JP2015220351A5 - - Google Patents

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Publication number
JP2015220351A5
JP2015220351A5 JP2014103097A JP2014103097A JP2015220351A5 JP 2015220351 A5 JP2015220351 A5 JP 2015220351A5 JP 2014103097 A JP2014103097 A JP 2014103097A JP 2014103097 A JP2014103097 A JP 2014103097A JP 2015220351 A5 JP2015220351 A5 JP 2015220351A5
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JP
Japan
Prior art keywords
substrate
alignment
unit
mark
detection
Prior art date
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Application number
JP2014103097A
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English (en)
Japanese (ja)
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JP2015220351A (ja
JP6465565B2 (ja
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Application filed filed Critical
Priority to JP2014103097A priority Critical patent/JP6465565B2/ja
Priority claimed from JP2014103097A external-priority patent/JP6465565B2/ja
Priority to KR1020150065297A priority patent/KR101852236B1/ko
Priority to US14/713,060 priority patent/US9594314B2/en
Publication of JP2015220351A publication Critical patent/JP2015220351A/ja
Publication of JP2015220351A5 publication Critical patent/JP2015220351A5/ja
Application granted granted Critical
Publication of JP6465565B2 publication Critical patent/JP6465565B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014103097A 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法 Expired - Fee Related JP6465565B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014103097A JP6465565B2 (ja) 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法
KR1020150065297A KR101852236B1 (ko) 2014-05-19 2015-05-11 노광 장치, 정렬 방법 및 디바이스 제조 방법
US14/713,060 US9594314B2 (en) 2014-05-19 2015-05-15 Exposure apparatus, alignment method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014103097A JP6465565B2 (ja) 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2015220351A JP2015220351A (ja) 2015-12-07
JP2015220351A5 true JP2015220351A5 (enExample) 2017-06-29
JP6465565B2 JP6465565B2 (ja) 2019-02-06

Family

ID=54538405

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014103097A Expired - Fee Related JP6465565B2 (ja) 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法

Country Status (3)

Country Link
US (1) US9594314B2 (enExample)
JP (1) JP6465565B2 (enExample)
KR (1) KR101852236B1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI895832B (zh) 2022-11-07 2025-09-01 南韓商奧路絲科技有限公司 圖像獲取方法及裝置
KR102830154B1 (ko) 2022-11-07 2025-07-04 (주) 오로스테크놀로지 이미지 획득 방법 및 장치

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0530304A (ja) 1991-07-22 1993-02-05 Ricoh Co Ltd スキヤナのキヤリツジ固定装置
JP3590916B2 (ja) * 1995-12-28 2004-11-17 株式会社ニコン 位置決め方法
US6225012B1 (en) * 1994-02-22 2001-05-01 Nikon Corporation Method for positioning substrate
JP2000250232A (ja) * 1999-02-25 2000-09-14 Ono Sokki Co Ltd パターン形成装置
JP2003092248A (ja) * 2001-09-17 2003-03-28 Canon Inc 位置検出装置、位置決め装置及びそれらの方法並びに露光装置及びデバイスの製造方法
JP2004296921A (ja) * 2003-03-27 2004-10-21 Canon Inc 位置検出装置
IL156589A0 (en) * 2003-06-23 2004-01-04 Nova Measuring Instr Ltd Method and system for automatic target finding
JP4289961B2 (ja) * 2003-09-26 2009-07-01 キヤノン株式会社 位置決め装置
JP2005167002A (ja) 2003-12-03 2005-06-23 Nikon Corp マーク検出方法とその装置、及び、露光方法とその装置
KR101477448B1 (ko) 2006-08-31 2014-12-29 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP5096965B2 (ja) * 2008-02-29 2012-12-12 キヤノン株式会社 位置合わせ方法、位置合わせ装置、露光方法及びデバイス製造方法
WO2013029893A2 (en) 2011-08-30 2013-03-07 Asml Netherlands B.V. Lithographic system, method of controlling a lithographic apparatus and device manufacturing method

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