JP2016058555A - 光電変換装置、光電変換システム - Google Patents
光電変換装置、光電変換システム Download PDFInfo
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- JP2016058555A JP2016058555A JP2014183698A JP2014183698A JP2016058555A JP 2016058555 A JP2016058555 A JP 2016058555A JP 2014183698 A JP2014183698 A JP 2014183698A JP 2014183698 A JP2014183698 A JP 2014183698A JP 2016058555 A JP2016058555 A JP 2016058555A
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 169
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- 239000011787 zinc oxide Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
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- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
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- VBVAVBCYMYWNOU-UHFFFAOYSA-N coumarin 6 Chemical compound C1=CC=C2SC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 VBVAVBCYMYWNOU-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
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- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
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- 238000001020 plasma etching Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14632—Wafer-level processed structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14687—Wafer level processing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
- H01L27/14689—MOS based technologies
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14636—Interconnect structures
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- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
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- Manufacturing & Machinery (AREA)
Abstract
Description
図1は、本実施例の光電変換装置の構成の一例を示した図である。
dVB=(Vd2−Vd1)×C1/(C1+C2) ・・・(1)
と表される。以下の説明では、説明を簡単にするため、容量値C1と容量値C2とが等しいとする。従って、変化量dVBは、
dVB=(Vd2−Vd1)×(1/2) ・・・(2)
と表される。
上記の実施例で述べた光電変換装置は種々の光電変換システムに適用可能である。光電変換システムの一例としては、デジタルスチルカメラ、デジタルカムコーダー、監視カメラなどがあげられる。図6に、光電変換システムの一例としてデジタルスチルカメラに本発明の実施例1の光電変換装置を適用した光電変換システムの模式図を示す。
106 酸化導電膜
201 共通電極
203 ブロッキング層
205 光電変換層
207 絶縁層
209 画素電極
Claims (4)
- 光電変換層を各々が有する複数の画素と、
前記複数の画素の各々の前記光電変換層に対して電位を共通に供給する第1の電極と、
前記電位を前記第1の電極に供給する第2の電極とを有する光電変換装置であって、
前記第1の電極と前記第2の電極とに挟まれて設けられた酸化導電膜をさらに有することを特徴とする光電変換装置。 - 前記酸化導電膜が、酸化インジウムを含む膜であることを特徴とする請求項1に記載の光電変換装置。
- 前記第2の電極が、前記複数の画素の外周で囲まれた領域の外部に設けられていることを特徴とする請求項1または2に記載の光電変換装置。
- 請求項1〜3のいずれかに記載の光電変換装置と、
前記光電変換装置が出力する信号を用いて画像データを出力する出力信号処理部と、
を有することを特徴とする光電変換システム。
Priority Applications (2)
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---|---|---|---|
JP2014183698A JP6465597B2 (ja) | 2014-09-09 | 2014-09-09 | 光電変換装置、光電変換システム |
US14/846,332 US9698189B2 (en) | 2014-09-09 | 2015-09-04 | Photoelectric converter and photoelectric conversion system |
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JP2014183698A JP6465597B2 (ja) | 2014-09-09 | 2014-09-09 | 光電変換装置、光電変換システム |
Publications (3)
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JP2016058555A true JP2016058555A (ja) | 2016-04-21 |
JP2016058555A5 JP2016058555A5 (ja) | 2017-10-12 |
JP6465597B2 JP6465597B2 (ja) | 2019-02-06 |
