JP6351458B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP6351458B2
JP6351458B2 JP2014191306A JP2014191306A JP6351458B2 JP 6351458 B2 JP6351458 B2 JP 6351458B2 JP 2014191306 A JP2014191306 A JP 2014191306A JP 2014191306 A JP2014191306 A JP 2014191306A JP 6351458 B2 JP6351458 B2 JP 6351458B2
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power source
frequency power
magnetic field
coil
plasma processing
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Japanese (ja)
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JP2016063131A5 (enExample
JP2016063131A (ja
Inventor
亨 伊東
亨 伊東
田村　仁
仁 田村
康雄 大越
康雄 大越
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2014191306A 2014-09-19 2014-09-19 プラズマ処理装置 Active JP6351458B2 (ja)

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JP2014191306A JP6351458B2 (ja) 2014-09-19 2014-09-19 プラズマ処理装置

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JP2014191306A JP6351458B2 (ja) 2014-09-19 2014-09-19 プラズマ処理装置

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JP2016063131A JP2016063131A (ja) 2016-04-25
JP2016063131A5 JP2016063131A5 (enExample) 2017-02-09
JP6351458B2 true JP6351458B2 (ja) 2018-07-04

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JP2014191306A Active JP6351458B2 (ja) 2014-09-19 2014-09-19 プラズマ処理装置

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Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2913131B2 (ja) * 1991-08-12 1999-06-28 東京エレクトロン株式会社 マイクロ波プラズマ装置
JP3121669B2 (ja) * 1992-03-31 2001-01-09 株式会社東芝 マイクロ波プラズマ発生装置
JP4224374B2 (ja) * 2002-12-18 2009-02-12 株式会社日立ハイテクノロジーズ プラズマ処理装置の処理方法およびプラズマ処理方法
JP2005079603A (ja) * 2004-09-29 2005-03-24 Hitachi Ltd プラズマ処理装置

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JP2016063131A (ja) 2016-04-25

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