JP2016079394A5 - - Google Patents
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- Publication number
- JP2016079394A5 JP2016079394A5 JP2015198977A JP2015198977A JP2016079394A5 JP 2016079394 A5 JP2016079394 A5 JP 2016079394A5 JP 2015198977 A JP2015198977 A JP 2015198977A JP 2015198977 A JP2015198977 A JP 2015198977A JP 2016079394 A5 JP2016079394 A5 JP 2016079394A5
- Authority
- JP
- Japan
- Prior art keywords
- repeating units
- substituted
- independently
- unsubstituted
- hydrocarbyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000000524 functional group Chemical group 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 12
- 150000002148 esters Chemical class 0.000 claims description 10
- 125000000743 hydrocarbylene group Chemical group 0.000 claims description 10
- 229920000642 polymer Polymers 0.000 claims description 10
- 125000000732 arylene group Chemical group 0.000 claims description 8
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 8
- 150000001733 carboxylic acid esters Chemical group 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- 230000002708 enhancing effect Effects 0.000 claims description 6
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 6
- -1 sulfonamide anion Chemical class 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 150000001450 anions Chemical class 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 5
- 150000002596 lactones Chemical class 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims description 4
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 150000001768 cations Chemical class 0.000 claims description 4
- 150000001298 alcohols Chemical class 0.000 claims description 3
- 229920001515 polyalkylene glycol Chemical class 0.000 claims description 3
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 3
- 150000008053 sultones Chemical class 0.000 claims description 3
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 claims description 2
- 229940124530 sulfonamide Drugs 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 4
- 239000000178 monomer Substances 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 230000003213 activating effect Effects 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 238000006467 substitution reaction Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 125000006002 1,1-difluoroethyl group Chemical group 0.000 description 1
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 229940059260 amidate Drugs 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 125000003636 chemical group Chemical group 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- NPUKDXXFDDZOKR-LLVKDONJSA-N etomidate Chemical compound CCOC(=O)C1=CN=CN1[C@H](C)C1=CC=CC=C1 NPUKDXXFDDZOKR-LLVKDONJSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462062343P | 2014-10-10 | 2014-10-10 | |
| US62/062,343 | 2014-10-10 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016079394A JP2016079394A (ja) | 2016-05-16 |
| JP2016079394A5 true JP2016079394A5 (enExample) | 2017-01-12 |
| JP6220370B2 JP6220370B2 (ja) | 2017-10-25 |
Family
ID=55655002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015198977A Active JP6220370B2 (ja) | 2014-10-10 | 2015-10-07 | 光酸発生官能基及び塩基溶解度向上官能基を有する繰り返し単位を含むポリマー、関連フォトレジスト組成物、ならびに電子デバイスを形成する方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9527936B2 (enExample) |
| JP (1) | JP6220370B2 (enExample) |
| KR (1) | KR101760377B1 (enExample) |
| CN (1) | CN105504119B (enExample) |
| TW (1) | TWI592429B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9551930B2 (en) | 2014-10-10 | 2017-01-24 | Rohm And Haas Electronic Materials Llc | Photoresist composition and associated method of forming an electronic device |
| US9606434B2 (en) * | 2014-10-10 | 2017-03-28 | Rohm And Haas Electronic Materials, Llc | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method |
| US9557642B2 (en) | 2014-10-10 | 2017-01-31 | Rohm And Haas Electronic Materials Llc | Photoresist composition and associated method of forming an electronic device |
| US9527936B2 (en) | 2014-10-10 | 2016-12-27 | Rohm And Haas Electronic Materials Llc | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method |
| US9921475B1 (en) * | 2016-08-31 | 2018-03-20 | Rohm And Haas Electronic Materials Llc | Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image |
