JP2016063131A5 - - Google Patents

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Publication number
JP2016063131A5
JP2016063131A5 JP2014191306A JP2014191306A JP2016063131A5 JP 2016063131 A5 JP2016063131 A5 JP 2016063131A5 JP 2014191306 A JP2014191306 A JP 2014191306A JP 2014191306 A JP2014191306 A JP 2014191306A JP 2016063131 A5 JP2016063131 A5 JP 2016063131A5
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JP
Japan
Prior art keywords
power source
processing apparatus
plasma processing
frequency power
magnetic field
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JP2014191306A
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English (en)
Japanese (ja)
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JP2016063131A (ja
JP6351458B2 (ja
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Priority to JP2014191306A priority Critical patent/JP6351458B2/ja
Priority claimed from JP2014191306A external-priority patent/JP6351458B2/ja
Publication of JP2016063131A publication Critical patent/JP2016063131A/ja
Publication of JP2016063131A5 publication Critical patent/JP2016063131A5/ja
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Publication of JP6351458B2 publication Critical patent/JP6351458B2/ja
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JP2014191306A 2014-09-19 2014-09-19 プラズマ処理装置 Active JP6351458B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014191306A JP6351458B2 (ja) 2014-09-19 2014-09-19 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014191306A JP6351458B2 (ja) 2014-09-19 2014-09-19 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2016063131A JP2016063131A (ja) 2016-04-25
JP2016063131A5 true JP2016063131A5 (enExample) 2017-02-09
JP6351458B2 JP6351458B2 (ja) 2018-07-04

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Family Applications (1)

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JP2014191306A Active JP6351458B2 (ja) 2014-09-19 2014-09-19 プラズマ処理装置

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JP (1) JP6351458B2 (enExample)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2913131B2 (ja) * 1991-08-12 1999-06-28 東京エレクトロン株式会社 マイクロ波プラズマ装置
JP3121669B2 (ja) * 1992-03-31 2001-01-09 株式会社東芝 マイクロ波プラズマ発生装置
JP4224374B2 (ja) * 2002-12-18 2009-02-12 株式会社日立ハイテクノロジーズ プラズマ処理装置の処理方法およびプラズマ処理方法
JP2005079603A (ja) * 2004-09-29 2005-03-24 Hitachi Ltd プラズマ処理装置

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