RU2592538C2 - Эксимерный источник света - Google Patents
Эксимерный источник света Download PDFInfo
- Publication number
- RU2592538C2 RU2592538C2 RU2013118110/05A RU2013118110A RU2592538C2 RU 2592538 C2 RU2592538 C2 RU 2592538C2 RU 2013118110/05 A RU2013118110/05 A RU 2013118110/05A RU 2013118110 A RU2013118110 A RU 2013118110A RU 2592538 C2 RU2592538 C2 RU 2592538C2
- Authority
- RU
- Russia
- Prior art keywords
- electrodes
- gas
- excimer
- light source
- sealed tubes
- Prior art date
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
- G01N23/12—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the material being a flowing fluid or a flowing granular solid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/08—Holders for targets or for other objects to be irradiated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/067—Main electrodes for low-pressure discharge lamps
- H01J61/0675—Main electrodes for low-pressure discharge lamps characterised by the material of the electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/073—Main electrodes for high-pressure discharge lamps
- H01J61/0735—Main electrodes for high-pressure discharge lamps characterised by the material of the electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
- H01J61/16—Selection of substances for gas fillings; Specified operating pressure or temperature having helium, argon, neon, krypton, or xenon as the principle constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
- H05B41/14—Circuit arrangements
- H05B41/24—Circuit arrangements in which the lamp is fed by high frequency AC, or with separate oscillator frequency
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B41/00—Circuit arrangements or apparatus for igniting or operating discharge lamps
- H05B41/14—Circuit arrangements
- H05B41/30—Circuit arrangements in which the lamp is fed by pulses, e.g. flash lamp
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3227—Units with two or more lamps
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- General Health & Medical Sciences (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Water Treatments (AREA)
- Discharge Lamp (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US38785610P | 2010-09-29 | 2010-09-29 | |
| US61/387,856 | 2010-09-29 | ||
| PCT/US2011/053751 WO2012050916A2 (en) | 2010-09-29 | 2011-09-28 | Excimer light source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2013118110A RU2013118110A (ru) | 2014-11-10 |
| RU2592538C2 true RU2592538C2 (ru) | 2016-07-20 |
Family
ID=45938874
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2013118110/05A RU2592538C2 (ru) | 2010-09-29 | 2011-09-28 | Эксимерный источник света |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US8946662B2 (https=) |
| EP (1) | EP2622623A4 (https=) |
| JP (1) | JP6096118B2 (https=) |
| KR (1) | KR102106293B1 (https=) |
| CN (2) | CN110459460B (https=) |
| AU (2) | AU2011314069B2 (https=) |
| CA (2) | CA3123418C (https=) |
| MX (1) | MX2013003437A (https=) |
| RU (1) | RU2592538C2 (https=) |
| WO (1) | WO2012050916A2 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102012017779A1 (de) * | 2012-09-07 | 2014-03-13 | Karlsruher Institut für Technologie | Dielektrisch behinderte Entladungs-Lampe |
| CN103227098A (zh) * | 2013-05-15 | 2013-07-31 | 王颂 | 282nm、222nm无极准分子灯 |
| WO2016125708A1 (ja) * | 2015-02-03 | 2016-08-11 | 合同会社紫光技研 | ガス放電装置とそれを使用した平面光源およびそれらの駆動方法 |
