CN107074889B - 有机硅化合物及其制造方法、以及使用其的金属表面处理剂 - Google Patents
有机硅化合物及其制造方法、以及使用其的金属表面处理剂 Download PDFInfo
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- CN107074889B CN107074889B CN201580056289.1A CN201580056289A CN107074889B CN 107074889 B CN107074889 B CN 107074889B CN 201580056289 A CN201580056289 A CN 201580056289A CN 107074889 B CN107074889 B CN 107074889B
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- surface treatment
- metal surface
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 94
- 239000002184 metal Substances 0.000 title claims abstract description 94
- 239000012756 surface treatment agent Substances 0.000 title claims abstract description 80
- 150000003961 organosilicon compounds Chemical class 0.000 title claims abstract description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 9
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 59
- 229910000831 Steel Inorganic materials 0.000 claims description 57
- 239000010959 steel Substances 0.000 claims description 57
- 150000001875 compounds Chemical class 0.000 claims description 51
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 45
- 125000004432 carbon atom Chemical group C* 0.000 claims description 24
- -1 benzotriazole compound Chemical class 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 20
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 229920005989 resin Polymers 0.000 claims description 17
- 239000011347 resin Substances 0.000 claims description 17
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 14
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 13
- 238000004381 surface treatment Methods 0.000 claims description 11
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 claims description 11
- 239000012964 benzotriazole Substances 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 150000002739 metals Chemical class 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 239000011247 coating layer Substances 0.000 claims description 6
- 229910052718 tin Inorganic materials 0.000 claims description 6
- 239000004480 active ingredient Substances 0.000 claims description 5
- 229910052727 yttrium Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910052684 Cerium Inorganic materials 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- 229910052746 lanthanum Inorganic materials 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 230000036961 partial effect Effects 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 230000007062 hydrolysis Effects 0.000 claims description 2
- 238000006460 hydrolysis reaction Methods 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 1
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- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract description 12
- 125000003118 aryl group Chemical group 0.000 abstract description 6
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 9
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- 238000005227 gel permeation chromatography Methods 0.000 description 8
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- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 239000006087 Silane Coupling Agent Substances 0.000 description 6
- 238000005452 bending Methods 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 229940085991 phosphate ion Drugs 0.000 description 6
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 6
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical group NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 5
- 150000003863 ammonium salts Chemical class 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 5
- 239000010955 niobium Substances 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 4
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 4
- 229910000861 Mg alloy Inorganic materials 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 235000011007 phosphoric acid Nutrition 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
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- 239000002994 raw material Substances 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 159000000000 sodium salts Chemical class 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- NNTRMVRTACZZIO-UHFFFAOYSA-N 3-isocyanatopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCN=C=O NNTRMVRTACZZIO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- SKIHFCFFRXCIJA-UHFFFAOYSA-I azanium;hexafluoroniobium(1-) Chemical compound [NH4+].[F-].F[Nb](F)(F)(F)F SKIHFCFFRXCIJA-UHFFFAOYSA-I 0.000 description 3
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 3
- 239000004202 carbamide Chemical group 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- PJIFJEUHCQYNHO-UHFFFAOYSA-N diethoxy-(3-isocyanatopropyl)-methylsilane Chemical compound CCO[Si](C)(OCC)CCCN=C=O PJIFJEUHCQYNHO-UHFFFAOYSA-N 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 150000002513 isocyanates Chemical class 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000012046 mixed solvent Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- NFVUDQKTAWONMJ-UHFFFAOYSA-I pentafluorovanadium Chemical compound [F-].[F-].[F-].[F-].[F-].[V+5] NFVUDQKTAWONMJ-UHFFFAOYSA-I 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
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- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
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- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
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- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 2
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 2
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- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
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- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
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- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
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- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 2
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- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 2
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 description 2
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
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- 239000007921 spray Substances 0.000 description 2
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- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
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- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 2
- DZKDPOPGYFUOGI-UHFFFAOYSA-N tungsten(iv) oxide Chemical compound O=[W]=O DZKDPOPGYFUOGI-UHFFFAOYSA-N 0.000 description 2
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- RXCBCUJUGULOGC-UHFFFAOYSA-H dipotassium;tetrafluorotitanium;difluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Ti+4] RXCBCUJUGULOGC-UHFFFAOYSA-H 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- TVQLLNFANZSCGY-UHFFFAOYSA-N disodium;dioxido(oxo)tin Chemical compound [Na+].[Na+].[O-][Sn]([O-])=O TVQLLNFANZSCGY-UHFFFAOYSA-N 0.000 description 1
