JP2020536238A5 - - Google Patents

Download PDF

Info

Publication number
JP2020536238A5
JP2020536238A5 JP2020518642A JP2020518642A JP2020536238A5 JP 2020536238 A5 JP2020536238 A5 JP 2020536238A5 JP 2020518642 A JP2020518642 A JP 2020518642A JP 2020518642 A JP2020518642 A JP 2020518642A JP 2020536238 A5 JP2020536238 A5 JP 2020536238A5
Authority
JP
Japan
Prior art keywords
layer
metal layer
gate electrodes
dielectric
elongated gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020518642A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020536238A (ja
JP7254366B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2018/053624 external-priority patent/WO2019068034A2/en
Publication of JP2020536238A publication Critical patent/JP2020536238A/ja
Publication of JP2020536238A5 publication Critical patent/JP2020536238A5/ja
Priority to JP2023044919A priority Critical patent/JP2023088979A/ja
Application granted granted Critical
Publication of JP7254366B2 publication Critical patent/JP7254366B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020518642A 2017-09-29 2018-09-28 ナノポア装置およびその製造方法 Active JP7254366B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023044919A JP2023088979A (ja) 2017-09-29 2023-03-22 ナノポア装置およびその製造方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762566313P 2017-09-29 2017-09-29
US62/566,313 2017-09-29
US201762593840P 2017-12-01 2017-12-01
US62/593,840 2017-12-01
PCT/US2018/053624 WO2019068034A2 (en) 2017-09-29 2018-09-28 NANOPORA DEVICE AND METHOD FOR MANUFACTURING THE SAME

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023044919A Division JP2023088979A (ja) 2017-09-29 2023-03-22 ナノポア装置およびその製造方法

Publications (3)

Publication Number Publication Date
JP2020536238A JP2020536238A (ja) 2020-12-10
JP2020536238A5 true JP2020536238A5 (enExample) 2021-11-04
JP7254366B2 JP7254366B2 (ja) 2023-04-10

Family

ID=63963484

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020518642A Active JP7254366B2 (ja) 2017-09-29 2018-09-28 ナノポア装置およびその製造方法
JP2023044919A Pending JP2023088979A (ja) 2017-09-29 2023-03-22 ナノポア装置およびその製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023044919A Pending JP2023088979A (ja) 2017-09-29 2023-03-22 ナノポア装置およびその製造方法

Country Status (6)

Country Link
US (3) US11041844B2 (enExample)
EP (1) EP3688464A2 (enExample)
JP (2) JP7254366B2 (enExample)
KR (1) KR102433301B1 (enExample)
CN (2) CN116042789B (enExample)
WO (1) WO2019068034A2 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11034847B2 (en) 2017-07-14 2021-06-15 Samsung Electronics Co., Ltd. Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition
KR102433666B1 (ko) 2017-07-27 2022-08-18 삼성전자주식회사 하드마스크 조성물, 이를 이용한 패턴의 형성방법 및 상기 하드마스크 조성물을 이용하여 형성된 하드마스크
KR102486388B1 (ko) * 2017-07-28 2023-01-09 삼성전자주식회사 그래핀 양자점의 제조방법, 상기 제조방법에 따라 얻어진 그래핀 양자점을 포함한 하드마스크 조성물, 이를 이용한 패턴의 형성방법 및 상기 하드마스크 조성물을 이용하여 형성된 하드마스크
US11067561B2 (en) 2017-12-31 2021-07-20 Palogen, Inc. Nanopore device and methods of electrical array addressing and sensing
CN112534258A (zh) * 2018-07-27 2021-03-19 帕洛根公司 纳米孔设备以及使用所述设备检测带电粒子的方法
US11701619B2 (en) * 2018-10-12 2023-07-18 MIS IP Holdings, LLC Diagnostic methods and apparatus for electrodialysis
US11686701B2 (en) 2019-07-16 2023-06-27 Palogen, Inc. Nanopore device and methods of detecting and classifying charged particles using same
US11674919B2 (en) * 2019-07-17 2023-06-13 Taiwan Semiconductor Manufacturing Company Ltd. Detector, detection device and method of using the same
CN111044574B (zh) * 2019-12-02 2022-03-04 东南大学 一种超灵敏塑胶炸弹侦测传感器
WO2021158985A1 (en) * 2020-02-06 2021-08-12 Palogen, Inc. Nanopore sensor device and methods of manufacturing the same
JP2022015499A (ja) 2020-07-09 2022-01-21 キオクシア株式会社 記憶装置
US20220042944A1 (en) * 2020-07-24 2022-02-10 Palogen, Inc. Nanochannel systems and methods for detecting pathogens using same
CN112251343A (zh) * 2020-11-11 2021-01-22 深圳市儒翰基因科技有限公司 一种dna测序装置、固态纳米孔组件及其制备方法
JP2022129253A (ja) 2021-02-24 2022-09-05 キオクシア株式会社 記憶装置
KR102416152B1 (ko) 2021-03-12 2022-07-06 고려대학교 산학협력단 나노 층상 구조막이 결합된 나노포어 소자
KR102547706B1 (ko) 2021-03-16 2023-06-29 주식회사 멤스팩 신속 바이오 진단키트
CN115141749A (zh) * 2021-03-29 2022-10-04 上海近观科技有限责任公司 基于电致发光材料的纳米孔阵列结构及其制备方法
CN115125132A (zh) * 2021-03-29 2022-09-30 上海近观科技有限责任公司 基于固态纳米孔阵列的测序芯片及其制备方法
CN113552332B (zh) * 2021-09-22 2022-04-22 成都齐碳科技有限公司 用于感测包含在液体中的分析物的装置和设备
WO2023056437A1 (en) * 2021-09-30 2023-04-06 California Institute Of Technology Systems and methods for molecular measurements

