JP2014086524A5 - - Google Patents

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Publication number
JP2014086524A5
JP2014086524A5 JP2012233558A JP2012233558A JP2014086524A5 JP 2014086524 A5 JP2014086524 A5 JP 2014086524A5 JP 2012233558 A JP2012233558 A JP 2012233558A JP 2012233558 A JP2012233558 A JP 2012233558A JP 2014086524 A5 JP2014086524 A5 JP 2014086524A5
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JP
Japan
Prior art keywords
support member
processing apparatus
chamber
processed
specific environment
Prior art date
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Application number
JP2012233558A
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English (en)
Japanese (ja)
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JP6087573B2 (ja
JP2014086524A (ja
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Priority to JP2012233558A priority Critical patent/JP6087573B2/ja
Priority claimed from JP2012233558A external-priority patent/JP6087573B2/ja
Priority to US14/045,880 priority patent/US9310688B2/en
Publication of JP2014086524A publication Critical patent/JP2014086524A/ja
Publication of JP2014086524A5 publication Critical patent/JP2014086524A5/ja
Application granted granted Critical
Publication of JP6087573B2 publication Critical patent/JP6087573B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012233558A 2012-10-23 2012-10-23 処理装置、それを用いた物品の製造方法 Expired - Fee Related JP6087573B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012233558A JP6087573B2 (ja) 2012-10-23 2012-10-23 処理装置、それを用いた物品の製造方法
US14/045,880 US9310688B2 (en) 2012-10-23 2013-10-04 Processing apparatus and article manufacturing method using same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012233558A JP6087573B2 (ja) 2012-10-23 2012-10-23 処理装置、それを用いた物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014086524A JP2014086524A (ja) 2014-05-12
JP2014086524A5 true JP2014086524A5 (enExample) 2015-12-10
JP6087573B2 JP6087573B2 (ja) 2017-03-01

Family

ID=50485060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012233558A Expired - Fee Related JP6087573B2 (ja) 2012-10-23 2012-10-23 処理装置、それを用いた物品の製造方法

Country Status (2)

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US (1) US9310688B2 (enExample)
JP (1) JP6087573B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201643561A (zh) * 2015-04-17 2016-12-16 尼康股份有限公司 曝光系統
CN105003798A (zh) * 2015-08-18 2015-10-28 赵东顺 一种建筑施工中工程测量设备的支撑装置
WO2017118508A1 (en) 2016-01-07 2017-07-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2018045958A (ja) * 2016-09-16 2018-03-22 東レエンジニアリング株式会社 撮像装置および電子線照射装置
WO2018213825A1 (en) 2017-05-19 2018-11-22 Massachusetts Institute Of Technology Transport system having a magnetically levitated transportation stage
CN108478264B (zh) * 2018-02-05 2020-09-25 青岛大学附属医院 一种便携式助产装置
WO2019204692A1 (en) * 2018-04-20 2019-10-24 Massachusetts Institute Of Technology Magnetically-levitated transporter

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2666953B2 (ja) * 1988-03-30 1997-10-22 株式会社東芝 荷電ピーム描画装置
JP3200282B2 (ja) * 1993-07-21 2001-08-20 キヤノン株式会社 処理システム及びこれを用いたデバイス製造方法
TW559688B (en) 1999-04-19 2003-11-01 Asml Netherlands Bv Lithographic projection apparatus, vacuum apparatus, low-stiffness seal for sealing between vacuum chamber wall and elongate rod, device manufacturing method and integrated circuit manufactured thereof
US6778258B2 (en) * 2001-10-19 2004-08-17 Asml Holding N.V. Wafer handling system for use in lithography patterning
JP2007220910A (ja) * 2006-02-16 2007-08-30 Nsk Ltd 真空用位置決め装置
JP2009099723A (ja) * 2007-10-16 2009-05-07 Nikon Corp 露光装置
JP2010080861A (ja) * 2008-09-29 2010-04-08 Nikon Corp 転写装置及びデバイス製造方法
JP5277059B2 (ja) * 2009-04-16 2013-08-28 株式会社日立ハイテクノロジーズ 成膜装置及び成膜システム
JP5758750B2 (ja) * 2010-10-29 2015-08-05 ギガフォトン株式会社 極端紫外光生成システム

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