storage Technologies Netherlands B.V. Patterned magnetic recording disk with patterned servo sectors having chevron servo patterns
US8821978B2 (en) * 2009-12-18 2014-09-02 International Business Machines Corporation Methods of directed self-assembly and layered structures formed therefrom
KR101865314B1 (ko) 2010-03-18 2018-06-08 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 블록 공중합체의 정렬을 위한 표면 처리
US20120135159A1 (en) 2010-11-30 2012-05-31 Seagate Technology Llc System and method for imprint-guided block copolymer nano-patterning
US9299381B2 (en) 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
GB201112369D0 (en) 2011-07-19 2011-08-31 Surface Innovations Ltd Polymeric structure
WO2013040483A1 (en) 2011-09-15 2013-03-21 Wisconsin Alumni Research Foundation Directed assembly of block copolymer films between a chemically patterned surface and a second surface
JP5898449B2 (ja) 2011-10-05 2016-04-06 旭化成イーマテリアルズ株式会社 パターン形成用樹脂組成物及びパターン形成方法
CN103094095B (zh) 2011-10-28 2015-10-21 中芯国际集成电路制造(北京)有限公司 制造半导体器件的方法
US8961918B2 (en) 2012-02-10 2015-02-24 Rohm And Haas Electronic Materials Llc Thermal annealing process
US8710150B2 (en) 2012-02-10 2014-04-29 Rohm And Haas Electronic Materials Llc Blended block copolymer composition
US8513356B1 (en) 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
US20130209755A1 (en) * 2012-02-15 2013-08-15 Phillip Dene Hustad Self-assembled structures, method of manufacture thereof and articles comprising the same
JP6306810B2 (ja) * 2012-03-14 2018-04-04 東京応化工業株式会社 下地剤、ブロックコポリマーを含む層のパターン形成方法
US9005877B2 (en) * 2012-05-15 2015-04-14 Tokyo Electron Limited Method of forming patterns using block copolymers and articles thereof
US8821738B2 (en) 2012-07-12 2014-09-02 Rohm And Haas Electronic Materials Llc Thermal annealing process
US9012545B2 (en) * 2012-08-31 2015-04-21 Rohm And Haas Electronic Materials Llc Composition and method for preparing pattern on a substrate
US8911846B2 (en) * 2012-10-05 2014-12-16 Seagate Technology Llc Block copolymer assembly
US20140142252A1 (en) 2012-11-19 2014-05-22 Sangho Cho Self-assembled structures, method of manufacture thereof and articles comprising the same
US9447220B2 (en) 2012-11-19 2016-09-20 Rohm And Haas Electronic Materials Llc Self-assembled structures, method of manufacture thereof and articles comprising the same
US9223214B2 (en) 2012-11-19 2015-12-29 The Texas A&M University System Self-assembled structures, method of manufacture thereof and articles comprising the same
US8822615B1 (en) 2013-02-08 2014-09-02 Rohm And Haas Electronic Materials Llc Block copolymer composition and methods relating thereto
US9632934B2 (en) 2013-03-14 2017-04-25 Silicon Graphics International Corp. Maintaining coherence when removing nodes from a directory-based shared memory system
US8853101B1 (en) 2013-03-15 2014-10-07 GlobalFoundries, Inc. Methods for fabricating integrated circuits including formation of chemical guide patterns for directed self-assembly lithography
JP2014186773A (ja) * 2013-03-22 2014-10-02 Toshiba Corp パターンの形成方法、及び磁気記録媒体の製造方法
US9802400B2 (en) 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US9382444B2 (en) * 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
JP6702649B2 (ja) 2013-12-31 2020-06-03 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ ブロックコポリマーの性質を制御する方法及びブロックコポリマーから製造された物品
US9822216B2 (en) 2014-07-25 2017-11-21 Wisconsin Alumni Research Foundation Microphase separation of block copolymer bottlebrushes
US10011713B2 (en) 2014-12-30 2018-07-03 Dow Global Technologies Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US20160186001A1 (en) 2014-12-30 2016-06-30 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
US10294359B2 (en) 2014-12-30 2019-05-21 Rohm And Haas Electronic Materials Llc Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same
TWI588200B (zh) 2015-02-26 2017-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI612379B (zh) 2015-02-26 2018-01-21 Rohm And Haas Electronic Materials Llc 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI669337B (zh) 2015-02-26 2019-08-21 美商羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI627219B (zh) 2015-02-26 2018-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件

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