JP2015037123A5 - - Google Patents

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Publication number
JP2015037123A5
JP2015037123A5 JP2013168335A JP2013168335A JP2015037123A5 JP 2015037123 A5 JP2015037123 A5 JP 2015037123A5 JP 2013168335 A JP2013168335 A JP 2013168335A JP 2013168335 A JP2013168335 A JP 2013168335A JP 2015037123 A5 JP2015037123 A5 JP 2015037123A5
Authority
JP
Japan
Prior art keywords
peripheral shot
pattern
lithographic apparatus
peripheral
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013168335A
Other languages
English (en)
Japanese (ja)
Other versions
JP6288985B2 (ja
JP2015037123A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2013168335A priority Critical patent/JP6288985B2/ja
Priority claimed from JP2013168335A external-priority patent/JP6288985B2/ja
Priority to US14/452,725 priority patent/US9529270B2/en
Publication of JP2015037123A publication Critical patent/JP2015037123A/ja
Publication of JP2015037123A5 publication Critical patent/JP2015037123A5/ja
Application granted granted Critical
Publication of JP6288985B2 publication Critical patent/JP6288985B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013168335A 2013-08-13 2013-08-13 リソグラフィ装置、および物品の製造方法 Active JP6288985B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2013168335A JP6288985B2 (ja) 2013-08-13 2013-08-13 リソグラフィ装置、および物品の製造方法
US14/452,725 US9529270B2 (en) 2013-08-13 2014-08-06 Lithography apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013168335A JP6288985B2 (ja) 2013-08-13 2013-08-13 リソグラフィ装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015037123A JP2015037123A (ja) 2015-02-23
JP2015037123A5 true JP2015037123A5 (enExample) 2016-09-29
JP6288985B2 JP6288985B2 (ja) 2018-03-07

Family

ID=52467140

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013168335A Active JP6288985B2 (ja) 2013-08-13 2013-08-13 リソグラフィ装置、および物品の製造方法

Country Status (2)

Country Link
US (1) US9529270B2 (enExample)
JP (1) JP6288985B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7145620B2 (ja) * 2018-02-27 2022-10-03 株式会社オーク製作所 投影露光装置
JP7162430B2 (ja) * 2018-02-27 2022-10-28 株式会社オーク製作所 投影露光装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62136859A (ja) 1985-12-10 1987-06-19 Nippon Denso Co Ltd 半導体ウエハのメツキ装置
JPH0950951A (ja) * 1995-08-04 1997-02-18 Nikon Corp リソグラフィ方法およびリソグラフィ装置
US6680774B1 (en) 2001-10-09 2004-01-20 Ultratech Stepper, Inc. Method and apparatus for mechanically masking a workpiece
SG121843A1 (en) * 2002-12-19 2006-05-26 Asml Netherlands Bv Device manufacturing method, device manufactured thereby, computer program and lithographic apparatus
JP4481698B2 (ja) * 2004-03-29 2010-06-16 キヤノン株式会社 加工装置
US7777863B2 (en) * 2007-05-30 2010-08-17 Asml Netherlands B.V. Lithographic apparatus with mask to prevent exposure of peripheral exposure region of substrate
JP2010135426A (ja) * 2008-12-02 2010-06-17 Renesas Electronics Corp 露光方法及び露光装置
JP5127875B2 (ja) * 2010-04-28 2013-01-23 キヤノン株式会社 リソグラフィ装置及び物品の製造方法
JP5789135B2 (ja) * 2011-06-17 2015-10-07 キヤノン株式会社 露光装置及びデバイスの製造方法
JP5535164B2 (ja) * 2011-09-22 2014-07-02 株式会社東芝 インプリント方法およびインプリント装置
JP5868094B2 (ja) * 2011-09-26 2016-02-24 キヤノン株式会社 露光装置及びデバイス製造方法
JP6029289B2 (ja) * 2012-02-28 2016-11-24 キヤノン株式会社 露光装置、それを用いたデバイスの製造方法

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