JP6465565B2 - 露光装置、位置合わせ方法およびデバイス製造方法 - Google Patents

露光装置、位置合わせ方法およびデバイス製造方法 Download PDF

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Publication number
JP6465565B2
JP6465565B2 JP2014103097A JP2014103097A JP6465565B2 JP 6465565 B2 JP6465565 B2 JP 6465565B2 JP 2014103097 A JP2014103097 A JP 2014103097A JP 2014103097 A JP2014103097 A JP 2014103097A JP 6465565 B2 JP6465565 B2 JP 6465565B2
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Japan
Prior art keywords
alignment
substrate
unit
detection
mark
Prior art date
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Expired - Fee Related
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JP2014103097A
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English (en)
Japanese (ja)
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JP2015220351A (ja
JP2015220351A5 (enExample
Inventor
崇 小倉
崇 小倉
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Canon Inc
Original Assignee
Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2014103097A priority Critical patent/JP6465565B2/ja
Priority to KR1020150065297A priority patent/KR101852236B1/ko
Priority to US14/713,060 priority patent/US9594314B2/en
Publication of JP2015220351A publication Critical patent/JP2015220351A/ja
Publication of JP2015220351A5 publication Critical patent/JP2015220351A5/ja
Application granted granted Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2014103097A 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法 Expired - Fee Related JP6465565B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2014103097A JP6465565B2 (ja) 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法
KR1020150065297A KR101852236B1 (ko) 2014-05-19 2015-05-11 노광 장치, 정렬 방법 및 디바이스 제조 방법
US14/713,060 US9594314B2 (en) 2014-05-19 2015-05-15 Exposure apparatus, alignment method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014103097A JP6465565B2 (ja) 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2015220351A JP2015220351A (ja) 2015-12-07
JP2015220351A5 JP2015220351A5 (enExample) 2017-06-29
JP6465565B2 true JP6465565B2 (ja) 2019-02-06

Family

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JP2014103097A Expired - Fee Related JP6465565B2 (ja) 2014-05-19 2014-05-19 露光装置、位置合わせ方法およびデバイス製造方法

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Country Link
US (1) US9594314B2 (enExample)
JP (1) JP6465565B2 (enExample)
KR (1) KR101852236B1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI895832B (zh) 2022-11-07 2025-09-01 南韓商奧路絲科技有限公司 圖像獲取方法及裝置
KR102830154B1 (ko) 2022-11-07 2025-07-04 (주) 오로스테크놀로지 이미지 획득 방법 및 장치

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0530304A (ja) 1991-07-22 1993-02-05 Ricoh Co Ltd スキヤナのキヤリツジ固定装置
JP3590916B2 (ja) * 1995-12-28 2004-11-17 株式会社ニコン 位置決め方法
US6225012B1 (en) * 1994-02-22 2001-05-01 Nikon Corporation Method for positioning substrate
JP2000250232A (ja) * 1999-02-25 2000-09-14 Ono Sokki Co Ltd パターン形成装置
JP2003092248A (ja) * 2001-09-17 2003-03-28 Canon Inc 位置検出装置、位置決め装置及びそれらの方法並びに露光装置及びデバイスの製造方法
JP2004296921A (ja) * 2003-03-27 2004-10-21 Canon Inc 位置検出装置
IL156589A0 (en) * 2003-06-23 2004-01-04 Nova Measuring Instr Ltd Method and system for automatic target finding
JP4289961B2 (ja) * 2003-09-26 2009-07-01 キヤノン株式会社 位置決め装置
JP2005167002A (ja) 2003-12-03 2005-06-23 Nikon Corp マーク検出方法とその装置、及び、露光方法とその装置
KR101585370B1 (ko) 2006-08-31 2016-01-14 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP5096965B2 (ja) * 2008-02-29 2012-12-12 キヤノン株式会社 位置合わせ方法、位置合わせ装置、露光方法及びデバイス製造方法
NL2009239A (en) 2011-08-30 2013-03-04 Asml Netherlands Bv Lithographic system, method of controlling a lithographic apparatus and device manufacturing method.

Also Published As

Publication number Publication date
KR20150133130A (ko) 2015-11-27
JP2015220351A (ja) 2015-12-07
US9594314B2 (en) 2017-03-14
KR101852236B1 (ko) 2018-04-25
US20150331329A1 (en) 2015-11-19

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