JP2016079130A - 有機ケイ素化合物及びその製造方法、並びにそれを用いる金属表面処理剤 - Google Patents
有機ケイ素化合物及びその製造方法、並びにそれを用いる金属表面処理剤 Download PDFInfo
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- JP2016079130A JP2016079130A JP2014212334A JP2014212334A JP2016079130A JP 2016079130 A JP2016079130 A JP 2016079130A JP 2014212334 A JP2014212334 A JP 2014212334A JP 2014212334 A JP2014212334 A JP 2014212334A JP 2016079130 A JP2016079130 A JP 2016079130A
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- metal surface
- group
- surface treatment
- formula
- organosilicon compound
- Prior art date
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- 239000002184 metal Substances 0.000 title claims abstract description 89
- 239000012756 surface treatment agent Substances 0.000 title claims abstract description 55
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- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 6
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 5
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 61
- 239000010959 steel Substances 0.000 claims description 61
- 239000000463 material Substances 0.000 claims description 52
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- 239000003795 chemical substances by application Substances 0.000 claims description 32
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- 238000000034 method Methods 0.000 claims description 18
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- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 4
- 229910052845 zircon Inorganic materials 0.000 description 4
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- WSLQHGMJTGELSF-UHFFFAOYSA-L dipotassium;difluoride Chemical compound [F-].[F-].[K+].[K+] WSLQHGMJTGELSF-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- TVQLLNFANZSCGY-UHFFFAOYSA-N disodium;dioxido(oxo)tin Chemical compound [Na+].[Na+].[O-][Sn]([O-])=O TVQLLNFANZSCGY-UHFFFAOYSA-N 0.000 description 1
- HLJCWGPUCQTHFY-UHFFFAOYSA-H disodium;hexafluorotitanium(2-) Chemical compound [F-].[F-].[Na+].[Na+].F[Ti](F)(F)F HLJCWGPUCQTHFY-UHFFFAOYSA-H 0.000 description 1
- 239000012990 dithiocarbamate Substances 0.000 description 1
- OAEGRYMCJYIXQT-UHFFFAOYSA-N dithiooxamide Chemical compound NC(=S)C(N)=S OAEGRYMCJYIXQT-UHFFFAOYSA-N 0.000 description 1
