JP2013166931A5 - - Google Patents
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- JP2013166931A5 JP2013166931A5 JP2013015055A JP2013015055A JP2013166931A5 JP 2013166931 A5 JP2013166931 A5 JP 2013166931A5 JP 2013015055 A JP2013015055 A JP 2013015055A JP 2013015055 A JP2013015055 A JP 2013015055A JP 2013166931 A5 JP2013166931 A5 JP 2013166931A5
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- monomer
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- formula
- alkyl
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- 239000000178 monomer Substances 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 15
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 229920001577 copolymer Polymers 0.000 claims description 9
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 150000002596 lactones Chemical class 0.000 claims description 6
- -1 perfluoro Chemical group 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 150000002148 esters Chemical group 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 4
- 125000003367 polycyclic group Chemical group 0.000 claims description 4
- 125000002950 monocyclic group Chemical group 0.000 claims description 3
- 238000006116 polymerization reaction Methods 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims 6
- 125000002947 alkylene group Chemical group 0.000 claims 5
- 229920002120 photoresistant polymer Polymers 0.000 claims 5
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 2
- 125000006586 (C3-C10) cycloalkylene group Chemical group 0.000 claims 2
- 150000001450 anions Chemical class 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 125000002993 cycloalkylene group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000006651 (C3-C20) cycloalkyl group Chemical group 0.000 claims 1
- 230000003213 activating effect Effects 0.000 claims 1
- 125000000129 anionic group Chemical group 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 125000005460 perfluorocycloalkyl group Chemical group 0.000 claims 1
- 229940124530 sulfonamide Drugs 0.000 claims 1
- 150000003456 sulfonamides Chemical class 0.000 claims 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims 1
- 238000010511 deprotection reaction Methods 0.000 description 7
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- RYHBNJHYFVUHQT-NMFSSPJFSA-N 2,2,3,3,5,5-hexadeuterio-1,4-dioxane Chemical compound [2H]C1([2H])COC([2H])([2H])C([2H])([2H])O1 RYHBNJHYFVUHQT-NMFSSPJFSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- 125000000923 (C1-C30) alkyl group Chemical group 0.000 description 1
- 125000002733 (C1-C6) fluoroalkyl group Chemical group 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 125000002015 acyclic group Chemical group 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000005248 alkyl aryloxy group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 238000013480 data collection Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000592 heterocycloalkyl group Chemical group 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000000449 nitro group Chemical class [O-][N+](*)=O 0.000 description 1
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261599421P | 2012-02-15 | 2012-02-15 | |
| US61/599,421 | 2012-02-15 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016181710A Division JP6373921B2 (ja) | 2012-02-15 | 2016-09-16 | 感光性コポリマー、このコポリマーを含むフォトレジスト組成物、およびこれから形成される物品 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013166931A JP2013166931A (ja) | 2013-08-29 |
| JP2013166931A5 true JP2013166931A5 (enExample) | 2016-05-19 |
Family
ID=48945835
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013015055A Pending JP2013166931A (ja) | 2012-02-15 | 2013-01-30 | 感光性コポリマー、このコポリマーを含むフォトレジスト組成物、およびこれから形成される物品 |
| JP2016181710A Active JP6373921B2 (ja) | 2012-02-15 | 2016-09-16 | 感光性コポリマー、このコポリマーを含むフォトレジスト組成物、およびこれから形成される物品 |
| JP2018077643A Withdrawn JP2018135529A (ja) | 2012-02-15 | 2018-04-13 | 感光性コポリマー、このコポリマーを含むフォトレジスト組成物、およびこれから形成される物品 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016181710A Active JP6373921B2 (ja) | 2012-02-15 | 2016-09-16 | 感光性コポリマー、このコポリマーを含むフォトレジスト組成物、およびこれから形成される物品 |
| JP2018077643A Withdrawn JP2018135529A (ja) | 2012-02-15 | 2018-04-13 | 感光性コポリマー、このコポリマーを含むフォトレジスト組成物、およびこれから形成される物品 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9182662B2 (enExample) |
| JP (3) | JP2013166931A (enExample) |
| KR (1) | KR101515453B1 (enExample) |
| CN (1) | CN103254346B (enExample) |
| TW (1) | TWI567095B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9182662B2 (en) * | 2012-02-15 | 2015-11-10 | Rohm And Haas Electronic Materials Llc | Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom |
| JP6297269B2 (ja) * | 2012-06-28 | 2018-03-20 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | ポリマー組成物、このポリマー組成物を含むフォトレジスト、およびこのフォトレジストを含むコーティングされた物品 |
| US9182669B2 (en) | 2013-12-19 | 2015-11-10 | Rohm And Haas Electronic Materials Llc | Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device |
| US9229319B2 (en) * | 2013-12-19 | 2016-01-05 | Rohm And Haas Electronic Materials Llc | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device |
| KR20150079487A (ko) * | 2013-12-31 | 2015-07-08 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | 포토리소그래피 방법 |
| JP2015197509A (ja) * | 2014-03-31 | 2015-11-09 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物の製造方法及び感活性光線性又は感放射線性樹脂組成物 |
| KR102325949B1 (ko) * | 2014-11-27 | 2021-11-12 | 삼성전자주식회사 | 포토레지스트용 고분자, 포토레지스트 조성물, 패턴 형성 방법 및 반도체 장치의 제조 방법 |
| JP6782569B2 (ja) * | 2016-06-28 | 2020-11-11 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
| JP6735171B2 (ja) * | 2016-07-22 | 2020-08-05 | 東京応化工業株式会社 | 高分子化合物の製造方法 |
| JP6789024B2 (ja) * | 2016-07-22 | 2020-11-25 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法、並びに、高分子化合物 |
| US11720022B2 (en) | 2019-02-12 | 2023-08-08 | Samsung Electronics Co., Ltd. | Resist compound, method of forming pattern using the same, and method of manufacturing semiconductor device using the same |
| JP2024031844A (ja) * | 2022-08-23 | 2024-03-07 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| KR20240043584A (ko) * | 2022-09-27 | 2024-04-03 | 에스케이하이닉스 주식회사 | 반도체 소자 제조 방법 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6005137A (en) * | 1997-06-10 | 1999-12-21 | 3M Innovative Properties Company | Halogenated acrylates and polymers derived therefrom |
| KR100707767B1 (ko) * | 1999-09-28 | 2007-04-17 | 후지필름 가부시키가이샤 | 포지티브 포토레지스트 조성물 |
| JP3897088B2 (ja) * | 2000-12-18 | 2007-03-22 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
| US6683202B2 (en) | 2001-02-22 | 2004-01-27 | Tokyo Ohka, Kogyo Co., Ltd. | Fluorine-containing monomeric ester compound for base resin in photoresist composition |
| JP3832564B2 (ja) * | 2001-02-23 | 2006-10-11 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
| KR100863984B1 (ko) * | 2001-07-03 | 2008-10-16 | 후지필름 가부시키가이샤 | 포지티브 레지스트 조성물 |
| US7022455B2 (en) | 2001-12-28 | 2006-04-04 | Shipley Company, L.L.C. | Photoacid-labile polymers and photoresists comprising same |
| JP4281326B2 (ja) | 2002-07-25 | 2009-06-17 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| JP4218476B2 (ja) * | 2003-09-12 | 2009-02-04 | 沖電気工業株式会社 | レジストパターン形成方法とデバイス製造方法 |
| US7569326B2 (en) * | 2006-10-27 | 2009-08-04 | Shin-Etsu Chemical Co., Ltd. | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process |
| KR100985929B1 (ko) | 2007-06-12 | 2010-10-06 | 샌트랄 글래스 컴퍼니 리미티드 | 불소 함유 화합물, 불소 함유 고분자 화합물, 포지티브형레지스트 조성물 및 이것을 사용한 패턴 형성방법 |
| JPWO2009011364A1 (ja) | 2007-07-18 | 2010-09-24 | 旭硝子株式会社 | 電子線、ｘ線またはｅｕｖ光を用いたリソグラフィー法に用いられるレジスト組成物 |
| KR100944227B1 (ko) | 2007-12-17 | 2010-02-24 | 제일모직주식회사 | 방향족 산 분해성 기를 갖는 (메타)아크릴레이트 화합물 및감광성 고분자 및 레지스트 조성물 |
| JP5136792B2 (ja) | 2008-11-21 | 2013-02-06 | 信越化学工業株式会社 | ポジ型レジスト材料及びパターン形成方法 |
| TWI503334B (zh) * | 2009-02-19 | 2015-10-11 | Jsr Corp | 聚合物及敏輻射線性組成物、及單體 |
| JP5445320B2 (ja) | 2009-05-29 | 2014-03-19 | 信越化学工業株式会社 | 化学増幅型レジスト材料及びパターン形成方法 |
| JP5287552B2 (ja) | 2009-07-02 | 2013-09-11 | 信越化学工業株式会社 | 光酸発生剤並びにレジスト材料及びパターン形成方法 |
| JP5851688B2 (ja) | 2009-12-31 | 2016-02-03 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 感光性組成物 |
| JP5216032B2 (ja) | 2010-02-02 | 2013-06-19 | 信越化学工業株式会社 | 新規スルホニウム塩、高分子化合物、高分子化合物の製造方法、レジスト材料及びパターン形成方法 |
| JP5598351B2 (ja) | 2010-02-16 | 2014-10-01 | 信越化学工業株式会社 | 電子線用又はｅｕｖ用化学増幅ポジ型レジスト組成物及びパターン形成方法 |
| JP5505371B2 (ja) | 2010-06-01 | 2014-05-28 | 信越化学工業株式会社 | 高分子化合物、化学増幅ポジ型レジスト材料、及びパターン形成方法 |
| JP5560115B2 (ja) * | 2010-06-28 | 2014-07-23 | 富士フイルム株式会社 | パターン形成方法、化学増幅型レジスト組成物、及び、レジスト膜 |
| JP5655754B2 (ja) * | 2011-10-03 | 2015-01-21 | 信越化学工業株式会社 | ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
| US9182662B2 (en) * | 2012-02-15 | 2015-11-10 | Rohm And Haas Electronic Materials Llc | Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom |
-
2013
- 2013-01-29 US US13/752,523 patent/US9182662B2/en active Active
- 2013-01-30 JP JP2013015055A patent/JP2013166931A/ja active Pending
- 2013-02-04 TW TW102104163A patent/TWI567095B/zh active
- 2013-02-06 CN CN201310048009.5A patent/CN103254346B/zh active Active
- 2013-02-14 KR KR1020130015742A patent/KR101515453B1/ko active Active
-
2016
- 2016-09-16 JP JP2016181710A patent/JP6373921B2/ja active Active
-
2018
- 2018-04-13 JP JP2018077643A patent/JP2018135529A/ja not_active Withdrawn
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