JP2013510333A5 - - Google Patents
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- JP2013510333A5 JP2013510333A5 JP2012537352A JP2012537352A JP2013510333A5 JP 2013510333 A5 JP2013510333 A5 JP 2013510333A5 JP 2012537352 A JP2012537352 A JP 2012537352A JP 2012537352 A JP2012537352 A JP 2012537352A JP 2013510333 A5 JP2013510333 A5 JP 2013510333A5
- Authority
- JP
- Japan
- Prior art keywords
- writing monomer
- polymer composition
- photosensitive polymer
- exposed
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000178 monomer Substances 0.000 claims description 25
- 229920000642 polymer Polymers 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 20
- 239000011159 matrix material Substances 0.000 claims description 9
- 239000000654 additive Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000003211 photoinitiator Substances 0.000 claims description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 2
- 239000003054 catalyst Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 239000003381 stabilizer Substances 0.000 claims description 2
- 230000000996 additive Effects 0.000 claims 1
- 239000004014 plasticizer Substances 0.000 description 5
- 125000004122 cyclic group Chemical group 0.000 description 4
- 125000000962 organic group Chemical group 0.000 description 4
- 125000005842 heteroatoms Chemical group 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000001264 neutralization Effects 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP20090013771 EP2317511B1 (de) | 2009-11-03 | 2009-11-03 | Photopolymerformulierungen mit einstellbarem mechanischem Modul Guv |
| EP09013771.2 | 2009-11-03 | ||
| PCT/EP2010/066456 WO2011054749A1 (de) | 2009-11-03 | 2010-10-29 | Photopolymerformulierungen mit einstellbarem mechanischem modul guv |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013510333A JP2013510333A (ja) | 2013-03-21 |
| JP2013510333A5 true JP2013510333A5 (ko) | 2013-12-19 |
| JP5886751B2 JP5886751B2 (ja) | 2016-03-16 |
Family
ID=41667267
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012537352A Active JP5886751B2 (ja) | 2009-11-03 | 2010-10-29 | 調節可能な力学的弾性率ｇｕｖを有する感光性ポリマー組成物 |
Country Status (12)
| Country | Link |
|---|---|
| US (2) | US8921012B2 (ko) |
| EP (1) | EP2317511B1 (ko) |
| JP (1) | JP5886751B2 (ko) |
| KR (1) | KR101727352B1 (ko) |
| CN (1) | CN102792377B (ko) |
| AT (1) | ATE548730T1 (ko) |
| BR (1) | BR112012010468A2 (ko) |
| ES (1) | ES2381808T3 (ko) |
| PL (1) | PL2317511T3 (ko) |
| RU (1) | RU2542975C9 (ko) |
| TW (1) | TWI494691B (ko) |
| WO (1) | WO2011054749A1 (ko) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL200996A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Photopolymer formulations having a low crosslinking density |
| US8852829B2 (en) * | 2008-10-01 | 2014-10-07 | Bayer Materialscience Ag | Prepolymer-based polyurethane formulations for producing holographic media |
| EP2218742A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Photopolymerzusammensetzungen als verdruckbare Formulierungen |
| US8808946B2 (en) * | 2009-11-03 | 2014-08-19 | Bayer Materialscience Ag | Urethane acrylate having a high refractive index and reduced double bond density |
| PL2317511T3 (pl) * | 2009-11-03 | 2012-08-31 | Bayer Materialscience Ag | Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv |
| WO2011054796A1 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Auswahlverfahren für additive in photopolymeren |