- OAEGRYMCJYIXQT-UHFFFAOYSA-N dithiooxamide Chemical compound NC(=S)C(N)=S OAEGRYMCJYIXQT-UHFFFAOYSA-N 0.000 description 1
- 229950004394 ditiocarb Drugs 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- FIHCECZPYHVEJO-UHFFFAOYSA-N ethoxy-dimethyl-phenylsilane Chemical compound CCO[Si](C)(C)C1=CC=CC=C1 FIHCECZPYHVEJO-UHFFFAOYSA-N 0.000 description 1
- BEGAGPQQLCVASI-UHFFFAOYSA-N ethyl 2-hydroxypropanoate;titanium Chemical compound [Ti].CCOC(=O)C(C)O BEGAGPQQLCVASI-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229910000449 hafnium oxide Inorganic materials 0.000 description 1
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- JYTUFVYWTIKZGR-UHFFFAOYSA-N holmium oxide Inorganic materials [O][Ho]O[Ho][O] JYTUFVYWTIKZGR-UHFFFAOYSA-N 0.000 description 1
- OWCYYNSBGXMRQN-UHFFFAOYSA-N holmium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ho+3].[Ho+3] OWCYYNSBGXMRQN-UHFFFAOYSA-N 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- XDBSEZHMWGHVIL-UHFFFAOYSA-M hydroxy(dioxo)vanadium Chemical compound O[V](=O)=O XDBSEZHMWGHVIL-UHFFFAOYSA-M 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- MDLRQEHNDJOFQN-UHFFFAOYSA-N methoxy(dimethyl)silicon Chemical compound CO[Si](C)C MDLRQEHNDJOFQN-UHFFFAOYSA-N 0.000 description 1
- REQXNMOSXYEQLM-UHFFFAOYSA-N methoxy-dimethyl-phenylsilane Chemical compound CO[Si](C)(C)C1=CC=CC=C1 REQXNMOSXYEQLM-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- BPLYVSYSBPLDOA-GYOJGHLZSA-N n-[(2r,3r)-1,3-dihydroxyoctadecan-2-yl]tetracosanamide Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC(=O)N[C@H](CO)[C@H](O)CCCCCCCCCCCCCCC BPLYVSYSBPLDOA-GYOJGHLZSA-N 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- AOLPZAHRYHXPLR-UHFFFAOYSA-I pentafluoroniobium Chemical compound F[Nb](F)(F)(F)F AOLPZAHRYHXPLR-UHFFFAOYSA-I 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Chemical group 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 235000002949 phytic acid Nutrition 0.000 description 1
- 239000000467 phytic acid Substances 0.000 description 1
- 229940068041 phytic acid Drugs 0.000 description 1
- 150000003053 piperidines Chemical class 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Chemical group 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- GRLPQNLYRHEGIJ-UHFFFAOYSA-J potassium aluminium sulfate Chemical compound [Al+3].[K+].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRLPQNLYRHEGIJ-UHFFFAOYSA-J 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000011684 sodium molybdate Substances 0.000 description 1
- 235000015393 sodium molybdate Nutrition 0.000 description 1
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 1
- UEBYQFJWEPTRMG-UHFFFAOYSA-K sodium molybdenum(4+) phosphate Chemical compound P(=O)([O-])([O-])[O-].[Na+].[Mo+4] UEBYQFJWEPTRMG-UHFFFAOYSA-K 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 229940079864 sodium stannate Drugs 0.000 description 1
- HVTHJRMZXBWFNE-UHFFFAOYSA-J sodium zincate Chemical compound [OH-].[OH-].[OH-].[OH-].[Na+].[Na+].[Zn+2] HVTHJRMZXBWFNE-UHFFFAOYSA-J 0.000 description 1