- 229950004394 ditiocarb Drugs 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- FIHCECZPYHVEJO-UHFFFAOYSA-N ethoxy-dimethyl-phenylsilane Chemical compound CCO[Si](C)(C)C1=CC=CC=C1 FIHCECZPYHVEJO-UHFFFAOYSA-N 0.000 description 1
- BEGAGPQQLCVASI-UHFFFAOYSA-N ethyl 2-hydroxypropanoate;titanium Chemical compound [Ti].CCOC(=O)C(C)O BEGAGPQQLCVASI-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- JYTUFVYWTIKZGR-UHFFFAOYSA-N holmium oxide Inorganic materials [O][Ho]O[Ho][O] JYTUFVYWTIKZGR-UHFFFAOYSA-N 0.000 description 1
- OWCYYNSBGXMRQN-UHFFFAOYSA-N holmium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ho+3].[Ho+3] OWCYYNSBGXMRQN-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- XDBSEZHMWGHVIL-UHFFFAOYSA-M hydroxy(dioxo)vanadium Chemical compound O[V](=O)=O XDBSEZHMWGHVIL-UHFFFAOYSA-M 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- REQXNMOSXYEQLM-UHFFFAOYSA-N methoxy-dimethyl-phenylsilane Chemical compound CO[Si](C)(C)C1=CC=CC=C1 REQXNMOSXYEQLM-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- BPLYVSYSBPLDOA-GYOJGHLZSA-N n-[(2r,3r)-1,3-dihydroxyoctadecan-2-yl]tetracosanamide Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC(=O)N[C@H](CO)[C@H](O)CCCCCCCCCCCCCCC BPLYVSYSBPLDOA-GYOJGHLZSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- AOLPZAHRYHXPLR-UHFFFAOYSA-I pentafluoroniobium Chemical compound F[Nb](F)(F)(F)F AOLPZAHRYHXPLR-UHFFFAOYSA-I 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Chemical group 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 235000002949 phytic acid Nutrition 0.000 description 1
- 239000000467 phytic acid Substances 0.000 description 1
- 229940068041 phytic acid Drugs 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- HHDOORYZQSEMGM-UHFFFAOYSA-L potassium;oxalate;titanium(4+) Chemical compound [K+].[Ti+4].[O-]C(=O)C([O-])=O HHDOORYZQSEMGM-UHFFFAOYSA-L 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical class [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 1
- 239000011684 sodium molybdate Substances 0.000 description 1
- 235000015393 sodium molybdate Nutrition 0.000 description 1
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 1
- 229940079864 sodium stannate Drugs 0.000 description 1
- HVTHJRMZXBWFNE-UHFFFAOYSA-J sodium zincate Chemical compound [OH-].[OH-].[OH-].[OH-].[Na+].[Na+].[Zn+2] HVTHJRMZXBWFNE-UHFFFAOYSA-J 0.000 description 1
