JP2015153776A - heat treatment apparatus - Google Patents

heat treatment apparatus Download PDF

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JP2015153776A
JP2015153776A JP2014023743A JP2014023743A JP2015153776A JP 2015153776 A JP2015153776 A JP 2015153776A JP 2014023743 A JP2014023743 A JP 2014023743A JP 2014023743 A JP2014023743 A JP 2014023743A JP 2015153776 A JP2015153776 A JP 2015153776A
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Prior art keywords
door
opening
drive arm
door frame
process tube
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JP6263407B2 (en
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篤史 森本
Atsushi Morimoto
篤史 森本
正範 小窪
Masanori Kokubo
正範 小窪
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JTEKT Thermo Systems Corp
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Koyo Thermo Systems Co Ltd
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Priority to JP2014023743A priority Critical patent/JP6263407B2/en
Priority to TW103135944A priority patent/TWI633265B/en
Priority to KR1020140151250A priority patent/KR102272832B1/en
Priority to CN201510066505.2A priority patent/CN104835760B/en
Publication of JP2015153776A publication Critical patent/JP2015153776A/en
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Publication of JP6263407B2 publication Critical patent/JP6263407B2/en
Priority to KR1020210083633A priority patent/KR102293229B1/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • H01L31/1864—Annealing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876—Particular processes or apparatus for batch treatment of the devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)
  • Special Wing (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a heat treatment apparatus capable of increasing sealing properties of a throat of a process tube and an inner surface member of an inner surface of a door while suppressing decrease in temperature of a quartz plate of the inner surface of the door.SOLUTION: A door 10 is arranged at a side of a throat 2A of a quartz tube 2 so as to open ord close the throat 2A with an opening/closing mechanism 20. The door 10 includes: a quartz plate 11 disposed at the side of the quartz tube 2; a heat insulation material 12 held at an inner side of the door 10; and a door frame 13 for holding the quartz plate 11 and the heat insulation material 12. The opening/closing mechanism 20 includes: a drive arm 21 which holds the door frame 13 at an end thereof, and is driven, together with the door 10, in directions for contacting with and separating from the quartz tube 2; and driving means 23 for driving the drive arm 21. The opening/closing mechanism 20 drives the door 10 with driving force of the driving means 23 so as to open or close the throat 2A of the quartz tube 2. A door inclination adjusting member 30 is supported at an end of the drive arm 21 in an inclinable manner, and arranged on the door frame 13 so as to support the door 10 in an inclination-adjustable manner.

Description

この発明は、シリコン基板などのワークに対して熱処理を行うための熱処理装置に関する。   The present invention relates to a heat treatment apparatus for performing heat treatment on a workpiece such as a silicon substrate.

太陽電池セルなどの製造プロセスでは、ワークであるシリコン基板（半導体ウエハ）の表面に不純物を拡散させる拡散処理等の熱処理が施される。この熱処理を行うための熱処理装置は、ワークを収容して熱処理を施すためのプロセスチューブ及びヒータを備えている。   In a manufacturing process of a solar battery cell or the like, a heat treatment such as a diffusion process for diffusing impurities is performed on the surface of a silicon substrate (semiconductor wafer) that is a workpiece. The heat treatment apparatus for performing the heat treatment includes a process tube and a heater for accommodating the workpiece and performing the heat treatment.

プロセスチューブは、例えば石英チューブであり、複数枚の半導体ウエハを互いに間に所定の間隙を設けて保持したボートを内部に収容する。ヒータは、プロセスチューブの外側を囲うように配置され、プロセスチューブの内部を所定の温度に加熱する。   The process tube is, for example, a quartz tube, and accommodates a boat that holds a plurality of semiconductor wafers with a predetermined gap therebetween. The heater is disposed so as to surround the outside of the process tube, and heats the inside of the process tube to a predetermined temperature.

プロセスチューブの一端には、ボートが出し入れされる開口が形成されており、この開口を開閉する扉が設けられている。扉によって開口を閉鎖することにより、プロセスチューブの内部が密閉される（例えば、特許文献１参照。）。   At one end of the process tube, an opening through which the boat is taken in and out is formed, and a door for opening and closing the opening is provided. By closing the opening with the door, the inside of the process tube is sealed (see, for example, Patent Document 1).

半導体ウエハの拡散処理時には、密閉されたプロセスチューブ内に例えばオキシ塩化リン（ＰＯＣｌ３）、三臭化ホウ素（ＢＢｒ３）などのガスが導入される。 During diffusion processing of a semiconductor wafer, a gas such as phosphorus oxychloride (POCl 3 ) or boron tribromide (BBr 3 ) is introduced into a sealed process tube.

特開２００１−１８５５０１号公報JP 2001-185501 A

扉は、内面が高温のプロセスチューブ内に露出する一方、外面が外気に晒されて冷却される。このため、扉の内面と外面との間の断熱が十分でないと、熱処理プロセス中にプロセスチューブの開口近傍が扉を介して冷却される。また、扉の内面とプロセスチューブの端面との密着性が十分でないと、両者の間隙からプロセスチューブ内に侵入する外気によってプロセスチューブの開口近傍が冷却される。半導体ウエハの拡散処理中にプロセスチューブの開口近傍が冷却されると、扉の内面やプロセスチューブの開口近傍にＰＯＣｌ３由来の五酸化二リン（Ｐ２Ｏ５）の析出を招く。また、プロセスチューブ内に侵入した外気に含まれる水蒸気とプロセスチューブ内のＰＯＣｌ３やＰ２Ｏ５との反応によって発生したリン酸水溶液が、扉を支持する金属製フレームに腐食を生じさせたり、プロセスチューブ内のワークを汚染する虞がある。 The door is exposed to the outside air while the inner surface is exposed in the hot process tube, and is cooled. For this reason, if the heat insulation between the inner surface and the outer surface of the door is not sufficient, the vicinity of the opening of the process tube is cooled through the door during the heat treatment process. Further, when the adhesion between the inner surface of the door and the end surface of the process tube is not sufficient, the vicinity of the opening of the process tube is cooled by the outside air that enters the process tube through the gap between the two. When the vicinity of the opening of the process tube is cooled during the diffusion process of the semiconductor wafer, the phosphorous pentoxide (P 2 O 5 ) derived from POCl 3 is precipitated on the inner surface of the door or in the vicinity of the opening of the process tube. In addition, the phosphoric acid aqueous solution generated by the reaction between water vapor contained in the outside air that has entered the process tube and POCl 3 or P 2 O 5 in the process tube causes corrosion to the metal frame that supports the door, There is a risk of contaminating the workpiece in the process tube.

