JP2013512306A - ＣＺＴＳ／Ｓｅ前駆体インクとＣＺＴＳ／Ｓｅ薄フィルムおよびＣＺＴＳ／Ｓｅ系光電池の製造方法 - Google Patents

ＣＺＴＳ／Ｓｅ前駆体インクとＣＺＴＳ／Ｓｅ薄フィルムおよびＣＺＴＳ／Ｓｅ系光電池の製造方法 Download PDF

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JP2013512306A
JP2013512306A JP2012541070A JP2012541070A JP2013512306A JP 2013512306 A JP2013512306 A JP 2013512306A JP 2012541070 A JP2012541070 A JP 2012541070A JP 2012541070 A JP2012541070 A JP 2012541070A JP 2013512306 A JP2013512306 A JP 2013512306A
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coated
czts
substrate
nanoparticles
composition
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JP2013512306A5 (enExample
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ヤンヤン ツァオ
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EIDP Inc
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EI Du Pont de Nemours and Co
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02587—Structure
    • H01L21/0259—Microstructure
    • H01L21/02601—Nanoparticles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02623—Liquid deposition
    • H01L21/02628—Liquid deposition using solutions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H10F77/128—Active materials comprising only Group I-II-IV-VI kesterite materials, e.g. Cu2ZnSnSe4 or Cu2ZnSnS4
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Photovoltaic Devices (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
JP2012541070A 2009-11-25 2010-05-21 ＣＺＴＳ／Ｓｅ前駆体インクとＣＺＴＳ／Ｓｅ薄フィルムおよびＣＺＴＳ／Ｓｅ系光電池の製造方法 Pending JP2013512306A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US26436209P 2009-11-25 2009-11-25
US61/264,362 2009-11-25
PCT/US2010/035792 WO2011065994A2 (en) 2009-11-25 2010-05-21 CZTS/Se PRECURSOR INKS AND METHODS FOR PREPARING CZTS/Se THIN FILMS AND CZTS/Se-BASED PHOTOVOLTAIC CELLS

Publications (2)

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JP2013512306A true JP2013512306A (ja) 2013-04-11
JP2013512306A5 JP2013512306A5 (enExample) 2013-05-30

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JP2012541070A Pending JP2013512306A (ja) 2009-11-25 2010-05-21 ＣＺＴＳ／Ｓｅ前駆体インクとＣＺＴＳ／Ｓｅ薄フィルムおよびＣＺＴＳ／Ｓｅ系光電池の製造方法

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US (1) US20120220066A1 (enExample)
EP (1) EP2504854A2 (enExample)
JP (1) JP2013512306A (enExample)
KR (1) KR20120085331A (enExample)
CN (1) CN102668021A (enExample)
WO (1) WO2011065994A2 (enExample)

Cited By (5)

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KR20150030598A (ko) * 2013-09-12 2015-03-20 주식회사 엘지화학 태양전지 광흡수층 제조용 금속 칼코게나이드 나노 입자 및 이의 제조방법
JP2016527708A (ja) * 2013-08-01 2016-09-08 エルジー・ケム・リミテッド 太陽電池の光吸収層製造用金属カルコゲナイドナノ粒子及びその製造方法
JP2016528718A (ja) * 2013-08-01 2016-09-15 エルジー・ケム・リミテッド 太陽電池光吸収層製造用３層コア−シェルナノ粒子及びその製造方法
JP2016529690A (ja) * 2013-08-01 2016-09-23 エルジー・ケム・リミテッド 太陽電池の光吸収層製造用インク組成物及びこれを使用した薄膜の製造方法
JP2017502173A (ja) * 2013-12-12 2017-01-19 エレクトリシテ・ドゥ・フランス モルホリン浴、及び層を化学的に析出させるための方法

