JP2014506341A5 - - Google Patents
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- JP2014506341A5 JP2014506341A5 JP2013546574A JP2013546574A JP2014506341A5 JP 2014506341 A5 JP2014506341 A5 JP 2014506341A5 JP 2013546574 A JP2013546574 A JP 2013546574A JP 2013546574 A JP2013546574 A JP 2013546574A JP 2014506341 A5 JP2014506341 A5 JP 2014506341A5
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- JP
- Japan
- Prior art keywords
- lens
- lens group
- group
- lenses
- focal length
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010619283.X | 2010-12-31 | ||
| CN201010619283.XA CN102540419B (zh) | 2010-12-31 | 2010-12-31 | 一种大视场投影光刻物镜 |
| PCT/CN2011/083616 WO2012089002A1 (zh) | 2010-12-31 | 2011-12-07 | 一种大视场投影光刻物镜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014506341A JP2014506341A (ja) | 2014-03-13 |
| JP2014506341A5 true JP2014506341A5 (https=) | 2014-11-27 |
Family
ID=46347698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013546574A Pending JP2014506341A (ja) | 2010-12-31 | 2011-12-07 | リソグラフィーのための広範囲露光対物レンズ |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20130293859A1 (https=) |
| EP (1) | EP2660638B1 (https=) |
| JP (1) | JP2014506341A (https=) |
| KR (1) | KR101685655B1 (https=) |
| CN (1) | CN102540419B (https=) |
| TW (1) | TW201235729A (https=) |
| WO (1) | WO2012089002A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6511701B2 (ja) * | 2014-01-22 | 2019-05-15 | リソテック株式会社 | 投影光学系、投影露光装置、及びデバイス製造方法 |
| US10139735B2 (en) | 2014-06-23 | 2018-11-27 | Asml Netherlands B.V. | Lithographic apparatus and method |
| CN105527701B (zh) * | 2014-09-28 | 2018-06-29 | 上海微电子装备（集团）股份有限公司 | 大视场投影光刻物镜 |
| CN113900227B (zh) * | 2021-10-09 | 2022-07-05 | 中国科学院苏州生物医学工程技术研究所 | 一种大视场高分辨宽波段的物镜 |
| JP2024055043A (ja) * | 2022-10-06 | 2024-04-18 | 株式会社エビデント | 対物レンズ |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01262513A (ja) * | 1988-04-13 | 1989-10-19 | Ricoh Co Ltd | 複写用可変焦点レンズ |
| JP3454390B2 (ja) * | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| US5808814A (en) * | 1996-07-18 | 1998-09-15 | Nikon Corporation | Short wavelength projection optical system |
| US5986824A (en) * | 1998-06-04 | 1999-11-16 | Nikon Corporation | Large NA projection lens system with aplanatic lens element for excimer laser lithography |
| US5969803A (en) * | 1998-06-30 | 1999-10-19 | Nikon Corporation | Large NA projection lens for excimer laser lithographic systems |
| DE19905203A1 (de) * | 1999-02-09 | 2000-08-10 | Zeiss Carl Fa | Reduktions-Projektionsobjektiv der Mikrolithographie |
| JP2000199850A (ja) * | 1999-01-07 | 2000-07-18 | Nikon Corp | 投影光学系及び投影露光装置並びにデバイスの製造方法 |
| JP2000356741A (ja) * | 1999-06-14 | 2000-12-26 | Canon Inc | 投影光学系 |
| JP3503631B2 (ja) * | 2001-04-27 | 2004-03-08 | セイコーエプソン株式会社 | 投映用ズームレンズ及びこれを備えたプロジェクター |
| JP2004012825A (ja) * | 2002-06-07 | 2004-01-15 | Fuji Photo Optical Co Ltd | 投影光学系およびそれを用いた投影露光装置 |
| JP2005109286A (ja) * | 2003-10-01 | 2005-04-21 | Nikon Corp | 投影光学系、露光装置、および露光方法 |
| JP2006147809A (ja) * | 2004-11-18 | 2006-06-08 | Canon Inc | 露光装置の投影光学系、露光装置およびデバイスの製造方法 |
| JP2008527403A (ja) * | 2004-12-30 | 2008-07-24 | カール・ツァイス・エスエムティー・アーゲー | 投影光学系 |
| JP4779394B2 (ja) | 2005-03-23 | 2011-09-28 | 株式会社ニコン | 投影光学系、露光装置、および露光方法 |
| JP4792779B2 (ja) * | 2005-03-29 | 2011-10-12 | 株式会社ニコン | ズームレンズ |
| JP2007079015A (ja) | 2005-09-13 | 2007-03-29 | Nikon Corp | 投影光学系、露光装置及びマイクロデバイスの製造方法 |
| JP5522520B2 (ja) * | 2006-05-05 | 2014-06-18 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学レンズ系 |
| KR101428136B1 (ko) * | 2007-08-03 | 2014-08-07 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피용 투사 대물렌즈, 투사 노광 장치, 투사 노광 방법 및 광학 보정 플레이트 |
| CN101231378B (zh) * | 2007-12-21 | 2010-11-10 | 上海微电子装备有限公司 | 一种全折射式投影光学系统 |
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2010
- 2010-12-31 CN CN201010619283.XA patent/CN102540419B/zh active Active
-
2011
- 2011-12-07 EP EP11852300.0A patent/EP2660638B1/en active Active
- 2011-12-07 JP JP2013546574A patent/JP2014506341A/ja active Pending
- 2011-12-07 KR KR1020137018676A patent/KR101685655B1/ko active Active
- 2011-12-07 WO PCT/CN2011/083616 patent/WO2012089002A1/zh not_active Ceased
- 2011-12-07 US US13/976,353 patent/US20130293859A1/en not_active Abandoned
- 2011-12-27 TW TW100148828A patent/TW201235729A/zh unknown