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8986928B2 (en) 2009-04-10 2015-03-24 Pacific Biosciences Of California, Inc. Nanopore sequencing devices and methods
US8828138B2 (en) * 2010-05-17 2014-09-09 International Business Machines Corporation FET nanopore sensor
US8138068B2 (en) * 2010-08-11 2012-03-20 International Business Machines Corporation Method to form nanopore array
US9240328B2 (en) * 2010-11-19 2016-01-19 Alphabet Energy, Inc. Arrays of long nanostructures in semiconductor materials and methods thereof
CN102242062B (zh) * 2011-04-19 2012-12-19 浙江大学 一种高分辨率的生物传感器
US9070758B2 (en) * 2011-06-20 2015-06-30 Imec CMOS compatible method for manufacturing a HEMT device and the HEMT device thereof
JP2014521956A (ja) * 2011-07-27 2014-08-28 ザ ボード オブ トラスティーズ オブ ザ ユニヴァーシティー オブ イリノイ 生体分子を特徴付けるためのナノ細孔センサー
JP5758744B2 (ja) * 2011-08-25 2015-08-05 株式会社日立製作所 相変化メモリ
US20130057557A1 (en) * 2011-09-07 2013-03-07 Qualcomm Mems Technologies, Inc. High area stacked layered metallic structures and related methods
CN103165613A (zh) * 2011-12-12 2013-06-19 中国科学院微电子研究所 半导体存储器及其制造方法
JP6054604B2 (ja) 2011-12-20 2016-12-27 株式会社日立製作所 マイクロ・ナノ流体解析デバイスおよびその製造方法
WO2013155116A1 (en) 2012-04-09 2013-10-17 Takulapalli Bharath Field effect transistor, device including the transistor, and methods of forming and using same
KR101927415B1 (ko) * 2012-11-05 2019-03-07 삼성전자주식회사 나노갭 소자 및 이로부터의 신호를 처리하는 방법
US9377431B2 (en) * 2013-07-24 2016-06-28 Globalfoundries Inc. Heterojunction nanopore for sequencing
JP6247064B2 (ja) * 2013-09-20 2017-12-13 株式会社日立ハイテクノロジーズ 生体分子計測装置
CN106414767A (zh) * 2014-01-24 2017-02-15 量子生物有限公司 生物分子的测序装置、系统及方法
WO2015157501A1 (en) * 2014-04-10 2015-10-15 Alphabet Energy, Inc. Ultra-long silicon nanostructures, and methods of forming and transferring the same
US9921181B2 (en) 2014-06-26 2018-03-20 International Business Machines Corporation Detection of translocation events using graphene-based nanopore assemblies
AU2016243036B2 (en) 2015-04-03 2022-02-17 Abbott Laboratories Devices and methods for sample analysis
GB2560668B (en) * 2015-12-17 2022-08-24 Hitachi High Tech Corp Biomolecule measurement apparatus
CN106929565A (zh) * 2015-12-30 2017-07-07 北京大学 基于纳米结构的蛋白质单分子电子器件及其制备和应用
US10669579B2 (en) * 2016-07-15 2020-06-02 International Business Machines Corporation DNA sequencing with stacked nanopores
US10319635B2 (en) * 2017-05-25 2019-06-11 Sandisk Technologies Llc Interconnect structure containing a metal slilicide hydrogen diffusion barrier and method of making thereof

Similar Documents

Publication Publication Date Title
JP2020536238A5 (enExample)
US10770232B2 (en) Multilayer electronic component and method of manufacturing the same
TWI689071B (zh) 具有改良電容的結構
CN102683318B (zh) 硅电容器内部多层电极连接结构及连接方法
RU2014134901A (ru) Емкостной преобразователь, полученный микрообработкой, и способ его изготовления
JP2016535441A5 (enExample)
GB2567363A (en) Air gap spacer formation for nano-scale semiconductor devices
RU2014134810A (ru) Емкостной преобразователь, полученный микрообработкой, и способ его изготовления
JP2015508625A5 (enExample)
CN107967995A (zh) 电容器装置及其制造方法
JP2007311584A5 (enExample)
JP2006187857A5 (enExample)
JP2019536294A5 (enExample)
CN107195620B (zh) 一种高深径比孔洞的制备方法及结构
JP2006093449A5 (enExample)
KR20180083244A (ko) 적층 세라믹 콘덴서 및 그 실장 구조체
JP2012522226A5 (enExample)
KR102721589B1 (ko) 3차원 용량성 구조들 및 그 제조 방법들
JP2015536622A5 (enExample)
JP2004146401A (ja) 積層電子部品及びその製造方法
KR20110113384A (ko) 적층 세라믹 커패시터의 제조방법
KR102696469B1 (ko) 용량성 소자와 기타 장치의 제조에 사용하기 위해, 표면적 확대를 사용하는 기판
CN108346566A (zh) 半导体装置及其制造方法
CN110164851B (zh) 三维固态电容器的制造方法、三维固态电容器及电子设备
JP2019106443A (ja) 積層セラミックコンデンサおよびその製造方法