この発明の目的は、扉の内面と外面との間を確実に断熱するとともに、扉の内面とプロセスチューブの端面との密閉性を高めることにより、フレームの腐食やワークの汚染の原因となる副生成物の発生を抑制できる熱処理装置を提供することにある。   The object of the present invention is to reliably insulate between the inner surface and the outer surface of the door, and to improve the hermeticity between the inner surface of the door and the end surface of the process tube, thereby causing corrosion of the frame and contamination of the workpiece. An object of the present invention is to provide a heat treatment apparatus capable of suppressing the generation of products.

本発明熱処理装置はプロセスチューブ、扉、開閉機構及び扉傾斜調整部材を備える。   The heat treatment apparatus of the present invention includes a process tube, a door, an opening / closing mechanism, and a door inclination adjusting member.

プロセスチューブは、筒状を呈し、一端が閉じられるとともに他端には開口（炉口）が形成されており、開口を通して熱処理されるワークが内部に収容される。扉はプロセスチューブの開口を開閉する。   The process tube has a cylindrical shape, one end is closed and an opening (furnace port) is formed at the other end, and a workpiece to be heat-treated through the opening is accommodated therein. The door opens and closes the process tube opening.

扉は、内面部材、断熱材及び扉フレームを有する。内面部材は、プロセスチューブ側に配置される。断熱材は、内面部材の外側に配置される。扉フレームは、断熱材の外側に配置されて内面部材及び断熱材を保持する。   The door includes an inner surface member, a heat insulating material, and a door frame. The inner surface member is disposed on the process tube side. The heat insulating material is disposed outside the inner surface member. The door frame is disposed outside the heat insulating material and holds the inner surface member and the heat insulating material.

開閉機構は、駆動アーム及び駆動手段を有する。駆動アームは先端に扉フレームを支持する。扉アームは扉とともにプロセスチューブに接近する一方向とプロセスチューブから遠ざかる他方向に駆動される。駆動手段はその駆動力によって駆動アームを駆動し、扉を動作させてプロセスチューブの開口を開放または閉鎖するように構成される。   The opening / closing mechanism has a drive arm and drive means. The drive arm supports the door frame at the tip. The door arm is driven with the door in one direction approaching the process tube and in the other direction away from the process tube. The driving means is configured to drive the driving arm by the driving force and operate the door to open or close the opening of the process tube.

扉傾斜調整部材は、扉を傾斜調整可能に支持する。扉駆動アームの先端に傾斜可能に支持されるとともに、扉フレームに取り付けられる。   The door inclination adjusting member supports the door so that the inclination can be adjusted. It is supported at the tip of the door drive arm so as to be tiltable and is attached to the door frame.

この構成によると、扉に断熱材が内蔵されるので、扉の内側と外側で温度差があっても、扉内面の内面部材の温度の低下が抑制される。これにより、プロセスチューブの炉口の近傍に拡散用ガス由来の副生成物が析出することが防止される。   According to this configuration, since the heat insulating material is built in the door, even if there is a temperature difference between the inside and the outside of the door, a decrease in the temperature of the inner surface member on the inner surface of the door is suppressed. This prevents the by-product derived from the diffusion gas from being deposited in the vicinity of the furnace port of the process tube.

断熱材と内面部材とは、扉フレームに保持される構造である。したがって、扉が断熱材を備える構造であっても扉外面の扉フレームを駆動アームの先端に支持して回動自在にする開閉機構により、支障なく扉を開閉できる。   A heat insulating material and an inner surface member are the structures hold | maintained at a door frame. Therefore, even if the door has a structure including a heat insulating material, the door can be opened and closed without hindrance by the opening and closing mechanism that supports the door frame on the outer surface of the door on the tip of the drive arm to be rotatable.

また、駆動アームの先端に設けられて扉を傾斜可能に支持する扉傾斜調整部材により、プロセスチューブの炉口の形状に沿って扉内面の内面部材が追従する形で密閉性を高めることができる。これにより、プロセスチューブの炉口からの大気の侵入が防止され、大気と反応して生成する、扉を腐食させたり炉内を汚染させたりする原因となる副生成物の発生を防止することができる。   Further, the door tilt adjustment member provided at the tip of the drive arm and tiltably supports the door can improve the sealing performance in such a way that the inner surface member of the door inner surface follows the shape of the furnace opening of the process tube. . This prevents intrusion of air from the furnace opening of the process tube and prevents the generation of by-products that react with the atmosphere and cause corrosion of the door and contamination of the furnace. it can.

扉傾斜調整部材は、前記駆動アームの先端に取り付けられたロッドエンド軸受と、該ロッドエンド軸受により軸心が傾斜可能に支持される揺動軸とを備える構成が挙げられる。なお、揺動軸は扉フレームに取り付けられる。   The door inclination adjusting member includes a rod end bearing attached to the tip of the drive arm, and a swing shaft whose axis is supported by the rod end bearing so as to be inclined. The swing shaft is attached to the door frame.

扉傾斜調整部材は、さらに追加的に、次のような角度調整ヘッド及び角度調整ブロックを追加的に備えることもできる。角度調整ヘッドは、揺動軸における扉フレームに取り付けられた一端部に対する反対側の他端部に設けられる。角度調節ブロックには開口が形成される。この開口の大きさは、角度調節ヘッドが貫通し、かつ角度調節ヘッドの傾斜を許容する大きさに設定される。   The door inclination adjusting member may additionally include an angle adjusting head and an angle adjusting block as follows. The angle adjusting head is provided at the other end of the swing shaft opposite to the one end attached to the door frame. An opening is formed in the angle adjustment block. The size of the opening is set to a size that allows the angle adjusting head to pass therethrough and allows the angle adjusting head to be inclined.

前記扉フレーム及び前記駆動アームには、扉におけるプロセスチューブの開口を閉じる面の中心より偏心した位置に、扉の中心回りの回転を規制する扉回転規制部材が設けられる。   The door frame and the drive arm are provided with a door rotation restricting member that restricts rotation around the center of the door at a position eccentric from the center of the surface of the door that closes the opening of the process tube.

これによると、扉傾斜調整部材が簡素に実現される。一方で、揺動軸に取り付けられた角度調節ヘッドが、角度調節ブロックの開口内で揺動軸の軸回りに回転することが許容されることで、プロセスチューブの炉口と扉内面の内面部材との摺り合わせ状態が変更され、開閉を繰り返すことで密閉性が低下することが考えられる。   According to this, the door inclination adjusting member is simply realized. On the other hand, the angle adjusting head attached to the swing shaft is allowed to rotate around the swing shaft within the opening of the angle control block, so that the furnace tube of the process tube and the inner surface member of the inner surface of the door It is conceivable that the sealing state is deteriorated by changing the sliding state and repeatedly opening and closing.

