JP2014112236A5 - - Google Patents

Download PDF

Info

Publication number
JP2014112236A5
JP2014112236A5 JP2013269412A JP2013269412A JP2014112236A5 JP 2014112236 A5 JP2014112236 A5 JP 2014112236A5 JP 2013269412 A JP2013269412 A JP 2013269412A JP 2013269412 A JP2013269412 A JP 2013269412A JP 2014112236 A5 JP2014112236 A5 JP 2014112236A5
Authority
JP
Japan
Prior art keywords
patterns
pattern
parameter
response
linear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013269412A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014112236A (ja
JP5940049B2 (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2014112236A publication Critical patent/JP2014112236A/ja
Publication of JP2014112236A5 publication Critical patent/JP2014112236A5/ja
Application granted granted Critical
Publication of JP5940049B2 publication Critical patent/JP5940049B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2013269412A 2011-07-08 2013-12-26 波面収差に対する応答を調整したパターン設計の方法及びシステム Expired - Fee Related JP5940049B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161505904P 2011-07-08 2011-07-08
US61/505,904 2011-07-08

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2012148374A Division JP5451821B2 (ja) 2011-07-08 2012-07-02 波面収差に対する応答を調整したパターン設計の方法及びシステム

Publications (3)

Publication Number Publication Date
JP2014112236A JP2014112236A (ja) 2014-06-19
JP2014112236A5 true JP2014112236A5 (https=) 2015-02-19
JP5940049B2 JP5940049B2 (ja) 2016-06-29

Family

ID=47439430

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2012148374A Expired - Fee Related JP5451821B2 (ja) 2011-07-08 2012-07-02 波面収差に対する応答を調整したパターン設計の方法及びシステム
JP2013269412A Expired - Fee Related JP5940049B2 (ja) 2011-07-08 2013-12-26 波面収差に対する応答を調整したパターン設計の方法及びシステム

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2012148374A Expired - Fee Related JP5451821B2 (ja) 2011-07-08 2012-07-02 波面収差に対する応答を調整したパターン設計の方法及びシステム

Country Status (4)