- UYLYBEXRJGPQSH-UHFFFAOYSA-N sodium;oxido(dioxo)niobium Chemical compound [Na+].[O-][Nb](=O)=O UYLYBEXRJGPQSH-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- NVKTUNLPFJHLCG-UHFFFAOYSA-N strontium chromate Chemical compound [Sr+2].[O-][Cr]([O-])(=O)=O NVKTUNLPFJHLCG-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- BFDQRLXGNLZULX-UHFFFAOYSA-N titanium hydrofluoride Chemical compound F.[Ti] BFDQRLXGNLZULX-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- RIAJLMJRHLGNMZ-UHFFFAOYSA-N triazanium;trioxomolybdenum;phosphate Chemical compound [NH4+].[NH4+].[NH4+].O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.[O-]P([O-])([O-])=O RIAJLMJRHLGNMZ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- YQMWDQQWGKVOSQ-UHFFFAOYSA-N trinitrooxystannyl nitrate Chemical compound [Sn+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O YQMWDQQWGKVOSQ-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- WQEVDHBJGNOKKO-UHFFFAOYSA-K vanadic acid Chemical compound O[V](O)(O)=O WQEVDHBJGNOKKO-UHFFFAOYSA-K 0.000 description 1
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 1
- DIMMBYOINZRKMD-UHFFFAOYSA-N vanadium(5+) Chemical class [V+5] DIMMBYOINZRKMD-UHFFFAOYSA-N 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- RKQOSDAEEGPRER-UHFFFAOYSA-L zinc diethyldithiocarbamate Chemical compound [Zn+2].CCN(CC)C([S-])=S.CCN(CC)C([S-])=S RKQOSDAEEGPRER-UHFFFAOYSA-L 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- KMNUDJAXRXUZQS-UHFFFAOYSA-L zinc;n-ethyl-n-phenylcarbamodithioate Chemical compound [Zn+2].CCN(C([S-])=S)C1=CC=CC=C1.CCN(C([S-])=S)C1=CC=CC=C1 KMNUDJAXRXUZQS-UHFFFAOYSA-L 0.000 description 1
- DUBNHZYBDBBJHD-UHFFFAOYSA-L ziram Chemical compound [Zn+2].CN(C)C([S-])=S.CN(C)C([S-])=S DUBNHZYBDBBJHD-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
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Abstract
Description
〔1〕
下記一般式(1)
で示される有機ケイ素化合物。
〔2〕
下記一般式(2)
で示される〔1〕に記載の有機ケイ素化合物。
〔3〕
下記一般式(3)
で示される有機ケイ素化合物と下記一般式(4)
で示されるベンゾトリアゾール化合物を反応させることを特徴とする〔1〕又は〔2〕記載の有機ケイ素化合物の製造方法。
〔4〕
〔1〕又は〔2〕記載の有機ケイ素化合物を有効成分とすることを特徴とする金属表面処理剤。
〔5〕
更に、下記一般式(13)
R6 xSi(OR7)4-x (13)
(式中、R6は炭素数1〜20の非置換又は置換の一価炭化水素基、R7は炭素数1〜8の非置換又は置換の一価炭化水素基を示し、xは0〜3の整数である。)
で示されるアルコキシシラン又はその部分加水分解縮合物を含むことを特徴とする〔4〕に記載の金属表面処理剤。
〔6〕