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US8366975B2 (en) * 2010-05-21 2013-02-05 E I Du Pont De Nemours And Company Atypical kesterite compositions
US8778724B2 (en) * 2010-09-24 2014-07-15 Ut-Battelle, Llc High volume method of making low-cost, lightweight solar materials
US8771555B2 (en) * 2011-05-06 2014-07-08 Neo Solar Power Corp. Ink composition
CN102344166B (zh) * 2011-07-04 2013-06-05 东华大学 一种Cu2ZnSnS4太阳能吸收层材料的制备方法
US20130074911A1 (en) * 2011-09-23 2013-03-28 Yueh-Chun Liao Photovoltaic Device Including a CZTS Absorber Layer and Method of Manufacturing the Same
US9666747B2 (en) 2011-11-30 2017-05-30 Konica Minolta Laboratory U.S.A., Inc. Method of manufacturing a photovoltaic device
KR101300791B1 (ko) * 2011-12-15 2013-08-29 한국생산기술연구원 전자빔 조사를 이용한 몰리브덴 박막의 전도도 향상 방법
US9346686B2 (en) 2011-12-22 2016-05-24 The University Of Western Ontario Copper-containing nanocrystals and methods of preparation therefor
US8673260B2 (en) * 2012-01-04 2014-03-18 Franklin And Marshall College Development of earth-abundant mixed-metal sulfide nanoparticles for use in solar energy conversion
CN102614897A (zh) * 2012-03-12 2012-08-01 中国科学院福建物质结构研究所 一种提高硫化锌材料光催化活性的退火处理方法
EP2647675A2 (en) * 2012-04-02 2013-10-09 Neo Solar Power Corp. Method for forming an ink
EP2647595A2 (en) * 2012-04-03 2013-10-09 Neo Solar Power Corp. Ink composition, chalcogenide semiconductor film, photovoltaic device and methods for forming the same
US20150118144A1 (en) * 2012-05-14 2015-04-30 E I Du Pont Nemours And Company Dispersible metal chalcogenide nanoparticles
US8598560B1 (en) 2012-07-12 2013-12-03 Micron Technology, Inc. Resistive memory elements exhibiting increased interfacial adhesion strength, methods of forming the same, and related resistive memory cells and memory devices
CN102856398A (zh) * 2012-07-25 2013-01-02 中国科学技术大学 铜锌锡硒太阳能电池及其制造方法
FR2993792B1 (fr) * 2012-07-26 2017-09-15 Imra Europe Sas Film de chalcogenure(s) metallique(s) cristallise(s) a gros grains, solution colloidale de particules amorphes et procedes de preparation.
KR101388451B1 (ko) * 2012-08-10 2014-04-24 한국에너지기술연구원 탄소층이 감소한 ｃｉ(ｇ)ｓ계 박막의 제조방법, 이에 의해 제조된 박막 및 이를 포함하는 태양전지
US8741386B2 (en) 2012-09-28 2014-06-03 Uchicago Argonne, Llc Atomic layer deposition of quaternary chalcogenides
US20140117293A1 (en) * 2012-10-29 2014-05-01 Tokyo Ohka Kogyo Co., Ltd. Coating solution for forming light-absorbing layer, and method of producing coating solution for forming light-absorbing layer
FR3001467B1 (fr) * 2013-01-29 2016-05-13 Imra Europe Sas Procede de preparation de couche mince d'absorbeur a base de sulfure(s) de cuivre, zinc et etain, couche mince recuite et dispositif photovoltaique obtenu
CN105164047B (zh) * 2013-03-15 2019-03-15 纳米技术有限公司 Cu2ZnSnS4纳米粒子
KR101449576B1 (ko) * 2013-04-04 2014-10-16 한국에너지기술연구원 비진공 방식에 의한 ｃｚｔｓ계 광흡수층 제조방법
CN103194739B (zh) * 2013-04-22 2015-04-22 青岛科技大学 一种铜锌锡硫薄膜的水热合成制备方法
CN103346201B (zh) * 2013-05-24 2016-11-23 徐东 掺锗的铜锌锡硫硒薄膜制备方法、薄膜及太阳能电池
CN103337551B (zh) * 2013-05-28 2015-12-23 湘潭大学 一种不含碳层的CZTS或者CZTSe薄膜的非真空制备方法
US9893220B2 (en) * 2013-10-15 2018-02-13 Nanoco Technologies Ltd. CIGS nanoparticle ink formulation having a high crack-free limit
KR101583026B1 (ko) * 2013-10-31 2016-01-08 재단법인대구경북과학기술원 Ｃｚｔｓ계 태양전지용 박막의 제조방법
CN103714973B (zh) * 2013-12-26 2016-08-31 中国矿业大学 一种光电化学太阳能电池用Cu3SnS4/Cu2SnSe3复合光阴极及其制备方法
CN104761956B (zh) * 2014-01-03 2017-07-18 中国科学院苏州纳米技术与纳米仿生研究所 纳米硒化铜导电墨水、其制备方法及应用
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WO2016040690A1 (en) * 2014-09-12 2016-03-17 The Regents Of The University Of California High performance thin films from solution processible two-dimensional nanoplates
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WO2016072654A2 (ko) * 2014-11-05 2016-05-12 주식회사 엘지화학 태양전지 광흡수층 제조용 전구체 및 이의 제조방법
CN104451597B (zh) * 2014-11-19 2017-08-11 上海纳米技术及应用国家工程研究中心有限公司 一种固体润滑ZnS薄膜的制备方法
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US10217888B2 (en) * 2016-10-06 2019-02-26 International Business Machines Corporation Solution-phase inclusion of silver into chalcogenide semiconductor inks
CN109148625A (zh) * 2018-05-17 2019-01-04 中国科学院物理研究所 铜锌锡硫硒薄膜太阳能电池及其制备方法
CN109678123A (zh) * 2018-11-30 2019-04-26 中国科学院物理研究所 铜锌锡硫硒薄膜太阳能电池及其前驱体溶液制备方法
CN109659356B (zh) * 2018-12-18 2021-08-27 河南师范大学 基于硒化铜单层的具有负微分电阻和开关作用的纳米器件
CN110639555A (zh) * 2019-10-09 2020-01-03 长春工业大学 一种可见光响应的CdS/CdIn2S4复合纳米结构光催化剂的制备方法及应用
CN114388660A (zh) * 2022-01-13 2022-04-22 黑龙江工业学院 一种降低CZTSSe薄膜中小晶粒层的方法