そこで、扉フレームと駆動アームとに、扉の回転を規制する扉回転規制部材を設けることで、プロセスチューブの炉口と扉内面の内面部材との摺り合わせの再現性を保ち、密閉性の低下を防ぐことができる。扉は扉の中心の回りに回転するので、扉回転規制部材は前記扉におけるプロセスチューブの開口を閉じる面の中心より偏心した位置に設けることが望ましい。   Therefore, by providing the door frame and drive arm with a door rotation regulating member that regulates the rotation of the door, the reproducibility of the sliding of the furnace tube of the process tube and the inner surface member of the inner surface of the door is maintained, and the sealing performance is lowered. Can be prevented. Since the door rotates around the center of the door, the door rotation restricting member is preferably provided at a position eccentric from the center of the surface of the door that closes the opening of the process tube.

前記扉回転規制部材の構成は、次のような回転規制ヘッド及び回転規制板を備える構成が挙げられる。回転規制ヘッドは、扉フレームまたは駆動アームのいずれか一方に設けられ。回転規制板は、扉フレームまたは駆動アームの他方に設けられ、回動規制ヘッドが貫通するとともに、回転規制ヘッドの回転を一定範囲に規制する大きさの開口が形成される。   Examples of the configuration of the door rotation regulating member include a configuration including the following rotation regulating head and rotation regulating plate. The rotation regulating head is provided on either the door frame or the drive arm. The rotation restricting plate is provided on the other of the door frame or the drive arm, and the rotation restricting head penetrates, and an opening having a size for restricting the rotation of the rotation restricting head to a certain range is formed.

前記駆動手段は次のようなシリンダ機構によって構成される。シリンダ機構は往復動するピストンロッドと、該ピストンロッドを収納するシリンダチューブとを備え、流体圧の供給を受けてピストンロッドがシリンダチューブに対して進出、後退して駆動力を生ずるものである。駆動アームの基端は前記ピストンロッドに連結され、駆動力が駆動アームに伝達される。   The driving means is constituted by the following cylinder mechanism. The cylinder mechanism includes a piston rod that reciprocates and a cylinder tube that houses the piston rod. When the fluid pressure is supplied, the piston rod advances and retracts from the cylinder tube to generate a driving force. The base end of the drive arm is connected to the piston rod, and the driving force is transmitted to the drive arm.

駆動アームの回転を実現する構成は次のようになっている。駆動アームは、プロセスチューブの開口を閉じる扉の面と略平行に延びるように設けられる。駆動アーム基端部には、駆動アームと供回りする第１リンクが設けられる。固定ブラケットが熱処理装置に固定される。固定ブラケットの一端部に、駆動アームの基端部と第１リンクの一端部とが回転可能に支持される。固定ブラケットの他端部に、固定ブラケットの他端部にはシリンダチューブが回転可能に支持される。第１リンクの他端部は、互いに回転可能に前記ピストンロッドの先端部と連結される。固定ブラケットは、一端部が他端部よりプロセスチューブに近い位置となるように設けられる。   The configuration for realizing the rotation of the drive arm is as follows. The drive arm is provided so as to extend substantially parallel to the surface of the door that closes the opening of the process tube. A first link that rotates around the drive arm is provided at the base end of the drive arm. A fixing bracket is fixed to the heat treatment apparatus. The base end portion of the drive arm and the one end portion of the first link are rotatably supported by one end portion of the fixed bracket. A cylinder tube is rotatably supported on the other end of the fixed bracket and on the other end of the fixed bracket. The other end of the first link is connected to the tip of the piston rod so as to be rotatable relative to each other. The fixing bracket is provided so that one end is closer to the process tube than the other end.

この発明によれば、扉内面の内面部材の温度低下を抑制しながらプロセスチューブの炉口と扉内面の内面部材との密閉を保つことができる。これにより、プロセスチューブの炉口付近への拡散用ガス由来の副生成物の析出と炉口からの大気の侵入の両方が抑制され、扉の腐食や炉内汚染の原因物質の生成が防止され、メンテナンス周期を長くすることが可能である。   According to this invention, it is possible to maintain the sealing between the furnace opening of the process tube and the inner surface member of the door inner surface while suppressing the temperature drop of the inner surface member of the door inner surface. This suppresses both the precipitation of by-products from the diffusion gas near the furnace port of the process tube and the intrusion of air from the furnace port, and prevents the generation of substances that cause door corrosion and furnace contamination. It is possible to lengthen the maintenance cycle.

この発明の実施形態に係る熱処理装置の要部を示す平面図である。It is a top view which shows the principal part of the heat processing apparatus which concerns on embodiment of this invention. 扉及び駆動アームを示す一部破断平面図である。It is a partially broken top view which shows a door and a drive arm. 扉傾斜調整部材の構成を示す図２の矢視III−III線断面図である。FIG. 3 is a cross-sectional view taken along the line III-III in FIG. 2 illustrating the configuration of the door inclination adjusting member. 扉傾斜調整部材の動作を説明する図である。It is a figure explaining operation | movement of a door inclination adjustment member. 扉回転規制部材の構成を示す図２の矢視V−V線断面図である。FIG. 5 is a cross-sectional view taken along the line VV in FIG. 2 illustrating the configuration of the door rotation regulating member. 開閉機構、扉傾斜調整部材及び扉回転規制部材の構成を示す正面図である。It is a front view which shows the structure of an opening-and-closing mechanism, a door inclination adjustment member, and a door rotation control member.

以下に、図面を参照して、この発明の実施の形態に係る熱処理装置を説明する。   A heat treatment apparatus according to an embodiment of the present invention will be described below with reference to the drawings.

熱処理装置１は、一例として、この発明のプロセスチューブである石英チューブ２をその長手方向を水平に配置した横型炉として構成されており、図１に示すように、ワークＷが収容される拡散室３を形成した石英チューブ２の開口（炉口）２Ａに扉１０を、開閉機構２０を用いて開閉可能に設けた基本構造を有する。ワークＷは例えば、太陽電池セル用の矩形のシリコン基板である。ボート４は複数枚のワークＷを垂直に等間隔に配列された状態に保持し、走行輪によって走行して炉口２Ａを介して拡散室３にワークＷを搬出入する。   As an example, the heat treatment apparatus 1 is configured as a horizontal furnace in which a quartz tube 2 which is a process tube of the present invention is horizontally arranged in its longitudinal direction, and as shown in FIG. 1, a diffusion chamber in which a workpiece W is accommodated. 3 has a basic structure in which a door 10 is provided at an opening (furnace port) 2A of the quartz tube 2 formed with an opening / closing mechanism 20 so as to be opened and closed. The workpiece W is, for example, a rectangular silicon substrate for solar cells. The boat 4 holds a plurality of workpieces W arranged vertically at equal intervals, travels by traveling wheels, and carries the workpieces W into and out of the diffusion chamber 3 through the furnace port 2A.

拡散室３には、図１では省略された石英チューブ２の閉じられた一端側に設置される拡散用ガス気流導入装置（不図示。）を用いて拡散源（例えば、ＰＯＣｌ３）を含む拡散用ガスが導入される。 The diffusion chamber 3 includes a diffusion source (for example, POCl 3 ) using a diffusion gas flow introduction device (not shown) installed on one closed end side of the quartz tube 2 omitted in FIG. Gas for use is introduced.

