JP2013514387A - エポキシ化始動工程 - Google Patents
エポキシ化始動工程 Download PDFInfo
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- JP2013514387A JP2013514387A JP2012544826A JP2012544826A JP2013514387A JP 2013514387 A JP2013514387 A JP 2013514387A JP 2012544826 A JP2012544826 A JP 2012544826A JP 2012544826 A JP2012544826 A JP 2012544826A JP 2013514387 A JP2013514387 A JP 2013514387A
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- Prior art keywords
- ethylene
- temperature
- catalyst
- epoxidation
- moderator
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/02—Synthesis of the oxirane ring
- C07D301/03—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
- C07D301/04—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with air or molecular oxygen
- C07D301/08—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with air or molecular oxygen in the gaseous phase
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C11/00—Aliphatic unsaturated hydrocarbons
- C07C11/02—Alkenes
- C07C11/04—Ethylene
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D301/00—Preparation of oxiranes
- C07D301/02—Synthesis of the oxirane ring
- C07D301/03—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds
- C07D301/04—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with air or molecular oxygen
- C07D301/08—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with air or molecular oxygen in the gaseous phase
- C07D301/10—Synthesis of the oxirane ring by oxidation of unsaturated compounds, or of mixtures of unsaturated and saturated compounds with air or molecular oxygen in the gaseous phase with catalysts containing silver or gold
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/04—Compounds containing oxirane rings containing only hydrogen and carbon atoms in addition to the ring oxygen atoms
Abstract
【解決手段】エポキシ化触媒の存在下でエチレンと酸素を含む供給ガス組成物を約180℃〜約210℃の温度で反応させることによりエポキシ化反応を開始し、約0.05ppm〜約2ppmの減速材を前記供給ガス組成物に添加し、約12時間〜約60時間にわたって第1の温度を約240℃〜約250℃の第2の温度に昇温し、及び、約50時間〜約150時間の間前記第2の温度を維持する工程を含む。
Description
銀系エポキシ化触媒は、担体及び少なくとも触媒有効量の銀又は銀含有化合物を含み、必要に応じて促進量のレニウム又はレニウム含有化合物、また必要に応じて促進量の1つ以上のアルカリ金属又はアルカリ金属含有化合物を含む。本発明で使用される担体は、多数の固体で耐火性の担体から選択することができ、多孔質でもよく、好適な細孔構造を有してもよい。アルミナは、オレフィンのエポキシ化用触媒担体として有用であることが周知であり、好適な担体である。担体は、α−アルミナ、炭、軽石、マグネシア、ジルコニア、チタニア、珪藻土、酸性白土、炭化ケイ素、シリカ、炭化ケイ素、粘土類、人工ゼオライト、天然ゼオライト、二酸化ケイ素及び/又は二酸化チタン、セラミック類等の材料及びその組み合わせから構成されてもよい。担体は、少なくとも約95wt%のα−アルミナ、好ましくは少なくとも約98wt%のα−アルミナを含んでもよい。残余成分は、シリカ、アルカリ金属酸化物(例えば、酸化ナトリウム)及び、微量のその他の金属含有又は非金属含有添加剤又は不純物等の、α−アルミナ以外の無機酸化物を含んでもよい。
エポキシ化工程は、前述の本発明により生成される触媒の存在下で、酸素含有ガスとオレフィン、好ましくはエチレンを連続的に接触させることにより行うことができる。酸素は、ほぼ純粋な分子形態又は空気等の混合物として反応用に供給することができる。一例として、反応体供給混合物は、約0.5%〜約45%のエチレンと約3%〜約15%の酸素を含み、残部は二酸化炭素、水、不活性ガス類、他の炭化水素類及び本明細書に記載される反応減速材等の物質を含む比較的不活性な材料からなる。不活性ガスの非限定的な例は、窒素、アルゴン、ヘリウム及びその混合物を含むものでもよい。他の炭化水素類の非限定的な例は、メタン、エタン、プロパン及びその混合物を含む。二酸化炭素と水は、エポキシ化工程の副生成物であるとともに、供給ガスの一般的な不純物である。どちらも触媒に悪影響を与えるため、これらの成分の濃度は通常最小限に維持される。
以下の非限定的実施例に関連して、本発明を更に詳細に説明する。
Claims (13)
- エポキシ化触媒の存在下でエチレンと酸素を含む供給ガス組成物を約180℃〜約210℃の温度で反応させることによりエポキシ化反応を開始し、
約0.05ppm〜約2ppmの減速材を前記供給ガス組成物に添加し、
約12時間〜約60時間にわたって前記第1の温度を約240℃〜約250℃の第2の温度に昇温し、及び
約50時間〜約150時間の間前記第2の温度を維持する工程からなることを特徴とするエチレンのエポキシ化工程の始動方法。 - 前記減速材は、約0.5ppm〜約1ppmの濃度で存在する請求項1記載の方法。
- 前記減速材は、有機ハロゲン化合物である請求項1記載の方法。
- 前記減速材は、C1〜C8のハロゲン化炭化水素類のみからなる群から選択される請求項1記載の方法。
- 前記減速材は、塩化メチル、塩化エチル、二塩化エチレン及び塩化ビニルのみからなる群より選ばれる請求項1記載の方法。
- 前記減速材は、二原子塩素及び過ハロゲン化炭化水素類のみからなる群から選択される請求項1記載の方法。
- 前記開始工程の間、前記供給ガス組成物が約1%〜約4%のエチレンと約0.3%〜0.5%の酸素を含む請求項1記載の方法。
- 前記開始工程の間、前記供給ガス組成物が約4%〜約20%のエチレンと約3%〜約5%の酸素を含む請求項1記載の方法。
- 前記第2の温度は約245℃である請求項1記載の方法。
- 前記維持工程の間、酸化エチレンの変化ΔEOは約2.0%を超える請求項1記載の方法。
- 前記維持工程の間、酸化エチレンの変化ΔEOは約2.0%〜約4%である請求項1記載の方法。