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Cited By (7)

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JP2016527708A (ja) * 2013-08-01 2016-09-08 エルジー・ケム・リミテッド 太陽電池の光吸収層製造用金属カルコゲナイドナノ粒子及びその製造方法
JP2016528718A (ja) * 2013-08-01 2016-09-15 エルジー・ケム・リミテッド 太陽電池光吸収層製造用３層コア−シェルナノ粒子及びその製造方法
JP2016529690A (ja) * 2013-08-01 2016-09-23 エルジー・ケム・リミテッド 太陽電池の光吸収層製造用インク組成物及びこれを使用した薄膜の製造方法
KR20150030598A (ko) * 2013-09-12 2015-03-20 주식회사 엘지화학 태양전지 광흡수층 제조용 금속 칼코게나이드 나노 입자 및 이의 제조방법
KR101650049B1 (ko) 2013-09-12 2016-08-22 주식회사 엘지화학 태양전지 광흡수층 제조용 금속 칼코게나이드 나노 입자 및 이의 제조방법
JP2016537823A (ja) * 2013-09-12 2016-12-01 エルジー・ケム・リミテッド 太陽電池光吸収層製造用金属カルコゲナイドナノ粒子及びその製造方法
JP2017502173A (ja) * 2013-12-12 2017-01-19 エレクトリシテ・ドゥ・フランス モルホリン浴、及び層を化学的に析出させるための方法

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CN102668021A (zh) 2012-09-12
US20120220066A1 (en) 2012-08-30
KR20120085331A (ko) 2012-07-31
EP2504854A2 (en) 2012-10-03
WO2011065994A3 (en) 2012-01-12
WO2011065994A2 (en) 2011-06-03

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