拡散用ガス気流導入装置は、具体的には、ソースガスにより液体拡散源をバブリングさせ、液体拡散源の飽和蒸気を含むソースガスをキャリアガスに合流して拡散用ガス気流とし、この拡散用ガス気流を石英チューブ２の一端から導入するように構成される。   Specifically, the diffusion gas flow introduction device bubbles a liquid diffusion source with a source gas, and combines the source gas containing saturated vapor of the liquid diffusion source with a carrier gas to form a diffusion gas flow. An air flow is configured to be introduced from one end of the quartz tube 2.

石英チューブ２の炉口２Ａの近傍周面には排気管５が接続される。ワークＷの処理に供された拡散用ガスは排気管５から炉外に排気される。炉口２Ａから拡散用ガスのガス漏れを防ぐために拡散室３は負圧になっている。   An exhaust pipe 5 is connected to the peripheral surface of the quartz tube 2 in the vicinity of the furnace port 2A. The diffusion gas used for processing the workpiece W is exhausted from the exhaust pipe 5 to the outside of the furnace. The diffusion chamber 3 is at a negative pressure to prevent the diffusion gas from leaking from the furnace port 2A.

石英チューブ２の外周には加熱装置が配置される。加熱装置は例えば、図示の如くヒータ７を備える構成が採用される。加熱装置の動作によって加熱された拡散室３に拡散用ガス導入装置から拡散源が導入されることで、ワークＷに不純物（たとえば、リン）が拡散される処理が行われる。なお、加熱装置は、石英チューブ２とヒータ７との間に均熱管を備えることもできる。   A heating device is disposed on the outer periphery of the quartz tube 2. As the heating device, for example, a configuration including a heater 7 as illustrated is adopted. By introducing a diffusion source from the diffusion gas introducing device into the diffusion chamber 3 heated by the operation of the heating device, a process for diffusing impurities (for example, phosphorus) into the workpiece W is performed. The heating device can also include a soaking tube between the quartz tube 2 and the heater 7.

石英チューブ２の炉口２Ａは開閉式の扉１０で塞がれる。扉１０は後述する開閉機構２０によって回動して炉口２Ａを開閉する。   The furnace port 2 </ b> A of the quartz tube 2 is closed by an openable door 10. The door 10 is rotated by an opening / closing mechanism 20 described later to open / close the furnace port 2A.

図２に示すように、扉１０は石英板１１、断熱材１２及び扉フレーム１３を備える。石英板１１は石英で作製された円盤であり、この発明の内面部材に相当する。扉フレーム１３は石英板及び断熱材を保持する。石英板１１は扉１０における内面側に存在し、扉１０が閉じられたときに石英チューブ２の炉口２Ａに押圧される。   As shown in FIG. 2, the door 10 includes a quartz plate 11, a heat insulating material 12, and a door frame 13. The quartz plate 11 is a disk made of quartz and corresponds to the inner surface member of the present invention. The door frame 13 holds a quartz plate and a heat insulating material. The quartz plate 11 exists on the inner surface side of the door 10 and is pressed against the furnace port 2A of the quartz tube 2 when the door 10 is closed.

扉フレーム１３は円盤部１３１と筒状部１３２が一体化された形状の部材である。扉フレーム１３はステンレスなどの剛性を有する材料で形成される。円盤部１３１は扉１０における外面側に存在する。筒状部１３２は、扉１０の側面部を構成する。   The door frame 13 is a member having a shape in which a disk part 131 and a cylindrical part 132 are integrated. The door frame 13 is formed of a material having rigidity such as stainless steel. The disk part 131 exists on the outer surface side of the door 10. The cylindrical part 132 constitutes a side part of the door 10.

断熱材１２は扉フレーム１３の筒状部１３２とで囲まれた空間に充填される。断熱材１２は扉フレーム１３の円盤部１３１と石英板１１とで挟まれ、扉フレーム１３の筒状部１３２の外周面と石英板１１の周囲部との周方向の複数箇所に取り付けられるストッパー１４によって固定される。こうして、石英板１１と断熱材１２が扉フレーム１３に組み付けられる。扉１０において、断熱材１２は石英板１１の拡散室３（図１参照。）と反対側に配置されることになる。   The heat insulating material 12 is filled in a space surrounded by the cylindrical portion 132 of the door frame 13. The heat insulating material 12 is sandwiched between the disk part 131 of the door frame 13 and the quartz plate 11, and is attached to a plurality of circumferential positions between the outer peripheral surface of the cylindrical part 132 of the door frame 13 and the peripheral part of the quartz plate 11. Fixed by. Thus, the quartz plate 11 and the heat insulating material 12 are assembled to the door frame 13. In the door 10, the heat insulating material 12 is disposed on the opposite side of the quartz plate 11 from the diffusion chamber 3 (see FIG. 1).

次に開閉機構２０の構成を説明する。開閉機構２０は、駆動アーム２１及び駆動手段２３を備える。駆動アーム２１は駆動手段２３により、扉１０とともに石英チューブ２に接近する一方向（図１矢印Ｒ１方向参照。）と石英チューブ２から遠ざかる他方向（同図矢印Ｒ２方向参照。）に駆動される。このように駆動アーム２１が駆動されることによって扉１０を駆動して石英チューブ２の炉口２Ａが開放または閉鎖される。   Next, the configuration of the opening / closing mechanism 20 will be described. The opening / closing mechanism 20 includes a driving arm 21 and driving means 23. The drive arm 21 is driven by the drive means 23 in one direction approaching the quartz tube 2 together with the door 10 (see the direction of arrow R1 in FIG. 1) and in the other direction away from the quartz tube 2 (see the direction of arrow R2 in the figure). . By driving the drive arm 21 in this way, the door 10 is driven and the furnace port 2A of the quartz tube 2 is opened or closed.

本実施形態では、駆動手段２３として、往復動するピストンロッド２３２と、ピストンロッド２３２を収納するシリンダチューブ２３１とを備え、流体圧の供給を受けてピストンロッド２３２がシリンダチューブ２３１に対して進出、後退して駆動力を伝達するシリンダ機構によって構成される。ここでは、シリンダ機構としてエアシリンダを用いている。   In this embodiment, the driving means 23 includes a piston rod 232 that reciprocates and a cylinder tube 231 that houses the piston rod 232, and the piston rod 232 advances relative to the cylinder tube 231 upon receiving fluid pressure. It is constituted by a cylinder mechanism that moves backward to transmit the driving force. Here, an air cylinder is used as the cylinder mechanism.

駆動アーム２１は、石英チューブ２の炉口Ａを閉じる扉１０の面と略平行に延びるように設けられる。   The drive arm 21 is provided so as to extend substantially parallel to the surface of the door 10 that closes the furnace port A of the quartz tube 2.