- UYLYBEXRJGPQSH-UHFFFAOYSA-N sodium;oxido(dioxo)niobium Chemical compound [Na+].[O-][Nb](=O)=O UYLYBEXRJGPQSH-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- NVKTUNLPFJHLCG-UHFFFAOYSA-N strontium chromate Chemical compound [Sr+2].[O-][Cr]([O-])(=O)=O NVKTUNLPFJHLCG-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- XRXPBLNWIMLYNO-UHFFFAOYSA-J tetrafluorotungsten Chemical compound F[W](F)(F)F XRXPBLNWIMLYNO-UHFFFAOYSA-J 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- IUTCEZPPWBHGIX-UHFFFAOYSA-N tin(2+) Chemical compound [Sn+2] IUTCEZPPWBHGIX-UHFFFAOYSA-N 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 229910001428 transition metal ion Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- RIAJLMJRHLGNMZ-UHFFFAOYSA-N triazanium;trioxomolybdenum;phosphate Chemical compound [NH4+].[NH4+].[NH4+].O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.O=[Mo](=O)=O.[O-]P([O-])([O-])=O RIAJLMJRHLGNMZ-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- YQMWDQQWGKVOSQ-UHFFFAOYSA-N trinitrooxystannyl nitrate Chemical compound [Sn+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O YQMWDQQWGKVOSQ-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical compound [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 1
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 1
- KOKKJWHERHSKEB-UHFFFAOYSA-N vanadium(3+) Chemical compound [V+3] KOKKJWHERHSKEB-UHFFFAOYSA-N 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
- 125000005287 vanadyl group Chemical group 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 229940041260 vanadyl sulfate Drugs 0.000 description 1
- 229910000352 vanadyl sulfate Inorganic materials 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- RKQOSDAEEGPRER-UHFFFAOYSA-L zinc diethyldithiocarbamate Chemical compound [Zn+2].CCN(CC)C([S-])=S.CCN(CC)C([S-])=S RKQOSDAEEGPRER-UHFFFAOYSA-L 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- KMNUDJAXRXUZQS-UHFFFAOYSA-L zinc;n-ethyl-n-phenylcarbamodithioate Chemical compound [Zn+2].CCN(C([S-])=S)C1=CC=CC=C1.CCN(C([S-])=S)C1=CC=CC=C1 KMNUDJAXRXUZQS-UHFFFAOYSA-L 0.000 description 1
- SZNCKQHFYDCMLZ-UHFFFAOYSA-L zinc;propan-2-yloxymethanedithioate Chemical compound [Zn+2].CC(C)OC([S-])=S.CC(C)OC([S-])=S SZNCKQHFYDCMLZ-UHFFFAOYSA-L 0.000 description 1
- DUBNHZYBDBBJHD-UHFFFAOYSA-L ziram Chemical compound [Zn+2].CN(C)C([S-])=S.CN(C)C([S-])=S DUBNHZYBDBBJHD-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- C—CHEMISTRY; METALLURGY
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Abstract
由下述通式(1)(R为水解性基团,R'为烷基,A为亚烷基,R1、R2、R3、R4中,R1与R2、R2与R3、或者R3与R4可各自结合而形成脂肪族或芳香族环骨架,没有形成环骨架的情况下,各自独立地为氢原子、或者烷基。m为1~3)表示的有机硅化合物。根据本发明,能够得到加工密合性优异、粘接强度高、防锈耐蚀性以高水平显现、可用作金属表面处理剂的有机硅化合物。
Description
技术领域
本发明涉及作为铜板、冷轧钢材、热轧钢材、不锈钢材、进而电镀锌钢材、熔融镀锌钢材、锌-铝合金系镀敷钢材、锌-铁合金系镀敷钢材、锌-镁合金系镀敷钢材、锌-铝-镁合金系镀敷钢材、铝系镀敷钢材、铝-硅合金系镀敷钢材、锡系镀敷钢材、铅-锡合金系镀敷钢材、铬系镀敷钢材、镍系镀敷钢材等涂饰钢材用等适合的金属表面处理剂、用该处理剂进行了表面处理的表面处理钢材及其表面处理方法、以及在其上具有上层覆膜的涂饰钢材及其制造方法。
背景技术
目前为止,作为金属的表面处理剂,使用了铬酸盐、磷酸铬酸盐等铬系表面处理剂,现在也已广泛地使用。但是,观察最近的环境管制的动向时,由于铬具有的毒性、特别是致癌性,将来有可能限制使用。因此,希望开发不含铬而具有与铬酸盐处理剂同等的密合性、耐蚀性的金属表面处理剂。
在日本特开平11-29724号公报(专利文献1)中,提出了在水溶性树脂中含有含硫羰基的化合物和磷酸根离子、进而水分散性二氧化硅的非铬的防锈处理剂。但是,该体系虽然耐蚀性优异,但加工性和与基材的密合性不充分。日本特开平8-073775号公报(专利文献2)中,公开了包含2种以上的硅烷偶联剂的酸性表面处理剂,但就该体系而言,在进行了金属表面处理后要求高的耐蚀性和加工性的情况下,耐蚀性不足。
与这些相关联地,日本特开2001-316845号公报(专利文献3)公开了以硅烷偶联剂、水分散性二氧化硅、锆或钛离子作为必要成分的非铬酸盐金属表面处理剂,虽然改善了耐蚀性和加工性,但在对基材的涂布性、以及与上层覆膜的密合强度等方面仍然不充分。
日本特开平10-60315号公报(专利文献4)中,公开了含有具有与水系乳液反应的特定官能团的硅烷偶联剂的钢结构物用表面处理剂,但这种情况下,所要求的耐蚀性只是针对于湿润试验这样的比较温和的试验,如果与本发明这样的经受严酷的耐蚀试验那样的金属表面处理剂相比,耐蚀性不足。
日本特开2000-297093号公报(专利文献5)中记载了将含有咪唑基的有机硅化合物用于金属等的表面处理剂,但在耐蚀性、深冲性等方面尚未充分地满足需要。日本特开平6-279463号公报(专利文献6)中记载了将含有苯并三唑基的有机硅化合物用于金属等的表面处理剂,但同样地在耐蚀性、深冲性等方面尚未充分地满足需要。
日本特开2007-297648号公报(专利文献7)中公开了含有水系乳液、3价过渡金属离子和2分子的β-二酮和2分子的水配位的化合物、硅烷偶联剂的防锈用表面处理剂,3价过渡金属络合物通过干燥而成为难溶性化合物,从而显现防锈能力、涂膜密合能力,虽然在这方面是有特色的,但所要求的耐蚀性并不是本发明这样的经受严酷的环境那样的耐蚀性,具有很大应改进的余地。
由以上出发,希望开发作为薄膜以高水平显现出耐蚀性、加工密合性、涂布性、粘接强度等诸性能的金属表面处理剂。
现有技术文献
专利文献
专利文献1:日本特开平11-29724号公报
专利文献2:日本特开平8-073775号公报
专利文献3:日本特开2001-316845号公报
专利文献4:日本特开平10-60315号公报
专利文献5:日本特开2000-297093号公报
