JP2015536622A5 - - Google Patents
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- Publication number
- JP2015536622A5 JP2015536622A5 JP2015542385A JP2015542385A JP2015536622A5 JP 2015536622 A5 JP2015536622 A5 JP 2015536622A5 JP 2015542385 A JP2015542385 A JP 2015542385A JP 2015542385 A JP2015542385 A JP 2015542385A JP 2015536622 A5 JP2015536622 A5 JP 2015536622A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrode layer
- dielectric film
- transducer
- depositing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000151 deposition Methods 0.000 claims 8
- 238000000034 method Methods 0.000 claims 8
- 238000000231 atomic layer deposition Methods 0.000 claims 5
- 238000000059 patterning Methods 0.000 claims 4
- 239000004020 conductor Substances 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- ITWBWJFEJCHKSN-UHFFFAOYSA-N 1,4,7-triazonane Chemical compound C1CNCCNCCN1 ITWBWJFEJCHKSN-UHFFFAOYSA-N 0.000 claims 1
- 241000877463 Lanio Species 0.000 claims 1
- 229910004121 SrRuO Inorganic materials 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261728339P | 2012-11-20 | 2012-11-20 | |
| US61/728,339 | 2012-11-20 | ||
| PCT/IB2013/059932 WO2014080310A2 (en) | 2012-11-20 | 2013-11-06 | Capacitive micro-machined transducer and method of manufacturing the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015536622A JP2015536622A (ja) | 2015-12-21 |
| JP2015536622A5 true JP2015536622A5 (enExample) | 2016-12-22 |
| JP6328131B2 JP6328131B2 (ja) | 2018-05-23 |
Family
ID=49596362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015542385A Expired - Fee Related JP6328131B2 (ja) | 2012-11-20 | 2013-11-06 | 容量性マイクロマシントランスデューサ及びその製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9607606B2 (enExample) |
| EP (1) | EP2922707B1 (enExample) |
| JP (1) | JP6328131B2 (enExample) |
| CN (1) | CN104812504B (enExample) |
| WO (1) | WO2014080310A2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6069798B2 (ja) | 2011-12-20 | 2017-02-01 | コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． | 超音波トランスデューサデバイス及びこれを製造する方法 |
| CN105592940B (zh) * | 2013-09-24 | 2018-09-25 | 皇家飞利浦有限公司 | Cmut装置制造方法、cmut装置和设备 |
| DE102015102300A1 (de) * | 2015-02-18 | 2016-08-18 | Osram Opto Semiconductors Gmbh | Verfahren zum Herstellen eines elektronischen Bauelements |
| US9957393B2 (en) | 2015-03-30 | 2018-05-01 | Enzo Biochem, Inc. | Monoazo dyes with cyclic amine as fluorescence quenchers |
| WO2019213388A1 (en) * | 2018-05-03 | 2019-11-07 | Butterfly Network, Inc. | Pressure port for ultrasonic transducer on cmos sensor |
| CN114302774B (zh) * | 2019-08-30 | 2023-05-23 | 维蒙股份公司 | Cmut换能器 |
| US20210403321A1 (en) * | 2020-06-30 | 2021-12-30 | Butterfly Network, Inc. | Formation of self-assembled monolayer for ultrasonic transducers |
| CN115367694B (zh) * | 2022-08-15 | 2025-07-18 | 瑞声声学科技(深圳)有限公司 | 一种mems器件的制造方法及mems器件 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007528153A (ja) * | 2004-02-06 | 2007-10-04 | ジョージア テック リサーチ コーポレイション | Ｃｍｕｔデバイス及び製造方法 |
| EP1883956A4 (en) * | 2005-05-18 | 2011-03-23 | Kolo Technologies Inc | BY-THE-WAFER CONNECTION |
| JP4724505B2 (ja) * | 2005-09-09 | 2011-07-13 | 株式会社日立製作所 | 超音波探触子およびその製造方法 |
| EP1914800A1 (en) * | 2006-10-20 | 2008-04-23 | Interuniversitair Microelektronica Centrum | Method of manufacturing a semiconductor device with multiple dielectrics |
| US7733552B2 (en) * | 2007-03-21 | 2010-06-08 | Qualcomm Mems Technologies, Inc | MEMS cavity-coating layers and methods |
| US7892176B2 (en) * | 2007-05-02 | 2011-02-22 | General Electric Company | Monitoring or imaging system with interconnect structure for large area sensor array |
| US20090275198A1 (en) * | 2008-05-01 | 2009-11-05 | Smuruthi Kamepalli | Vapor Phase Methods for Forming Electrodes in Phase Change Memory Devices |
| US9132693B2 (en) | 2008-09-16 | 2015-09-15 | Koninklijke Philps N.V. | Capacitive micromachine ultrasound transducer |
| JP2011023658A (ja) * | 2009-07-17 | 2011-02-03 | Fuji Electric Systems Co Ltd | 半導体装置の製造方法 |
| US20110065276A1 (en) * | 2009-09-11 | 2011-03-17 | Applied Materials, Inc. | Apparatus and Methods for Cyclical Oxidation and Etching |
| WO2011142850A2 (en) * | 2010-01-22 | 2011-11-17 | The Regents Of The University Of California | Etchant-free methods of producing a gap between two layers, and devices produced thereby |
| JP2012080095A (ja) * | 2010-09-10 | 2012-04-19 | Elpida Memory Inc | 半導体装置及びその製造方法 |
| JP5677016B2 (ja) * | 2010-10-15 | 2015-02-25 | キヤノン株式会社 | 電気機械変換装置及びその作製方法 |
-
2013
- 2013-11-06 CN CN201380060566.7A patent/CN104812504B/zh active Active
- 2013-11-06 WO PCT/IB2013/059932 patent/WO2014080310A2/en not_active Ceased
- 2013-11-06 EP EP13792500.4A patent/EP2922707B1/en active Active
- 2013-11-06 US US14/443,159 patent/US9607606B2/en active Active
- 2013-11-06 JP JP2015542385A patent/JP6328131B2/ja not_active Expired - Fee Related