JP2015082610A5 - - Google Patents

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Publication number
JP2015082610A5
JP2015082610A5 JP2013220484A JP2013220484A JP2015082610A5 JP 2015082610 A5 JP2015082610 A5 JP 2015082610A5 JP 2013220484 A JP2013220484 A JP 2013220484A JP 2013220484 A JP2013220484 A JP 2013220484A JP 2015082610 A5 JP2015082610 A5 JP 2015082610A5
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JP
Japan
Prior art keywords
substrate
stage
positions
lithographic apparatus
holding surface
Prior art date
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Application number
JP2013220484A
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English (en)
Japanese (ja)
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JP2015082610A (ja
JP6294633B2 (ja
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Priority to JP2013220484A priority Critical patent/JP6294633B2/ja
Priority claimed from JP2013220484A external-priority patent/JP6294633B2/ja
Priority to US14/511,448 priority patent/US9557659B2/en
Publication of JP2015082610A publication Critical patent/JP2015082610A/ja
Publication of JP2015082610A5 publication Critical patent/JP2015082610A5/ja
Application granted granted Critical
Publication of JP6294633B2 publication Critical patent/JP6294633B2/ja
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JP2013220484A 2013-10-23 2013-10-23 リソグラフィ装置、決定方法及び物品の製造方法 Active JP6294633B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013220484A JP6294633B2 (ja) 2013-10-23 2013-10-23 リソグラフィ装置、決定方法及び物品の製造方法
US14/511,448 US9557659B2 (en) 2013-10-23 2014-10-10 Lithography apparatus, determination method, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013220484A JP6294633B2 (ja) 2013-10-23 2013-10-23 リソグラフィ装置、決定方法及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015082610A JP2015082610A (ja) 2015-04-27
JP2015082610A5 true JP2015082610A5 (OSRAM) 2016-12-08
JP6294633B2 JP6294633B2 (ja) 2018-03-14

Family

ID=52825920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013220484A Active JP6294633B2 (ja) 2013-10-23 2013-10-23 リソグラフィ装置、決定方法及び物品の製造方法

Country Status (2)

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US (1) US9557659B2 (OSRAM)
JP (1) JP6294633B2 (OSRAM)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG10201603103UA (en) 2015-04-30 2016-11-29 Canon Kk Imprint device, substrate conveying device, imprinting method, and method for manufacturing article
JP6708455B2 (ja) * 2016-03-25 2020-06-10 キヤノン株式会社 保持装置、保持方法、リソグラフィ装置、および物品の製造方法
US12228395B2 (en) 2017-02-14 2025-02-18 Applied Materials, Inc. Substrate position calibration for substrate supports in substrate processing systems
US11201078B2 (en) * 2017-02-14 2021-12-14 Applied Materials, Inc. Substrate position calibration for substrate supports in substrate processing systems
KR20240100439A (ko) * 2021-11-19 2024-07-01 어플라이드 머티어리얼스, 인코포레이티드 기판 처리 시스템들에서의 기판 지지부들을 위한 기판 위치 교정

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62193119A (ja) 1986-02-19 1987-08-25 Canon Inc ウエハ密着方法
JP3682395B2 (ja) * 2000-01-21 2005-08-10 株式会社ニコン 走査型露光装置および走査露光方法
US6525805B2 (en) 2001-05-14 2003-02-25 Ultratech Stepper, Inc. Backside alignment system and method
US6788991B2 (en) * 2002-10-09 2004-09-07 Asm International N.V. Devices and methods for detecting orientation and shape of an object
US7352440B2 (en) * 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
NL1036040A1 (nl) * 2007-10-10 2009-04-15 Asml Netherlands Bv Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus.
JP2009267271A (ja) * 2008-04-28 2009-11-12 Canon Inc 露光装置およびデバイス製造方法
JP5235566B2 (ja) * 2008-09-01 2013-07-10 キヤノン株式会社 露光装置およびデバイス製造方法
US8060330B2 (en) * 2008-12-12 2011-11-15 Lam Research Corporation Method and system for centering wafer on chuck

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