駆動アーム２１の基端は第１リンク２６及び第２リンク２８を介してピストンロッド２３２の先端に連結される。   The proximal end of the drive arm 21 is connected to the distal end of the piston rod 232 via the first link 26 and the second link 28.

石英チューブ２の炉口２Ａの脇に、固定ブラケット（固定具）２７が熱処理装置に対して固定される。固定ブラケット２７の長手方向は石英チューブ２の軸方向に直交する方向に規定される。固定ブラケット２７は、一端部が他端部より石英チューブ２に近い位置となるように設けられる。その固定ブラケット２７の長手方向の一端部及び他端部にそれぞれ第１回動軸２４及び第２回動軸２５が設けられる。   Next to the furnace port 2A of the quartz tube 2, a fixing bracket (fixing tool) 27 is fixed to the heat treatment apparatus. The longitudinal direction of the fixing bracket 27 is defined as a direction orthogonal to the axial direction of the quartz tube 2. The fixing bracket 27 is provided so that one end thereof is closer to the quartz tube 2 than the other end. A first rotating shaft 24 and a second rotating shaft 25 are provided at one end and the other end in the longitudinal direction of the fixed bracket 27, respectively.

第１回動軸２４は固定ブラケット２７に固定される円柱状の支柱２４１と、支柱２４１の周囲に回転自在に配設された円筒状のスリーブ２４２と、から構成される。固定ブラケット２７の一端部には、駆動アーム２１と第１リンク２６とが供回りするように第１回動軸２４によって駆動アーム２１の基端部と第１リンク２６の一端部とが回転可能に支持される。   The first rotation shaft 24 includes a columnar column 241 fixed to the fixed bracket 27, and a cylindrical sleeve 242 that is rotatably disposed around the column 241. The base end portion of the drive arm 21 and the one end portion of the first link 26 can be rotated by the first rotation shaft 24 so that the drive arm 21 and the first link 26 are rotated around one end portion of the fixed bracket 27. Supported by

第１リンク２６の他端部は、互いに回転可能にピストンロッド２３２の先端部と連結される。第１リンク２６の他端部とピストンロッド２３２の先端部とは、第１リンク２６に対して回転可能な第２リンク２８を介して連結される。   The other end of the first link 26 is connected to the tip of the piston rod 232 so as to be rotatable relative to each other. The other end of the first link 26 and the tip of the piston rod 232 are connected via a second link 28 that is rotatable with respect to the first link 26.

第２回動軸２５は固定ブラケット２７にピンを凸設し、ピンが嵌合する穴をシリンダチューブ２３１に設けるなど、単純な凹凸嵌合で実現出来る。固定ブラケット２７の他端部には、シリンダチューブ２３１が第２回動軸２５によって回転可能に支持される。   The second rotating shaft 25 can be realized by simple concave and convex fitting, such as providing a pin on the fixed bracket 27 and providing a hole for fitting the pin in the cylinder tube 231. A cylinder tube 231 is rotatably supported by the second rotating shaft 25 at the other end of the fixed bracket 27.

駆動手段２３は駆動アーム２１の回動を自動化する装置である。そして、駆動手段２３に関して、ピストンロッド２３２がシリンダチューブ２３１より進出すると、駆動アーム２１が石英チューブ２の炉口２Ａに近づくように回転し、扉１０が閉じるように回動する。そして、扉１０が炉口２Ａに押圧され、石英チューブ２内が密閉される。   The drive means 23 is a device that automates the rotation of the drive arm 21. When the piston rod 232 advances from the cylinder tube 231 with respect to the drive means 23, the drive arm 21 rotates so as to approach the furnace port 2A of the quartz tube 2 and rotates so that the door 10 is closed. And the door 10 is pressed by the furnace port 2A, and the inside of the quartz tube 2 is sealed.

一方、ピストンロッド２３２がシリンダチューブ２３１に対して後退すると、駆動アーム２１が石英チューブ２の炉口２Ａから遠ざかるように回転し、扉１０が開くように回動する。なお、ピストンロッド２３２がシリンダチューブ２３１に対して後退すると、駆動アーム２１が石英チューブ２の炉口２Ａから遠ざかるように回転し、扉１０が開くように回動する。なお、駆動手段２３を特に図示しないコントローラにより制御するようにすると、駆動アーム２１の駆動を自動制御することができる。   On the other hand, when the piston rod 232 moves backward with respect to the cylinder tube 231, the drive arm 21 rotates so as to move away from the furnace port 2A of the quartz tube 2, and rotates so that the door 10 opens. When the piston rod 232 moves backward with respect to the cylinder tube 231, the drive arm 21 rotates to move away from the furnace port 2A of the quartz tube 2 and rotates so that the door 10 opens. If the drive means 23 is controlled by a controller (not shown), the drive of the drive arm 21 can be automatically controlled.

扉フレーム１３は、駆動アーム２１の先端に配設される扉傾斜調整部材３０によって傾斜（揺動）自在に支持される。   The door frame 13 is supported by a door inclination adjusting member 30 disposed at the tip of the drive arm 21 so as to be inclined (swingable).

具体的には、扉傾斜調整部材３０は、図３に示すように、ロッドエンド軸受３１及び揺動軸３２を備える。ロッドエンド軸受３１は駆動アーム２１の先端に取り付けられる。揺動軸３２は、ロッドエンド軸受３１により軸心が傾斜可能に支持される。揺動軸３２は、扉フレーム１３の中心に金具３２１を用いて固定される。金具３２１で扉フレーム１３に固定された揺動軸３２は、駆動アーム２１の先端上面に取り付けられたロッドエンド軸受３１の球面内輪３１１に挿通される。   Specifically, the door inclination adjusting member 30 includes a rod end bearing 31 and a swing shaft 32 as shown in FIG. The rod end bearing 31 is attached to the tip of the drive arm 21. The swing shaft 32 is supported by the rod end bearing 31 so that the shaft center can be tilted. The swing shaft 32 is fixed to the center of the door frame 13 using a metal fitting 321. The swing shaft 32 fixed to the door frame 13 with the metal fitting 321 is inserted into the spherical inner ring 311 of the rod end bearing 31 attached to the top end surface of the drive arm 21.

ロッドエンド軸受３１は、公知のロッドエンド軸受（特開２００３−２４７５４０号公報、実開平２−７８８０８号公報。）を用いて構成することができ、内側に形成された球面状の取付孔に、球面内輪３１１が揺動可能に保持されている。揺動軸３２は、球面内輪３１１とともに傾斜可能に保持される。   The rod end bearing 31 can be configured using a known rod end bearing (Japanese Patent Laid-Open No. 2003-247540, Japanese Utility Model Laid-Open No. 2-78808), and a spherical mounting hole formed on the inner side, A spherical inner ring 311 is swingably held. The swing shaft 32 is held so as to be tiltable together with the spherical inner ring 311.

