CA3123418C - Excimer light source - Google Patents

Excimer light source Download PDF

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Publication number
CA3123418C
CA3123418C CA3123418A CA3123418A CA3123418C CA 3123418 C CA3123418 C CA 3123418C CA 3123418 A CA3123418 A CA 3123418A CA 3123418 A CA3123418 A CA 3123418A CA 3123418 C CA3123418 C CA 3123418C
Authority
CA
Canada
Prior art keywords
elongated electrode
electrode
envelope
excimer
elongated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CA3123418A
Other languages
English (en)
French (fr)
Other versions
CA3123418A1 (en
Inventor
James Randall Cooper
Ronald W. Chaffee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEO TECH AQUA SOLUTIONS Inc
Original Assignee
NEO TECH AQUA SOLUTIONS Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEO TECH AQUA SOLUTIONS Inc filed Critical NEO TECH AQUA SOLUTIONS Inc
Publication of CA3123418A1 publication Critical patent/CA3123418A1/en
Application granted granted Critical
Publication of CA3123418C publication Critical patent/CA3123418C/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G01N23/12Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the material being a flowing fluid or a flowing granular solid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/04Electrodes; Screens; Shields
    • H01J61/06Main electrodes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • C02F1/32Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325Irradiation devices or lamp constructions
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KHANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • G21K5/08Holders for targets or for other objects to be irradiated
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/04Electrodes; Screens; Shields
    • H01J61/06Main electrodes
    • H01J61/067Main electrodes for low-pressure discharge lamps
    • H01J61/0675Main electrodes for low-pressure discharge lamps characterised by the material of the electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/04Electrodes; Screens; Shields
    • H01J61/06Main electrodes
    • H01J61/073Main electrodes for high-pressure discharge lamps
    • H01J61/0735Main electrodes for high-pressure discharge lamps characterised by the material of the electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/02Details
    • H01J61/12Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/16Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14Circuit arrangements
    • H05B41/24Circuit arrangements in which the lamp is fed by high frequency AC, or with separate oscillator frequency
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14Circuit arrangements
    • H05B41/30Circuit arrangements in which the lamp is fed by pulses, e.g. flash lamp
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/30Organic compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/32Details relating to UV-irradiation devices
    • C02F2201/322Lamp arrangement
    • C02F2201/3227Units with two or more lamps

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • General Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Water Treatments (AREA)
  • Discharge Lamp (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CA3123418A 2010-09-29 2011-09-28 Excimer light source Active CA3123418C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US38785610P 2010-09-29 2010-09-29
US61/387,856 2010-09-29
CA2812947A CA2812947C (en) 2010-09-29 2011-09-28 Excimer light source

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CA2812947A Division CA2812947C (en) 2010-09-29 2011-09-28 Excimer light source

Publications (2)

Publication Number Publication Date
CA3123418A1 CA3123418A1 (en) 2012-04-19
CA3123418C true CA3123418C (en) 2023-10-10

Family

ID=45938874

Family Applications (2)

Application Number Title Priority Date Filing Date
CA3123418A Active CA3123418C (en) 2010-09-29 2011-09-28 Excimer light source
CA2812947A Active CA2812947C (en) 2010-09-29 2011-09-28 Excimer light source

Family Applications After (1)

Application Number Title Priority Date Filing Date
CA2812947A Active CA2812947C (en) 2010-09-29 2011-09-28 Excimer light source

Country Status (10)

Country Link
US (2) US8946662B2 (https=)
EP (1) EP2622623A4 (https=)
JP (1) JP6096118B2 (https=)
KR (1) KR102106293B1 (https=)
CN (2) CN110459460B (https=)
AU (2) AU2011314069B2 (https=)
CA (2) CA3123418C (https=)
MX (1) MX2013003437A (https=)
RU (1) RU2592538C2 (https=)
WO (1) WO2012050916A2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012017779A1 (de) * 2012-09-07 2014-03-13 Karlsruher Institut für Technologie Dielektrisch behinderte Entladungs-Lampe
CN103227098A (zh) * 2013-05-15 2013-07-31 王颂 282nm、222nm无极准分子灯
WO2016125708A1 (ja) * 2015-02-03 2016-08-11 合同会社紫光技研 ガス放電装置とそれを使用した平面光源およびそれらの駆動方法
CN205191526U (zh) * 2015-11-06 2016-04-27 东莞莹辉灯饰有限公司 Led净化节能灯
US11614407B2 (en) 2020-04-20 2023-03-28 Denovo Lighting, Llc Devices for instant detection and disinfection of aerosol droplet particles using UV light sources
US11786622B2 (en) 2020-05-08 2023-10-17 Ultra-Violet Solutions, Llc Far UV-C light apparatus
JP6948606B1 (ja) * 2020-08-28 2021-10-13 ウシオ電機株式会社 エキシマランプ及び光照射装置
WO2022116366A1 (zh) * 2020-12-04 2022-06-09 广明源光科技股份有限公司 准分子灯
CN113270309A (zh) * 2021-06-21 2021-08-17 深圳市大博实业有限公司 一种uv准分子灯

