JP2014525889A - 低温金属蒸着工程を適用した熱変色性ガラスの製造方法及びこれによる熱変色性ガラス - Google Patents
低温金属蒸着工程を適用した熱変色性ガラスの製造方法及びこれによる熱変色性ガラス Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 91
- 239000002184 metal Substances 0.000 title claims abstract description 37
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 238000005019 vapor deposition process Methods 0.000 title description 5
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 238000009792 diffusion process Methods 0.000 claims abstract description 36
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 32
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 31
- 239000013078 crystal Substances 0.000 claims abstract description 19
- 238000000151 deposition Methods 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims description 37
- 150000002500 ions Chemical class 0.000 claims description 33
- 230000008569 process Effects 0.000 claims description 31
- 238000010438 heat treatment Methods 0.000 claims description 29
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 20
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 claims description 17
- 238000004544 sputter deposition Methods 0.000 claims description 17
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical group O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 claims description 17
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 13
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 13
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical group [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 11
- 239000010410 layer Substances 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 7
- 238000007740 vapor deposition Methods 0.000 claims description 6
- 238000000231 atomic layer deposition Methods 0.000 claims description 4
- 230000004888 barrier function Effects 0.000 claims description 4
- 239000002356 single layer Substances 0.000 claims description 4
- 239000010408 film Substances 0.000 description 22
- 230000000052 comparative effect Effects 0.000 description 21
- 239000010409 thin film Substances 0.000 description 13
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- 238000002834 transmittance Methods 0.000 description 11
- 229910052720 vanadium Inorganic materials 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 239000004408 titanium dioxide Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 229910001415 sodium ion Inorganic materials 0.000 description 5
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical class [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 229910001935 vanadium oxide Inorganic materials 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000005328 architectural glass Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B27/00—Tempering or quenching glass products
- C03B27/012—Tempering or quenching glass products by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/27—Oxides by oxidation of a coating previously applied
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/218—V2O5, Nb2O5, Ta2O5
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/322—Oxidation
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- Chemical Kinetics & Catalysis (AREA)
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- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Abstract
【解決手段】本発明にかかる熱変色性カラスの製造方法は、ガラス基板の上部にイオン拡散防止膜を形成し、イオン拡散防止膜の上部に熱変色性金属酸化物形成用金属を蒸着し、ガラス基板を後熱処理することによって、蒸着された金属を酸化させて熱変色性金属酸化物結晶相を得ることを特徴とするものである。
【選択図】図1
Description
Claims (14)
- ガラス基板の上部に熱変色性金属酸化物形成用金属を蒸着する段階;及び
前記ガラス基板を後熱処理することによって、蒸着された金属を酸化させて熱変色性金属酸化物結晶相を得る段階;
を含むことを特徴とする熱変色性ガラスの製造方法。 - ガラス基板の上部にイオン拡散防止膜を形成する段階;
前記イオン拡散防止膜の上部に熱変色性金属酸化物形成用金属を蒸着する段階;及び
前記ガラス基板を後熱処理することによって、蒸着された金属を酸化させて熱変色性金属酸化物結晶相を得る段階;
を含むことを特徴とする熱変色性ガラスの製造方法。 - 前記熱変色性金属酸化物形成用金属はバナジウム(V)であることを特徴とする、請求項1又は2に記載の熱変色性ガラスの製造方法。
- 前記熱変色性金属酸化物形成用金属の蒸着は、スパッタリング工程又は原子層蒸着工程によることを特徴とする、請求項1又は2に記載の熱変色性ガラスの製造方法。
- 前記熱変色性金属酸化物形成用金属の蒸着時の温度は10℃ないし100℃であることを特徴とする、請求項1又は2に記載の熱変色性ガラスの製造方法。
- 前記後熱処理時の温度は460℃ないし480℃であることを特徴とする、請求項1又は2に記載の熱変色性ガラスの製造方法。
- 前記後熱処理時の時間は360秒ないし600秒であることを特徴とする、請求項1又は2に記載の熱変色性ガラスの製造方法。
- 前記熱変色性金属酸化物結晶相は二酸化バナジウム(VO2)であることを特徴とする、請求項1又は2に記載の熱変色性ガラスの製造方法。
- 前記イオン拡散防止膜は、窒化ケイ素(SiNx)又は二酸化チタン(TiO2)の単一層であることを特徴とする、請求項2に記載の熱変色性ガラスの製造方法。
- 前記イオン拡散防止膜は、窒化ケイ素(SiNx)及び二酸化チタン(TiO2)の2層構造であることを特徴とする、請求項2に記載の熱変色性ガラスの製造方法。
- ガラス基板;
前記ガラス基板の上部に形成されたイオン拡散防止膜;及び