专利文献6:日本特开平6-279463号公报
专利文献7:日本特开2007-297648号公报
发明内容
发明要解决的课题
本发明鉴于上述实际情况而完成,目的在于提供有机硅化合物及其制造方法、使用了该有机硅化合物的金属表面处理剂、利用该处理剂进行了表面处理的表面处理钢材及其表面处理方法、以及在其上具有上层覆膜的涂饰钢材及其制造方法,该有机硅化合物可用作非铬酸盐金属表面处理剂,该非铬酸盐金属表面处理剂最适合作为金属、特别是金属覆膜钢材用,不含铬,作为涂料等的涂布的前处理能够赋予优异的加工性、密合性、耐蚀性。
用于解决课题的手段
本发明为了实现上述目的,提供下述的有机硅化合物及其制造方法、金属表面处理剂、表面处理钢材及其表面处理方法、以及涂饰钢材及其制造方法。
[1]由下述通式(1)表示的有机硅化合物。
[化1]
(式中,R为水解性基团,R'为碳数1~4的烷基,A为碳数1~8的亚烷基,R1、R2、R3、R4中,R1与R2、R2与R3、或者R3与R4可各自结合而形成脂肪族或芳香族环骨架,没有形成环骨架的情况下,各自独立地为氢原子、或碳数1~6的烷基。m为1~3的整数。)
[2][1]所述的有机硅化合物,其由下述通式(2)表示。
[化2]
(式中,R5为碳数1~10的烷基、或者碳数6~10的芳基,R1、R2、R3、R4、m与上述相同。Me为甲基。)
[3][1]或[2]所述的有机硅化合物的制造方法,其特征在于,使由下述通式(3)表示的有机硅化合物与由下述通式(4)表示的苯并三唑化合物反应。
[化3]
(式中,R、R'、A、m与上述相同。)
[化4]
(式中,R1、R2、R3、R4与上述相同。)
[4]金属表面处理剂,其特征在于,以[1]或[2]所述的有机硅化合物作为有效成分。
[5][4]所述的金属表面处理剂,其特征在于,还包含由下述通式(13)表示的烷氧基硅烷或其部分水解缩合物。
R6 xSi(OR7)4-x (13)
(式中,R6表示碳数1~20的未取代或取代的一价烃基,R7表示碳数1~8的未取代或取代的一价烃基,x为0~3的整数。)。
[6][4]或[5]所述的金属表面处理剂,其特征在于,还包含有机钛酸酯。
[7][4]~[6]的任一项所述的金属表面处理剂,其特征在于,还包含水分散性二氧化硅或有机溶剂分散性二氧化硅。
[8][4]~[7]的任一项所述的金属表面处理剂,其特征在于,还包含选自Fe、Zr、Ti、V、W、Mo、Al、Sn、Nb、Hf、Y、Ho、Bi、La、Ce和Zn中的1种以上的金属的化合物。
[9][4]~[8]的任一项所述的金属表面处理剂,其特征在于,还包含含有硫羰基的化合物。
[10][4]~[9]的任一项所述的金属表面处理剂,其特征在于,还包含水溶性或水分散性树脂。
[11][4]~[10]的任一项所述的金属表面处理剂,其特征在于,还包含磷酸根离子。
[12]钢材的表面处理方法,其特征在于,用[4]~[11]的任一项所述的金属表面处理剂对钢材的表面进行表面处理。
[13]涂饰钢材的制造方法,其特征在于,用[4]~[11]的任一项所述的金属表面处理剂对钢材进行了处理后,进一步设置上层覆膜层。
[14]采用[12]所述的表面处理方法得到的表面处理钢材。
[15]采用[13]所述的制造方法得到的涂饰钢材。
发明的效果
本发明的有机硅化合物为具有苯并三唑基和脲键的硅烷偶联剂,将其作为必要成分的金属表面处理剂通过被处理金属材料和该硅烷偶联剂的苯并三唑基、脲键配位结合而形成难溶性的络合物,显现良好的防锈能力,而且通过水解性甲硅烷基,与基材和根据需要在上层设置的有机·无机树脂覆膜层的加工密合性优异,因此粘接强度高,因此得到的涂饰钢材的防锈耐蚀性以高水平显现。
具体实施方式
以下对本发明更详细地说明。
本发明的有机硅化合物是具有苯并三唑基和脲键的有机硅化合物,进而本发明的金属表面处理剂以其作为必要成分、将其在水、有机溶剂或者水与有机溶剂的混合溶剂中溶解而成。
[有机硅化合物]
本发明的有机硅化合物由下述通式(1)表示。
[化5]
(式中,R为水解性基团,R'为碳数1~4的烷基,A为碳数1~8的亚烷基,R1、R2、R3、R4中,R1与R2、R2与R3、或者R3与R4可各自结合而形成脂肪族或芳香族环骨架,没有形成环骨架的情况下,各自独立地为氢原子、或碳数1~6的烷基。m为1~3的整数。)
这种情况下,作为有机硅化合物,优选由下述通式(2)表示的有机硅化合物。
[化6]
(式中,R5为碳数1~10的烷基、或者碳数6~10的芳基,R1、R2、R3、R4、m与上述相同。Me为甲基。)
其中,作为上述式中的R,可列举出氯、溴等卤素原子,甲氧基、乙氧基等烷氧基,优选烷氧基,特别优选甲氧基。作为R',可列举出甲基、乙基、丙基等烷基,优选甲基。A可列举出亚甲基、亚乙基、亚丙基、亚己基、亚辛基等,优选碳数1~3的直链状的亚烷基,特别优选亚丙基。作为R1、R2、R3、R4,可列举出氢原子、甲基、乙基、丙基、异丙基、丁基、异丁基等烷基,R1与R2、R2与R3、或R3与R4结合的环己烷环、苯环等环骨架。m为1~3的整数,优选为2或3,特别优选为3。
本发明的有机硅化合物,从经济的观点出发,优选下述有机硅化合物(5)~(12)。
[化7]
[化8]
[有机硅化合物的合成方法]
本发明的有机硅化合物能够通过使由下述通式(3)
[化9]
(式中,R、R'、A、m与上述相同。)
表示的有机硅化合物与由下述通式(4)
[化10]
(式中,R1、R2、R3、R4与上述相同。)
表示的苯并三唑化合物反应而得到。
作为由通式(3)表示的有机硅化合物,可列举出3-异氰酸酯基丙基三甲氧基硅烷、3-异氰酸酯基丙基三乙氧基硅烷、3-异氰酸酯基丙基甲基二甲氧基硅烷、3-异氰酸酯基丙基甲基二乙氧基硅烷等。
作为由通式(4)表示的苯并三唑化合物,可列举出苯并三唑、3-甲基苯并三唑、4-甲基苯并三唑、5-甲基苯并三唑、6-甲基苯并三唑、1H-萘并[2,3]三唑、1H-萘并[1,2]三唑等。
这种情况下,适宜地选择上述式(3)的有机硅化合物与式(4)的苯并三唑化合物的比例,相对于式(3)的有机硅化合物1摩尔,优选使式(4)的苯并三唑化合物为0.5~1.5摩尔、特别地0.8~1.2摩尔。
本发明的有机硅化合物制造时可根据需要使用溶剂。溶剂只要与作为原料的含有异氰酸酯基的有机硅化合物及苯并三唑化合物为非反应性,则并无特别限定,具体地可列举出戊烷、己烷、庚烷、癸烷等脂肪族烃系溶剂,二乙基醚、四氢呋喃、1,4-二噁烷等醚系溶剂、甲酰胺、二甲基甲酰胺、N-甲基吡咯烷酮等酰胺系溶剂,苯、甲苯、二甲苯等芳香族烃系溶剂等。
本发明的有机硅化合物制造时,根据需要可使用催化剂。催化剂为一般使用的异氰酸酯的反应催化剂即可,优选为锡化合物。其中从催化剂活性的方面出发,更优选锡(II)的羧酸盐化合物。催化剂的使用量,相对于异氰酸酯单体1mol,为1~0.00001mol,更优选为0.01~0.0001mol。超过1mol而使用的情况下效果饱和,不经济。比0.00001mol少的情况下,催化效果不足,反应速度低,生产率降低。
本发明的有机硅化合物制造时,反应为放热反应,如果不需要地成为高温,则有可能发生副反应。因此,制造时优选的反应温度为20~150℃,更优选为30~130℃,进一步优选为40~110℃的范围。比20℃低的情况下,反应速度低,生产率降低。另一方面,超过150℃的情况下,有可能发生异氰酸酯单体的聚合反应等副反应。
本发明的有机硅化合物制造时所必需的反应时间,只要可进行基于上述所述那样的放热反应的温度管理,并且放热反应完成,则并无特别限定,优选为10分钟~24小时,更优选为1小时~10小时左右。
[金属表面处理剂]
本发明的金属表面处理剂为以由下述式(1)表示的有机硅化合物作为有效成分的金属表面处理剂。
[化11]
(式中,R、R'、A、R1、R2、R3、R4、m如上述所述。)
更优选地,为以由下述式(2)表示的有机硅化合物作为有效成分的金属表面处理剂。
[化12]
(式中,R1、R2、R3、R4、R5、Me、m如上述所述。)
本发明的金属表面处理剂中使用的有机硅化合物,从经济的观点出发,优选上述的有机硅化合物(5)~(12)。
作为本发明的金属表面处理剂的其他成分,能够列举出水、将上述有机硅化合物溶解的有机溶剂、或者水与该有机溶剂的混合溶剂,作为该有机溶剂,可列举出甲醇、乙醇等醇系溶剂,甲酰胺、N,N-二甲基甲酰胺、吡咯烷酮、N-甲基吡咯烷酮等酰胺系溶剂,丙酮、甲乙酮、甲基异丁基酮等酮系溶剂,戊烷、己烷、庚烷等饱和烃系溶剂,苯、甲苯、二甲苯等芳香族烃系溶剂等,其中特别优选甲醇、乙醇,但并不限于在此列举的实例。