揺動軸３２の扉フレーム１３に取り付けられた一端部に対する反対側の他端部には、角度調節ヘッド３３が設けられる。駆動アーム２１の先端には角度調節ブロック３４が取り付けられる。角度調節ブロック３４には角度調節ヘッド３３が貫通される開口３４Ａが形成される。開口３４Ａの大きさは、角度調節ヘッド３３の傾斜を許容する大きさに設定される。   An angle adjustment head 33 is provided at the other end of the swing shaft 32 opposite to the one end attached to the door frame 13. An angle adjustment block 34 is attached to the tip of the drive arm 21. The angle adjusting block 34 is formed with an opening 34A through which the angle adjusting head 33 is passed. The size of the opening 34 </ b> A is set to a size that allows the angle adjusting head 33 to tilt.

以上の扉傾斜調整部材３０の構成によって、図４に示すように、扉１０は駆動アーム２１に対して傾斜自在に支持される。扉１０の傾斜角度の最大αは角度調節ヘッド３３の外径と角度調節ブロックの開口３４Ａの内径との相対関係によって規制（調節）される。   With the above-described configuration of the door inclination adjusting member 30, the door 10 is supported to be tiltable with respect to the drive arm 21 as shown in FIG. 4. The maximum inclination angle α of the door 10 is regulated (adjusted) by the relative relationship between the outer diameter of the angle adjusting head 33 and the inner diameter of the opening 34A of the angle adjusting block.

さらに、扉フレーム１３及び駆動アーム２１には、扉１０の中心回りの回転を規制する扉回転規制部材４０が設けられる。図６に示すように、扉回転規制部材４０は扉１０における石英チューブ２の炉口２Ａを閉じる面の中心から偏位した位置に設けられて、扉１０の回転を規制するものである。   Further, the door frame 13 and the drive arm 21 are provided with a door rotation restricting member 40 that restricts rotation around the center of the door 10. As shown in FIG. 6, the door rotation restricting member 40 is provided at a position displaced from the center of the surface of the door 10 that closes the furnace port 2 </ b> A of the quartz tube 2, and restricts the rotation of the door 10.

本実施形態では、扉回転規制部材４０は、図５に示すように、回転規制ヘッド４２及び回転規制板４１を備える。回転規制ヘッド４２は駆動アーム２１に固定される。回転規制板４１は扉フレーム１３に固定される。なお、これとは逆に、回転規制ヘッド４２が扉フレーム１３に固定され、回転規制板４１が駆動アーム２１に固定される構成を採用することも可能である。   In the present embodiment, the door rotation restriction member 40 includes a rotation restriction head 42 and a rotation restriction plate 41 as shown in FIG. The rotation restricting head 42 is fixed to the drive arm 21. The rotation restricting plate 41 is fixed to the door frame 13. On the contrary, it is also possible to adopt a configuration in which the rotation restricting head 42 is fixed to the door frame 13 and the rotation restricting plate 41 is fixed to the drive arm 21.

回転規制板４１は、例えば、短冊状の板金をその長手方向の２箇所で略Ｚ字状に曲げ加工して作製される。回転規制ヘッド４２は駆動アーム２１における扉１０と反対側に垂直に固定される支持ブロック４３に、扉１０の方へ突出するように取付けられる。   The rotation restricting plate 41 is produced, for example, by bending a strip-shaped sheet metal into a substantially Z shape at two locations in the longitudinal direction. The rotation restricting head 42 is attached to a support block 43 that is vertically fixed to the side opposite to the door 10 in the drive arm 21 so as to protrude toward the door 10.

回転規制板４１は、互いに平行になる両端片４１１，４１２の一方４１１を用いて扉フレーム１３の円盤部１３１にビス止めなどで固定される。回転規制板４１の他方の端片４１２に形成された開口４１Ａに回転規制ヘッド４２が貫通される。開口４１Ａの大きさは、回転規制ヘッド４２の回転を一定範囲に規制する大きさに設定される。具体的には、扉１０の傾斜角度が前記角度αの範囲で変更可能に回転規制ヘッド４２が開口４１Ａに挿通するように、回転規制ヘッド４２と開口４１Ａとが調整される。   The rotation restricting plate 41 is fixed to the disk part 131 of the door frame 13 with screws or the like using one of the end pieces 411 and 412 that are parallel to each other. The rotation restricting head 42 passes through the opening 41 </ b> A formed in the other end piece 412 of the rotation restricting plate 41. The size of the opening 41A is set to a size that regulates the rotation of the rotation regulating head 42 within a certain range. Specifically, the rotation restriction head 42 and the opening 41A are adjusted such that the rotation restriction head 42 is inserted into the opening 41A so that the inclination angle of the door 10 can be changed within the range of the angle α.

以上の扉回転規制部材４０の構成により、揺動軸３２回りの扉１０の回転が規制される。これにより、石英チューブ２の炉口２Ａと扉内面の石英板１１との摺り合わせの再現性を保つことができる 本発明によると、扉１０に断熱材１２が内蔵されるので、扉１０の内側と外側に温度差があっても、扉内面の石英板１１の温度低下が抑制される。これにより、石英チューブ２の炉口２Ａの近傍に拡散用ガス由来の副生成物が析出することが防止される。   With the configuration of the door rotation restricting member 40 described above, the rotation of the door 10 around the swing shaft 32 is restricted. Thereby, reproducibility of the sliding between the furnace port 2A of the quartz tube 2 and the quartz plate 11 on the inner surface of the door can be maintained. According to the present invention, since the heat insulating material 12 is built in the door 10, the inner side of the door 10 can be maintained. Even if there is a temperature difference between the outside and the outside, the temperature drop of the quartz plate 11 on the inner surface of the door is suppressed. This prevents the by-product derived from the diffusion gas from being deposited in the vicinity of the furnace port 2A of the quartz tube 2.

扉１０は、扉フレーム１３と石英板１１との間に断熱材が挟まれる構造である。したがって、扉１０が断熱材１２を備える構造であっても扉外面の扉フレーム１３を駆動アーム２１で支持して回動自在にする開閉機構２０によって、支障なく扉１０を開閉できる。   The door 10 has a structure in which a heat insulating material is sandwiched between the door frame 13 and the quartz plate 11. Therefore, even if the door 10 has a structure including the heat insulating material 12, the door 10 can be opened and closed without any trouble by the opening / closing mechanism 20 that supports the door frame 13 on the outer surface of the door by the drive arm 21 and makes it turnable.

