JP6087573B2 - 処理装置、それを用いた物品の製造方法 - Google Patents

処理装置、それを用いた物品の製造方法 Download PDF

Info

Publication number
JP6087573B2
JP6087573B2 JP2012233558A JP2012233558A JP6087573B2 JP 6087573 B2 JP6087573 B2 JP 6087573B2 JP 2012233558 A JP2012233558 A JP 2012233558A JP 2012233558 A JP2012233558 A JP 2012233558A JP 6087573 B2 JP6087573 B2 JP 6087573B2
Authority
JP
Japan
Prior art keywords
support member
chamber
support
opening
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012233558A
Other languages
English (en)
Japanese (ja)
Other versions
JP2014086524A5 (enExample
JP2014086524A (ja
Inventor
大介 岩▲瀬▼
大介 岩▲瀬▼
是永　伸茂
伸茂 是永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012233558A priority Critical patent/JP6087573B2/ja
Priority to US14/045,880 priority patent/US9310688B2/en
Publication of JP2014086524A publication Critical patent/JP2014086524A/ja
Publication of JP2014086524A5 publication Critical patent/JP2014086524A5/ja
Application granted granted Critical
Publication of JP6087573B2 publication Critical patent/JP6087573B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/02—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine for mounting on a work-table, tool-slide, or analogous part
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/08—Holders for targets or for other objects to be irradiated

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diaphragms And Bellows (AREA)
JP2012233558A 2012-10-23 2012-10-23 処理装置、それを用いた物品の製造方法 Expired - Fee Related JP6087573B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012233558A JP6087573B2 (ja) 2012-10-23 2012-10-23 処理装置、それを用いた物品の製造方法
US14/045,880 US9310688B2 (en) 2012-10-23 2013-10-04 Processing apparatus and article manufacturing method using same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012233558A JP6087573B2 (ja) 2012-10-23 2012-10-23 処理装置、それを用いた物品の製造方法

Publications (3)

Publication Number Publication Date
JP2014086524A JP2014086524A (ja) 2014-05-12
JP2014086524A5 JP2014086524A5 (enExample) 2015-12-10
JP6087573B2 true JP6087573B2 (ja) 2017-03-01

Family

ID=50485060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012233558A Expired - Fee Related JP6087573B2 (ja) 2012-10-23 2012-10-23 処理装置、それを用いた物品の製造方法

Country Status (2)

Country Link
US (1) US9310688B2 (enExample)
JP (1) JP6087573B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201643561A (zh) * 2015-04-17 2016-12-16 尼康股份有限公司 曝光系統
CN105003798A (zh) * 2015-08-18 2015-10-28 赵东顺 一种建筑施工中工程测量设备的支撑装置
WO2017118508A1 (en) 2016-01-07 2017-07-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2018045958A (ja) * 2016-09-16 2018-03-22 東レエンジニアリング株式会社 撮像装置および電子線照射装置
WO2018213825A1 (en) 2017-05-19 2018-11-22 Massachusetts Institute Of Technology Transport system having a magnetically levitated transportation stage
CN108478264B (zh) * 2018-02-05 2020-09-25 青岛大学附属医院 一种便携式助产装置
WO2019204692A1 (en) * 2018-04-20 2019-10-24 Massachusetts Institute Of Technology Magnetically-levitated transporter

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2666953B2 (ja) * 1988-03-30 1997-10-22 株式会社東芝 荷電ピーム描画装置
JP3200282B2 (ja) * 1993-07-21 2001-08-20 キヤノン株式会社 処理システム及びこれを用いたデバイス製造方法
TW559688B (en) 1999-04-19 2003-11-01 Asml Netherlands Bv Lithographic projection apparatus, vacuum apparatus, low-stiffness seal for sealing between vacuum chamber wall and elongate rod, device manufacturing method and integrated circuit manufactured thereof
US6778258B2 (en) * 2001-10-19 2004-08-17 Asml Holding N.V. Wafer handling system for use in lithography patterning
JP2007220910A (ja) * 2006-02-16 2007-08-30 Nsk Ltd 真空用位置決め装置
JP2009099723A (ja) * 2007-10-16 2009-05-07 Nikon Corp 露光装置
JP2010080861A (ja) * 2008-09-29 2010-04-08 Nikon Corp 転写装置及びデバイス製造方法
JP5277059B2 (ja) * 2009-04-16 2013-08-28 株式会社日立ハイテクノロジーズ 成膜装置及び成膜システム
JP5758750B2 (ja) * 2010-10-29 2015-08-05 ギガフォトン株式会社 極端紫外光生成システム

Also Published As

Publication number Publication date
US20140111780A1 (en) 2014-04-24
US9310688B2 (en) 2016-04-12
JP2014086524A (ja) 2014-05-12

Similar Documents

Publication Publication Date Title
JP6087573B2 (ja) 処理装置、それを用いた物品の製造方法
JP2005268268A (ja) 電子ビーム露光装置
US11302512B2 (en) Electron beam inspection apparatus stage positioning
JP3862639B2 (ja) 露光装置
US20180088472A1 (en) Exposure system
US20190324375A1 (en) Adjustment assembly and substrate exposure system comprising such an adjustment assembly
CN108369383A (zh) 曝光装置及曝光装置的控制方法、以及元件制造方法
JP2013021044A (ja) 荷電粒子線描画装置、および、物品の製造方法
JP6610890B2 (ja) 荷電粒子線露光装置及びデバイス製造方法
US11276558B2 (en) Exposure apparatus and exposure method, lithography method, and device manufacturing method
US20040169832A1 (en) Vacuum chamber having instrument-mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same
US20030043357A1 (en) Vacuum chamber having instrument- mounting bulkhead exhibiting reduced deformation in response to pressure differential, and energy-beam systems comprising same
US9431208B2 (en) Charged-particle beam drawing apparatus and vibration damping mechanism
JP7279207B2 (ja) 荷電粒子線装置及び振動抑制機構
JP2009278002A (ja) 荷電ビーム描画装置
TWI712864B (zh) 帶電粒子束照射裝置
US20240071713A1 (en) Dual focus soluton for sem metrology tools
JP2001217172A (ja) ステージ装置及び露光装置
WO2018167936A1 (ja) 露光装置及びリソグラフィ方法、並びにデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20151023

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20151023

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160722

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160802

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161003

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20170105

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20170202

R151 Written notification of patent or utility model registration

Ref document number: 6087573

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

LAPS Cancellation because of no payment of annual fees