再有,上述式(1)~(12)的有机硅化合物优选在本发明的金属表面处理剂中以0.01~200g/L、特别地0.05~100g/L的浓度含有,如果含量过少,有时本发明的效果变得不充分,如果过多,有时涂料的液体稳定性降低。
本发明的金属表面处理剂优选还包含由上述式(1)~(12)表示的有机硅化合物以外的有机硅化合物。作为有机硅化合物,只要是由上述式(1)~(12)表示的有机硅化合物以外的具有水解性甲硅烷基的化合物,则并无特别限定,优选为由下述通式(13)表示的具有水解性甲硅烷基的有机硅化合物或其部分水解缩合物。
R6 xSi(OR7)4-x (13)
(式中,R6表示碳数1~20、特别地碳数1~15的未取代或取代的一价烃基,R7表示碳数1~8、特别地碳数1~6的未取代或取代的一价烃基,优选为甲基、乙基。x为0~3的整数,特别优选0~2的整数。)
其中,作为上述未取代的一价烃基,可列举出甲基、乙基、丙基等烷基,乙烯基、烯丙基等烯基,苯基、甲苯基等芳基,苄基等芳烷基。作为取代的一价烃基,可列举出用环氧基、(甲基)丙烯酰氧基、巯基、氨基、氨基烷基氨基、烷基氨基、异氰酸酯基、聚醚基、卤素原子、全氟聚醚基将烷基等未取代的一价烃基的氢原子的1个或多个取代的产物。
具体地,可列举出四甲氧基硅烷、四乙氧基硅烷、甲基三甲氧基硅烷、甲基三乙氧基硅烷、二甲基二甲氧基硅烷、二甲基二乙氧基硅烷、三甲基甲氧基硅烷、三甲基乙氧基硅烷、苯基三甲氧基硅烷、苯基三乙氧基硅烷、苯基甲基二甲氧基硅烷、苯基甲基二乙氧基硅烷、苯基二甲基甲氧基硅烷、苯基二甲基乙氧基硅烷、二苯基二甲氧基硅烷、二苯基二乙氧基硅烷、乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、乙烯基甲基二甲氧基硅烷、乙烯基甲基二乙氧基硅烷、γ-缩水甘油氧基丙基三甲氧基硅烷、γ-缩水甘油氧基丙基三乙氧基硅烷、γ-缩水甘油氧基丙基甲基二甲氧基硅烷、γ-缩水甘油氧基丙基甲基二乙氧基硅烷、γ-(甲基)丙烯酰氧基丙基三甲氧基硅烷、γ-(甲基)丙烯酰氧基丙基三乙氧基硅烷、γ-(甲基)丙烯酰氧基丙基甲基二甲氧基硅烷、γ-(甲基)丙烯酰氧基丙基甲基二乙氧基硅烷、3-巯基丙基三甲氧基硅烷、3-巯基丙基三乙氧基硅烷、3-巯基丙基甲基二甲氧基硅烷、3-巯基丙基甲基二乙氧基硅烷、3-氨基丙基三甲氧基硅烷、3-氨基丙基三乙氧基硅烷、3-氨基丙基甲基二甲氧基硅烷、3-氨基丙基甲基二乙氧基硅烷、N-氨基乙基-γ-氨基丙基三甲氧基硅烷、N-氨基乙基-γ-氨基丙基三乙氧基硅烷、N-氨基乙基-γ-氨基丙基甲基二甲氧基硅烷、N-氨基乙基-γ-氨基丙基甲基二乙氧基硅烷、γ-异氰酸酯基丙基三甲氧基硅烷、γ-异氰酸酯基丙基三乙氧基硅烷、γ-异氰酸酯基丙基甲基二甲氧基硅烷、γ-异氰酸酯基丙基甲基二乙氧基硅烷、3-氯丙基三甲氧基硅烷、3-氯丙基三乙氧基硅烷、3-氯丙基甲基二甲氧基硅烷、3-氯丙基甲基二乙氧基硅烷、2-(3,4-环氧环己基)乙基三甲氧基硅烷、2-(3,4-环氧环己基)乙基三乙氧基硅烷、2-(3,4-环氧环己基)乙基甲基二甲氧基硅烷、2-(3,4-环氧环己基)乙基甲基二乙氧基硅烷等。
配合上述有机硅化合物的情况下,优选在金属表面处理剂中以0.05~100g/L的浓度含有,特别优选以0.5~60g/L的浓度含有。如果含量不到0.05g/L,有时耐蚀性不足,如果超过100g/L,有时耐蚀性饱和、生产率降低。
本发明的金属表面处理剂优选还包含有机钛酸酯类。该有机钛酸酯类可使用已市售的产品,对结构等并无特别限定,作为有机钛酸酯类,具体地可列举出钛酸四乙酯、钛酸四异丙酯、钛酸四正丁酯、钛酸丁酯二聚体、钛酸四(2-乙基己基)酯、及它们的聚合物。另外,也能够使用乙酰钛酸钛、聚乙酰丙酮钛、辛基甘氨酸钛、乳酸钛、乳酸乙酯钛、三乙醇胺钛等钛螯合化合物,能够将它们中的1种单独使用或者将2种以上并用而使用。
配合上述有机钛酸酯类的情况下,优选在金属表面处理剂中以0.05~100g/L的浓度含有,特别优选以0.5~60g/L的浓度含有。如果含量不到0.05g/L,有时耐蚀性不足,如果超过100g/L,有时耐蚀性饱和、金属表面处理剂的浴稳定性反而降低。
本发明的金属表面处理剂优选还包含水或有机溶剂分散性二氧化硅。作为该水或有机溶剂分散性二氧化硅,并无特别限定,但优选钠等杂质少、为弱碱系的球状二氧化硅、链状二氧化硅、铝改性二氧化硅。作为球状二氧化硅,能够列举出“スノーテックスN”、“スノーテックスUP”(均为日产化学工业株式会社制造)等胶体二氧化硅、“AEROSIL”(日本AEROSIL公司制造)等气相法二氧化硅,作为链状二氧化硅,能够使用“スノーテックスPS”(日产化学工业株式会社制造)等硅胶,进而作为铝改性二氧化硅,能够使用“ADELITE AT-20A”(旭电化工业株式会社制造)等市售的硅胶。
再有,作为有机溶剂,能够例示甲醇、乙醇、异丙醇等醇,丙二醇单甲基醚、四氢呋喃等醚化合物。
配合上述水或有机溶剂分散性二氧化硅的情况下,优选在金属表面处理剂中以固体成分计以0.05~100g/L、特别地0.5~60g/L的浓度含有。如果水或有机溶剂分散性的二氧化硅的含量不到0.05g/L,有时耐蚀性不足,如果超过100g/L,有时看不到耐蚀性提高效果、金属表面处理剂的浴稳定性反而降低。
本发明的金属表面处理剂优选还包含选自Fe、Zr、Ti、V、W、Mo、Al、Sn、Nb、Hf、Y、Ho、Bi、La、Ce和Zn中的任1种以上的金属的化合物。具体地,可列举出上述金属的碳酸盐、氧化物、氢氧化物、硝酸盐、硫酸盐、磷酸盐、氟化物、含氟酸或其盐、含氧酸盐、有机酸盐等。
更具体地,作为锆(Zr)化合物的例子,可列举出碳酸锆铵、氟锆酸、氟锆酸铵、氟锆酸钾、氟锆酸钠、乙酰丙酮锆、丁醇锆的1-丁醇溶液、正丙醇锆等。
作为钛(Ti)化合物的例子,可列举出氟钛酸、氟钛酸铵、草酸钛钾、异丙醇钛、钛酸异丙酯、乙醇钛、2-乙基-1-己酸钛、钛酸四异丙酯、钛酸四正丁酯、氟钛酸钾、氟钛酸钠等。
作为钒(V)化合物的例子,可列举出五氧化钒(V)、三氧化钒(III)、二氧化钒(IV)、氢氧化钒(II)、氢氧化钒(III)、硫酸钒(II)、硫酸钒(III)、硫酸氧钒(IV)、氟化钒(III)、氟化钒(IV)、氟化钒(V)、三氯化氧钒VOCl3、三氯化钒VCl3、六氟钒酸(III)或其盐(钾盐、铵盐等)、偏钒酸(V)或其盐(钠盐、铵盐等)、乙酰丙酮氧钒(IV)VO(OC(=CH2)CH2COCH3)2、乙酰丙酮钒(III)V(OC(=CH2)CH2COCH3)3、磷钒钼酸H15-X[PV12-XMoO40]·nH2O(6<X<12,n<30)等。
作为钨(W)化合物的例子,可列举出氧化钨(IV)、氧化钨(V)、氧化钨(VI)、氟化钨(IV)、氟化钨(VI)、钨酸(VI)H2WO4或其盐(铵盐、钠盐等)、偏钨酸(VI)H6[H2W12O40]或其盐(铵盐、钠盐等)、仲钨酸(VI)H10[H10W12O46]或其盐(铵盐、钠盐等)等。
作为钼(Mo)化合物的例子,可列举出磷钒钼酸H15-X[PV12-XMoO40]·nH2O(6<X<12,n<30)、氧化钼、钼酸H2MoO4、钼酸铵、仲钼酸铵、钼酸钠、钼磷酸化合物(例如钼磷酸铵(NH4)3[PO4Mo12O36]·3H2O、钼磷酸钠Na3[PO4Mo12O36]·nH2O等)等。
作为铝(Al)化合物的例子,可列举出硝酸铝、硫酸铝、硫酸钾铝、硫酸钠铝、硫酸铵铝、磷酸铝、碳酸铝、氧化铝、氢氧化铝等。
作为锡(Sn)化合物的例子,可列举出氧化锡(IV)、锡酸钠Na2SnO3、氯化锡(II)、氯化锡(IV)、硝酸锡(II)、硝酸锡(IV)、六氟锡酸铵(NH4)2SnF6等。
作为铌(Nb)化合物的例子,可列举出五氧化铌(Nb2O5)、铌酸钠(NaNbO3)、氟化铌(NbF5)、六氟铌酸铵(NH4)NbF6等。
作为铪(Hf)化合物、钇(Y)化合物、钬(Ho)化合物、铋(Bi)化合物、镧(La)化合物的例子,可列举出氧化铪、六氟铪酸、氧化钇、乙酰丙酮钇、氧化钬、氧化铋、氧化镧等。
作为铈(Ce)化合物的例子,可列举出氧化铈、醋酸铈Ce(CH3CO2)3、硝酸铈(III)或(IV)、硝酸铈铵、硫酸铈、氯化铈等。