また、駆動アーム２１が駆動手段２３により石英チューブ２の炉口２Ａ側へ付勢されており、この駆動アーム２１の先端に設けられる扉傾斜調整部材３０によって扉フレーム１３が支持されていることで、石英チューブ２の炉口２Ａの形状に沿って扉内面の石英板１１が追従する形で両者の密閉性を高めることができる。これにより、石英チューブ２の炉口２Ａからの大気の侵入が防止され、大気との反応による副生成物の発生を防止することができ、扉の腐食や炉内の汚染を防ぐことができる。   Further, the drive arm 21 is urged toward the furnace port 2A side of the quartz tube 2 by the drive means 23, and the door frame 13 is supported by the door inclination adjusting member 30 provided at the tip of the drive arm 21. The sealing performance of the quartz tube 2 can be improved by the quartz plate 11 on the inner surface of the door following the shape of the furnace port 2A of the quartz tube 2. Thereby, intrusion of air from the furnace port 2A of the quartz tube 2 is prevented, generation of by-products due to reaction with the air can be prevented, and door corrosion and furnace contamination can be prevented.

上述の実施形態の説明は、すべての点で例示であって、制限的なものではないと考えられるべきである。この発明の範囲は、上述の実施形態ではなく、特許請求の範囲によって示される。さらに、この発明の範囲には、特許請求の範囲と均等の意味及び範囲内でのすべての変更が含まれることが意図される。   The above description of the embodiment is to be considered in all respects as illustrative and not restrictive. The scope of the present invention is shown not by the above-described embodiments but by the claims. Furthermore, the scope of the present invention is intended to include all modifications within the meaning and scope equivalent to the scope of the claims.

Ｗ…ワーク
１…熱処理装置
２…石英チューブ（プロセスチューブ）
２Ａ…炉口
３…拡散室
４…ボート
５…排気管
６…均熱管
７…ヒータ
１０…扉
１１…石英板（内面部材）
１２…断熱材
１３…扉フレーム
１４…ストッパー
２０…開閉機構
２１…駆動アーム
２３…駆動手段
２６…第１リンク
２７…固定ブラケット
２８…第２リンク
３０…扉傾斜調整部材
３１…ロッドエンド軸受
３２…揺動軸
３３…角度調節ヘッド
３４…角度調節ブロック
４０…扉回転規制部材
４１…回転規制板
４２…回転規制ヘッド
４３…支持ブロック W ... Work 1 ... Heat treatment device 2 ... Quartz tube (process tube)
2A ... Furnace 3 ... Diffusion chamber 4 ... Boat 5 ... Exhaust pipe 6 ... Soaking pipe 7 ... Heater 10 ... Door 11 ... Quartz plate (inner surface member)
DESCRIPTION OF SYMBOLS 12 ... Heat insulating material 13 ... Door frame 14 ... Stopper 20 ... Opening / closing mechanism 21 ... Drive arm 23 ... Drive means 26 ... 1st link 27 ... Fixed bracket 28 ... 2nd link 30 ... Door inclination adjustment member 31 ... Rod end bearing 32 ... Oscillating shaft 33 ... angle adjusting head 34 ... angle adjusting block 40 ... door rotation restricting member 41 ... rotation restricting plate 42 ... rotation restricting head 43 ... support block

Claims (7)

一端が閉じられるとともに他端には開口が形成され、前記他端の開口を通して熱処理されるワークが収容されるプロセスチューブと、該プロセスチューブの開口を開閉する扉と、前記開口を開閉するように前記扉を動作させる開閉機構とを備え、
前記扉は、前記プロセスチューブ側に配置される内面部材、前記内面部材の外側に配置される断熱材、及び前記断熱材の外側に配置されて前記内面部材及び前記断熱材を保持する扉フレームを有し、
前記開閉機構は、先端に前記扉フレームを支持し、前記扉とともに前記プロセスチューブに接近する一方向とプロセスチューブから遠ざかる他方向に駆動される駆動アームと、前記駆動アームを駆動する駆動手段とを有し、前記駆動手段の駆動力によって前記扉を駆動して前記プロセスチューブの開口を開放または閉鎖するように構成されており、
前記駆動アームの先端に傾斜可能に支持されるとともに、前記扉フレームに取り付けられ、前記扉を傾斜調整可能に支持する扉傾斜調整部材を備えることを特徴とする、熱処理装置。 One end is closed and an opening is formed at the other end, a process tube that accommodates a workpiece to be heat-treated through the opening at the other end, a door that opens and closes the opening of the process tube, and the opening and closing An opening and closing mechanism for operating the door,
The door includes an inner surface member arranged on the process tube side, a heat insulating material arranged outside the inner surface member, and a door frame arranged outside the heat insulating material to hold the inner surface member and the heat insulating material. Have
The opening / closing mechanism includes a driving arm that supports the door frame at a tip and is driven in one direction approaching the process tube together with the door and in the other direction moving away from the process tube, and a driving unit that drives the driving arm. The door is driven by the driving force of the driving means to open or close the opening of the process tube;
A heat treatment apparatus, comprising: a door inclination adjusting member which is supported at a tip end of the drive arm so as to be tiltable, is attached to the door frame and supports the door so as to be tiltable. 前記扉傾斜調整部材は、前記駆動アームの先端に取り付けられたロッドエンド軸受と、前記ロッドエンド軸受により軸心が傾斜可能に支持される揺動軸とを備え、前記揺動軸が前記扉フレームに取り付けられる、請求項１に記載の熱処理装置。   The door inclination adjusting member includes a rod end bearing attached to a tip end of the drive arm, and a swing shaft supported by the rod end bearing so that an axis can be tilted, and the swing shaft is the door frame. The heat processing apparatus of Claim 1 attached to. 前記揺動軸の扉フレームに取り付けられた一端部に対する反対側の他端部には、角度調節ヘッドが設けられ、
前記角度調節ヘッドが貫通し、かつ前記角度調節ヘッドの傾斜を許容する大きさの開口が形成された角度調節ブロックが前記駆動アームの先端に取り付けられる、請求項２に記載の熱処理装置。 An angle adjustment head is provided on the other end of the swing shaft opposite to the one end attached to the door frame,
3. The heat treatment apparatus according to claim 2, wherein an angle adjustment block through which the angle adjustment head penetrates and an opening having a size allowing the inclination of the angle adjustment head is formed is attached to a tip of the drive arm. 前記扉フレーム及び前記駆動アームには、前記扉における前記プロセスチューブの開口を閉じる面の中心より偏心した位置に、前記扉の中心回りの回転を規制する扉回転規制部材が設けられる、請求項３に記載の熱処理装置。   The door frame and the drive arm are provided with a door rotation restricting member that restricts rotation around the center of the door at a position eccentric from the center of the surface of the door that closes the opening of the process tube. The heat processing apparatus as described in. 前記扉回転規制部材は、前記扉フレームまたは前記駆動アームのいずれか一方に設けられた回転規制ヘッドと、前記扉フレームまたは前記駆動アームの他方に設けられ、前記回動規制ヘッドが貫通するとともに、前記回転規制ヘッドの回転を一定範囲に規制する大きさの開口が形成された回転規制板と、を備える請求項４に記載の熱処理装置。   The door rotation restricting member is provided on a rotation restricting head provided on either the door frame or the drive arm, and on the other of the door frame or the drive arm, and the rotation restricting head passes therethrough. The heat treatment apparatus according to claim 4, further comprising: a rotation restriction plate formed with an opening having a size that restricts rotation of the rotation restriction head within a certain range. 前記駆動手段として、往復動するピストンロッドと、前記ピストンロッドを収納するシリンダチューブとを備え、流体圧の供給を受けてピストンロッドがシリンダチューブに対して進出、後退して駆動力を伝達するシリンダ機構によって構成され、
前記駆動アームの基端が前記ピストンロッドに連結されることを特徴とする請求項１〜５のいずれかに記載の熱処理装置。 A cylinder having a piston rod that reciprocates as a driving means and a cylinder tube that houses the piston rod, and a piston rod that moves forward and backward with respect to the cylinder tube upon receipt of fluid pressure to transmit a driving force. Composed by mechanism,
The heat treatment apparatus according to claim 1, wherein a base end of the drive arm is connected to the piston rod. 前記駆動アームは、前記プロセスチューブの開口を閉じる前記扉の面と略平行に延びるように設けられ、
当該熱処理装置に固定された固定ブラケットの一端部には、前記駆動アームと前記第１リンクとが供回りするように、前記駆動アームの基端部と前記第１リンクの一端部とが回転可能に支持され、
前記固定ブラケットの他端部には前記シリンダチューブが回転可能に支持されるとともに、前記第１リンクの他端部は、互いに回転可能に前記ピストンロッドの先端部と連結され、前記固定ブラケットは、一端部が他端部より当該プロセスチューブに近い位置となるように設けられる、請求項６に記載の熱処理装置。 The drive arm is provided to extend substantially parallel to a surface of the door that closes the opening of the process tube,
The base end portion of the drive arm and the one end portion of the first link are rotatable so that the drive arm and the first link are rotated around one end portion of the fixing bracket fixed to the heat treatment apparatus. Supported by
The cylinder tube is rotatably supported at the other end of the fixed bracket, and the other end of the first link is connected to the tip of the piston rod so as to be rotatable relative to each other. The heat treatment apparatus according to claim 6, wherein the one end portion is provided so as to be closer to the process tube than the other end portion.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107860232A (en) * 2017-12-05 2018-03-30 重庆顺博铝合金股份有限公司 A kind of aluminum alloy smelting furnace and smelting apparatus
CN109827438A (en) * 2018-12-27 2019-05-31 浙江智造热成型科技有限公司 The connecting rod rocker-arm stove-door switching mechanism of heating furnace
CN110030834A (en) * 2019-05-20 2019-07-19 宁波恒普真空技术有限公司 A kind of open and close type insulated door
JP2020107904A (en) * 2020-03-13 2020-07-09 光洋サーモシステム株式会社 Thermal treatment apparatus