更に有機チタン酸エステルを含むことを特徴とする〔4〕又は〔5〕に記載の金属表面処理剤。
〔7〕
更に、水分散性シリカ又は有機溶剤分散性シリカを含むことを特徴とする〔4〕〜〔6〕のいずれかに記載の金属表面処理剤。
〔8〕
更に、Fe,Zr,Ti,V,W,Mo,Al,Sn,Nb,Hf,Y,Ho,Bi,La,Ce及びZnから選択される1種以上の金属の化合物を含むことを特徴とする〔4〕〜〔7〕のいずれかに記載の金属表面処理剤。
〔9〕
更に、チオカルボニル基含有化合物を含むことを特徴とする〔4〕〜〔8〕のいずれかに記載の金属表面処理剤。
〔10〕
更に、水溶性又は水分散性樹脂を含むことを特徴とする〔4〕〜〔9〕のいずれかに記載の金属表面処理剤。
〔11〕
更に、リン酸イオンを含むことを特徴とする〔4〕〜〔10〕のいずれかに記載の金属表面処理剤。
〔12〕
鋼材の表面を〔4〕〜〔11〕のいずれかに記載の金属表面処理剤で表面処理することを特徴とする鋼材の表面処理方法。
〔13〕
〔4〕〜〔11〕のいずれかに記載の金属表面処理剤で鋼材を処理した後、更に上層被膜層を設けることを特徴とする塗装鋼材の製造方法。
〔14〕
〔12〕に記載の表面処理方法で得られた表面処理鋼材。
〔15〕
〔13〕に記載の製造方法で得られた塗装鋼材。
本発明の有機ケイ素化合物は、ベンゾトリアゾール基とウレア結合を有する有機ケイ素化合物であり、更に本発明の金属表面処理剤はそれを必須成分とし、これを水、有機溶剤又は水と有機溶剤の混合溶媒に溶解してなるものである。
本発明の有機ケイ素化合物は下記一般式(1)で示される。
本発明の有機ケイ素化合物は、下記一般式(3)
で示される有機ケイ素化合物と下記一般式(4)
で示されるベンゾトリアゾール化合物を反応させることにより得ることができる。
R6 xSi(OR7)4-x (13)
(式中、R6は炭素数1〜20、特に炭素数1〜15の非置換又は置換の一価炭化水素基、R7は炭素数1〜8、特に炭素数1〜6の非置換又は置換の一価炭化水素基を示し、好ましくはメチル基、エチル基である。xは0〜3の整数であり、特に0〜2の整数が好ましい。)
有機ケイ素化合物(5)の製造法
撹拌機、還流冷却器、滴下ロート及び温度計を備えた1Lセパラブルフラスコにベンゾトリアゾール118.1g(1mol)、トルエン200gを納め、40℃まで加温した。その中に3−イソシアネートプロピルトリメトキシシラン205.3g(1mol)を滴下し、100℃にて1時間撹拌した。その後、IR測定により原料のイソチオシアネート基由来の吸収ピークが完全に消失したことを確認し反応終了とした。その後、溶媒を除去して得られた生成物は黄色液体であり、ゲルパーミエーションクロマトグラフィー(GPC)より反応生成物は下記式(5)で示される単一の生成物であった。
有機ケイ素化合物(8)の製造法
撹拌機、還流冷却器、滴下ロート及び温度計を備えた1Lセパラブルフラスコに5−メチルベンゾトリアゾール133.2g(1mol)、トルエン200gを納め、40℃まで加温した。その中に3−イソシアネートプロピルトリメトキシシラン205.3g(1mol)を滴下し、100℃にて1時間撹拌した。その後、IR測定により原料のイソチオシアネート基由来の吸収ピークが完全に消失したことを確認し反応終了とした。その後、溶媒を除去して得られた生成物は黄色液体であり、ゲルパーミエーションクロマトグラフィー(GPC)より反応生成物は下記式(8)で示される単一の生成物であった。
有機ケイ素化合物(9)の製造法
撹拌機、還流冷却器、滴下ロート及び温度計を備えた1Lセパラブルフラスコに6−メチルベンゾトリアゾール133.2g(1mol)、トルエン200gを納め、40℃まで加温した。その中に3−イソシアネートプロピルトリメトキシシラン205.3g(1mol)を滴下し、100℃にて1時間撹拌した。その後、IR測定により原料のイソチオシアネート基由来の吸収ピークが完全に消失したことを確認し反応終了とした。その後、溶媒を除去して得られた生成物は黄色液体であり、ゲルパーミエーションクロマトグラフィー(GPC)より反応生成物は下記式(9)で示される単一の生成物であった。
メタノール990g、水10gの混合溶媒に実施例1で得た有機ケイ素化合物(5)を不揮発分として10g添加し、室温で5分間撹拌することで金属表面処理剤を得た。得られた金属表面処理剤を脱脂乾燥した市販の溶融亜鉛めっき鋼板(日本テストパネル社製;70×150×0.4mm)にバーコーターNo.20で乾燥膜厚が10μmになるように塗布し、金属表面温度105℃で10分間乾燥させた。その後V/P顔料含有のノンクロメートプライマーをバーコーターNo.16で乾燥膜厚が5μmになるように塗布し、金属表面温度215℃で5分間乾燥した。更にトップコートとしてフレキコート1060(ポリエステル系上塗り塗料;日本ペイント社製)をバーコーターNo.36で乾燥膜厚が15μmとなるように塗布し、金属表面温度を230℃で乾燥させて試験板を得た。得られた試験板の折り曲げ密着性、深絞り性、耐食性を下記の評価方法に従って評価し、その結果を表1に記載した。
実施例1で得られた化合物を実施例2〜4で得られた化合物に変更した以外は、実施例4と同様にして金属表面処理剤を調製した。これらの金属表面処理剤を用いて、実施例4と同様にして試験板を作製し、これらの評価を行った。得られた結果を表1に記載した。
