JP2015526741A - 長波長赤外線の検出および長波長赤外光源を用いた画像処理 - Google Patents
長波長赤外線の検出および長波長赤外光源を用いた画像処理 Download PDFInfo
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Abstract
Description
Claims (29)
- 標的物を照射するための放射線を供給し、前記放射線が赤外スペクトルの指紋領域における少なくとも一つの波長に同調するレーザー光源と、
前記標的物から後方散乱する放射線を検出するように構成された検出器と、
少なくとも、前記少なくとも一つの波長において検出された信号の有無から、所定の揮発性化合物の存在を判定するために、所定のスペクトルに検出された放射線信号を照合するように適合された解析器とを含むことを特徴とする赤外線検出システム。 - 前記レーザー光源が、励起レーザーおよび非線形媒質を有する光パラメトリック発振器を含むことを特徴とする請求項1に記載の赤外線検出システム。
- 前記非線形媒質が、ZnGeP2結晶を含むことを特徴とする請求項2に記載の赤外線検出システム。
- 前記非線形結晶が、前記励起レーザーの共振器内に配置されていることを特徴とする請求項2または3に記載の赤外線検出システム。
- 前記光パラメトリックレーザーのアイドラー光および信号光が、出力放射線として供給されることを特徴とする請求項2乃至4のいずれか一項に記載の赤外線検出システム。
- 前記アイドラー光が、前記指紋領域内で少なくとも部分的に出力放射線を供給し、前記信号光が、前記指紋領域内より短い波長で、少なくとも部分的に出力放射線を供給することを特徴とする請求項5に記載の赤外線検出システム。
- 前記レーザー光源を複数の波長間で同調させる同調手段をさらに含み、前記赤外線検出システムが、ハイパースペクトル検出システムであることを特徴とする請求項1乃至6のいずれか一項に記載の赤外線検出システム。
- 前記解析器が、前記複数の波長の一つ以上の波長において検出された信号の前記有無から所定の揮発性化合物が存在するかどうかを判定するように適合されていることを特徴とする請求項7に記載の赤外線検出システム。
- 前記解析器が、前記複数の波長において検出された信号の前記有無から複数の所定の揮発性化合物の一つ以上が存在するかどうかを判定するように適合されていることを特徴とする請求項7または8に記載の赤外線検出システム。
- 複数のレーザー光源が備えられ、異なる非線形結晶を有する二基の光パラメトリック発振器を含むことを特徴とする請求項1乃至9のいずれか一項に記載の赤外線検出システム。
- 前記一つ以上のレーザー光源が、パルス出力放射線を供給することを特徴とする請求項1乃至10のいずれか一項に記載の赤外線検出システム。
- 前記検出器が画像処理システムを含み、前記赤外線検出システムが撮像装置を含むことを特徴とする請求項1乃至11のいずれか一項に記載の赤外線検出システム。
- 前記赤外線検出システムが、実時間で画像を供給することを特徴とする請求項12に記載の赤外線検出システム。
- 前記赤外線検出システムが、標的領域を走査するための走査システムを含み、前記走査システムが、前記パルス出力放射線と同期することを特徴とする請求項11に従属する請求項12または13に記載の赤外線検出システム。
- 前記一つ以上のレーザー光源により一つの波長で出力された放射線パルスが、前記一つの波長で画像ピクセル値を測定することを特徴とする請求項14に記載の赤外線検出システム。
- 前記解析器が、所定の物質が存在するか存在しない画像の一部分を判定することを特徴とする請求項12乃至15のいずれか一項に記載の赤外線検出システム。
- 所定の物質の前記有無が、擬似色画像の中で示されることを特徴とする請求項16に記載の赤外線検出システム。
- 前記解析器が、前記所定の物質に関して判定された複数の波長で、検出された放射線信号を所定のスペクトルと照合することを特徴とする請求項1乃至17のいずれか一項に記載の赤外線検出システム。
- 前記複数の波長の少なくともいくつかが、前記指紋領域にあることを特徴とする請求項18に記載の赤外線検出システム。
- 所定の揮発性化合物の有無を決定する方法であって、
赤外スペクトルの指紋領域の少なくとも一つの波長に同調するレーザー光源からの放射線を標的物に照射するステップと、
前記標的物から後方散乱した放射線を検出するステップと、
検出された放射線信号を所定のスペクトルと照合することにより、少なくとも、前記少なくとも一つの波長において検出された信号の有無から所定の揮発性化合物の存在を判定するステップとを含むことを特徴とする方法。 - 励起レーザーの共振器内で励起ビームを生成するためのレーザー利得媒体と、励起レーザー光源と、ZnGeP2(ZGP)結晶を含む非線形媒質とを有する光パラメトリック装置であって、
前記励起ビームで刺激を加えると、前記ZnGeP2(ZGP)の結晶は、前記スペクトルの指紋領域に波長を有する信号光と前記スペクトルの前記中間赤外領域に波長を有するアイドラー光を生成するように適合されており、前記レーザー利得媒体および前記ZnGeP2(ZGP)結晶が、前記励起レーザー共振器内に配置されていることを特徴とする光パラメトリック装置。 - 前記励起レーザー光源が、Ho:YAGレーザーを含むことを特徴とする請求項21に記載の光パラメトリック装置。
- 共振器内光パラメトリック発振器が、二つのビームスプリッターミラー204を用いて、前記信号光および前記アイドラー光を前記励起ビームから分離するように形成されていることを特徴とする請求項21または22に記載の光パラメトリック装置。
- 前記ビームスプリッターミラーがZnSeミラーを含むことを特徴とする請求項23に記載の光パラメトリック装置。
- 前記励起ビームがパルス化されていることを特徴とする請求項21乃至24のいずれか一項に記載の光パラメトリック装置。
- 前記励起レーザーがQスイッチ方式であることを特徴とする請求項25に記載の光パラメトリック装置。
- 音響光学Qスイッチを含むことを特徴とする請求項26に記載の光パラメトリック装置。
- 前記信号光と前記アイドラー光を一つの波長域に亘って同調させるように適合されていることを特徴とする請求項21乃至27のいずれか一項に記載の光パラメトリック装置。
- 回動可能な移動ステージをさらに含み、前記ZnGeP2(ZGP)結晶が前記回動可能な移動ステージに取り付けられ、前記信号光および前記アイドラー光が前記回動可能な移動ステージの回転によって同調させられることを特徴とする請求項28に記載の光パラメトリック装置。
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