JP2013522445A5 - - Google Patents

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Publication number
JP2013522445A5
JP2013522445A5 JP2013501267A JP2013501267A JP2013522445A5 JP 2013522445 A5 JP2013522445 A5 JP 2013522445A5 JP 2013501267 A JP2013501267 A JP 2013501267A JP 2013501267 A JP2013501267 A JP 2013501267A JP 2013522445 A5 JP2013522445 A5 JP 2013522445A5
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Japan
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group
alkyl
independently
residue
divalent
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JP2013501267A
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Japanese (ja)
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JP5955832B2 (ja
JP2013522445A (ja
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Priority claimed from PCT/US2011/025153 external-priority patent/WO2011119272A2/en
Publication of JP2013522445A publication Critical patent/JP2013522445A/ja
Publication of JP2013522445A5 publication Critical patent/JP2013522445A5/ja
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Publication of JP5955832B2 publication Critical patent/JP5955832B2/ja
Expired - Fee Related legal-status Critical Current
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JP2013501267A 2010-03-22 2011-02-17 マクロ光開始剤およびそれらの硬化性組成物 Expired - Fee Related JP5955832B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US31619010P 2010-03-22 2010-03-22
US61/316,190 2010-03-22
PCT/US2011/025153 WO2011119272A2 (en) 2010-03-22 2011-02-17 Macro-photoinitiators and curable compositions thereof

Publications (3)

Publication Number Publication Date
JP2013522445A JP2013522445A (ja) 2013-06-13
JP2013522445A5 true JP2013522445A5 (US20040106767A1-20040603-C00005.png) 2014-06-26
JP5955832B2 JP5955832B2 (ja) 2016-07-20

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ID=44673796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013501267A Expired - Fee Related JP5955832B2 (ja) 2010-03-22 2011-02-17 マクロ光開始剤およびそれらの硬化性組成物

Country Status (8)

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US (1) US8748503B2 (US20040106767A1-20040603-C00005.png)
EP (1) EP2550307B1 (US20040106767A1-20040603-C00005.png)
JP (1) JP5955832B2 (US20040106767A1-20040603-C00005.png)
KR (1) KR101437751B1 (US20040106767A1-20040603-C00005.png)
CN (1) CN102770465B (US20040106767A1-20040603-C00005.png)
CA (1) CA2786630C (US20040106767A1-20040603-C00005.png)
ES (1) ES2657710T3 (US20040106767A1-20040603-C00005.png)
WO (1) WO2011119272A2 (US20040106767A1-20040603-C00005.png)

