AU2011314069B2 - Excimer light source - Google Patents

Excimer light source Download PDF

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Publication number
AU2011314069B2
AU2011314069B2 AU2011314069A AU2011314069A AU2011314069B2 AU 2011314069 B2 AU2011314069 B2 AU 2011314069B2 AU 2011314069 A AU2011314069 A AU 2011314069A AU 2011314069 A AU2011314069 A AU 2011314069A AU 2011314069 B2 AU2011314069 B2 AU 2011314069B2
Authority
AU
Australia
Prior art keywords
electrodes
excimer
gas
sealed tubes
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
AU2011314069A
Other languages
English (en)
Other versions
AU2011314069A1 (en
Inventor
Ronald W. Chaffee
James Randall Cooper
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEO TECH AQUA SOLUTIONS Inc
Original Assignee
NEO TECH AQUA SOLUTIONS Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEO TECH AQUA SOLUTIONS Inc filed Critical NEO TECH AQUA SOLUTIONS Inc
Publication of AU2011314069A1 publication Critical patent/AU2011314069A1/en
Application granted granted Critical
Publication of AU2011314069B2 publication Critical patent/AU2011314069B2/en
Priority to AU2015206251A priority Critical patent/AU2015206251B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G01N23/12—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the material being a flowing fluid or a flowing granular solid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325—Irradiation devices or lamp constructions
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/08—Holders for targets or for other objects to be irradiated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/067—Main electrodes for low-pressure discharge lamps
    • H01J61/0675—Main electrodes for low-pressure discharge lamps characterised by the material of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0735—Main electrodes for high-pressure discharge lamps characterised by the material of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
    • H01J61/16—Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/24—Circuit arrangements in which the lamp is fed by high frequency AC, or with separate oscillator frequency
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14—Circuit arrangements
    • H05B41/30—Circuit arrangements in which the lamp is fed by pulses, e.g. flash lamp
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/30—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3227—Units with two or more lamps

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Hydrology & Water Resources (AREA)
  • General Health & Medical Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Water Treatments (AREA)
  • Discharge Lamp (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AU2011314069A 2010-09-29 2011-09-28 Excimer light source Active AU2011314069B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2015206251A AU2015206251B2 (en) 2010-09-29 2015-07-27 Excimer Light Source

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US38785610P 2010-09-29 2010-09-29
US61/387,856 2010-09-29
PCT/US2011/053751 WO2012050916A2 (en) 2010-09-29 2011-09-28 Excimer light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
AU2015206251A Division AU2015206251B2 (en) 2010-09-29 2015-07-27 Excimer Light Source

Publications (2)

Publication Number Publication Date
AU2011314069A1 AU2011314069A1 (en) 2013-05-02
AU2011314069B2 true AU2011314069B2 (en) 2015-04-30

Family

ID=45938874

Family Applications (2)

Application Number Title Priority Date Filing Date
AU2011314069A Active AU2011314069B2 (en) 2010-09-29 2011-09-28 Excimer light source
AU2015206251A Active AU2015206251B2 (en) 2010-09-29 2015-07-27 Excimer Light Source

Family Applications After (1)

Application Number Title Priority Date Filing Date
AU2015206251A Active AU2015206251B2 (en) 2010-09-29 2015-07-27 Excimer Light Source

Country Status (10)

Country Link
US (2) US8946662B2 (https=)
EP (1) EP2622623A4 (https=)
JP (1) JP6096118B2 (https=)
KR (1) KR102106293B1 (https=)
CN (2) CN103415338B (https=)
AU (2) AU2011314069B2 (https=)
CA (2) CA2812947C (https=)
MX (1) MX2013003437A (https=)
RU (1) RU2592538C2 (https=)
WO (1) WO2012050916A2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012017779A1 (de) * 2012-09-07 2014-03-13 Karlsruher Institut für Technologie Dielektrisch behinderte Entladungs-Lampe
CN103227098A (zh) * 2013-05-15 2013-07-31 王颂 282nm、222nm无极准分子灯
KR101949001B1 (ko) * 2015-02-03 2019-05-10 고도가이샤 시코기켄 자외선 발광용 가스 방전 장치와 이것을 사용한 평면 광원 및 이들의 구동 방법
CN205191526U (zh) * 2015-11-06 2016-04-27 东莞莹辉灯饰有限公司 Led净化节能灯
US11614407B2 (en) 2020-04-20 2023-03-28 Denovo Lighting, Llc Devices for instant detection and disinfection of aerosol droplet particles using UV light sources
US11786622B2 (en) 2020-05-08 2023-10-17 Ultra-Violet Solutions, Llc Far UV-C light apparatus
JP6948606B1 (ja) * 2020-08-28 2021-10-13 ウシオ電機株式会社 エキシマランプ及び光照射装置
WO2022116366A1 (zh) * 2020-12-04 2022-06-09 广明源光科技股份有限公司 准分子灯
CN113270309A (zh) * 2021-06-21 2021-08-17 深圳市大博实业有限公司 一种uv准分子灯

