JP2015523199A5 - - Google Patents
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- Publication number
- JP2015523199A5 JP2015523199A5 JP2015514047A JP2015514047A JP2015523199A5 JP 2015523199 A5 JP2015523199 A5 JP 2015523199A5 JP 2015514047 A JP2015514047 A JP 2015514047A JP 2015514047 A JP2015514047 A JP 2015514047A JP 2015523199 A5 JP2015523199 A5 JP 2015523199A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- pan
- mechanical
- upper portion
- particulate bed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000005243 fluidization Methods 0.000 claims 25
- 239000007789 gas Substances 0.000 claims 12
- 239000013626 chemical specie Substances 0.000 claims 10
- 239000002245 particle Substances 0.000 claims 8
- 230000005540 biological transmission Effects 0.000 claims 6
- 239000011261 inert gas Substances 0.000 claims 4
- 230000033001 locomotion Effects 0.000 claims 4
- 239000012528 membrane Substances 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 239000013618 particulate matter Substances 0.000 claims 3
- 238000000354 decomposition reaction Methods 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000011236 particulate material Substances 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 2
- 229920005591 polysilicon Polymers 0.000 claims 2
- 229910000851 Alloy steel Inorganic materials 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910000990 Ni alloy Inorganic materials 0.000 claims 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 230000002457 bidirectional effect Effects 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims 1
- 239000003085 diluting agent Substances 0.000 claims 1
- 239000000284 extract Substances 0.000 claims 1
- 229910002804 graphite Inorganic materials 0.000 claims 1
- 239000010439 graphite Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000011796 hollow space material Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 229910021332 silicide Inorganic materials 0.000 claims 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 claims 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims 1
- 239000005052 trichlorosilane Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/481,548 US8871153B2 (en) | 2012-05-25 | 2012-05-25 | Mechanically fluidized silicon deposition systems and methods |
| US13/481,548 | 2012-05-25 | ||
| PCT/US2013/040398 WO2013176902A1 (en) | 2012-05-25 | 2013-05-09 | Mechanically fluidized silicon deposition systems and methods |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015523199A JP2015523199A (ja) | 2015-08-13 |
| JP2015523199A5 true JP2015523199A5 (enExample) | 2016-09-29 |
Family
ID=49621816
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015514047A Abandoned JP2015523199A (ja) | 2012-05-25 | 2013-05-09 | 機械的流動化シリコン堆積システム及び方法 |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US8871153B2 (enExample) |
| EP (1) | EP2855006A4 (enExample) |
| JP (1) | JP2015523199A (enExample) |
| KR (1) | KR101760167B1 (enExample) |
| CN (2) | CN104540581B (enExample) |
| BR (1) | BR112014029408A2 (enExample) |
| CA (1) | CA2873631A1 (enExample) |
| EA (1) | EA201492201A1 (enExample) |
| IN (1) | IN2014DN10188A (enExample) |
| TW (1) | TW201404917A (enExample) |
| WO (1) | WO2013176902A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8871153B2 (en) | 2012-05-25 | 2014-10-28 | Rokstar Technologies Llc | Mechanically fluidized silicon deposition systems and methods |
| KR101436409B1 (ko) * | 2013-01-11 | 2014-09-01 | 후성정공 주식회사 | 나노복합소재 제조용 복합 가스 제조장치 |
| KR101559204B1 (ko) * | 2013-09-16 | 2015-10-13 | 대진대학교 산학협력단 | 원자층 증착기술을 이용한 코어-쉘 구조의 나노 입자 코팅장치 |