Family
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JP2014183698A Expired - Fee Related JP6465597B2 (ja) | 2014-09-09 | 2014-09-09 | 光電変換装置、光電変換システム |
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US (1) | US9698189B2 (ja) |
JP (1) | JP6465597B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2019239851A1 (ja) * | 2018-06-14 | 2020-12-17 | パナソニックIpマネジメント株式会社 | 制御電極と、透明電極と、前記制御電極と前記透明電極の側面とを電気的に接続する接続層と、を備えるイメージセンサ |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001223217A (ja) * | 2000-02-10 | 2001-08-17 | Lg Philips Lcd Co Ltd | 銅配線基板及びその製造方法並びに液晶表示装置 |
JP2006049873A (ja) * | 2004-07-06 | 2006-02-16 | Fuji Photo Film Co Ltd | 機能素子 |
JP2008216490A (ja) * | 2007-03-01 | 2008-09-18 | Kobe Steel Ltd | 表示デバイス用透明電極およびその作製方法 |
JP2008227092A (ja) * | 2007-03-12 | 2008-09-25 | Fujifilm Corp | 光電変換素子、撮像素子、撮像装置 |
JP2011171646A (ja) * | 2010-02-22 | 2011-09-01 | Rohm Co Ltd | カラー用固体撮像装置 |
JP2011238781A (ja) * | 2010-05-11 | 2011-11-24 | Panasonic Corp | 固体撮像素子及びその製造方法 |
JP2012074418A (ja) * | 2010-09-27 | 2012-04-12 | Fujifilm Corp | 固体撮像素子及び撮像装置 |
JP2012124343A (ja) * | 2010-12-08 | 2012-06-28 | Fujifilm Corp | 撮像素子及び撮像素子の製造方法 |
WO2014103150A1 (ja) * | 2012-12-28 | 2014-07-03 | パナソニック株式会社 | 固体撮像装置およびその製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4905762B2 (ja) | 2005-08-23 | 2012-03-28 | 富士フイルム株式会社 | 光電変換素子、撮像素子、および該光電変換素子の製造方法 |
JP5564847B2 (ja) | 2009-07-23 | 2014-08-06 | ソニー株式会社 | 固体撮像装置とその製造方法、及び電子機器 |
-
2014
- 2014-09-09 JP JP2014183698A patent/JP6465597B2/ja not_active Expired - Fee Related
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2015
- 2015-09-04 US US14/846,332 patent/US9698189B2/en not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001223217A (ja) * | 2000-02-10 | 2001-08-17 | Lg Philips Lcd Co Ltd | 銅配線基板及びその製造方法並びに液晶表示装置 |
JP2006049873A (ja) * | 2004-07-06 | 2006-02-16 | Fuji Photo Film Co Ltd | 機能素子 |
JP2008216490A (ja) * | 2007-03-01 | 2008-09-18 | Kobe Steel Ltd | 表示デバイス用透明電極およびその作製方法 |
JP2008227092A (ja) * | 2007-03-12 | 2008-09-25 | Fujifilm Corp | 光電変換素子、撮像素子、撮像装置 |
JP2011171646A (ja) * | 2010-02-22 | 2011-09-01 | Rohm Co Ltd | カラー用固体撮像装置 |
JP2011238781A (ja) * | 2010-05-11 | 2011-11-24 | Panasonic Corp | 固体撮像素子及びその製造方法 |
JP2012074418A (ja) * | 2010-09-27 | 2012-04-12 | Fujifilm Corp | 固体撮像素子及び撮像装置 |
JP2012124343A (ja) * | 2010-12-08 | 2012-06-28 | Fujifilm Corp | 撮像素子及び撮像素子の製造方法 |
WO2014103150A1 (ja) * | 2012-12-28 | 2014-07-03 | パナソニック株式会社 | 固体撮像装置およびその製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2019239851A1 (ja) * | 2018-06-14 | 2020-12-17 | パナソニックIpマネジメント株式会社 | 制御電極と、透明電極と、前記制御電極と前記透明電極の側面とを電気的に接続する接続層と、を備えるイメージセンサ |
JP7162275B2 (ja) | 2018-06-14 | 2022-10-28 | パナソニックIpマネジメント株式会社 | 制御電極と、透明電極と、前記制御電極と前記透明電極の側面とを電気的に接続する接続層と、を備えるイメージセンサ |
Also Published As
Publication number | Publication date |
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US9698189B2 (en) | 2017-07-04 |
JP6465597B2 (ja) | 2019-02-06 |
US20160071986A1 (en) | 2016-03-10 |
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