JP2015021130A5 - - Google Patents

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Publication number
JP2015021130A5
JP2015021130A5 JP2014144250A JP2014144250A JP2015021130A5 JP 2015021130 A5 JP2015021130 A5 JP 2015021130A5 JP 2014144250 A JP2014144250 A JP 2014144250A JP 2014144250 A JP2014144250 A JP 2014144250A JP 2015021130 A5 JP2015021130 A5 JP 2015021130A5
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JP
Japan
Prior art keywords
hydrogen
ochve
hydroxyl
polymer
bond
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JP2014144250A
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English (en)
Japanese (ja)
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JP2015021130A (ja
JP5813832B2 (ja
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Priority claimed from US13/943,169 external-priority patent/US9410016B2/en
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Publication of JP2015021130A publication Critical patent/JP2015021130A/ja
Publication of JP2015021130A5 publication Critical patent/JP2015021130A5/ja
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Publication of JP5813832B2 publication Critical patent/JP5813832B2/ja
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JP2014144250A 2013-07-16 2014-07-14 芳香族ポリアセタールおよびそれを含む物品 Active JP5813832B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/943,169 2013-07-16
US13/943,169 US9410016B2 (en) 2013-07-16 2013-07-16 Aromatic polyacetals and articles comprising them

Publications (3)

Publication Number Publication Date
JP2015021130A JP2015021130A (ja) 2015-02-02
JP2015021130A5 true JP2015021130A5 (enExample) 2015-09-03
JP5813832B2 JP5813832B2 (ja) 2015-11-17

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ID=52344088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014144250A Active JP5813832B2 (ja) 2013-07-16 2014-07-14 芳香族ポリアセタールおよびそれを含む物品

Country Status (5)

Country Link
US (1) US9410016B2 (enExample)
JP (1) JP5813832B2 (enExample)
KR (1) KR101618179B1 (enExample)
CN (1) CN104341583B (enExample)
TW (1) TWI554553B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
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US9229319B2 (en) 2013-12-19 2016-01-05 Rohm And Haas Electronic Materials Llc Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
US9581901B2 (en) 2013-12-19 2017-02-28 Rohm And Haas Electronic Materials Llc Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
US9527790B1 (en) 2015-08-18 2016-12-27 Dow Global Technologies Llc Fluorosulfonyl-substituted bis(aryl)acetal compounds
US9574046B1 (en) 2015-08-18 2017-02-21 Dow Global Technologies Llc Method of forming polyaryl polymers and polymers formed thereby
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