作为锌(Zn)化合物的例子,可列举出氧化锌、氢氧化锌、醋酸锌、硝酸锌、硫酸锌、氯化锌、锌酸钠等。
上述化合物可单独使用1种,也可将2种以上并用。
配合上述化合物的情况下,在金属表面处理剂中,以金属离子的量计,优选各自以0.01~50g/L、特别地0.05~5g/L的浓度含有。如果上述化合物的含量各自为不到0.01g/L,则有时耐蚀性变得不充分,如果超过50g/L,则有时看不到加工密合性能的提高效果、浴稳定性反而降低。
本发明的金属表面处理剂优选还包含含有硫羰基的化合物。作为含有硫羰基的化合物,能够例示硫脲、二甲基硫脲、1,3-二甲基硫脲、二丙基硫脲、二丁基硫脲、1,3-二苯基-2-硫脲、2,2-二(甲苯基)硫脲、硫代乙酰胺、二甲基二硫代氨基甲酸钠、一硫化四甲基秋兰姆、二硫化四丁基秋兰姆、N-乙基-N-苯基二硫代氨基甲酸锌、二甲基二硫代氨基甲酸锌、五亚甲基二硫代氨基甲酸哌啶盐、二乙基二硫代氨基甲酸锌、二乙基二硫代氨基甲酸钠、异丙基黄原酸锌、亚乙基硫脲、硫化二甲基黄原酸酯、二硫代草酰胺、聚二硫代氨基甲酸或其盐等含有至少1个硫羰基的化合物。上述化合物可单独地使用,也可将2种以上并用。
配合上述含有硫羰基的化合物的情况下,优选在本发明的金属表面处理剂中以0.01~100g/L、特别地0.1~10g/L的浓度含有。如果上述化合物的含量不到0.01g/L,有时耐蚀性变得不充分,如果超过100g/L,有时耐蚀性饱和,变得不经济。
本发明的金属表面处理剂优选还包含水溶性或水分散性树脂。作为水溶性或水分散性树脂,可列举出丙烯酸系树脂、环氧系树脂、聚氨酯系树脂、乙烯丙烯酸系共聚物、酚醛系树脂、聚酯系树脂、聚烯烃系树脂、醇酸系树脂、聚碳酸酯系树脂等。这些树脂可单独使用,也可将2种以上并用,进而可进行共聚而使用。具体地,例如作为水溶性丙烯酸系树脂,为以丙烯酸和/或甲基丙烯酸作为主成分的共聚物,能够例示丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯等,也可使用它们的衍生物、与其他的丙烯酸系单体的共聚物。特别地,共聚物中的丙烯酸和/或甲基丙烯酸单体比例优选为70质量%以上。
另外,使用树脂时,为了提高其成膜性,形成更为均匀、平滑的涂膜,可使用有机溶剂。进而,可使用表面活性剂、流平剂、润湿性提高剂、消泡剂。
水溶性或水分散性树脂的分子量,以采用凝胶渗透色谱(GPC)的聚苯乙烯换算重均分子量计,优选为1万以上。更优选为30万~200万。如果不到1万,有时无法充分地发挥本发明的效果、特别是涂膜的深冲性提高效果。另外,如果超过200万,有时粘度升高,处理作业的效率降低。
配合上述水溶性或水分散性树脂的情况下,优选在金属表面处理剂中以0.1~100g/L、特别地5~80g/L的浓度含有。如果树脂的浓度不到0.1g/L,有时提高折曲密合性和深冲性的效果变得不充分,如果超过100g/L,有时折曲密合性和深冲性的提高效果饱和,变得不经济。
本发明的金属表面处理剂优选还包含磷酸根离子。通过添加磷酸根离子,能够进一步提高耐蚀性。该磷酸根离子的添加能够通过添加可在水中形成磷酸根离子的化合物而进行。作为这样的化合物,可列举出磷酸、Na3PO4、Na2HPO4、NaH2PO4等磷酸盐类、缩合磷酸、多聚磷酸、偏磷酸、二聚磷酸等缩合的磷酸或它们的盐类。这些可单独地使用,另外也可将2种以上并用。
配合上述磷酸根离子时的添加量,优选在金属表面处理剂中为0.01~100g/L的浓度,更优选为0.1~10g/L的浓度。如果添加量不到0.01g/L,则有时耐蚀性的改善效果变得不充分,如果超过100g/L,则有时对锌系镀敷钢材产生过度的蚀刻,引起性能降低,或者在作为其他成分包含水性树脂的情况下引起凝胶化。
另外,本发明的金属表面处理剂可进一步配合公知的添加剂作为金属表面处理剂。例如可例示鞣酸或其盐、植酸或其盐等。
本发明的金属表面处理剂作为铜板、冷轧钢材、热轧钢材、不锈钢材、进而电镀锌钢材、熔融镀锌钢材、锌-铝合金系镀敷钢材、锌-铁合金系镀敷钢材、锌-镁合金系镀敷钢材、锌-铝-镁合金系镀敷钢材、铝系镀敷钢材、铝-硅合金系镀敷钢材、锡系镀敷钢材、铅-锡合金系镀敷钢材、铬系镀敷钢材、镍系镀敷钢材等金属钢材的表面处理剂使用,特别是对于金属被覆钢材(镀敷钢材)效果显著。
作为该表面处理剂的使用方法、即表面处理方法,可以是将上述金属表面处理剂涂布于被涂物、涂布后使被涂物干燥的方法,也可以是预先将被涂物加热、然后涂布上述本发明的金属表面处理剂、利用余热使其干燥的方法。
在任一情况下,都能够使上述干燥条件成为室温~250℃下2秒~1小时、优选地40~180℃下5秒~20分钟。如果超过250℃,有可能产生密合性、耐蚀性等的性能劣化。
上述表面处理方法中,就上述本发明的金属表面处理剂的涂布量而言,优选干燥后的覆膜质量为0.1mg/m2以上。如果覆膜质量为不到0.1mg/m2,则有时防锈性不足。另一方面,如果附着量过多,则作为涂饰用前处理剂是不经济的,更优选为0.5~500mg/m2,进一步优选为1~250mg/m2。
在上述表面处理方法中,对金属表面处理剂的涂布方法并无特别限定,能够采用一般使用的辊涂、淋涂、喷射、浸渍、毛刷涂布等进行涂布。另外,成为被处理的对象的钢材为上述的金属钢材,特别是最适合各种镀敷钢材的处理。
本发明的涂饰钢材的制造方法为用上述金属表面处理剂对上述金属钢材进行表面处理、干燥、接下来涂布上层覆膜层的方法。作为上述覆膜层,能够列举出根据需要非铬酸盐底漆涂布干燥后、进而涂布面涂层的涂饰体系、具有耐指纹性、润滑性等功能的功能性涂层等。上述制造方法并不限于预涂覆钢材,也能够适用于后涂覆钢材,本发明中涂饰钢材包含它们两者。另外,本发明中钢材是包含钢板的概念。
作为本发明中能够使用的上述非铬酸盐底漆,在底漆的配合中没有使用铬酸盐系防锈颜料的底漆全部能够使用。作为这样的底漆,优选使用了钒酸系防锈颜料和磷酸系防锈颜料的底漆(V/P颜料底漆)或使用了硅酸钙系防锈颜料的底漆。
上述底漆的涂布膜厚以干燥膜厚计,优选为1~20μm。如果不到1μm,有时耐蚀性不足,如果超过20μm,有时加工密合性降低。
就上述非铬酸盐底漆的烧结干燥条件而言,例如在金属表面温度150~250℃下能够使时间为10秒~5分钟。
作为上述面涂层,并无特别限定,通常的涂饰用面涂层全部能够使用。另外,作为功能性涂层,并无特别限定,现在在铬酸盐系前处理覆膜上施用的涂层等全部可使用。对上述非铬酸盐底漆和面涂层、功能性涂层的涂布方法并无特别限定,能够利用一般使用的辊涂、淋涂、空气喷涂、无空气喷涂、浸渍等。另外,面涂层的厚度能够适当地选择,能够使其成为与其种类相符的通常的涂膜厚度。
实施例
以下列举实施例和比较例对本发明更详细地说明,但本发明并不限定于这些实施例。应予说明,以下的例子中份表示质量份,Me表示甲基,IR为红外分光法的简写。
[实施例1]
有机硅化合物(5)的制造法
在具有搅拌器、回流冷凝器、滴液漏斗和温度计的1L可拆式烧瓶中装入苯并三唑118.1g(1mol)、甲苯200g,加热到40℃。在其中滴入3-异氰酸酯基丙基三甲氧基硅烷205.3g(1mol),在100℃下搅拌1小时。然后,通过IR测定确认原料的来自异氰酸酯基的吸收峰完全地消失,作为反应结束。然后,将溶剂除去而得到的生成物为黄色液体,通过凝胶渗透色谱(GPC),反应生成物为由下述式(5)表示的单一的生成物。
[化13]
[实施例2]
有机硅化合物(8)的制造法
在具有搅拌器、回流冷凝器、滴液漏斗和温度计的1L可拆式烧瓶中装入5-甲基苯并三唑133.2g(1mol)、甲苯200g,加热到40℃。向其中滴入3-异氰酸酯基丙基三甲氧基硅烷205.3g(1mol),在100℃下搅拌了1小时。然后,通过IR测定确认原料的来自异氰酸酯基的吸收峰完全消失,作为反应结束。然后,将溶剂除去而得到的生成物为黄色液体,通过凝胶渗透色谱(GPC),反应生成物为由下述式(8)表示的单一的生成物。
[化14]
[实施例3]
有机硅化合物(9)的制造法
在具有搅拌器、回流冷凝器、滴液漏斗和温度计的1L可拆式烧瓶中装入6-甲基苯并三唑133.2g(1mol)、甲苯200g,加热到40℃。向其中滴入3-异氰酸酯基丙基三甲氧基硅烷205.3g(1mol),在100℃下搅拌了1小时。然后,通过IR测定确认原料的来自异氰酸酯基的吸收峰完全消失,作为反应结束。然后,将溶剂除去而得到的生成物为黄色液体,通过凝胶渗透色谱(GPC),反应生成物为由下述式(9)表示的单一的生成物。