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3462118A1 (en) * 2017-09-28 2019-04-03 StrikoWestofen GmbH Door system for opening and closing a container opening of a furnace
JP7386045B2 (en) * 2019-10-31 2023-11-24 株式会社ジェイテクトサーモシステム heat treatment equipment
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KR102441994B1 (en) * 2021-12-27 2022-09-08 주식회사 에이치피에스피 Fast Cooling High Pressure Chamber
CN114737171B (en) * 2022-04-18 2023-09-08 北京北方华创微电子装备有限公司 Adjusting device and semiconductor heat treatment equipment
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KR102606702B1 (en) * 2022-11-04 2023-11-29 주식회사 에이치피에스피 High pressure heat treatment apparatus and process gas line used therefor
CN116426730B (en) * 2023-02-20 2024-02-02 娄底市利通磁电科技有限公司 Heat treatment device for magnetic core production and use method thereof

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5724500U (en) * 1980-07-18 1982-02-08
JPS57130197U (en) * 1981-02-07 1982-08-13
JPS63201325U (en) * 1987-06-17 1988-12-26
JPH02306619A (en) * 1989-05-22 1990-12-20 Sharp Corp Impurity diffusing equipment
JPH08162421A (en) * 1994-12-08 1996-06-21 Sony Corp Horizontal diffusion furnace
JP2000018212A (en) * 1998-07-02 2000-01-18 Kogure Seisakusho:Kk Fluid pressure device
JP2000260724A (en) * 1999-03-05 2000-09-22 Sharp Corp Lateral diffusion furnace
JP2001185501A (en) * 1999-12-22 2001-07-06 Mitsubishi Electric Corp Lateral type diffusion furnace for manufacturing process of semiconductor element

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5820731B2 (en) * 2011-03-22 2015-11-24 株式会社日立国際電気 Substrate processing apparatus and solid material replenishment method
JP2012204645A (en) * 2011-03-25 2012-10-22 Tokyo Electron Ltd Lid opening/closing device
KR101611487B1 (en) * 2011-07-06 2016-04-11 히라따기꼬오 가부시키가이샤 Container opening/closing device
CN202888141U (en) * 2012-10-24 2013-04-17 技鼎股份有限公司 Semiconductor processing device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5724500U (en) * 1980-07-18 1982-02-08
JPS57130197U (en) * 1981-02-07 1982-08-13
JPS63201325U (en) * 1987-06-17 1988-12-26
JPH02306619A (en) * 1989-05-22 1990-12-20 Sharp Corp Impurity diffusing equipment
JPH08162421A (en) * 1994-12-08 1996-06-21 Sony Corp Horizontal diffusion furnace
JP2000018212A (en) * 1998-07-02 2000-01-18 Kogure Seisakusho:Kk Fluid pressure device
JP2000260724A (en) * 1999-03-05 2000-09-22 Sharp Corp Lateral diffusion furnace
JP2001185501A (en) * 1999-12-22 2001-07-06 Mitsubishi Electric Corp Lateral type diffusion furnace for manufacturing process of semiconductor element

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107860232A (en) * 2017-12-05 2018-03-30 重庆顺博铝合金股份有限公司 A kind of aluminum alloy smelting furnace and smelting apparatus
CN109827438A (en) * 2018-12-27 2019-05-31 浙江智造热成型科技有限公司 The connecting rod rocker-arm stove-door switching mechanism of heating furnace
CN110030834A (en) * 2019-05-20 2019-07-19 宁波恒普真空技术有限公司 A kind of open and close type insulated door
CN110030834B (en) * 2019-05-20 2024-01-30 宁波恒普技术股份有限公司 Open-close type heat insulation door
JP2020107904A (en) * 2020-03-13 2020-07-09 光洋サーモシステム株式会社 Thermal treatment apparatus
JP7001726B2 (en) 2020-03-13 2022-01-20 光洋サーモシステム株式会社 Heat treatment equipment

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