| EP3605228B1 (en) * | 2017-03-30 | 2022-02-09 | JSR Corporation | Radiation sensitive composition and resist pattern forming method |
| EP4024132B1 (en) * | 2019-08-28 | 2024-11-20 | FUJIFILM Corporation | Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resin |
Family Cites Families (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3902115A1 (de) | 1989-01-25 | 1990-08-02 | Basf Ag | Strahlungsempfindliche polymere |
| JP3613491B2 (ja) | 1996-06-04 | 2005-01-26 | 富士写真フイルム株式会社 | 感光性組成物 |
| US7569326B2 (en) * | 2006-10-27 | 2009-08-04 | Shin-Etsu Chemical Co., Ltd. | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process |
| EP2101217B1 (en) * | 2008-03-14 | 2011-05-11 | Shin-Etsu Chemical Co., Ltd. | Sulfonium salt-containing polymer, resist compositon, and patterning process |
| JP4998746B2 (ja) * | 2008-04-24 | 2012-08-15 | 信越化学工業株式会社 | スルホニウム塩を含む高分子化合物、レジスト材料及びパターン形成方法 |
| JP5201363B2 (ja) * | 2008-08-28 | 2013-06-05 | 信越化学工業株式会社 | 重合性アニオンを有するスルホニウム塩及び高分子化合物、レジスト材料及びパターン形成方法 |
| JP5955492B2 (ja) * | 2008-09-24 | 2016-07-20 | 住友化学株式会社 | 樹脂、該樹脂の製造方法及び該樹脂を含む化学増幅型フォトレジスト組成物 |
| TWI400226B (zh) | 2008-10-17 | 2013-07-01 | Shinetsu Chemical Co | 具有聚合性陰離子之鹽及高分子化合物、光阻劑材料及圖案形成方法 |
| JP5851688B2 (ja) | 2009-12-31 | 2016-02-03 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 感光性組成物 |
| JP5782283B2 (ja) | 2010-03-31 | 2015-09-24 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 新規のポリマーおよびフォトレジスト組成物 |
| JP5521996B2 (ja) * | 2010-11-19 | 2014-06-18 | 信越化学工業株式会社 | スルホニウム塩を含む高分子化合物、レジスト材料及びパターン形成方法、並びにスルホニウム塩単量体及びその製造方法 |
| JP5802394B2 (ja) | 2011-01-17 | 2015-10-28 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法及び高分子化合物 |
| JP5677135B2 (ja) | 2011-02-23 | 2015-02-25 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法および高分子化合物 |
| JP5707241B2 (ja) * | 2011-06-07 | 2015-04-22 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法及び高分子化合物 |
| JP5715890B2 (ja) | 2011-06-10 | 2015-05-13 | 東京応化工業株式会社 | 高分子化合物の製造方法 |
| US20120322006A1 (en) | 2011-06-20 | 2012-12-20 | Central Glass Company, Limited | Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method |
| JP2013040296A (ja) * | 2011-08-18 | 2013-02-28 | Tokyo Ohka Kogyo Co Ltd | 重合体、レジスト組成物及びレジストパターン形成方法 |
| TW201323456A (zh) | 2011-07-21 | 2013-06-16 | Tokyo Ohka Kogyo Co Ltd | 聚合物，光阻組成物及光阻圖型之形成方法 |
| JP6019849B2 (ja) | 2011-09-08 | 2016-11-02 | セントラル硝子株式会社 | 含フッ素スルホン酸塩類、含フッ素スルホン酸塩樹脂、レジスト組成物及びそれを用いたパターン形成方法 |
| JP6006928B2 (ja) | 2011-11-02 | 2016-10-12 | 東京応化工業株式会社 | 高分子化合物の製造方法 |
| JP5783137B2 (ja) * | 2012-06-15 | 2015-09-24 | 信越化学工業株式会社 | スルホニウム塩、高分子化合物、レジスト材料及びパターン形成方法 |
| US8945814B2 (en) | 2012-09-15 | 2015-02-03 | Rohm And Haas Electronic Materials Llc | Acid generators and photoresists comprising same |
| TWI619733B (zh) * | 2012-09-15 | 2018-04-01 | Rohm And Haas Electronic Materials Llc | 包含多種酸產生劑化合物之光阻劑 |
| JP6106432B2 (ja) | 2012-12-28 | 2017-03-29 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、高分子化合物 |
| JP6571912B2 (ja) | 2012-12-31 | 2019-09-04 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 樹状化合物、フォトレジスト組成物、および電子デバイスを作製する方法 |
| US9581901B2 (en) | 2013-12-19 | 2017-02-28 | Rohm And Haas Electronic Materials Llc | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device |
| US10345700B2 (en) | 2014-09-08 | 2019-07-09 | International Business Machines Corporation | Negative-tone resist compositions and multifunctional polymers therein |
| US9557642B2 (en) | 2014-10-10 | 2017-01-31 | Rohm And Haas Electronic Materials Llc | Photoresist composition and associated method of forming an electronic device |
| US9527936B2 (en) | 2014-10-10 | 2016-12-27 | Rohm And Haas Electronic Materials Llc | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method |
| US9551930B2 (en) | 2014-10-10 | 2017-01-24 | Rohm And Haas Electronic Materials Llc | Photoresist composition and associated method of forming an electronic device |
| US9606434B2 (en) | 2014-10-10 | 2017-03-28 | Rohm And Haas Electronic Materials, Llc | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method |
-
2015
- 2015-08-24 US US14/833,245 patent/US9527936B2/en active Active
- 2015-10-06 TW TW104132897A patent/TWI592429B/zh active
- 2015-10-07 KR KR1020150140989A patent/KR101760377B1/ko active Active
- 2015-10-07 JP JP2015198977A patent/JP6220370B2/ja active Active
- 2015-10-09 CN CN201510650702.9A patent/CN105504119B/zh active Active
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