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142547A (en) * 1988-04-25 1992-08-25 Siemens Aktiengesellschaft Device for pre-ionization in discharge-pumped gas lasers, in particular for x-ray pre-ionization
US20080061669A1 (en) * 2004-04-08 2008-03-13 Sen Engineering Co., Ltd. Dielectric barrier discharge excimer light source

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US3927342A (en) * 1969-04-28 1975-12-16 Owens Illinois Inc Capillary tube gas discharge device
JPH04303549A (ja) * 1991-03-30 1992-10-27 Toshiba Lighting & Technol Corp 高周波点灯式放電ランプ
JP3291809B2 (ja) * 1993-01-20 2002-06-17 ウシオ電機株式会社 誘電体バリヤ放電ランプを使用した処理方法
JPH09259834A (ja) * 1996-03-26 1997-10-03 Toshiba Corp 真空紫外光源
JPH1021880A (ja) * 1996-07-08 1998-01-23 Toshiba Lighting & Technol Corp 放電ランプ、照射装置、殺菌装置および水処理装置
RU2120152C1 (ru) * 1996-12-16 1998-10-10 Общество с ограниченной ответственностью "Микроэлектронные системы" - ООО "МИКС" Газоразрядная лампа
US7006546B2 (en) * 2000-03-15 2006-02-28 Komatsu Ltd. Gas laser electrode, laser chamber employing the electrode, and gas laser device
CA2466953A1 (en) * 2001-11-14 2003-08-14 Blacklight Power, Inc. Hydrogen power, plasma, and reactor for lasing, and power conversion
CN2592631Y (zh) * 2002-08-28 2003-12-17 中国科学院等离子体物理研究所 准分子紫外光源
AU2003272969A1 (en) 2002-10-10 2004-05-04 Kansai Paint Co., Ltd. Method for forming semiconductor film and use of semiconductor film
EP1581458B1 (en) 2003-01-02 2010-08-11 Ultraviolet Sciences, Inc. Micro-discharge devices and applications
GB2399216B (en) * 2003-03-06 2007-05-09 Quay Technologies Ltd Ultraviolet light source
JP4013923B2 (ja) * 2003-09-04 2007-11-28 ウシオ電機株式会社 エキシマランプ
KR20080002851A (ko) * 2005-04-22 2008-01-04 호야 칸데오 옵트로닉스 가부시키가이샤 엑시머 램프
JP2006302720A (ja) * 2005-04-22 2006-11-02 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 エキシマランプ
JP2005317555A (ja) * 2005-07-12 2005-11-10 Quark Systems Co Ltd エキシマランプ及びエキシマ照射装置
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US8946993B2 (en) * 2008-05-15 2015-02-03 Rutgers, The State University Fluorescent excimer lamps
JP2010056008A (ja) * 2008-08-29 2010-03-11 Ehime Univ 無水銀殺菌ランプおよび殺菌装置
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Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142547A (en) * 1988-04-25 1992-08-25 Siemens Aktiengesellschaft Device for pre-ionization in discharge-pumped gas lasers, in particular for x-ray pre-ionization
US20080061669A1 (en) * 2004-04-08 2008-03-13 Sen Engineering Co., Ltd. Dielectric barrier discharge excimer light source

Also Published As

Publication number Publication date
EP2622623A4 (en) 2016-08-31
US9865448B2 (en) 2018-01-09
CA2812947C (en) 2021-06-29
US8946662B2 (en) 2015-02-03
JP2013541816A (ja) 2013-11-14
WO2012050916A3 (en) 2012-07-19
CA3123418C (en) 2023-10-10
AU2015206251B2 (en) 2017-03-02
JP6096118B2 (ja) 2017-03-15
CN103415338B (zh) 2019-09-10
EP2622623A2 (en) 2013-08-07
KR102106293B1 (ko) 2020-06-02
MX2013003437A (es) 2014-02-27
AU2015206251A1 (en) 2015-08-20
AU2011314069A1 (en) 2013-05-02
CA3123418A1 (en) 2012-04-19
KR20140038340A (ko) 2014-03-28
CN103415338A (zh) 2013-11-27
WO2012050916A2 (en) 2012-04-19
RU2013118110A (ru) 2014-11-10
RU2592538C2 (ru) 2016-07-20
US20130175454A1 (en) 2013-07-11
US20150136999A1 (en) 2015-05-21
CA2812947A1 (en) 2012-04-19
CN110459460B (zh) 2023-03-21
CN110459460A (zh) 2019-11-15

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Date Code Title Description
FGA Letters patent sealed or granted (standard patent)