| WO2016105507A1 (en) * | 2014-12-23 | 2016-06-30 | Sitec Gmbh | Mechanically fluidized deposition systems and methods |
| CA2972658A1 (en) * | 2014-12-30 | 2016-07-07 | Sitec Gmbh | Crystal production systems and methods |
| US20170096224A1 (en) * | 2015-10-06 | 2017-04-06 | Itamar Marom | Vehicle seat sleeping device |
| WO2017066129A1 (en) | 2015-10-12 | 2017-04-20 | Applied Quantum Energies, Llc | Methods and apparatuses for treating agricultural matter |
| DE102015224099A1 (de) * | 2015-12-02 | 2017-06-08 | Wacker Chemie Ag | Wirbelschichtreaktor und Verfahren zur Herstellung von polykristallinem Siliciumgranulat |
| JP6813824B2 (ja) * | 2016-02-05 | 2021-01-13 | 国立大学法人山形大学 | 酸化物薄膜形成方法及び酸化物薄膜形成装置 |
| CN105568254B (zh) * | 2016-02-24 | 2018-10-30 | 清华大学 | 一种用于流化床化学气相沉积反应器的气体入口设备 |
| WO2017172745A1 (en) * | 2016-03-30 | 2017-10-05 | Sitec Gmbh | Mechanically vibrated packed bed reactor and related methods |
| SG11201901464WA (en) * | 2016-09-16 | 2019-03-28 | Picosun Oy | Particle coating by atomic layer depostion (ald) |
| US20180207647A1 (en) * | 2017-01-25 | 2018-07-26 | James A. Yanez | Gold panning machine |
| KR101990683B1 (ko) * | 2017-07-14 | 2019-06-18 | 고려대학교 산학협력단 | 원자층 증착 공정용 챔버 |
| US20190062914A1 (en) | 2017-08-24 | 2019-02-28 | Forge Nano, Inc. | Manufacturing processes to synthesize, functionalize, surface treat and/or encapsulate powders, and applications thereof |
| KR102607682B1 (ko) * | 2021-04-05 | 2023-11-30 | 엔티엠 주식회사 | 전지용 전극제 표면처리 공정 시스템 |
| KR20230014469A (ko) * | 2021-07-21 | 2023-01-30 | 주식회사 소로나 | 파우더 코팅 방법 및 장치 |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2369478A (en) * | 1941-04-25 | 1945-02-13 | Universal Oil Prod Co | Reactor |
| US2856273A (en) * | 1953-12-28 | 1958-10-14 | Pure Oil Co | Apparatus for low velocity fluidization |
| DE1061593B (de) | 1956-06-25 | 1959-07-16 | Siemens Ag | Vorrichtung zur Gewinnung reinsten Halbleitermaterials fuer elektrotechnische Zwecke |
| US3011877A (en) | 1956-06-25 | 1961-12-05 | Siemens Ag | Production of high-purity semiconductor materials for electrical purposes |
| NL251143A (enExample) | 1959-05-04 | |||
| US3161483A (en) | 1960-02-15 | 1964-12-15 | Rex Chainbelt Inc | Vibrating fluidized systems |
| US3585268A (en) | 1968-01-04 | 1971-06-15 | Owens Illinois Inc | Metal-lined glass melter |
| US3640767A (en) | 1969-05-16 | 1972-02-08 | Rca Corp | Encapsulated magnetic memory element |
| US3963838A (en) | 1974-05-24 | 1976-06-15 | Texas Instruments Incorporated | Method of operating a quartz fluidized bed reactor for the production of silicon |
| DE2620739A1 (de) | 1976-05-11 | 1977-12-01 | Wacker Chemitronic | Verfahren zur herstellung von hochreinem silicium |
| JPS53106626A (en) | 1977-03-02 | 1978-09-16 | Komatsu Mfg Co Ltd | Method of making high purity rod silicon and appratus therefor |
| US4179530A (en) | 1977-05-20 | 1979-12-18 | Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe Mbh | Process for the deposition of pure semiconductor material |
| JPS546892A (en) | 1977-06-20 | 1979-01-19 | Minoru Tanmachi | Method and apparatus for regenerating active carbon |
| US4271783A (en) | 1978-01-20 | 1981-06-09 | General Electric Company | Apparatus for fluidized bed-electrostatic coating of indefinite length substrate |
| DE2912661C2 (de) | 1979-03-30 | 1982-06-24 | Wacker-Chemitronic Gesellschaft Fuer Elektronik-Grundstoffe Mbh, 8263 Burghausen | Verfahren zur Abscheidung von reinem Halbleitermaterial und Düse zur Durchführung des Verfahrens |
| US4628838A (en) | 1980-11-19 | 1986-12-16 | Peabody Engineering Corp. | Fluidized bed combustion method |
