JP2014053439A5 - - Google Patents
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- Publication number
- JP2014053439A5 JP2014053439A5 JP2012196737A JP2012196737A JP2014053439A5 JP 2014053439 A5 JP2014053439 A5 JP 2014053439A5 JP 2012196737 A JP2012196737 A JP 2012196737A JP 2012196737 A JP2012196737 A JP 2012196737A JP 2014053439 A5 JP2014053439 A5 JP 2014053439A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- neutral layer
- substrate processing
- resist pattern
- block copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 claims description 52
- 230000007935 neutral effect Effects 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 49
- 229920001400 block copolymer Polymers 0.000 claims description 32
- 229920001477 hydrophilic polymer Polymers 0.000 claims description 22
- 229920001600 hydrophobic polymer Polymers 0.000 claims description 22
- 238000000576 coating method Methods 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000926 separation method Methods 0.000 claims description 6
- 238000004381 surface treatment Methods 0.000 claims description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 4
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 4
- 239000004793 Polystyrene Substances 0.000 claims description 3
- 238000005191 phase separation Methods 0.000 claims description 3
- 238000003672 processing method Methods 0.000 claims 17
- 230000002209 hydrophobic effect Effects 0.000 claims 8
- 230000001678 irradiating effect Effects 0.000 claims 2
- 229920002223 polystyrene Polymers 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012196737A JP5881565B2 (ja) | 2012-09-07 | 2012-09-07 | 基板処理方法、プログラム及びコンピュータ記憶媒体 |
| PCT/JP2013/072704 WO2014038420A1 (ja) | 2012-09-07 | 2013-08-26 | 基板処理方法、コンピュータ記憶媒体及び基板処理システム |
| TW102131552A TW201426845A (zh) | 2012-09-07 | 2013-09-02 | 基板處理方法、程式、電腦記憶媒體及基板處理系統 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012196737A JP5881565B2 (ja) | 2012-09-07 | 2012-09-07 | 基板処理方法、プログラム及びコンピュータ記憶媒体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014053439A JP2014053439A (ja) | 2014-03-20 |
| JP2014053439A5 true JP2014053439A5 (https=) | 2014-11-13 |
| JP5881565B2 JP5881565B2 (ja) | 2016-03-09 |
Family
ID=50237032
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012196737A Active JP5881565B2 (ja) | 2012-09-07 | 2012-09-07 | 基板処理方法、プログラム及びコンピュータ記憶媒体 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5881565B2 (https=) |
| TW (1) | TW201426845A (https=) |
| WO (1) | WO2014038420A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6177723B2 (ja) * | 2014-04-25 | 2017-08-09 | 東京エレクトロン株式会社 | 基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム |
| JP6267143B2 (ja) * | 2015-03-05 | 2018-01-24 | 東京エレクトロン株式会社 | 基板処理方法、プログラム、コンピュータ記憶媒体及び基板処理システム |
| JP6346115B2 (ja) * | 2015-03-24 | 2018-06-20 | 東芝メモリ株式会社 | パターン形成方法 |
| JP6494446B2 (ja) * | 2015-06-23 | 2019-04-03 | 東京エレクトロン株式会社 | 基板処理方法、プログラム及びコンピュータ記憶媒体 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04364021A (ja) * | 1991-06-11 | 1992-12-16 | Sumitomo Electric Ind Ltd | 半導体装置の製造方法 |
| JP4753672B2 (ja) * | 2005-09-16 | 2011-08-24 | 独立行政法人農業・食品産業技術総合研究機構 | 樹脂製マイクロチャネルアレイの製造方法及びこれを用いた血液測定方法 |
| US7989026B2 (en) * | 2008-01-12 | 2011-08-02 | International Business Machines Corporation | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films |
| US7521094B1 (en) * | 2008-01-14 | 2009-04-21 | International Business Machines Corporation | Method of forming polymer features by directed self-assembly of block copolymers |
| US8822139B2 (en) * | 2010-04-14 | 2014-09-02 | Asml Netherlands B.V. | Method for providing an ordered layer of self-assemblable polymer for use in lithography |
| JP2013534542A (ja) * | 2010-06-04 | 2013-09-05 | エーエスエムエル ネザーランズ ビー．ブイ． | 自己組織化可能な重合体及びリソグラフィにおける使用方法 |
-
2012
- 2012-09-07 JP JP2012196737A patent/JP5881565B2/ja active Active
-
2013
- 2013-08-26 WO PCT/JP2013/072704 patent/WO2014038420A1/ja not_active Ceased
- 2013-09-02 TW TW102131552A patent/TW201426845A/zh unknown
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