Country Link
US (2) US8918742B2 (https=)
JP (2) JP5451821B2 (https=)
CN (1) CN102866590B (https=)
NL (1) NL2008957A (https=)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003719A (en) 2008-11-10 2010-05-11 Brion Tech Inc Delta tcc for fast sensitivity model computation.
NL2008702A (en) * 2011-05-25 2012-11-27 Asml Netherlands Bv Computational process control.
US9182289B2 (en) * 2011-10-14 2015-11-10 Canon Kabushiki Kaisha Apparatus and method for estimating wavefront parameters
WO2014009100A1 (en) 2012-07-10 2014-01-16 Asml Netherlands B.V. Lithographic cluster system, method for calibrating a positioning device of a lithographic apparatus
JP5784657B2 (ja) * 2013-02-26 2015-09-24 株式会社東芝 フォーカス位置調整装置、レチクル、フォーカス位置調整プログラムおよび半導体装置の製造方法
US10473525B2 (en) 2013-11-01 2019-11-12 Tokyo Electron Limited Spatially resolved optical emission spectroscopy (OES) in plasma processing
US9970818B2 (en) 2013-11-01 2018-05-15 Tokyo Electron Limited Spatially resolved optical emission spectroscopy (OES) in plasma processing
KR101860038B1 (ko) 2013-12-30 2018-05-21 에이에스엠엘 네델란즈 비.브이. 메트롤로지 타겟의 디자인을 위한 방법 및 장치
WO2015101460A1 (en) 2013-12-30 2015-07-09 Asml Netherlands B.V. Method and apparatus for design of a metrology target
SG11201604739RA (en) 2013-12-30 2016-07-28 Asml Netherlands Bv Method and apparatus for design of a metrology target
WO2015101458A1 (en) 2013-12-30 2015-07-09 Asml Netherlands B.V. Method and apparatus for design of a metrology target
WO2015189026A2 (en) 2014-06-10 2015-12-17 Asml Netherlands B.V. Computational wafer inspection
WO2016045901A1 (en) 2014-09-22 2016-03-31 Asml Netherlands B.V. Process window identifier
CN104267581B (zh) * 2014-09-26 2016-08-24 中国科学院光电技术研究所 一种光学系统气压分段补偿像差的划分方法
KR102404639B1 (ko) 2015-02-02 2022-06-03 삼성전자주식회사 전자 빔 노광 방법 및 그를 포함하는 기판 제조 방법
CN107532945B (zh) * 2015-04-21 2020-12-01 科磊股份有限公司 用于倾斜装置设计的计量目标设计
WO2017080729A1 (en) * 2015-11-13 2017-05-18 Asml Netherlands B.V. Methods for identifying a process window boundary
US10394984B2 (en) 2015-11-25 2019-08-27 International Business Machines Corporation Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
WO2017102336A1 (en) * 2015-12-18 2017-06-22 Asml Netherlands B.V. Improvements in gauge pattern selection
US10615084B2 (en) * 2016-03-01 2020-04-07 Asml Netherlands B.V. Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
IT201600083804A1 (it) * 2016-08-09 2018-02-09 St Microelectronics Srl Procedimento di fabbricazione di un dispositivo a semiconduttore includente una struttura microelettromeccanica ed un associato circuito elettronico integrato e relativo dispositivo a semiconduttore
US11029594B2 (en) 2016-09-13 2021-06-08 Asml Netherlands B.V. Optimization of a lithography apparatus or patterning process based on selected aberration
US10215704B2 (en) 2017-03-02 2019-02-26 Tokyo Electron Limited Computed tomography using intersecting views of plasma using optical emission spectroscopy during plasma processing
US10705420B2 (en) * 2018-05-15 2020-07-07 Asml Us, Llc Mask bias approximation
CN110530530B (zh) * 2018-05-23 2021-01-15 中国科学院长春光学精密机械与物理研究所 一种波前提取算法及采用该算法的剪切干涉仪
TWI794544B (zh) * 2018-10-09 2023-03-01 荷蘭商Ａｓｍｌ荷蘭公司 用於高數值孔徑穿縫源光罩最佳化之方法
CN111352303B (zh) * 2018-12-21 2021-06-18 上海微电子装备（集团）股份有限公司 投影物镜波像差检测装置及方法、光刻机
KR102745234B1 (ko) * 2019-09-03 2024-12-23 에이에스엠엘 네델란즈 비.브이. 패턴들의 수차 감도를 결정하는 방법
CN113126443B (zh) * 2019-12-31 2021-12-10 上海微电子装备（集团）股份有限公司 解决光刻机像面畸变的工艺方法及装置、掩膜版设计方法
EP3964809A1 (en) * 2020-09-02 2022-03-09 Stichting VU Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatuses

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11184070A (ja) * 1997-12-24 1999-07-09 Toshiba Corp 収差測定方法および収差測定用フォトマスク
US6567226B2 (en) * 1998-03-03 2003-05-20 Sumitomo Electric Industries, Ltd. Method for designing a refractive or reflective optical system and method for designing a diffraction optical element
US6272392B1 (en) * 1998-12-04 2001-08-07 Advanced Micro Devices, Inc. Methodology for extracting effective lens aberrations using a neural network
KR20000006622A (ko) * 1999-07-06 2000-02-07 이환성 의료용매트
JP2001068398A (ja) * 1999-08-27 2001-03-16 Hitachi Ltd 半導体集積回路装置の製造方法およびマスクの製造方法
US6396569B2 (en) * 1999-09-02 2002-05-28 Texas Instruments Incorporated Image displacement test reticle for measuring aberration characteristics of projection optics
JP3442007B2 (ja) * 1999-09-03 2003-09-02 沖電気工業株式会社 ステッパレンズの収差測定パターンおよびステッパレンズの収差特性評価方法
JP2001168000A (ja) * 1999-12-03 2001-06-22 Nikon Corp 露光装置の製造方法、および該製造方法によって製造された露光装置を用いたマイクロデバイスの製造方法
US6621556B2 (en) * 2000-02-28 2003-09-16 Nikon Corporation Projection exposure apparatus and manufacturing and adjusting methods thereof
JP4005763B2 (ja) * 2000-06-30 2007-11-14 株式会社東芝 投影光学系の収差補正方法及び半導体装置の製造方法
US20050136340A1 (en) * 2000-07-21 2005-06-23 Asml Netherlands B.V. Lithographic apparatus and methods, patterning structure and method for making a patterning structure, device manufacturing method, and device manufactured thereby
TWI285295B (en) * 2001-02-23 2007-08-11 Asml Netherlands Bv Illumination optimization in lithography
US6956659B2 (en) * 2001-05-22 2005-10-18 Nikon Precision Inc. Measurement of critical dimensions of etched features
TWI254837B (en) * 2001-08-23 2006-05-11 Asml Netherlands Bv Method of measuring aberration of a projection system of a lithographic apparatus, device manufacturing method, and device manufactured thereby
JP4343685B2 (ja) * 2001-08-31 2009-10-14 キヤノン株式会社 レチクル及び光学特性計測方法
US6842237B2 (en) * 2001-12-28 2005-01-11 International Business Machines Corporation Phase shifted test pattern for monitoring focus and aberrations in optical projection systems
CN100568455C (zh) * 2002-04-17 2009-12-09 佳能株式会社 中间掩模和光学特性测量方法
US6664121B2 (en) * 2002-05-20 2003-12-16 Nikon Precision, Inc. Method and apparatus for position measurement of a pattern formed by a lithographic exposure tool
DE10224363A1 (de) * 2002-05-24 2003-12-04 Zeiss Carl Smt Ag Verfahren zur Bestimmung von Wellenfrontaberrationen
JP3875158B2 (ja) * 2002-08-09 2007-01-31 株式会社東芝 露光装置判定システム、露光装置判定方法、露光装置判定プログラム及び半導体装置の製造方法
JP2004253673A (ja) * 2003-02-21 2004-09-09 Nikon Corp 予測方法、評価方法、調整方法、露光方法、デバイス製造方法、並びにプログラム
JP4015079B2 (ja) * 2003-07-18 2007-11-28 株式会社東芝 レチクル、露光装置検査システム、露光装置検査方法及びレチクルの製造方法
US7245354B2 (en) * 2004-02-03 2007-07-17 Yuri Granik Source optimization for image fidelity and throughput
US9188974B1 (en) * 2004-02-13 2015-11-17 Kla-Tencor Technologies Corp. Methods for improved monitor and control of lithography processes
US7242475B2 (en) * 2004-03-25 2007-07-10 Asml Netherlands B.V. Method of determining aberration of a projection system of a lithographic apparatus
JP4455129B2 (ja) * 2004-04-06 2010-04-21 キヤノン株式会社 収差計測方法及びそれを用いた投影露光装置
US7266800B2 (en) * 2004-06-04 2007-09-04 Invarium, Inc. Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes
US7310796B2 (en) 2004-08-27 2007-12-18 Applied Materials, Israel, Ltd. System and method for simulating an aerial image
US7331033B2 (en) 2004-08-27 2008-02-12 Applied Materials, Israel, Ltd. Simulation of aerial images
US7508527B2 (en) * 2005-04-11 2009-03-24 Zetetic Institute Apparatus and method of in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
US7519940B2 (en) * 2005-05-02 2009-04-14 Cadence Design Systems, Inc. Apparatus and method for compensating a lithography projection tool
WO2007019269A2 (en) * 2005-08-08 2007-02-15 Brion Technologies, Inc. System and method for creating a focus-exposure model of a lithography process
JP2007066926A (ja) * 2005-08-29 2007-03-15 Canon Inc 計測方法及び装置、露光装置、並びに、デバイス製造方法
US7695876B2 (en) * 2005-08-31 2010-04-13 Brion Technologies, Inc. Method for identifying and using process window signature patterns for lithography process control
US7617477B2 (en) 2005-09-09 2009-11-10 Brion Technologies, Inc. Method for selecting and optimizing exposure tool using an individual mask error model
ATE467153T1 (de) * 2005-12-09 2010-05-15 Imec Verfahren und vorrichtungen zur lithographie
US7643976B2 (en) * 2006-02-28 2010-01-05 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip
US7580113B2 (en) * 2006-06-23 2009-08-25 Asml Netherlands B.V. Method of reducing a wave front aberration, and computer program product
US8098926B2 (en) * 2007-01-10 2012-01-17 Applied Materials Israel, Ltd. Method and system for evaluating an evaluated pattern of a mask
US7832864B2 (en) * 2007-06-15 2010-11-16 The Arizona Board Of Regents On Behalf Of The University Of Arizona Inverse optical design
JP5225463B2 (ja) * 2008-06-03 2013-07-03 エーエスエムエル ネザーランズ ビー．ブイ． レンズ加熱補償方法
NL2003143A1 (nl) * 2008-07-07 2010-01-11 Brion Tech Inc Illumination optimization.
JP5153492B2 (ja) * 2008-07-11 2013-02-27 キヤノン株式会社 露光条件決定方法およびコンピュータプログラム
JP2010109294A (ja) * 2008-10-31 2010-05-13 Canon Inc 測定装置、露光装置およびデバイス製造方法
NL2003719A (en) * 2008-11-10 2010-05-11 Brion Tech Inc Delta tcc for fast sensitivity model computation.
NL2003702A (en) 2008-11-10 2010-05-11 Brion Tech Inc Pattern selection for lithographic model calibration.
NL2006700A (en) * 2010-06-04 2011-12-06 Asml Netherlands Bv Method and apparatus for measuring a structure on a substrate, computer program products for implementing such methods & apparatus.
NL2007306A (en) * 2010-09-23 2012-03-26 Asml Netherlands Bv Source polarization optimization.
NL2007579A (en) * 2010-11-10 2012-05-14 Asml Netherlands Bv Pattern-dependent proximity matching/tuning including light manipulation by projection optics.
NL2007642A (en) * 2010-11-10 2012-05-14 Asml Netherlands Bv Optimization flows of source, mask and projection optics.
NL2007577A (en) * 2010-11-10 2012-05-14 Asml Netherlands Bv Optimization of source, mask and projection optics.
NL2007578A (en) * 2010-11-17 2012-05-22 Asml Netherlands Bv Pattern-independent and hybrid matching/tuning including light manipulation by projection optics.
NL2008311A (en) * 2011-04-04 2012-10-08 Asml Netherlands Bv Integration of lithography apparatus and mask optimization process with multiple patterning process.
US8887105B1 (en) * 2011-10-28 2014-11-11 Asml Netherlands B.V. Calibration pattern selection based on noise sensitivity
NL2009982A (en) * 2012-01-10 2013-07-15 Asml Netherlands Bv Source mask optimization to reduce stochastic effects.
KR101757780B1 (ko) * 2012-05-31 2017-07-14 에이에스엠엘 네델란즈 비.브이. 구배-기반 패턴 및 평가 지점 선택
KR101668984B1 (ko) * 2013-09-14 2016-10-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 장치의 동작 방법

