JP2015076521A5 - - Google Patents
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- JP2015076521A5 JP2015076521A5 JP2013212021A JP2013212021A JP2015076521A5 JP 2015076521 A5 JP2015076521 A5 JP 2015076521A5 JP 2013212021 A JP2013212021 A JP 2013212021A JP 2013212021 A JP2013212021 A JP 2013212021A JP 2015076521 A5 JP2015076521 A5 JP 2015076521A5
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- 238000007654 immersion Methods 0.000 claims description 75
- 239000007788 liquid Substances 0.000 claims description 60
- 239000000758 substrate Substances 0.000 claims description 42
- 230000003287 optical effect Effects 0.000 claims description 39
- 238000013459 approach Methods 0.000 claims 1
- 238000011084 recovery Methods 0.000 description 37
- 238000000034 method Methods 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013212021A JP6318534B2 (ja) | 2013-10-09 | 2013-10-09 | 露光装置及び露光方法、並びにデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013212021A JP6318534B2 (ja) | 2013-10-09 | 2013-10-09 | 露光装置及び露光方法、並びにデバイス製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018072471A Division JP6575629B2 (ja) | 2018-04-04 | 2018-04-04 | 露光装置及び露光方法、並びにデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015076521A JP2015076521A (ja) | 2015-04-20 |
| JP2015076521A5 true JP2015076521A5 (enExample) | 2016-11-10 |
| JP6318534B2 JP6318534B2 (ja) | 2018-05-09 |
Family
ID=53001144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013212021A Active JP6318534B2 (ja) | 2013-10-09 | 2013-10-09 | 露光装置及び露光方法、並びにデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6318534B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3184250B2 (ja) | 1991-06-26 | 2001-07-09 | 竹原 芳子 | 停止表示器及び停止表示器用停止表示板 |
| NL2009692A (en) | 2011-12-07 | 2013-06-10 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
| CN105116688B (zh) * | 2015-09-01 | 2017-06-23 | 浙江大学 | 一种用于浸没式光刻机的浸没液体控制装置 |
| KR102215539B1 (ko) | 2015-11-20 | 2021-02-16 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 리소그래피 장치를 작동시키는 방법 |
| CN109690413B (zh) | 2016-09-12 | 2021-04-13 | Asml荷兰有限公司 | 用于光刻设备的流体处理结构 |
| US11156921B2 (en) | 2017-12-15 | 2021-10-26 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus, and method of using a fluid handling structure |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007287824A (ja) * | 2006-04-14 | 2007-11-01 | Nikon Corp | 露光装置及びデバイス製造方法 |
| US20070273856A1 (en) * | 2006-05-25 | 2007-11-29 | Nikon Corporation | Apparatus and methods for inhibiting immersion liquid from flowing below a substrate |
| JP2010267656A (ja) * | 2009-05-12 | 2010-11-25 | Nikon Corp | 露光装置、露光方法、及びデバイス製造方法 |
| JP2013102029A (ja) * | 2011-11-08 | 2013-05-23 | Nikon Corp | 露光装置、露光方法、デバイス製造方法、プログラム、及び記録媒体 |
-
2013
- 2013-10-09 JP JP2013212021A patent/JP6318534B2/ja active Active
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