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3927342A (en) * 1969-04-28 1975-12-16 Owens Illinois Inc Capillary tube gas discharge device
EP0402417A1 (de) * 1988-04-25 1990-12-19 Siemens Aktiengesellschaft Einrichtung zur vorionisierung an entladungsgepumpten gaslasern, insbesondere zur röntgen-vorionisierung
JPH04303549A (ja) * 1991-03-30 1992-10-27 Toshiba Lighting & Technol Corp 高周波点灯式放電ランプ
JP3291809B2 (ja) * 1993-01-20 2002-06-17 ウシオ電機株式会社 誘電体バリヤ放電ランプを使用した処理方法
JPH09259834A (ja) * 1996-03-26 1997-10-03 Toshiba Corp 真空紫外光源
JPH1021880A (ja) * 1996-07-08 1998-01-23 Toshiba Lighting & Technol Corp 放電ランプ、照射装置、殺菌装置および水処理装置
RU2120152C1 (ru) * 1996-12-16 1998-10-10 Общество с ограниченной ответственностью "Микроэлектронные системы" - ООО "МИКС" Газоразрядная лампа
US7006546B2 (en) * 2000-03-15 2006-02-28 Komatsu Ltd. Gas laser electrode, laser chamber employing the electrode, and gas laser device
AU2002365227A1 (en) * 2001-11-14 2003-09-02 Blacklight Power, Inc. Hydrogen power, plasma, and reactor for lasing, and power conversion
CN2592631Y (zh) * 2002-08-28 2003-12-17 中国科学院等离子体物理研究所 准分子紫外光源
EP1550742A4 (en) 2002-10-10 2007-01-03 Kansai Paint Co Ltd METHOD FOR PRODUCING A SEMICONDUCTOR FILM AND USE OF SEMICONDUCTOR FILM
DE60333792D1 (de) 2003-01-02 2010-09-23 Ultraviolet Sciences Inc Mikro-entladungsvorrichtungen und anwendungen
GB2399216B (en) * 2003-03-06 2007-05-09 Quay Technologies Ltd Ultraviolet light source
JP4013923B2 (ja) * 2003-09-04 2007-11-28 ウシオ電機株式会社 エキシマランプ
WO2005098903A1 (ja) * 2004-04-08 2005-10-20 Sen Engineering Co., Ltd. 誘電体バリア放電エキシマ光源
KR20080002851A (ko) * 2005-04-22 2008-01-04 호야 칸데오 옵트로닉스 가부시키가이샤 엑시머 램프
JP2006302720A (ja) * 2005-04-22 2006-11-02 Hoya Candeo Optronics株式会社 エキシマランプ
JP2005317555A (ja) * 2005-07-12 2005-11-10 Quark Systems Co Ltd エキシマランプ及びエキシマ照射装置
JP2007088116A (ja) * 2005-09-21 2007-04-05 Harison Toshiba Lighting Corp 紫外光照射装置および光洗浄装置
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JP2010056008A (ja) * 2008-08-29 2010-03-11 Ehime Univ 無水銀殺菌ランプおよび殺菌装置
WO2011060033A1 (en) 2009-11-10 2011-05-19 Immunolight, L.L.C. Up and down coversion systems for production of emitted light from various energy sources including radio frequency, microwave energy and magnetic induction sources for upconversion

Also Published As

Publication number Publication date
JP2013541816A (ja) 2013-11-14
CN110459460B (zh) 2023-03-21
JP6096118B2 (ja) 2017-03-15
WO2012050916A2 (en) 2012-04-19
US8946662B2 (en) 2015-02-03
EP2622623A4 (en) 2016-08-31
WO2012050916A3 (en) 2012-07-19
AU2015206251B2 (en) 2017-03-02
CA3123418A1 (en) 2012-04-19
AU2011314069A1 (en) 2013-05-02
KR20140038340A (ko) 2014-03-28
RU2013118110A (ru) 2014-11-10
EP2622623A2 (en) 2013-08-07
AU2011314069B2 (en) 2015-04-30
KR102106293B1 (ko) 2020-06-02
AU2015206251A1 (en) 2015-08-20
CN103415338A (zh) 2013-11-27
CA2812947C (en) 2021-06-29
CA2812947A1 (en) 2012-04-19
US9865448B2 (en) 2018-01-09
MX2013003437A (es) 2014-02-27
RU2592538C2 (ru) 2016-07-20
CN103415338B (zh) 2019-09-10
CN110459460A (zh) 2019-11-15
US20130175454A1 (en) 2013-07-11
US20150136999A1 (en) 2015-05-21

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