Similar Documents

Publication Publication Date Title
JP2014112236A5 (https=)
Johannessen et al. On the similarities and differences between Classical Hierarchical, Truncated Hierarchical and LR B-splines
Chkifa On the Lebesgue constant of Leja sequences for the complex unit disk and of their real projection
Wang et al. Two-level discretizations of nonlinear closure models for proper orthogonal decomposition
Clark et al. Big data and ophthalmic research
WO2016098452A8 (ja) マスクブランク用基板、マスクブランク及びこれらの製造方法、転写用マスクの製造方法並びに半導体デバイスの製造方法
JP2015118290A5 (https=)
JP2013117848A5 (https=)
JP2013040791A5 (https=)
JP2013154121A5 (https=)
EP4404141A3 (en) Systems and methods for planning a treatment of cardiovascular disease of a patient
JP2014160987A5 (https=)
JP2015122068A5 (https=)
JP2019517017A5 (https=)
JP2011248478A5 (ja) 画像処理装置、画像処理方法及びプログラム
JP2008259612A5 (https=)
JP2017505494A5 (https=)
Wang et al. Robust stability and robust passivity of parabolic complex networks with parametric uncertainties and time-varying delays
JP2017176399A5 (https=)
JP2013254165A5 (https=)
RU2015144910A (ru) Способ и устройство обработки звука и программа
JP2014007262A5 (https=)
Babu et al. Nonlinear rotating convection in a sparsely packed porous medium
JP2015114988A5 (https=)
JP2013143712A5 (https=)