[化15]
[实施例4]
通过在甲醇990g、水10g的混合溶剂中添加10g(以不挥发分计)实施例1中得到的有机硅化合物(5),在室温下搅拌5分钟,从而得到了金属表面处理剂。用棒式涂布机No.20将得到的金属表面处理剂涂布于脱脂干燥了的市售的熔融镀锌钢板(日本テストパネル社制造;70×150×0.4mm)以使干燥膜厚成为10μm,在金属表面温度105℃下使其干燥10分钟。然后,使用棒式涂布机No.16涂布含有V/P颜料的非铬酸盐底漆以使干燥膜厚成为5μm,在金属表面温度215℃下将其干燥5分钟。进而,作为面涂层,使用棒式涂布机No.36涂布フレキコート1060(聚酯系面涂涂料;日本ペイント社制造)以使干燥膜厚成为15μm,在金属表面温度230℃下使其干燥,得到了试验板。按照下述的评价方法对得到的试验板的折曲密合性、深冲性、耐蚀性进行评价,将其结果记载于表1中。
[实施例5、6]
除了将实施例1中得到的化合物变为实施例2和3中得到的化合物以外,与实施例4同样地制备了金属表面处理剂。使用这些金属表面处理剂,与实施例4同样地制作试验板,进行了这些评价。将得到的结果记载于表1中。
[实施例7~13]
除了将实施例1中得到的化合物、硅烷系化合物的种类和浓度、有机钛酸酯、水分散性二氧化硅、锆离子、含有硫羰基的化合物、水溶性树脂以及磷酸根离子的浓度分别如表1中记载那样配合以外,与实施例4同样地制备了金属表面处理剂。使用这些金属表面处理剂,与实施例4同样地制作试验板,进行了这些评价。将得到的结果记载于表1中。
[比较例1~3]
除了没有使用实施例1~3中得到的化合物,将硅烷系化合物的种类和浓度、有机钛酸酯、水分散性二氧化硅、锆离子、含有硫羰基的化合物、水溶性树脂以及磷酸根离子的浓度分别如表1中记载那样配合以外,与实施例4同样地制备了金属表面处理剂。使用这些金属表面处理剂,与实施例4同样地制作试验板,进行了这些评价。将得到的结果记载于表1。
[比较例4]
除了代替金属表面处理剂,将市售的涂布型铬酸盐处理剂(含有树脂型)涂布、干燥以使铬附着量成为20mg/m2,以及使用了含有铬的底漆(含有铬酸锶颜料的底漆)以外,与实施例4同样地制作试验板和评价,将得到的结果记载于表1中。
应予说明,下述表1中,作为硅烷系化合物、有机钛酸酯、水分散性二氧化硅、形成锆离子的化合物、含有硫羰基的化合物、水溶性树脂、形成磷酸根离子的化合物,使用了以下的市售品。
[硅烷化合物]
A:KBM-903(γ-氨基丙基三甲氧基硅烷;信越化学工业(株)制造)
B:KBM-403(γ-缩水甘油氧基丙基三甲氧基硅烷;信越化学工业(株)制造)
C:KBM-403和苯并三唑的反应生成物(参考日本特开平6-279463号公报合成)
[有机钛酸酯]
四异丙氧基钛
[水分散性二氧化硅]
甲醇硅溶胶(日产化学工业社制造)
[形成锆离子的化合物]
ジルコノゾールAC-7(碳酸锆铵;第一稀元素社制造)
[含有硫羰基的化合物]
硫脲
[水溶性树脂]
聚丙烯酸(重均分子量100万)
[形成磷酸根离子的化合物]
磷酸
[评价方法]
上述实施例4~13和比较例1~4中的折曲密合性、深冲性、耐蚀性的评价基于以下的方法、评价标准进行。
折曲密合性:
在20℃的环境下、使用锥形芯轴试验机使试验板夹持2mmφ的间隔物,进行180°折曲加工,对折曲加工部进行3次胶带剥离,用20倍放大镜观察剥离程度,按照下述的标准进行了评价。
A:无裂纹
B:在加工部整面具有裂纹
C:剥离面积为加工部的不到20%
D:剥离面积为加工部的20%以上~不到80%
E:剥离面积为加工部的80%以上
深冲性:
在20℃的环境下在拉深比:2.3、防皱压力:2t、冲头R:5mm、模肩R:5mm、无涂油的条件下进行了圆筒深拉试验。然后,从交叉切割部测定涂膜的剥离宽度,按照下述的标准进行了评价。
A:鼓起宽度为不到1mm
B:鼓起宽度为1mm以上~不到2mm
C:鼓起宽度为2mm以上~不到3mm
D:鼓起宽度为3mm以上~不到5mm
E:鼓起宽度为5mm以上
耐蚀性:
(切割部)
在试验板中形成交叉切痕,进行了500小时的基于JISZ2371的盐水喷雾试验后,测定切割部单侧的鼓起宽度,按照下述的标准进行了评价。
A:鼓起宽度为0mm
B:鼓起宽度超过0mm~不到1mm
C:鼓起宽度为1mm以上~不到3mm
D:鼓起宽度为3mm以上~不到5mm
E:鼓起宽度为5mm以上
(端面)
对试验板进行了500小时的基于JISZ2371的盐水喷雾试验后,采用与切割部相同的标准对从上毛刺端面的鼓起宽度进行了评价。
[表1]
以上的实施例和比较例的结果证实使用本发明的金属表面处理剂形成的覆膜给予良好的防锈能力和基材密合性。
Claims (16)
6.根据权利要求4或5所述的金属表面处理剂,其特征在于,还包含由下述通式(13)表示的烷氧基硅烷或其部分水解缩合物:
R6 xSi(OR7)4-x (13)
式中,R6表示碳数1~20的未取代或取代的一价烃基,R7表示碳数1~8的未取代或取代的一价烃基,x为0~3的整数。
7.根据权利要求4或5所述的金属表面处理剂,其特征在于,还包含有机钛酸酯。
8.根据权利要求4或5所述的金属表面处理剂,其特征在于,还包含水分散性二氧化硅或有机溶剂分散性二氧化硅。
9.根据权利要求4或5所述的金属表面处理剂,其特征在于,还包含选自Fe、Zr、Ti、V、W、Mo、Al、Sn、Nb、Hf、Y、Ho、Bi、La、Ce和Zn中的1种以上的金属的化合物。
10.根据权利要求4或5所述的金属表面处理剂,其特征在于,还包含含有硫羰基的化合物。
11.根据权利要求4或5所述的金属表面处理剂,其特征在于,还包含水溶性或水分散性树脂。
12.根据权利要求4或5所述的金属表面处理剂,其特征在于,还包含磷酸根离子。
13.钢材的表面处理方法,其特征在于,用权利要求4~12的任一项所述的金属表面处理剂对钢材的表面进行表面处理。
14.涂饰钢材的制造方法,其特征在于,用权利要求4~12的任一项所述的金属表面处理剂对钢材处理后,进一步设置上层覆膜层。
15.采用权利要求13所述的表面处理方法得到的表面处理钢材。
16.采用权利要求14所述的制造方法得到的涂饰钢材。
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Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4623740A (en) * | 1984-07-04 | 1986-11-18 | Ulrich Deschler | N,N'- and N,N',N'-substituted silylureas and process for their production |
JP2000297093A (ja) * | 1999-04-15 | 2000-10-24 | Japan Energy Corp | 新規有機ケイ素化合物およびその製造方法並びにそれを用いる表面処理剤および樹脂添加剤 |
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JPH0873775A (ja) | 1994-09-02 | 1996-03-19 | Nippon Parkerizing Co Ltd | 耐指紋性、耐食性、塗装密着性にすぐれた皮膜形成用金属表面処理剤および処理方法 |
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JP5055822B2 (ja) | 2006-04-27 | 2012-10-24 | 住友金属工業株式会社 | 塗膜密着性に優れた塗装鋼板 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4623740A (en) * | 1984-07-04 | 1986-11-18 | Ulrich Deschler | N,N'- and N,N',N'-substituted silylureas and process for their production |
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