JP2014020422A - 真空処理装置用の断熱材 - Google Patents
真空処理装置用の断熱材 Download PDFInfo
- Publication number
- JP2014020422A JP2014020422A JP2012158112A JP2012158112A JP2014020422A JP 2014020422 A JP2014020422 A JP 2014020422A JP 2012158112 A JP2012158112 A JP 2012158112A JP 2012158112 A JP2012158112 A JP 2012158112A JP 2014020422 A JP2014020422 A JP 2014020422A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- vacuum processing
- processing chamber
- heat
- heat insulation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Chemical Vapour Deposition (AREA)
- Thermal Insulation (AREA)
Abstract
【解決手段】真空雰囲気の形成が可能な真空処理室1a内に設けられる本発明の真空処理装置用の断熱材Bは、隙間を持って対向配置される一対の保持体21,22と両保持体間に充填される粒体3とを備える。そして、真空処理室が真空雰囲気であり、両保持体間の空間が1〜1000Paの範囲内の圧力である状態で、一方の保持体から他方の保持体への伝熱が粒体の固体熱伝導により起こるように構成する。
【選択図】図2
Description
Claims (2)
- 真空雰囲気の形成が可能な真空処理室内に設けられる真空処理装置用の断熱材であって、
隙間を持って対向配置される一対の保持体と両保持体間に充填される粒体とを備え、
真空処理室が真空雰囲気であり、両保持体間の空間が1〜1000Paの範囲内の圧力である状態で、一方の保持体から他方の保持体への伝熱が粒体の固体熱伝導により起こるように構成したことを特徴とする真空処理装置用の断熱材。 - 前記粒体を構成する微粒子の各々は、球状の輪郭を持つことを特徴とする請求項1記載の真空処理装置用の断熱材。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012158112A JP6030364B2 (ja) | 2012-07-13 | 2012-07-13 | 真空処理装置用の断熱材 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012158112A JP6030364B2 (ja) | 2012-07-13 | 2012-07-13 | 真空処理装置用の断熱材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014020422A true JP2014020422A (ja) | 2014-02-03 |
JP6030364B2 JP6030364B2 (ja) | 2016-11-24 |
Family
ID=50195579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012158112A Active JP6030364B2 (ja) | 2012-07-13 | 2012-07-13 | 真空処理装置用の断熱材 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6030364B2 (ja) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61144492A (ja) * | 1985-12-13 | 1986-07-02 | 松下電器産業株式会社 | 粉末真空断熱板 |
JPS62283883A (ja) * | 1986-05-29 | 1987-12-09 | イビデン株式会社 | 半導体製造設備用の断熱材 |
JPH0544889A (ja) * | 1991-08-13 | 1993-02-23 | Kubota Corp | 真空断熱体 |
JPH09125166A (ja) * | 1995-11-02 | 1997-05-13 | Daido Steel Co Ltd | 粉粒体の真空加熱装置 |
JP2001030397A (ja) * | 1999-07-21 | 2001-02-06 | Dainippon Printing Co Ltd | 断熱化粧シート及び断熱化粧部材 |
JP2006097080A (ja) * | 2004-09-29 | 2006-04-13 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2010261501A (ja) * | 2009-05-07 | 2010-11-18 | Panasonic Corp | 真空断熱箱体 |
JP2012049380A (ja) * | 2010-08-27 | 2012-03-08 | Tokyo Electron Ltd | 熱処理装置 |
-
2012
- 2012-07-13 JP JP2012158112A patent/JP6030364B2/ja active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61144492A (ja) * | 1985-12-13 | 1986-07-02 | 松下電器産業株式会社 | 粉末真空断熱板 |
JPS62283883A (ja) * | 1986-05-29 | 1987-12-09 | イビデン株式会社 | 半導体製造設備用の断熱材 |
JPH0544889A (ja) * | 1991-08-13 | 1993-02-23 | Kubota Corp | 真空断熱体 |
JPH09125166A (ja) * | 1995-11-02 | 1997-05-13 | Daido Steel Co Ltd | 粉粒体の真空加熱装置 |
JP2001030397A (ja) * | 1999-07-21 | 2001-02-06 | Dainippon Printing Co Ltd | 断熱化粧シート及び断熱化粧部材 |
JP2006097080A (ja) * | 2004-09-29 | 2006-04-13 | Hitachi Kokusai Electric Inc | 基板処理装置 |
JP2010261501A (ja) * | 2009-05-07 | 2010-11-18 | Panasonic Corp | 真空断熱箱体 |
JP2012049380A (ja) * | 2010-08-27 | 2012-03-08 | Tokyo Electron Ltd | 熱処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JP6030364B2 (ja) | 2016-11-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6860564B2 (ja) | 堆積された表面フィーチャを有する基板支持アセンブリ | |
TWI416643B (zh) | Vacuum isolation device and treatment method | |
US20130014896A1 (en) | Wafer-Supporting Device and Method for Producing Same | |
TW200826226A (en) | Electrostatic attraction electrode, substrate processor, and manufacturing method for electrostatic attraction electrode | |
JP2009283699A (ja) | 真空処理装置および真空処理方法 | |
JP5981358B2 (ja) | 伝熱シート貼付方法 | |
KR102215801B1 (ko) | 성막 장치 | |
US20140020629A1 (en) | Two piece shutter disk assembly for a substrate process chamber | |
TW201145441A (en) | Substrate mounting table and method for manufacturing the same, and substrate processing apparatus | |
JP2008251742A (ja) | 基板処理装置及びフォーカスリングを載置する基板載置台 | |
TW201034112A (en) | Ring-shaped member and method for manufacturing same | |
JP2004356624A (ja) | 載置台構造及び熱処理装置 | |
JP4318504B2 (ja) | 成膜装置の基板トレイ | |
TW201821636A (zh) | 原子層成長裝置及原子層成長方法 | |
TW200818311A (en) | Heat conductive structure and substrate treatment apparatus | |
US8361549B2 (en) | Power loading substrates to reduce particle contamination | |
JP6967944B2 (ja) | プラズマ処理装置 | |
JP6030364B2 (ja) | 真空処理装置用の断熱材 | |
TWI695902B (zh) | 基板支撐組件、具有其之處理腔室以及處理基板的方法 | |
CN104241184A (zh) | 承载装置及等离子体加工设备 | |
JP5398358B2 (ja) | 基板支持台の構造及びプラズマ処理装置 | |
JP2009071210A (ja) | サセプタおよびエピタキシャル成長装置 | |
TWI740184B (zh) | 真空處理裝置 | |
JPH07331445A (ja) | 処理装置及び該処理装置に用いられるカバー体の洗浄方法 | |
JP2009174060A (ja) | 成膜装置の基板トレイ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150615 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20160311 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160607 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160720 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20161011 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20161020 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6030364 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |