JP2015205837A5 - - Google Patents
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- Publication number
- JP2015205837A5 JP2015205837A5 JP2014087310A JP2014087310A JP2015205837A5 JP 2015205837 A5 JP2015205837 A5 JP 2015205837A5 JP 2014087310 A JP2014087310 A JP 2014087310A JP 2014087310 A JP2014087310 A JP 2014087310A JP 2015205837 A5 JP2015205837 A5 JP 2015205837A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- hydrocarbon group
- represented
- general formulas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atom Chemical group C* 0.000 claims 18
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 15
- 229910052739 hydrogen Inorganic materials 0.000 claims 9
- 239000001257 hydrogen Substances 0.000 claims 9
- -1 alkoxide compound Chemical class 0.000 claims 8
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 7
- 125000004429 atom Chemical group 0.000 claims 5
- 229910052751 metal Inorganic materials 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 4
- 239000010409 thin film Substances 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- 125000003277 amino group Chemical group 0.000 claims 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 2
- 239000002994 raw material Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical group [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 1
- 239000010941 cobalt Chemical group 0.000 claims 1
- 229910017052 cobalt Inorganic materials 0.000 claims 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical group [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 239000010408 film Substances 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052748 manganese Chemical group 0.000 claims 1
- 239000011572 manganese Chemical group 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 125000002560 nitrile group Chemical group 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014087310A JP6343481B2 (ja) | 2014-04-21 | 2014-04-21 | 薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
| US15/303,845 US10351584B2 (en) | 2014-04-21 | 2015-03-30 | Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound |
| KR1020167029729A KR102375179B1 (ko) | 2014-04-21 | 2015-03-30 | 알콕사이드 화합물, 박막 형성용 원료, 박막의 제조방법 및 알코올 화합물 |
| PCT/JP2015/059903 WO2015163090A1 (ja) | 2014-04-21 | 2015-03-30 | アルコキシド化合物、薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
| EP15782391.5A EP3135664B1 (en) | 2014-04-21 | 2015-03-30 | Alkoxide compound, raw material for forming thin film, method for producing thin film, and alcohol compound |
| TW104111262A TWI652274B (zh) | 2014-04-21 | 2015-04-08 | 烷氧化合物，薄膜形成用原料，薄膜的製造方法及醇化合物 |
| IL248335A IL248335B (en) | 2014-04-21 | 2016-10-13 | Alkoxide compound, raw material for forming a thin layer, method for producing a thin layer and alcohol compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014087310A JP6343481B2 (ja) | 2014-04-21 | 2014-04-21 | 薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018011074A Division JP6408178B2 (ja) | 2018-01-26 | 2018-01-26 | アルコキシド化合物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015205837A JP2015205837A (ja) | 2015-11-19 |
| JP2015205837A5 true JP2015205837A5 (enExample) | 2017-03-16 |
| JP6343481B2 JP6343481B2 (ja) | 2018-06-13 |
Family
ID=54332259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014087310A Active JP6343481B2 (ja) | 2014-04-21 | 2014-04-21 | 薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10351584B2 (enExample) |
| EP (1) | EP3135664B1 (enExample) |
| JP (1) | JP6343481B2 (enExample) |
| KR (1) | KR102375179B1 (enExample) |
| IL (1) | IL248335B (enExample) |
| TW (1) | TWI652274B (enExample) |
| WO (1) | WO2015163090A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102592325B1 (ko) * | 2016-07-14 | 2023-10-20 | 삼성전자주식회사 | 알루미늄 화합물과 이를 이용한 박막 형성 방법 및 집적회로 소자의 제조 방법 |
| JPWO2018235530A1 (ja) * | 2017-06-21 | 2020-04-23 | 株式会社Adeka | 金属アルコキシド化合物、薄膜形成用原料及び薄膜の製造方法 |
| CN111602228B (zh) | 2017-12-17 | 2023-12-12 | 应用材料公司 | 通过选择性沉积的硅化物膜 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006057503A1 (en) * | 2004-11-25 | 2006-06-01 | Lg Life Sciences, Ltd. | NOVEL COMPOUNDS AS AGONIST FOR PPARϜ AND PPARα, METHOD FOR PREPARATION OF THE SAME, AND PHARMACEUTICAL COMPOSITION CONTAINING THE SAME |
| WO2006107121A1 (en) | 2005-04-07 | 2006-10-12 | Korea Research Institue Of Chemical Technology | Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same |
| JP4781012B2 (ja) | 2005-05-30 | 2011-09-28 | 株式会社Ａｄｅｋａ | アルコール化合物を配位子とした金属化合物及び薄膜形成用原料並びに薄膜の製造方法 |
| KR100675983B1 (ko) | 2006-03-06 | 2007-01-30 | 한국화학연구원 | 신규의 코발트 아미노알콕사이드 화합물 및 그 제조 방법 |
| WO2013188377A1 (en) * | 2012-06-11 | 2013-12-19 | Wayne State University | Precursors for atomic layer deposition |
| CN103664803A (zh) * | 2012-09-17 | 2014-03-26 | 王天桃 | 2,3,5,6-四甲基吡嗪新的合成方法 |
| KR102046334B1 (ko) * | 2012-11-13 | 2019-11-19 | 가부시키가이샤 아데카 | 금속 알콕시드 화합물, 박막 형성용 원료, 박막의 제조방법 및 알코올 화합물 |
| US9758866B2 (en) | 2013-02-13 | 2017-09-12 | Wayne State University | Synthesis and characterization of first row transition metal complexes containing α-imino alkoxides as precursors for deposition of metal films |
-
2014
- 2014-04-21 JP JP2014087310A patent/JP6343481B2/ja active Active
-
2015
- 2015-03-30 WO PCT/JP2015/059903 patent/WO2015163090A1/ja not_active Ceased
- 2015-03-30 KR KR1020167029729A patent/KR102375179B1/ko active Active
- 2015-03-30 EP EP15782391.5A patent/EP3135664B1/en active Active
- 2015-03-30 US US15/303,845 patent/US10351584B2/en active Active
- 2015-04-08 TW TW104111262A patent/TWI652274B/zh active
-
2016
- 2016-10-13 IL IL248335A patent/IL248335B/en active IP Right Grant
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