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* Cited by examiner, † Cited by third party
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US9097979B2 (en) 2013-03-13 2015-08-04 Wisconsin Alumni Research Foundation Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
JP6227150B2 (ja) * 2014-08-29 2017-11-08 三菱電機株式会社 半導体装置及び多相用半導体装置
US9587062B2 (en) * 2014-12-15 2017-03-07 Henkel IP & Holding GmbH and Henkel AG & Co. KGaA Photocrosslinkable block copolymers for hot-melt adhesives
WO2016111743A1 (en) * 2015-01-08 2016-07-14 Henkel IP & Holding GmbH Process for preparing high molecular weight polyacrylates having narrow polydispersity indices
US11208527B2 (en) * 2016-04-15 2021-12-28 Beckman Coulter, Inc. Photoactive macromolecules and uses thereof
EP3481872B1 (en) * 2016-07-11 2020-04-08 3M Innovative Properties Company Polymeric material and methods of making using controlled radical initiators
JP6946443B2 (ja) 2017-09-15 2021-10-06 富士フイルム株式会社 組成物、膜、積層体、赤外線透過フィルタ、固体撮像素子および赤外線センサ
KR20210003915A (ko) 2018-05-04 2021-01-12 얼라인 테크널러지, 인크. 고온 석판인쇄-기반 광중합 공정에서 사용하기 위한 경화형 조성물 및 이로부터 가교 중합체를 제조하는 방법
CA3098622A1 (en) * 2018-05-04 2019-11-07 Align Technology, Inc. Polymerizable monomers and method of polymerizing the same
WO2020059509A1 (ja) 2018-09-20 2020-03-26 富士フイルム株式会社 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法
JP7260847B2 (ja) 2019-02-26 2023-04-19 株式会社リコー 活性エネルギー線重合性開始剤、活性エネルギー線重合性組成物、活性エネルギー線重合性インク、インク収容容器、画像形成方法および画像形成装置
JPWO2020262270A1 (US20040106767A1-20040603-C00005.png) 2019-06-27 2020-12-30
WO2021039205A1 (ja) 2019-08-29 2021-03-04 富士フイルム株式会社 組成物、膜、近赤外線カットフィルタ、パターン形成方法、積層体、固体撮像素子、赤外線センサ、画像表示装置、カメラモジュール、及び、化合物
KR20220035458A (ko) 2019-08-30 2022-03-22 후지필름 가부시키가이샤 조성물, 막, 광학 필터 및 그 제조 방법, 고체 촬상 소자, 적외선 센서, 및, 센서 모듈
CN110981995B (zh) * 2019-12-27 2021-12-07 阜阳欣奕华材料科技有限公司 一种低迁移型光引发剂及其制备方法和应用
WO2021199748A1 (ja) 2020-03-30 2021-10-07 富士フイルム株式会社 組成物、膜及び光センサ
JP7477628B2 (ja) 2020-09-28 2024-05-01 富士フイルム株式会社 積層体の製造方法、アンテナインパッケージの製造方法、及び積層体
CN112430279A (zh) * 2020-11-23 2021-03-02 濮阳展辰新材料有限公司 一种酰化法制备大分子光引发剂的方法及其应用
EP4266094A1 (en) 2020-12-16 2023-10-25 FUJIFILM Corporation Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor
EP4266093A1 (en) 2020-12-17 2023-10-25 FUJIFILM Corporation Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor
EP4310556A1 (en) 2021-03-19 2024-01-24 FUJIFILM Corporation Film and photosensor
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
EP4318057A1 (en) 2021-03-29 2024-02-07 FUJIFILM Corporation Black photosensitive composition, manufacturing method of black photosensitive composition, cured film, color filter, light-shielding film, optical element, solid-state image capturing element, and headlight unit
JP7259141B1 (ja) 2021-08-31 2023-04-17 富士フイルム株式会社 硬化物の製造方法、積層体の製造方法、及び、半導体デバイスの製造方法、並びに、処理液
JPWO2023054142A1 (US20040106767A1-20040603-C00005.png) 2021-09-29 2023-04-06
WO2023120037A1 (ja) 2021-12-23 2023-06-29 富士フイルム株式会社 接合体の製造方法、接合体、積層体の製造方法、積層体、デバイスの製造方法、及び、デバイス、並びに、ポリイミド含有前駆体部形成用組成物

Family Cites Families (7)

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IE45626B1 (en) 1976-07-14 1982-10-20 Loctite Ltd Filled cyanoacrylate adhesive compositions
IE45111B1 (en) 1976-07-14 1982-06-30 Loctite Ltd Cyanoacrylate adhesive paste compositions
EP1086145B1 (en) * 1998-05-29 2004-05-12 Ciba SC Holding AG Photoinitiators and their applications
US6673850B1 (en) 1999-05-10 2004-01-06 Ciba Specialty Chemicals Corporation Photoinitiators and their applications
CN1324081C (zh) * 2002-07-03 2007-07-04 宝洁公司 辐射固化性低应力弛豫弹性体材料
JP2009209275A (ja) * 2008-03-05 2009-09-17 Fujifilm Corp 光硬化性コーティング組成物、オーバープリント及びその製造方法
US9243083B2 (en) * 2008-04-03 2016-01-26 Henkel IP & Holding GmbH Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications

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