| US4354987A (en) | 1981-03-31 | 1982-10-19 | Union Carbide Corporation | Consolidation of high purity silicon powder |
| DE3141906A1 (de) | 1981-10-08 | 1983-04-21 | Degussa Ag, 6000 Frankfurt | Verfahren und vorrichtung zur durchfuehrung von gas/feststoff-reaktionen, insbesondere zum aktivieren und reaktivieren von aktivkohle |
| US4543399A (en) | 1982-03-24 | 1985-09-24 | Union Carbide Corporation | Fluidized bed reaction systems |
| US4440108A (en) | 1982-09-24 | 1984-04-03 | Spire Corporation | Ion beam coating apparatus |
| JPS59115736A (ja) | 1982-12-23 | 1984-07-04 | Toshiba Corp | シリコン顆粒供給装置 |
| US4606941A (en) | 1983-07-21 | 1986-08-19 | Jenkin William C | Deposition metalizing bulk material by chemical vapor |
| JPH0622689B2 (ja) | 1986-02-24 | 1994-03-30 | 中央化工機株式会社 | 恒温装置 |
| JPS63270394A (ja) | 1987-04-28 | 1988-11-08 | Showa Denko Kk | 流動式ダイヤモンド合成方法及び合成装置 |
| JPS6414194A (en) * | 1987-07-09 | 1989-01-18 | Showa Denko Kk | Method and device for synthesizing diamond by fluidized system |
| JP2637134B2 (ja) | 1988-01-21 | 1997-08-06 | 昭和電工株式会社 | 気相法ダイヤモンドの合成法 |
| US5118485A (en) | 1988-03-25 | 1992-06-02 | Hemlock Semiconductor Corporation | Recovery of lower-boiling silanes in a cvd process |
| JPH05246786A (ja) * | 1991-07-02 | 1993-09-24 | L'air Liquide | コア粉体の存在下で化学蒸着法により珪素ベース超微粒子をコア粉に均一に塗布する方法 |
| JPH063866A (ja) | 1992-06-19 | 1994-01-14 | Mitsubishi Kasei Corp | 静電荷像現像用コートキャリアの製造法 |
| JPH06127924A (ja) | 1992-10-16 | 1994-05-10 | Tonen Chem Corp | 多結晶シリコンの製造方法 |
| JP3103227B2 (ja) | 1992-12-09 | 2000-10-30 | 株式会社日立製作所 | 半導体装置の製造方法 |
| US6190625B1 (en) | 1997-08-07 | 2001-02-20 | Qualchem, Inc. | Fluidized-bed roasting of molybdenite concentrates |
| US6015597A (en) | 1997-11-26 | 2000-01-18 | 3M Innovative Properties Company | Method for coating diamond-like networks onto particles |
| JP4196959B2 (ja) | 2004-05-20 | 2008-12-17 | セイコーエプソン株式会社 | 電気光学装置及びその駆動回路並びに電子機器 |
| FR2872061B1 (fr) | 2004-06-23 | 2007-04-27 | Toulouse Inst Nat Polytech | Composition solide divisee formee de grains a depot metallique atomique continu et son procede d'obtention |
| KR100813131B1 (ko) * | 2006-06-15 | 2008-03-17 | 한국화학연구원 | 유동층 반응기를 이용한 다결정 실리콘의 지속 가능한제조방법 |
| BR112013008352A2 (pt) * | 2010-10-07 | 2017-03-01 | W Dassel Mark | métodos e sistemas de reator mecanicamente fluidificados, apropriados para a produção de silício |
| US8871153B2 (en) | 2012-05-25 | 2014-10-28 | Rokstar Technologies Llc | Mechanically fluidized silicon deposition systems and methods |
-
2012
- 2012-05-25 US US13/481,548 patent/US8871153B2/en not_active Expired - Fee Related
-
2013
- 2013-05-09 CN CN201380036496.1A patent/CN104540581B/zh not_active Expired - Fee Related
- 2013-05-09 EP EP13794694.3A patent/EP2855006A4/en not_active Withdrawn
- 2013-05-09 CA CA2873631A patent/CA2873631A1/en not_active Abandoned
- 2013-05-09 EA EA201492201A patent/EA201492201A1/ru unknown
- 2013-05-09 KR KR1020147032687A patent/KR101760167B1/ko not_active Expired - Fee Related
- 2013-05-09 BR BR112014029408A patent/BR112014029408A2/pt not_active IP Right Cessation
- 2013-05-09 CN CN201610149976.4A patent/CN105797656A/zh active Pending
- 2013-05-09 JP JP2015514047A patent/JP2015523199A/ja not_active Abandoned
- 2013-05-09 IN IN10188DEN2014 patent/IN2014DN10188A/en unknown
- 2013-05-09 WO PCT/US2013/040398 patent/WO2013176902A1/en not_active Ceased
- 2013-05-24 TW TW102118495A patent/TW201404917A/zh unknown
-
2014
- 2014-09-25 US US14/497,107 patent/US9365929B2/en not_active Expired - Fee Related
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