実施例1で得られた化合物、シラン系化合物の種類と濃度、有機チタン酸エステル、水分散性シリカ、ジルコニウムイオン、チオカルボニル基含有化合物、水溶性樹脂並びにリン酸イオンの濃度をそれぞれ表1に記載したように配合した以外は、実施例4と同様にして金属表面処理剤を調製した。これらの金属表面処理剤を用いて、実施例4と同様にして試験板を作製し、これらの評価を行った。得られた結果を表1に記載した。
実施例1〜3で得られた化合物を用いずに、シラン系化合物の種類と濃度、有機チタン酸エステル、水分散性シリカ、ジルコニウムイオン、チオカルボニル基含有化合物、水溶性樹脂並びにリン酸イオンの濃度をそれぞれ表1に記載したように配合した以外は、実施例4と同様にして金属表面処理剤を調製した。これらの金属表面処理剤を用いて、実施例4と同様にして試験板を作製し、これらの評価を行った。得られた結果を表1に記載した。
金属表面処理剤に代えて、市販の塗布型クロメート処理剤(樹脂含有タイプ)をクロム付着量が20mg/m2となるように塗布、乾燥したこと、及びクロム含有プライマー(ストロンチウムクロメート顔料含有プライマー)を用いたこと以外は、実施例4と同様にして試験板を作製及び評価し、得られた結果を表1に記載した。
[シラン化合物]
A:KBM−903(γ−アミノプロピルトリメトキシシラン;信越化学工業(株)製)
B:KBM−403(γ−グリシドキシプロピルトリメトキシシラン;信越化学工業(株)製)
C:KBM−403とベンゾトリアゾールの反応生成物(特開平6−279463号公報を参考に合成)
[有機チタン酸エステル]
チタンテトライソプロポキシド
[水分散性シリカ]
メタノールシリカゾル(日産化学工業社製)
[ジルコニウムイオンを形成する化合物]
ジルコノゾールAC−7(炭酸ジルコニルアンモニウム;第一稀元素社製)
[チオカルボニル基含有化合物]
チオ尿素
[水溶性樹脂]
ポリアクリル酸(重量平均分子量100万)
[リン酸イオンを形成する化合物]
リン酸
上記実施例4〜13及び比較例1〜4における折り曲げ密着性、深絞り性、耐食性の評価は以下の方法、評価基準に基づいて行った。
折り曲げ密着性:
20℃の環境下、コニカルマンドレル試験機を用いて試験板を2mmφのスペーサーを挟んで180°折り曲げ加工し、折り曲げ加工部を3回テープ剥離して、剥離度合いを20倍ルーペで観察し、下記の基準で評価した。
A:クラックなし
B:加工部全面にクラック
C:剥離面積が加工部の20%未満
D:剥離面積が加工部の20%以上〜80%未満
E:剥離面積が加工部の80%以上
20℃の環境下で絞り比:2.3、シワ抑え圧:2t、ポンチR:5mm、ダイス肩R:5mm、無塗油の条件で円筒絞り試験を行った。その後、クロスカット部から塗膜の剥離幅を測定し、下記の基準で評価した。
A:ふくれ幅が1mm未満
B:ふくれ幅が1mm以上〜2mm未満
C:ふくれ幅が2mm以上〜3mm未満
D:ふくれ幅が3mm以上〜5mm未満
E:ふくれ幅が5mm以上
(カット部)
試験板にクロスカットを入れ、JIS Z 2371に基づく塩水噴霧試験を500時間行った後、カット部片側のふくれ幅を測定し、下記の基準で評価した。
A:ふくれ幅が0mm
B:ふくれ幅が0mmを超え〜1mm未満
C:ふくれ幅が1mm以上〜3mm未満
D:ふくれ幅が3mm以上〜5mm未満
E:ふくれ幅が5mm以上
(端面)
試験板をJIS Z 2371に基づく塩水噴霧試験を500時間行った後、上バリ端面からのふくれ幅をカット部と同一基準で評価した。
Claims (15)
- 請求項1又は2に記載の有機ケイ素化合物を有効成分とすることを特徴とする金属表面処理剤。
- 更に、下記一般式(13)
R6 xSi(OR7)4-x (13)
(式中、R6は炭素数1〜20の非置換又は置換の一価炭化水素基、R7は炭素数1〜8の非置換又は置換の一価炭化水素基を示し、xは0〜3の整数である。)
で示されるアルコキシシラン又はその部分加水分解縮合物を含むことを特徴とする請求項4に記載の金属表面処理剤。 - 更に有機チタン酸エステルを含むことを特徴とする請求項4又は5に記載の金属表面処理剤。
- 更に、水分散性シリカ又は有機溶剤分散性シリカを含むことを特徴とする請求項4〜6のいずれか1項に記載の金属表面処理剤。
- 更に、Fe,Zr,Ti,V,W,Mo,Al,Sn,Nb,Hf,Y,Ho,Bi,La,Ce及びZnから選択される1種以上の金属の化合物を含むことを特徴とする請求項4〜7のいずれか1項に記載の金属表面処理剤。
- 更に、チオカルボニル基含有化合物を含むことを特徴とする請求項4〜8のいずれか1項に記載の金属表面処理剤。
- 更に、水溶性又は水分散性樹脂を含むことを特徴とする請求項4〜9のいずれか1項に記載の金属表面処理剤。
- 更に、リン酸イオンを含むことを特徴とする請求項4〜10のいずれか1項に記載の金属表面処理剤。
- 鋼材の表面を請求項4〜11のいずれか1項に記載の金属表面処理剤で表面処理することを特徴とする鋼材の表面処理方法。
- 請求項4〜11のいずれか1項に記載の金属表面処理剤で鋼材を処理した後、更に上層被膜層を設けることを特徴とする塗装鋼材の製造方法。
- 請求項12に記載の表面処理方法で得られた表面処理鋼材。