| CN205191526U (zh) * | 2015-11-06 | 2016-04-27 | 东莞莹辉灯饰有限公司 | Led净化节能灯 |
| US11614407B2 (en) | 2020-04-20 | 2023-03-28 | Denovo Lighting, Llc | Devices for instant detection and disinfection of aerosol droplet particles using UV light sources |
| US11786622B2 (en) | 2020-05-08 | 2023-10-17 | Ultra-Violet Solutions, Llc | Far UV-C light apparatus |
| JP6948606B1 (ja) * | 2020-08-28 | 2021-10-13 | ウシオ電機株式会社 | エキシマランプ及び光照射装置 |
| WO2022116366A1 (zh) * | 2020-12-04 | 2022-06-09 | 广明源光科技股份有限公司 | 准分子灯 |
| CN113270309A (zh) * | 2021-06-21 | 2021-08-17 | 深圳市大博实业有限公司 | 一种uv准分子灯 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5142547A (en) * | 1988-04-25 | 1992-08-25 | Siemens Aktiengesellschaft | Device for pre-ionization in discharge-pumped gas lasers, in particular for x-ray pre-ionization |
| RU2120152C1 (ru) * | 1996-12-16 | 1998-10-10 | Общество с ограниченной ответственностью "Микроэлектронные системы" - ООО "МИКС" | Газоразрядная лампа |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3927342A (en) * | 1969-04-28 | 1975-12-16 | Owens Illinois Inc | Capillary tube gas discharge device |
| JPH04303549A (ja) * | 1991-03-30 | 1992-10-27 | Toshiba Lighting & Technol Corp | 高周波点灯式放電ランプ |
| JP3291809B2 (ja) * | 1993-01-20 | 2002-06-17 | ウシオ電機株式会社 | 誘電体バリヤ放電ランプを使用した処理方法 |
| JPH09259834A (ja) * | 1996-03-26 | 1997-10-03 | Toshiba Corp | 真空紫外光源 |
| JPH1021880A (ja) * | 1996-07-08 | 1998-01-23 | Toshiba Lighting & Technol Corp | 放電ランプ、照射装置、殺菌装置および水処理装置 |
| US7006546B2 (en) * | 2000-03-15 | 2006-02-28 | Komatsu Ltd. | Gas laser electrode, laser chamber employing the electrode, and gas laser device |
| AU2002365227A1 (en) * | 2001-11-14 | 2003-09-02 | Blacklight Power, Inc. | Hydrogen power, plasma, and reactor for lasing, and power conversion |
| CN2592631Y (zh) * | 2002-08-28 | 2003-12-17 | 中国科学院等离子体物理研究所 | 准分子紫外光源 |
| EP1550742A4 (en) | 2002-10-10 | 2007-01-03 | Kansai Paint Co Ltd | METHOD FOR PRODUCING A SEMICONDUCTOR FILM AND USE OF SEMICONDUCTOR FILM |
| DE60333792D1 (de) | 2003-01-02 | 2010-09-23 | Ultraviolet Sciences Inc | Mikro-entladungsvorrichtungen und anwendungen |
| GB2399216B (en) * | 2003-03-06 | 2007-05-09 | Quay Technologies Ltd | Ultraviolet light source |
| JP4013923B2 (ja) * | 2003-09-04 | 2007-11-28 | ウシオ電機株式会社 | エキシマランプ |
| WO2005098903A1 (ja) * | 2004-04-08 | 2005-10-20 | Sen Engineering Co., Ltd. | 誘電体バリア放電エキシマ光源 |
| KR20080002851A (ko) * | 2005-04-22 | 2008-01-04 | 호야 칸데오 옵트로닉스 가부시키가이샤 | 엑시머 램프 |
| JP2006302720A (ja) * | 2005-04-22 | 2006-11-02 | Hoya Candeo Optronics株式会社 | エキシマランプ |
| JP2005317555A (ja) * | 2005-07-12 | 2005-11-10 | Quark Systems Co Ltd | エキシマランプ及びエキシマ照射装置 |
| JP2007088116A (ja) * | 2005-09-21 | 2007-04-05 | Harison Toshiba Lighting Corp | 紫外光照射装置および光洗浄装置 |
| CN101489939B (zh) * | 2006-07-13 | 2011-11-16 | 皇家飞利浦电子股份有限公司 | 包括辐射源模块和冷却装置的流体处理系统 |
| JP4424394B2 (ja) * | 2007-08-31 | 2010-03-03 | ウシオ電機株式会社 | エキシマランプ |
| WO2009139908A1 (en) * | 2008-05-15 | 2009-11-19 | Rutgers, The State University | Fluorescent excimer lamps |
| JP2010056008A (ja) * | 2008-08-29 | 2010-03-11 | Ehime Univ | 無水銀殺菌ランプおよび殺菌装置 |
| WO2011060033A1 (en) | 2009-11-10 | 2011-05-19 | Immunolight, L.L.C. | Up and down coversion systems for production of emitted light from various energy sources including radio frequency, microwave energy and magnetic induction sources for upconversion |
-
2011
