JP2013541816A5 - - Google Patents

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Publication number
JP2013541816A5
JP2013541816A5 JP2013531778A JP2013531778A JP2013541816A5 JP 2013541816 A5 JP2013541816 A5 JP 2013541816A5 JP 2013531778 A JP2013531778 A JP 2013531778A JP 2013531778 A JP2013531778 A JP 2013531778A JP 2013541816 A5 JP2013541816 A5 JP 2013541816A5
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JP
Japan
Prior art keywords
excimer
electrodes
ultraviolet
excimer lamp
sealed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013531778A
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English (en)
Japanese (ja)
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JP2013541816A (ja
JP6096118B2 (ja
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Publication date
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Priority claimed from PCT/US2011/053751 external-priority patent/WO2012050916A2/en
Publication of JP2013541816A publication Critical patent/JP2013541816A/ja
Publication of JP2013541816A5 publication Critical patent/JP2013541816A5/ja
Application granted granted Critical
Publication of JP6096118B2 publication Critical patent/JP6096118B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013531778A 2010-09-29 2011-09-28 エキシマ光源 Active JP6096118B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US38785610P 2010-09-29 2010-09-29
US61/387,856 2010-09-29
PCT/US2011/053751 WO2012050916A2 (en) 2010-09-29 2011-09-28 Excimer light source

Publications (3)

Publication Number Publication Date
JP2013541816A JP2013541816A (ja) 2013-11-14
JP2013541816A5 true JP2013541816A5 (https=) 2014-11-13
JP6096118B2 JP6096118B2 (ja) 2017-03-15

Family

ID=45938874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013531778A Active JP6096118B2 (ja) 2010-09-29 2011-09-28 エキシマ光源

Country Status (10)

Country Link
US (2) US8946662B2 (https=)
EP (1) EP2622623A4 (https=)
JP (1) JP6096118B2 (https=)
KR (1) KR102106293B1 (https=)
CN (2) CN103415338B (https=)
AU (2) AU2011314069B2 (https=)
CA (2) CA2812947C (https=)
MX (1) MX2013003437A (https=)
RU (1) RU2592538C2 (https=)
WO (1) WO2012050916A2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012017779A1 (de) * 2012-09-07 2014-03-13 Karlsruher Institut für Technologie Dielektrisch behinderte Entladungs-Lampe
CN103227098A (zh) * 2013-05-15 2013-07-31 王颂 282nm、222nm无极准分子灯
KR101949001B1 (ko) * 2015-02-03 2019-05-10 고도가이샤 시코기켄 자외선 발광용 가스 방전 장치와 이것을 사용한 평면 광원 및 이들의 구동 방법
CN205191526U (zh) * 2015-11-06 2016-04-27 东莞莹辉灯饰有限公司 Led净化节能灯
US11614407B2 (en) 2020-04-20 2023-03-28 Denovo Lighting, Llc Devices for instant detection and disinfection of aerosol droplet particles using UV light sources
US11786622B2 (en) 2020-05-08 2023-10-17 Ultra-Violet Solutions, Llc Far UV-C light apparatus
JP6948606B1 (ja) * 2020-08-28 2021-10-13 ウシオ電機株式会社 エキシマランプ及び光照射装置
WO2022116366A1 (zh) * 2020-12-04 2022-06-09 广明源光科技股份有限公司 准分子灯
CN113270309A (zh) * 2021-06-21 2021-08-17 深圳市大博实业有限公司 一种uv准分子灯

Family Cites Families (24)

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US3927342A (en) * 1969-04-28 1975-12-16 Owens Illinois Inc Capillary tube gas discharge device
EP0402417A1 (de) * 1988-04-25 1990-12-19 Siemens Aktiengesellschaft Einrichtung zur vorionisierung an entladungsgepumpten gaslasern, insbesondere zur röntgen-vorionisierung
JPH04303549A (ja) * 1991-03-30 1992-10-27 Toshiba Lighting & Technol Corp 高周波点灯式放電ランプ
JP3291809B2 (ja) * 1993-01-20 2002-06-17 ウシオ電機株式会社 誘電体バリヤ放電ランプを使用した処理方法
JPH09259834A (ja) * 1996-03-26 1997-10-03 Toshiba Corp 真空紫外光源
JPH1021880A (ja) * 1996-07-08 1998-01-23 Toshiba Lighting & Technol Corp 放電ランプ、照射装置、殺菌装置および水処理装置
RU2120152C1 (ru) * 1996-12-16 1998-10-10 Общество с ограниченной ответственностью "Микроэлектронные системы" - ООО "МИКС" Газоразрядная лампа
US7006546B2 (en) * 2000-03-15 2006-02-28 Komatsu Ltd. Gas laser electrode, laser chamber employing the electrode, and gas laser device
CA2466953A1 (en) * 2001-11-14 2003-08-14 Blacklight Power, Inc. Hydrogen power, plasma, and reactor for lasing, and power conversion
CN2592631Y (zh) * 2002-08-28 2003-12-17 中国科学院等离子体物理研究所 准分子紫外光源
AU2003272969A1 (en) 2002-10-10 2004-05-04 Kansai Paint Co., Ltd. Method for forming semiconductor film and use of semiconductor film
EP1581458B1 (en) 2003-01-02 2010-08-11 Ultraviolet Sciences, Inc. Micro-discharge devices and applications
GB2399216B (en) * 2003-03-06 2007-05-09 Quay Technologies Ltd Ultraviolet light source
JP4013923B2 (ja) * 2003-09-04 2007-11-28 ウシオ電機株式会社 エキシマランプ
US20070210713A1 (en) * 2004-04-08 2007-09-13 Sen Engineering Co., Ltd. Dielectric Barrier Discharge Excimer Light Source
KR20080002851A (ko) * 2005-04-22 2008-01-04 호야 칸데오 옵트로닉스 가부시키가이샤 엑시머 램프
JP2006302720A (ja) * 2005-04-22 2006-11-02 Hoya Candeo Optronics株式会社 エキシマランプ
JP2005317555A (ja) * 2005-07-12 2005-11-10 Quark Systems Co Ltd エキシマランプ及びエキシマ照射装置
JP2007088116A (ja) * 2005-09-21 2007-04-05 Harison Toshiba Lighting Corp 紫外光照射装置および光洗浄装置
EP2046687B1 (en) 2006-07-13 2010-02-10 Philips Intellectual Property & Standards GmbH Fluid treatment system comprising radiation source module and cooling means
JP4424394B2 (ja) * 2007-08-31 2010-03-03 ウシオ電機株式会社 エキシマランプ
US8946993B2 (en) * 2008-05-15 2015-02-03 Rutgers, The State University Fluorescent excimer lamps
JP2010056008A (ja) * 2008-08-29 2010-03-11 Ehime Univ 無水銀殺菌ランプおよび殺菌装置
CN102870235B (zh) 2009-11-10 2016-11-23 免疫之光有限责任公司 用于从包括用于上变频的射频、微波能量和磁感应源的各种能量源产生发射光的上下变频系统

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