- 請求項13に記載の製造方法で得られた塗装鋼材。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014212334A JP6206373B2 (ja) | 2014-10-17 | 2014-10-17 | 有機ケイ素化合物の製造方法及び金属表面処理剤 |
US15/519,459 US10442822B2 (en) | 2014-10-17 | 2015-10-13 | Organosilicon compound, method for producing same and metal surface treatment agent using same |
EP15851369.7A EP3208274B1 (en) | 2014-10-17 | 2015-10-13 | Organosilicon compound, method for producing same and metal surface treatment agent using same |
PCT/JP2015/078872 WO2016060099A1 (ja) | 2014-10-17 | 2015-10-13 | 有機ケイ素化合物及びその製造方法、並びにそれを用いる金属表面処理剤 |
KR1020177012333A KR102406796B1 (ko) | 2014-10-17 | 2015-10-13 | 유기 규소 화합물, 그 제조 방법, 및 그것을 사용하는 금속 표면 처리제 |
CN201580056289.1A CN107074889B (zh) | 2014-10-17 | 2015-10-13 | 有机硅化合物及其制造方法、以及使用其的金属表面处理剂 |
EP19152364.6A EP3492478B1 (en) | 2014-10-17 | 2015-10-13 | Method for producing organosilicon compounds useful as metal surface treatment agents |
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JP2017222089A (ja) * | 2016-06-15 | 2017-12-21 | 株式会社新技術研究所 | ポリエステル系樹脂を含む銅合金物品およびその製造方法 |
EP3943640A1 (en) | 2020-07-20 | 2022-01-26 | Mec Company., Ltd. | Coating film-forming composition, method for producing surface-treated metal member, and method for producing metal-resin composite |
JP2022038782A (ja) * | 2020-08-27 | 2022-03-10 | 信越化学工業株式会社 | シリコーン変性ポリイミド樹脂組成物 |
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US12091430B2 (en) * | 2019-09-06 | 2024-09-17 | Shikoku Chemicals Corporation | Metal surface treatment liquid and liquid concentrate thereof, metal surface treatment liquid set, metal surface treatment method, and method for manufacturing printed wiring board |
CN112553608B (zh) * | 2020-01-02 | 2023-01-24 | 天津中车四方轨道车辆有限公司 | 一种铝合金表面转化膜处理剂、制备方法和使用方法 |
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EP3208274A4 (en) | 2018-05-16 |
EP3208274A1 (en) | 2017-08-23 |
US10442822B2 (en) | 2019-10-15 |
US20170226136A1 (en) | 2017-08-10 |
EP3492478B1 (en) | 2020-04-15 |
WO2016060099A1 (ja) | 2016-04-21 |
EP3492478A1 (en) | 2019-06-05 |
JP6206373B2 (ja) | 2017-10-04 |
KR20170070101A (ko) | 2017-06-21 |
CN107074889A (zh) | 2017-08-18 |
KR102406796B1 (ko) | 2022-06-10 |
EP3208274B1 (en) | 2020-04-08 |
CN107074889B (zh) | 2020-01-07 |
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