JP2016051768A5 - - Google Patents

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Publication number
JP2016051768A5
JP2016051768A5 JP2014175448A JP2014175448A JP2016051768A5 JP 2016051768 A5 JP2016051768 A5 JP 2016051768A5 JP 2014175448 A JP2014175448 A JP 2014175448A JP 2014175448 A JP2014175448 A JP 2014175448A JP 2016051768 A5 JP2016051768 A5 JP 2016051768A5
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JP
Japan
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substrate
suction
chuck
unit
adsorption
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JP2014175448A
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English (en)
Japanese (ja)
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JP2016051768A (ja
JP6440416B2 (ja
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Priority to JP2014175448A priority Critical patent/JP6440416B2/ja
Priority claimed from JP2014175448A external-priority patent/JP6440416B2/ja
Priority to US14/834,742 priority patent/US9594312B2/en
Priority to EP15002510.4A priority patent/EP2993522B1/en
Publication of JP2016051768A publication Critical patent/JP2016051768A/ja
Publication of JP2016051768A5 publication Critical patent/JP2016051768A5/ja
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Publication of JP6440416B2 publication Critical patent/JP6440416B2/ja
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JP2014175448A 2014-08-29 2014-08-29 処理装置、処理方法及びデバイスの製造方法 Active JP6440416B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014175448A JP6440416B2 (ja) 2014-08-29 2014-08-29 処理装置、処理方法及びデバイスの製造方法
US14/834,742 US9594312B2 (en) 2014-08-29 2015-08-25 Processing apparatus, processing method, and device manufacturing method
EP15002510.4A EP2993522B1 (en) 2014-08-29 2015-08-25 Processing apparatus, processing method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014175448A JP6440416B2 (ja) 2014-08-29 2014-08-29 処理装置、処理方法及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2016051768A JP2016051768A (ja) 2016-04-11
JP2016051768A5 true JP2016051768A5 (cg-RX-API-DMAC7.html) 2017-10-12
JP6440416B2 JP6440416B2 (ja) 2018-12-19

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JP2014175448A Active JP6440416B2 (ja) 2014-08-29 2014-08-29 処理装置、処理方法及びデバイスの製造方法

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US (1) US9594312B2 (cg-RX-API-DMAC7.html)
EP (1) EP2993522B1 (cg-RX-API-DMAC7.html)
JP (1) JP6440416B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10528488B1 (en) * 2017-03-30 2020-01-07 Pure Storage, Inc. Efficient name coding
CN109597279B (zh) * 2017-09-30 2023-09-29 上海微电子装备（集团）股份有限公司 真空吸附手、基底交接装置及光刻机
JP7212558B2 (ja) * 2019-03-15 2023-01-25 キヤノン株式会社 基板処理装置、決定方法及び物品の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03111361A (ja) * 1989-09-26 1991-05-13 Canon Inc 搬送装置およびその制御方法
US5923408A (en) * 1996-01-31 1999-07-13 Canon Kabushiki Kaisha Substrate holding system and exposure apparatus using the same
JP2002217276A (ja) * 2001-01-17 2002-08-02 Ushio Inc ステージ装置
JP2004273714A (ja) * 2003-03-07 2004-09-30 Tokyo Electron Ltd 基板処理装置及び基板処理方法
JP3997165B2 (ja) * 2003-03-12 2007-10-24 東京エレクトロン株式会社 基板処理装置
JP2005003799A (ja) * 2003-06-10 2005-01-06 Fuji Photo Film Co Ltd 感光性板状部材吸着機構及び画像記録装置
JP2005114882A (ja) * 2003-10-06 2005-04-28 Hitachi High-Tech Electronics Engineering Co Ltd 処理ステージの基板載置方法、基板露光ステージおよび基板露光装置
JP2006041386A (ja) * 2004-07-29 2006-02-09 Nikon Corp 搬送方法、搬送装置、露光装置及び吸着状態検出方法
KR100763251B1 (ko) * 2006-02-01 2007-10-04 삼성전자주식회사 웨이퍼 이송 장치
JP2007281073A (ja) * 2006-04-04 2007-10-25 Canon Inc 基板搬送装置
EP2006899A4 (en) * 2006-04-05 2011-12-28 Nikon Corp STAGE APPARATUS, EXPOSURE APPARATUS, STAGE CONTROL METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
JP2008251754A (ja) 2007-03-29 2008-10-16 Nikon Corp 基板搬送方法及び装置、並びに露光方法及び装置
JP5036596B2 (ja) * 2008-03-03 2012-09-26 東京応化工業株式会社 吸着装置
JP2010129929A (ja) * 2008-11-28 2010-06-10 Canon Inc 基板保持装置、基板保持方法、露光装置およびデバイス製造方法
JP5609513B2 (ja) * 2010-10-05 2014-10-22 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP5868228B2 (ja) * 2012-03-12 2016-02-24 住友重機械工業株式会社 基板保持装置及び基板保持方法

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