- 前記維持工程の間、酸化エチレン生成レベルが、フル生成レベルに相当するレベルに達する請求項1記載の方法。
- 前記維持工程の間の選択性が、約85%〜約90%である請求項1記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US28739309P | 2009-12-17 | 2009-12-17 | |
US61/287,393 | 2009-12-17 | ||
PCT/US2010/060769 WO2011084600A2 (en) | 2009-12-17 | 2010-12-16 | Process for epoxidation start-up |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013514387A true JP2013514387A (ja) | 2013-04-25 |
JP5946772B2 JP5946772B2 (ja) | 2016-07-06 |
Family
ID=44152004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012544826A Expired - Fee Related JP5946772B2 (ja) | 2009-12-17 | 2010-12-16 | エポキシ化始動工程 |
Country Status (13)
Country | Link |
---|---|
US (1) | US8530682B2 (ja) |
EP (2) | EP2778157A1 (ja) |
JP (1) | JP5946772B2 (ja) |
KR (1) | KR101790254B1 (ja) |
CN (1) | CN102666514B (ja) |
BR (1) | BR112012014695A2 (ja) |
CA (1) | CA2783604C (ja) |
IN (1) | IN2012DN05178A (ja) |
MX (1) | MX2012007043A (ja) |
MY (1) | MY157612A (ja) |
RU (1) | RU2542978C2 (ja) |
TW (1) | TWI485141B (ja) |
WO (1) | WO2011084600A2 (ja) |
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CN103547365B (zh) | 2011-04-11 | 2016-03-16 | 陶氏技术投资有限责任公司 | 调节高效环氧乙烷催化剂的方法 |
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US9221776B2 (en) | 2013-12-23 | 2015-12-29 | Scientific Design Company, Inc. | Epoxidation process |
WO2015102992A1 (en) | 2013-12-31 | 2015-07-09 | Saint-Gobain Abrasives, Inc. | Abrasive article including shaped abrasive particles |
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CN106457522B (zh) | 2014-04-14 | 2020-03-24 | 圣戈本陶瓷及塑料股份有限公司 | 包括成形磨粒的研磨制品 |
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KR102313436B1 (ko) | 2016-05-10 | 2021-10-19 | 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 | 연마 입자들 및 그 형성 방법 |
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US11230653B2 (en) | 2016-09-29 | 2022-01-25 | Saint-Gobain Abrasives, Inc. | Fixed abrasive articles and methods of forming same |
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- 2010-12-16 TW TW099144226A patent/TWI485141B/zh not_active IP Right Cessation
- 2010-12-16 KR KR1020127018627A patent/KR101790254B1/ko active IP Right Grant
- 2010-12-16 US US12/970,392 patent/US8530682B2/en active Active
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- 2010-12-16 JP JP2012544826A patent/JP5946772B2/ja not_active Expired - Fee Related
- 2010-12-16 RU RU2012130065/04A patent/RU2542978C2/ru not_active IP Right Cessation
- 2010-12-16 BR BR112012014695A patent/BR112012014695A2/pt not_active IP Right Cessation
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- 2010-12-16 WO PCT/US2010/060769 patent/WO2011084600A2/en active Application Filing
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Also Published As
Publication number | Publication date |
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BR112012014695A2 (pt) | 2015-09-15 |
WO2011084600A3 (en) | 2011-11-17 |
EP2778157A1 (en) | 2014-09-17 |
EP2513077A4 (en) | 2013-05-22 |
CA2783604A1 (en) | 2011-07-14 |
CN102666514A (zh) | 2012-09-12 |
EP2513077B1 (en) | 2014-06-11 |
TW201136906A (en) | 2011-11-01 |
US8530682B2 (en) | 2013-09-10 |
MX2012007043A (es) | 2012-07-20 |
CN102666514B (zh) | 2015-11-25 |
US20110152548A1 (en) | 2011-06-23 |
WO2011084600A2 (en) | 2011-07-14 |
CA2783604C (en) | 2018-05-01 |
RU2542978C2 (ru) | 2015-02-27 |
IN2012DN05178A (ja) | 2015-10-23 |
MY157612A (en) | 2016-06-30 |
EP2513077A2 (en) | 2012-10-24 |
KR20120106809A (ko) | 2012-09-26 |
KR101790254B1 (ko) | 2017-10-26 |
TWI485141B (zh) | 2015-05-21 |
JP5946772B2 (ja) | 2016-07-06 |
RU2012130065A (ru) | 2014-01-27 |
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