JP7254366B2 - ナノポア装置およびその製造方法 - Google Patents
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- 238000004519 manufacturing process Methods 0.000 title claims description 27
- 238000000034 method Methods 0.000 claims description 75
- 229910052751 metal Inorganic materials 0.000 claims description 42
- 239000002184 metal Substances 0.000 claims description 42
- 230000001629 suppression Effects 0.000 claims description 27
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 25
- 238000000151 deposition Methods 0.000 claims description 23
- 239000003792 electrolyte Substances 0.000 claims description 14
- 238000005530 etching Methods 0.000 claims description 13
- 238000000059 patterning Methods 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 116
- 108091006146 Channels Proteins 0.000 description 51
- 238000012163 sequencing technique Methods 0.000 description 28
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 18
- 229920005591 polysilicon Polymers 0.000 description 18
- 238000005516 engineering process Methods 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
- 238000003491 array Methods 0.000 description 13
- 238000000231 atomic layer deposition Methods 0.000 description 13
- 108020004707 nucleic acids Proteins 0.000 description 12
- 102000039446 nucleic acids Human genes 0.000 description 12
- 150000007523 nucleic acids Chemical class 0.000 description 12
- 239000002245 particle Substances 0.000 description 12
- 108020004414 DNA Proteins 0.000 description 11
- 230000008569 process Effects 0.000 description 11
- 239000012528 membrane Substances 0.000 description 10
- 230000035945 sensitivity Effects 0.000 description 9
- 230000005945 translocation Effects 0.000 description 9
- 229910052804 chromium Inorganic materials 0.000 description 8
- 230000005641 tunneling Effects 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 229910021389 graphene Inorganic materials 0.000 description 7
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- 238000001712 DNA sequencing Methods 0.000 description 6
- 229920001222 biopolymer Polymers 0.000 description 6
- 229910052681 coesite Inorganic materials 0.000 description 6
- 229910052906 cristobalite Inorganic materials 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 230000005012 migration Effects 0.000 description 6
- 238000013508 migration Methods 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 229910052682 stishovite Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052905 tridymite Inorganic materials 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052593 corundum Inorganic materials 0.000 description 5
- 230000008878 coupling Effects 0.000 description 5
- 238000010168 coupling process Methods 0.000 description 5
- 238000005859 coupling reaction Methods 0.000 description 5
- 239000002773 nucleotide Substances 0.000 description 5
- 125000003729 nucleotide group Chemical group 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 229910001845 yogo sapphire Inorganic materials 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 108090000623 proteins and genes Proteins 0.000 description 4
- 229910052715 tantalum Inorganic materials 0.000 description 4
- 238000000277 atomic layer chemical vapour deposition Methods 0.000 description 3
- 239000003989 dielectric material Substances 0.000 description 3
- 238000007672 fourth generation sequencing Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000001020 plasma etching Methods 0.000 description 3
- 102000004169 proteins and genes Human genes 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 108010013381 Porins Proteins 0.000 description 2
- 238000011529 RT qPCR Methods 0.000 description 2
- ISAKRJDGNUQOIC-UHFFFAOYSA-N Uracil Chemical compound O=C1C=CNC(=O)N1 ISAKRJDGNUQOIC-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- OPTASPLRGRRNAP-UHFFFAOYSA-N cytosine Chemical compound NC=1C=CNC(=O)N=1 OPTASPLRGRRNAP-UHFFFAOYSA-N 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000003487 electrochemical reaction Methods 0.000 description 2