- 2011-09-28 JP JP2013531778A patent/JP6096118B2/ja active Active
- 2011-09-28 RU RU2013118110/05A patent/RU2592538C2/ru active
- 2011-09-28 US US13/822,575 patent/US8946662B2/en active Active
- 2011-09-28 EP EP11833068.7A patent/EP2622623A4/en not_active Ceased
- 2011-09-28 CN CN201910748148.6A patent/CN110459460B/zh active Active
- 2011-09-28 CA CA3123418A patent/CA3123418C/en active Active
- 2011-09-28 AU AU2011314069A patent/AU2011314069B2/en active Active
- 2011-09-28 KR KR1020137010922A patent/KR102106293B1/ko active Active
- 2011-09-28 CA CA2812947A patent/CA2812947C/en active Active
- 2011-09-28 WO PCT/US2011/053751 patent/WO2012050916A2/en not_active Ceased
- 2011-09-28 MX MX2013003437A patent/MX2013003437A/es active IP Right Grant
- 2011-09-28 CN CN201180051962.4A patent/CN103415338B/zh active Active
-
2015
- 2015-01-30 US US14/609,757 patent/US9865448B2/en active Active
- 2015-07-27 AU AU2015206251A patent/AU2015206251B2/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5142547A (en) * | 1988-04-25 | 1992-08-25 | Siemens Aktiengesellschaft | Device for pre-ionization in discharge-pumped gas lasers, in particular for x-ray pre-ionization |
| RU2120152C1 (ru) * | 1996-12-16 | 1998-10-10 | Общество с ограниченной ответственностью "Микроэлектронные системы" - ООО "МИКС" | Газоразрядная лампа |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013541816A (ja) | 2013-11-14 |
| CN110459460B (zh) | 2023-03-21 |
| JP6096118B2 (ja) | 2017-03-15 |
| WO2012050916A2 (en) | 2012-04-19 |
| US8946662B2 (en) | 2015-02-03 |
| EP2622623A4 (en) | 2016-08-31 |
| WO2012050916A3 (en) | 2012-07-19 |
| AU2015206251B2 (en) | 2017-03-02 |
| CA3123418A1 (en) | 2012-04-19 |
| AU2011314069A1 (en) | 2013-05-02 |
| KR20140038340A (ko) | 2014-03-28 |
| RU2013118110A (ru) | 2014-11-10 |
| EP2622623A2 (en) | 2013-08-07 |
| AU2011314069B2 (en) | 2015-04-30 |
| KR102106293B1 (ko) | 2020-06-02 |
| AU2015206251A1 (en) | 2015-08-20 |
| CN103415338A (zh) | 2013-11-27 |
| CA2812947C (en) | 2021-06-29 |
| CA2812947A1 (en) | 2012-04-19 |
| US9865448B2 (en) | 2018-01-09 |
| MX2013003437A (es) | 2014-02-27 |
| CN103415338B (zh) | 2019-09-10 |
| CN110459460A (zh) | 2019-11-15 |
| CA3123418C (en) | 2023-10-10 |
| US20130175454A1 (en) | 2013-07-11 |
| US20150136999A1 (en) | 2015-05-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| RU2592538C2 (ru) | Эксимерный источник света | |
| JPH04229671A (ja) | 高出力ビーム発生装置 | |
| CN103959431A (zh) | 准分子灯 | |
| JP2009542437A (ja) | 放射線源及び冷却手段を含む流体処理システム | |
| US6858988B1 (en) | Electrodeless excimer UV lamp | |
| US7855492B2 (en) | Lamp holder for a dielectric barrier discharge lamp | |
| JP5244398B2 (ja) | セグメント化された誘電バリア放電ランプ | |
| RU2236060C1 (ru) | Газоразрядный источник ультрафиолетового излучения | |
| JP7346687B2 (ja) | 放電ランプおよびオゾン生成方法 | |
| US20080284335A1 (en) | Discharge lamp | |
| KR100783207B1 (ko) | 외부 전극들을 포함하는 유전체 배리어 방전 램프 및그러한 램프를 구비하는 조명 장치 | |
| JP7615466B2 (ja) | 紫外線照射装置 | |
| US9334177B1 (en) | Coreless transformer UV light source system | |
| RU2291516C2 (ru) | Лампа вакуумная ультрафиолетового диапазона спектра | |
| RU2559806C1 (ru) | Источник излучения | |
| JP3660057B2 (ja) | 流体処理装置 | |
| KR100268706B1 (ko) | 유전체 배리어 방전램프 | |
| KR200288954Y1 (ko) | 오존발생장치 | |
| EP3648144A1 (en) | Vacuum ultraviolet excimer lamp with uv fluorescent coating | |
| JPH10106506A (ja) | 無電極放電ランプ装置、無電極放電ランプ点灯装置及び流体処理装置 |