JP2016127115A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016127115A5 JP2016127115A5 JP2014266139A JP2014266139A JP2016127115A5 JP 2016127115 A5 JP2016127115 A5 JP 2016127115A5 JP 2014266139 A JP2014266139 A JP 2014266139A JP 2014266139 A JP2014266139 A JP 2014266139A JP 2016127115 A5 JP2016127115 A5 JP 2016127115A5
- Authority
- JP
- Japan
- Prior art keywords
- adhesive sheet
- semiconductor chips
- pressure
- sensitive adhesive
- interval
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims description 17
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 239000013256 coordination polymer Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014266139A JP6482865B2 (ja) | 2014-12-26 | 2014-12-26 | 半導体装置の製造方法 |
| TW104143853A TWI676210B (zh) | 2014-12-26 | 2015-12-25 | 半導體裝置之製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014266139A JP6482865B2 (ja) | 2014-12-26 | 2014-12-26 | 半導体装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016127115A JP2016127115A (ja) | 2016-07-11 |
| JP2016127115A5 true JP2016127115A5 (https=) | 2017-11-16 |
| JP6482865B2 JP6482865B2 (ja) | 2019-03-13 |
Family
ID=56358112
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014266139A Active JP6482865B2 (ja) | 2014-12-26 | 2014-12-26 | 半導体装置の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6482865B2 (https=) |
| TW (1) | TWI676210B (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018216621A1 (ja) * | 2017-05-22 | 2018-11-29 | 日立化成株式会社 | 半導体装置の製造方法及びエキスパンドテープ |
| JP2019012714A (ja) * | 2017-06-29 | 2019-01-24 | 株式会社ディスコ | 半導体パッケージの製造方法 |
| KR102515684B1 (ko) * | 2017-11-16 | 2023-03-30 | 린텍 가부시키가이샤 | 반도체 장치의 제조 방법 |
| CN111295739B (zh) * | 2017-11-16 | 2023-08-25 | 琳得科株式会社 | 半导体装置的制造方法 |
| TWI785161B (zh) * | 2017-12-07 | 2022-12-01 | 日商琳得科股份有限公司 | 黏著性層積體、黏著性層積體之使用方法及半導體裝置之製造方法 |
| JP7084228B2 (ja) | 2018-06-26 | 2022-06-14 | 日東電工株式会社 | 半導体装置製造方法 |
| JP7250468B6 (ja) * | 2018-10-12 | 2023-04-25 | 三井化学株式会社 | 電子装置の製造方法および粘着性フィルム |
| KR102123419B1 (ko) * | 2018-10-29 | 2020-06-17 | 한국기계연구원 | 소자 간격 제어가 가능한 시트 및 이를 이용한 소자 간격 제어방법 |
| CN113366080B (zh) * | 2019-01-31 | 2023-12-26 | 琳得科株式会社 | 扩片方法以及半导体装置的制造方法 |
| CN114823456B (zh) * | 2021-01-19 | 2025-08-22 | 矽磐微电子(重庆)有限公司 | 转膜治具及芯片贴片方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010058646A1 (ja) * | 2008-11-21 | 2010-05-27 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 半導体パッケージおよびその製造方法 |
| JP2011077235A (ja) * | 2009-09-30 | 2011-04-14 | Nitto Denko Corp | 素子保持用粘着シートおよび素子の製造方法 |
| JP5350980B2 (ja) * | 2009-11-02 | 2013-11-27 | シチズン電子株式会社 | Led素子の製造方法 |
| JP5460374B2 (ja) * | 2010-02-19 | 2014-04-02 | シチズン電子株式会社 | 半導体装置の製造方法 |
| WO2014002535A1 (ja) * | 2012-06-29 | 2014-01-03 | シャープ株式会社 | 半導体装置の製造方法 |
-
2014
- 2014-12-26 JP JP2014266139A patent/JP6482865B2/ja active Active
-
2015
- 2015-12-25 TW TW104143853A patent/TWI676210B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2016127115A5 (https=) | ||
| IL273545A (en) | Etching solution for the simultaneous removal of silicon and silicon-germanium alloy from a silicon-germanium/silicon stack during semiconductor device fabrication | |
| TW201130022A (en) | Methods of fabricating stacked device and handling device wafer | |
| JP2014237545A5 (https=) | ||
| IL261357A (en) | Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device | |
| JP2010251632A5 (https=) | ||
| US7675170B2 (en) | Removable wafer expander for die bonding equipment | |
| JP2016171261A5 (https=) | ||
| JP2011119548A5 (https=) | ||
| JP2015144197A5 (https=) | ||
| EP4583660A3 (en) | Methods of forming a semiconductor device structure including a stair step structure, and related semiconductor devices | |
| EP2770545A3 (en) | Growth substrate, nitride semiconductor device and method of manufacturing the same | |
| JP2017050327A5 (https=) | ||
| US9230862B2 (en) | Wafer die separation | |
| SG10201907327RA (en) | Redistribution substrate, method of fabricating the same, and semiconductor package including the same | |
| GB2541146A (en) | Method of manufacturing a germanium-on-insulator substrate | |
| SG10202004731SA (en) | Semiconductor die, semiconductor wafer, semiconductor device including the semiconductor die and method of manufacturing the semiconductor device | |
| JP2019054209A5 (https=) | ||
| RU2015123791A (ru) | Способ изготовления обтекателя радиолокационной антенны | |
| WO2016059547A3 (en) | Method of manufacturing an object with microchannels provided therethrough | |
| JP2016208018A5 (https=) | ||
| MY207389A (en) | Method of separating electronic devices having a back layer and apparatus | |
| JP2017079329A5 (ja) | ロードロックアセンブリ | |
| EP2846353A3 (en) | Complementary metal oxide semiconductor device and method of manufacturing the same | |
| SG11202109419WA (en) | Dry etching method, method for manufacturing semiconductor device, and etching device |