- 238000001962 electrophoresis Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 230000001404 mediated effect Effects 0.000 description 2
- 102000007739 porin activity proteins Human genes 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- RWQNBRDOKXIBIV-UHFFFAOYSA-N thymine Chemical compound CC1=CNC(=O)NC1=O RWQNBRDOKXIBIV-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000009966 trimming Methods 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- 229930024421 Adenine Natural products 0.000 description 1
- 101710092462 Alpha-hemolysin Proteins 0.000 description 1
- -1 Au--Cr Chemical class 0.000 description 1
- 102000053602 DNA Human genes 0.000 description 1
- 229910004140 HfO Inorganic materials 0.000 description 1
- 208000026350 Inborn Genetic disease Diseases 0.000 description 1
- 108091005461 Nucleic proteins Proteins 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910004166 TaN Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229960000643 adenine Drugs 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229940104302 cytosine Drugs 0.000 description 1
- 238000000708 deep reactive-ion etching Methods 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000002405 diagnostic procedure Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 208000016361 genetic disease Diseases 0.000 description 1
- 230000007614 genetic variation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000013152 interventional procedure Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001823 molecular biology technique Methods 0.000 description 1
- 229910052961 molybdenite Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002096 quantum dot Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009919 sequestration Effects 0.000 description 1
- 229940113082 thymine Drugs 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229940035893 uracil Drugs 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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Description
[0045]上述のように、現在の最先端のナノポアデバイスは、少なくとも感度と製造コストの点で制限がある。本書記載のナノポアデバイスの実施形態は、とりわけ、現在のナノポアデバイスのこれらの制限に対処するものである。
[0058]3Dナノポアデバイス(200、300など)は、様々な方法で製造することができる。一実施形態では、3Dナノポアデバイス200、300を製造するのに半導体技術(例えば、以下で説明するCMOSプロセス)が用いられる。CMOSプロセスでは、大きなナノポアアレイを使用してナノポア310の幅を調整することもできる。一実施形態では、ナノポア310の幅は、ルックアップテーブルを有するソフトウェアを使用して製造中に制御することができ、これにより大量生産の製造が可能になる。CMOSプロセスを用いると、バイオセンサソリューションをCMOSテクノロジーに組み込むことができる。様々な実施形態では、CMOSプロセスは、電気化学反応および/またはイオン感応性電界効果トランジスタ技術のための二次元ウェルを含む。マイクロ流体チャネルを、3Dナノポアデバイス200、300に(例えば、ダイ内に)統合することができ、これによりデバイス200、300のコストが低減する。
Claims (4)
- 3Dナノポアデバイスの製造方法において、
第1の誘電体層の上に第1のSi3N4層を堆積するステップと、
前記第1のSi3N4層の上に第1の金属層を堆積するステップと、
前記第1の金属層の上に第2の誘電体層を堆積するステップと、
前記第2の誘電体層の上に第2のSi3N4層を堆積するステップと、
前記第2のSi3N4層の上に第2の金属層を堆積するステップと、
前記第2の金属層をエッチングおよびパターニングして、第1の複数の細長い抑制電極を形成するステップと、
前記第2の金属層の上に第3の誘電体層を堆積するステップと、
前記第3の誘電体層の上に第3のSi3N4層を堆積するステップと、
前記第3のSi3N4層の上に第3の金属層を堆積するステップと、
前記第3の金属層をエッチングおよびパターニングして、第2の複数の細長い抑制電極を形成するステップと、
前記第1および第2の複数の細長い抑制電極と、前記第2および第3のSi3N4層と、前記第2および第3の誘電体層とをエッチングして、これらを通る複数の貫通ナノポアチャネルを形成するステップと
を含み、
前記第1の複数の細長い抑制電極のそれぞれが、前記第2の金属層から加工されており、
前記第1の複数の細長い抑制電極のそれぞれが、前記第1の複数の細長い抑制電極の他の細長い抑制電極と平行であり、
前記第2の複数の細長い抑制電極のそれぞれが、前記第3の金属層から加工されており、
前記第2の複数の細長い抑制電極のそれぞれが、前記第2の複数の細長い抑制電極の他の細長い抑制電極と平行であり、
前記第1および第2の複数の細長い抑制電極が、互いに直交していることを特徴とする方法。 - 請求項1に記載の方法が、さらに、前記第1の誘電体層と、前記第1のSi3N4層と、前記第1の金属層とを、前記第2の誘電体層に対する反対側からエッチングして、下部チャンバを前記複数の貫通ナノポアチャネルに流体的に連結するステップを含むことを特徴とする方法。
- 請求項1に記載の方法が、さらに、前記第1の誘電体層と、前記第1のSi3N4層と、前記第1の金属層と、前記第2の誘電体層と、前記第2のSi3N4層と、前記第2の金属層とを、上部チャンバおよび下部チャンバの間に堆積するステップを含み、
前記上部チャンバおよび前記下部チャンバが前記複数の貫通ナノポアチャネルによって流体的に連結されるように、前記上部チャンバ、前記下部チャンバ、および前記複数の貫通ナノポアチャネルが電解液を含むことを特徴とする方法。 - 請求項1に記載の方法において、高アスペクト比の反応性イオンエッチングを用いて、複数の誘電体層と、Si3N4層と、金属層とのスタックをエッチングして、貫通ナノポアチャネルを形成することを特徴とする方法。
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