前記イオン拡散防止膜の上部に形成された熱変色性金属酸化物膜;を含むことを特徴とする熱変色性ガラス。 - 前記イオン拡散防止膜は、窒化ケイ素(SiNx)又は二酸化チタン(TiO2)の単一層であることを特徴とする、請求項11に記載の熱変色性ガラス。
- 前記イオン拡散防止膜は、窒化ケイ素(SiNx)及び二酸化チタン(TiO2)の2層構造であることを特徴とする、請求項11に記載の熱変色性ガラス。
- 前記熱変色性金属酸化物膜は二酸化バナジウム(VO2)であることを特徴とする、請求項11に記載の熱変色性ガラス。
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KR1020110080816A KR101380509B1 (ko) | 2011-08-12 | 2011-08-12 | 저온 금속 증착공정을 적용한 열변색성 유리의 제조방법 및 이에 의한 열변색성 유리 |
KR10-2011-0080816 | 2011-08-12 | ||
PCT/KR2012/006275 WO2013025000A2 (ko) | 2011-08-12 | 2012-08-08 | 저온 금속 증착공정을 적용한 열변색성 유리의 제조방법 및 이에 의한 열변색성 유리 |
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JP2014525889A true JP2014525889A (ja) | 2014-10-02 |
JP5816753B2 JP5816753B2 (ja) | 2015-11-18 |
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US (1) | US9193624B2 (ja) |
EP (1) | EP2743239B1 (ja) |
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KR (1) | KR101380509B1 (ja) |
CN (1) | CN103732553A (ja) |
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US20150362374A1 (en) * | 2014-06-16 | 2015-12-17 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Atomic Layer Deposition of Vanadium Oxide for Microbolometer and Imager |
KR101762308B1 (ko) * | 2014-10-31 | 2017-07-28 | 부경대학교 산학협력단 | 유연 열변색 필름 |
KR101906656B1 (ko) * | 2015-12-03 | 2018-10-10 | 아주대학교산학협력단 | 단층 스마트 윈도우 |
CN105861989B (zh) * | 2016-06-02 | 2018-09-28 | 中国科学院广州能源研究所 | 一种氧化钒膜层的制备方法 |
CN109626425B (zh) * | 2019-02-25 | 2021-02-02 | 上海海事大学 | 一种纳米线状Na1.1V3O7.9材料、其制备方法及用途 |
KR20230078090A (ko) * | 2021-11-26 | 2023-06-02 | 한국전자기술연구원 | 바나듐 산화물 박막 및 이의 제조방법 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5881976A (ja) * | 1981-11-06 | 1983-05-17 | Toru Mashida | 装飾体の製造法 |
JP2001048586A (ja) * | 1999-08-03 | 2001-02-20 | Nisshin Steel Co Ltd | 光反射ガラスビーズ及びその製造方法 |
JP2002086606A (ja) * | 2000-05-23 | 2002-03-26 | Saint-Gobain Glass France | サーモクロミック性の少なくとも1つの層でコーティングされたグレージング |
JP2004313828A (ja) * | 2003-04-11 | 2004-11-11 | Fuji Photo Film Co Ltd | 金属化合物薄膜の形成方法および基板 |
JP2006206398A (ja) * | 2005-01-28 | 2006-08-10 | National Institute Of Advanced Industrial & Technology | 高断熱自動調光ガラス及びその製造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3660155A (en) * | 1970-04-15 | 1972-05-02 | Us Navy | Method for preparing solid films |
US4400412A (en) | 1982-02-01 | 1983-08-23 | Ppg Industries, Inc. | Thermochromic vanadium oxide coated glass |
CA2084247A1 (en) * | 1992-03-18 | 1993-09-19 | Francis Paul Fehlner | Lcd panel production |
KR960031660A (ko) * | 1995-02-06 | 1996-09-17 | 이문희 | 써모크로믹 스마트 윈도우용 박막의 결정화 방법 |
KR100343134B1 (ko) * | 1998-07-09 | 2002-10-25 | 삼성전자 주식회사 | 유전막형성방법 |
JP2000137251A (ja) * | 1998-08-28 | 2000-05-16 | Itaru Yasui | サ―モクロミック体及びその製造方法 |
KR100753997B1 (ko) * | 2006-02-10 | 2007-09-03 | 황진하 | 니켈 산화물 박막 형성방법과 이를 이용한 비정질 실리콘박막의 결정화 방법 및 박막 트랜지스터 제조 방법. |
GB0614545D0 (en) | 2006-07-21 | 2006-08-30 | Univ London | Coating Film |
JP2008297500A (ja) * | 2007-06-01 | 2008-12-11 | Nippon Sheet Glass Co Ltd | サーモクロミック体その製造方法 |
FR2922886B1 (fr) | 2007-10-25 | 2010-10-29 | Saint Gobain | Substrat verrier revetu de couches a resistivite amelioree. |
CN101560638B (zh) * | 2009-05-27 | 2010-12-01 | 天津大学 | 金属氧化法制备氧化钒薄膜的方法 |
-
2011
- 2011-08-12 KR KR1020110080816A patent/KR101380509B1/ko active IP Right Grant
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2012
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5881976A (ja) * | 1981-11-06 | 1983-05-17 | Toru Mashida | 装飾体の製造法 |
JP2001048586A (ja) * | 1999-08-03 | 2001-02-20 | Nisshin Steel Co Ltd | 光反射ガラスビーズ及びその製造方法 |
JP2002086606A (ja) * | 2000-05-23 | 2002-03-26 | Saint-Gobain Glass France | サーモクロミック性の少なくとも1つの層でコーティングされたグレージング |
JP2004313828A (ja) * | 2003-04-11 | 2004-11-11 | Fuji Photo Film Co Ltd | 金属化合物薄膜の形成方法および基板 |
JP2006206398A (ja) * | 2005-01-28 | 2006-08-10 | National Institute Of Advanced Industrial & Technology | 高断熱自動調光ガラス及びその製造方法 |
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EP2743239B1 (en) | 2017-09-27 |
JP5816753B2 (ja) | 2015-11-18 |
CN103732553A (zh) | 2014-04-16 |
US9193624B2 (en) | 2015-11-24 |
KR20130018012A (ko) | 2013-02-20 |
KR101380509B1 (ko) | 2014-04-01 |
EP2743239A4 (en) | 2015-04-29 |
US20140170420A1 (en) | 2014-06-19 |
EP2743239A2 (en) | 2014-06-18 |
WO2013025000A2 (ko) | 2013-02-21 |
WO2013025000A3 (ko) | 2013-05-30 |
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