JP2015505419A5 - - Google Patents

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Publication number
JP2015505419A5
JP2015505419A5 JP2014553398A JP2014553398A JP2015505419A5 JP 2015505419 A5 JP2015505419 A5 JP 2015505419A5 JP 2014553398 A JP2014553398 A JP 2014553398A JP 2014553398 A JP2014553398 A JP 2014553398A JP 2015505419 A5 JP2015505419 A5 JP 2015505419A5
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JP
Japan
Prior art keywords
plasma
filter assembly
plasma cell
cell
gas
Prior art date
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JP2014553398A
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English (en)
Japanese (ja)
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JP2015505419A (ja
JP6333734B2 (ja
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Priority claimed from US13/741,566 external-priority patent/US9927094B2/en
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Publication of JP2015505419A publication Critical patent/JP2015505419A/ja
Publication of JP2015505419A5 publication Critical patent/JP2015505419A5/ja
Application granted granted Critical
Publication of JP6333734B2 publication Critical patent/JP6333734B2/ja
Active legal-status Critical Current
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JP2014553398A 2012-01-17 2013-01-17 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル Active JP6333734B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261587380P 2012-01-17 2012-01-17
US61/587,380 2012-01-17
US13/741,566 US9927094B2 (en) 2012-01-17 2013-01-15 Plasma cell for providing VUV filtering in a laser-sustained plasma light source
US13/741,566 2013-01-15
PCT/US2013/021857 WO2013109701A1 (en) 2012-01-17 2013-01-17 Plasma cell for providing vuv filtering in a laser-sustained plasma light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018084339A Division JP6509404B2 (ja) 2012-01-17 2018-04-25 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル

Publications (3)

Publication Number Publication Date
JP2015505419A JP2015505419A (ja) 2015-02-19
JP2015505419A5 true JP2015505419A5 (enExample) 2016-03-03
JP6333734B2 JP6333734B2 (ja) 2018-05-30

Family

ID=48779500

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2014553398A Active JP6333734B2 (ja) 2012-01-17 2013-01-17 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル
JP2018084339A Active JP6509404B2 (ja) 2012-01-17 2018-04-25 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2018084339A Active JP6509404B2 (ja) 2012-01-17 2018-04-25 レーザ維持プラズマ光源におけるｖｕｖフィルタリングを提供するためのプラズマセル

Country Status (5)

Country Link
US (3) US9927094B2 (enExample)
JP (2) JP6333734B2 (enExample)
KR (2) KR102134110B1 (enExample)
DE (2) DE112013000595T5 (enExample)
WO (1) WO2013109701A1 (enExample)

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US10495287B1 (en) 2017-01-03 2019-12-03 Kla-Tencor Corporation Nanocrystal-based light source for sample characterization
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US10691024B2 (en) 2018-01-26 2020-06-23 Kla-Tencor Corporation High-power short-pass total internal reflection filter
US10714327B2 (en) 2018-03-19 2020-07-14 Kla-Tencor Corporation System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination
US10568195B2 (en) 2018-05-30 2020-02-18 Kla-Tencor Corporation System and method for pumping laser sustained plasma with a frequency converted illumination source
US11262591B2 (en) 2018-11-09 2022-03-01 Kla Corporation System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution
US11121521B2 (en) 2019-02-25 2021-09-14 Kla Corporation System and method for pumping laser sustained plasma with interlaced pulsed illumination sources
US11862922B2 (en) * 2020-12-21 2024-01-02 Energetiq Technology, Inc. Light emitting sealed body and light source device
US11972931B2 (en) * 2020-12-21 2024-04-30 Hamamatsu Photonics K.K. Light emitting sealed body, light emitting unit, and light source device
US12452987B2 (en) * 2023-02-14 2025-10-21 Kla Corporation High-power compact VUV laser-sustained plasma light source

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