| JP5638085B2 (ja) * | 2009-11-03 | 2014-12-10 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ | 異なった書込コモノマーを含有する感光性ポリマー組成物 |
| US8771903B2 (en) * | 2009-11-03 | 2014-07-08 | Bayer Materialscience Ag | Method for producing a holographic film |
| TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
| TWI489204B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 製造全像媒體之方法 |
| JP5925686B2 (ja) * | 2009-11-03 | 2016-05-25 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ | ホログラフィックフィルムの製造方法 |
| CN102667934B (zh) * | 2009-11-03 | 2015-09-09 | 拜尔材料科学股份公司 | 作为光聚合物制剂中的添加剂的氟代氨基甲酸酯 |
| CN102754026B (zh) * | 2010-02-02 | 2015-10-07 | 拜耳知识产权有限责任公司 | 具有酯基书写单体的光聚合物制剂 |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| EP2613319A1 (de) * | 2012-01-05 | 2013-07-10 | Bayer MaterialScience AG | Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht |
| US20140302425A1 (en) * | 2012-04-30 | 2014-10-09 | Bayer Intellectual Property Gmbh | Method for producing holographic media |
| JP6437435B2 (ja) | 2012-08-13 | 2018-12-12 | コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ | 出力結合素子を有する導光板 |
| EP2700510B1 (de) * | 2012-08-23 | 2015-09-16 | Bayer MaterialScience AG | Polycarbonatbasierte Sicherheits- und/oder Wertdokumente mit Hologramm im Kartenkörper |
| EP2888116B1 (de) * | 2012-08-23 | 2016-09-21 | Covestro Deutschland AG | Sicherheits- und/oder wertdokument enthaltend ein visuell schaltbares fenster mit einem hologramm |
| CN106232651B (zh) * | 2014-04-25 | 2019-08-13 | 科思创德国股份有限公司 | 作为全息光聚合物组合物中的书写单体的芳族二醇醚 |
| US10241402B2 (en) * | 2014-12-12 | 2019-03-26 | Covestro Deutschland Ag | Naphthyl acrylates as writing monomers for photopolymers |
| CN107223121B (zh) * | 2014-12-19 | 2020-10-27 | 科思创德国股份有限公司 | 湿稳定的全息介质 |
| JP7046811B2 (ja) | 2015-12-22 | 2022-04-04 | コベストロ、ドイチュラント、アクチエンゲゼルシャフト | 基板に誘導される再構成ビームを用いて体積反射ホログラムを工業生産するための装置および方法 |
| US11427656B2 (en) * | 2016-08-30 | 2022-08-30 | Sony Corporation | Photosensitive composition for hologram recording, hologram recording medium, and hologram |
| KR102009421B1 (ko) * | 2017-04-25 | 2019-08-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| TW201906730A (zh) * | 2017-05-09 | 2019-02-16 | 德商科思創德意志股份有限公司 | 用於保護光聚合物膜複合物中之全像圖之含ｕｖ硬化性黏著層的塑膠膜 |
| EP3435156A1 (de) * | 2017-07-26 | 2019-01-30 | Covestro Deutschland AG | Schutzschicht für photopolymer |
| KR102156872B1 (ko) * | 2017-09-27 | 2020-09-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102244648B1 (ko) * | 2017-12-08 | 2021-04-26 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102166846B1 (ko) | 2017-12-11 | 2020-10-16 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| KR102157366B1 (ko) * | 2017-12-15 | 2021-03-29 | 주식회사 엘지화학 | 염료 화합물 및 포토폴리머 조성물 |
| CN108645336B (zh) * | 2018-05-11 | 2020-06-09 | 赣南师范大学 | 一种无参考光数字全息相机及标定方法 |
| KR102228538B1 (ko) | 2018-06-01 | 2021-03-15 | 주식회사 엘지화학 | 염료 화합물 및 포토폴리머 조성물 |
| KR102239212B1 (ko) * | 2018-12-14 | 2021-04-12 | 주식회사 엘지화학 | 포토폴리머 조성물 |
| US11718580B2 (en) | 2019-05-08 | 2023-08-08 | Meta Platforms Technologies, Llc | Fluorene derivatized monomers and polymers for volume Bragg gratings |
| US11137603B2 (en) * | 2019-06-20 | 2021-10-05 | Facebook Technologies, Llc | Surface-relief grating with patterned refractive index modulation |
| US11780819B2 (en) | 2019-11-27 | 2023-10-10 | Meta Platforms Technologies, Llc | Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings |
| US11879024B1 (en) | 2020-07-14 | 2024-01-23 | Meta Platforms Technologies, