JP2013543279A - 太陽電池のためのバイパスダイオード - Google Patents
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Abstract
【選択図】図1
Description
本明細書において記載される発明は、米国エネルギー省により与えられた契約番号第DE−FC36−07GO17043のもとで、政府の支援によりなされた。政府は、本発明において一定の権利を有する。
図9Cを参照し、一実施形態において、太陽電池のためのバイパスダイオードの製造方法はまた、基板904に設けられ、第1導電性領域902の下の基板904の部分を囲むアイソレーショントレンチ914を形成する工程を含む。一実施形態において、製造方法はまた、アイソレーショントレンチ914内、並びに、第1導電性領域902及び第2導電性領域910それぞれの少なくとも一部上に、誘電体層918を形成する工程を含む。図9Eに表されるように、特定の実施形態において、その後のコンタクト部の形成のために、誘電体層918内に開口部が形成される。別の特定の実施形態において、図9Dに表されるように、製造方法は更に、誘電体層918を形成する工程の前に、アイソレーショントレンチ914の底面をエッチングして、規則的又は不規則的にテクスチャ加工したパターン916を付与する工程を含む。
Claims (20)
- 太陽電池のためのバイパスダイオードであって、
前記太陽電池の基板と、
前記基板上に配置された第1導電型の第1導電性領域と、
前記第1導電性領域上に配置され、前記第1導電型とは反対の第2導電型の第2導電性領域とを備えるバイパスダイオード。 - 前記基板上に配置される薄い誘電体層を更に備え、前記第1導電性領域が前記薄い誘電体層上に配置される請求項1に記載のバイパスダイオード。
- 前記第2導電性領域は、前記第1導電性領域よりも狭く、前記第1導電性領域の上面が露出している請求項1に記載のバイパスダイオード。
- 前記基板は、N型ドーパント不純物原子でドーピングされ、
前記第1導電型はP型であり、
前記第2導電型はN型であり、
前記第1導電性領域の上面を露出させることは、P型領域を露出させることを含む請求項3に記載のバイパスダイオード。 - 前記第2導電性領域は、前記第1導電性領域の最上部内に配置され、かつ、前記第1導電性領域に囲まれるが、前記第1導電性領域の最下部には配置されない請求項1に記載のバイパスダイオード。
- 前記基板は、N型ドーパント不純物原子でドーピングされ、
前記第1導電型はP型であり、
前記第2導電型はN型であり、
前記第2導電性領域は、P型領域内に配置され、かつ、前記P型領域に囲まれる請求項5に記載のバイパスダイオード。 - 前記基板に配置され、前記第1導電性領域の下の前記基板の部分を囲むアイソレーショントレンチを更に備え、
前記アイソレーショントレンチは、前記第1導電性領域及び前記第2導電性領域上に配置される誘電体層に覆われている請求項1に記載のバイパスダイオード。 - 太陽電池のためのバイパスダイオードの製造方法であって、
前記太陽電池の基板上に、第1導電型の第1導電性領域を形成する工程と、
前記第1導電性領域上に、前記第1導電型と反対の第2導電型の第2導電性領域を印刷する工程とを備え、
前記第2導電性領域は、前記第1導電性領域の上面が露出した状態を維持するべく、前記第1導電性領域よりも狭く印刷されるバイパスダイオードの製造方法。 - 前記第1導電性領域を形成する工程の前に、前記基板上に薄い誘電体層を形成する工程を更に備え、
前記第1導電性領域は、前記薄い誘電体層上に形成される請求項8に記載のバイパスダイオードの製造方法。 - 前記基板は、N型ドーパント不純物原子でドーピングされ、
前記第1導電型はP型であり、
前記第2導電型はN型である請求項8に記載のバイパスダイオードの製造方法。 - 前記基板に設けられ、前記第1導電性領域の下の前記基板の部分を囲むアイソレーショントレンチを形成する工程と、
前記アイソレーショントレンチ内、並びに、前記第1導電性領域及び前記第2導電性領域それぞれの少なくとも一部の上に、誘電体層を形成する工程とを更に備える請求項8に記載のバイパスダイオードの製造方法。 - 前記誘電体層を形成する工程の前に、前記アイソレーショントレンチの底面をエッチングして、不規則又は規則的にテクスチャ加工したパターンを付与する工程を更に備える請求項11に記載のバイパスダイオードの製造方法。
- 前記第1導電性領域及び前記第2導電性領域を形成する工程は、ポリシリコンを含むドーピングされた多結晶層、ドーピングされたナノ粒子、ドーピングされた非晶質膜、及び、導電性ポリマーからなる群から選択される材料を使用する工程を含む請求項8に記載のバイパスダイオードの製造方法。
- 請求項8に記載のバイパスダイオードの製造方法によって製造される太陽電池のためのバイパスダイオード。
- 太陽電池のためのバイパスダイオードの製造方法であって、
前記太陽電池の基板上に、第1導電型の第1導電性領域を形成する工程と、
前記第1導電型とは反対の第2導電型の第2導電性領域を、前記第1導電性領域の最上部内に前記第1導電性領域に囲まれるように設けられるが、前記第1導電性領域の最下部には設けられないように形成する工程とを備えるバイパスダイオードの製造方法。 - 前記第1導電性領域を形成する工程の前に、前記基板上に薄い誘電体層を形成する工程を更に備え、
前記第1導電性領域は、前記薄い誘電体層上に形成される請求項15に記載のバイパスダイオードの製造方法。 - 前記基板は、N型ドーパント不純物原子でドーピングされ、
前記第1導電型はP型であり、
前記第2導電型はN型である請求項15に記載のバイパスダイオードの製造方法。 - 前記基板に設けられ、前記第1導電性領域の下の前記基板の部分を囲むアイソレーショントレンチを形成する工程と、
前記アイソレーショントレンチ内、並びに、前記第1導電性領域及び前記第2導電性領域それぞれの少なくとも一部の上に、誘電体層を形成する工程とを更に備える請求項15に記載のバイパスダイオードの製造方法。 - 前記第2導電性領域を形成する工程は、レーザドーピングプロセスを使用する工程を含む、請求項15に記載のバイパスダイオードの製造方法。
- 前記第1導電性領域を形成する工程は、ポリシリコンを含むドーピングされた多結晶層、ドーピングされたナノ粒子、ドーピングされた非晶質膜、及び、導電性ポリマーからなる群から選択される材料を使用する工程を含む、請求項15に記載のバイパスダイオードの製造方法。
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US12/967,976 US8134217B2 (en) | 2010-12-14 | 2010-12-14 | Bypass diode for a solar cell |
PCT/US2011/054607 WO2013058724A2 (en) | 2010-12-14 | 2011-10-03 | Bypass diode for a solar cell |
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Also Published As
Publication number | Publication date |
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JP5752798B2 (ja) | 2015-07-22 |
US20120171799A1 (en) | 2012-07-05 |
CN203339177U (zh) | 2013-12-11 |
AU2011371275A1 (en) | 2013-05-16 |
JP6154848B2 (ja) | 2017-06-28 |
US8580599B2 (en) | 2013-11-12 |
US8134217B2 (en) | 2012-03-13 |
KR20140010920A (ko) | 2014-01-27 |
WO2013058724A3 (en) | 2013-07-18 |
US20110284986A1 (en) | 2011-11-24 |
JP2015167251A (ja) | 2015-09-24 |
KR101889429B1 (ko) | 2018-08-20 |
EP2652795A2 (en) | 2013-10-23 |
EP2652795A4 (en) | 2014-11-26 |
WO2013058724A2 (en) | 2013-04-25 |
AU2011371275B2 (en) | 2015-05-28 |
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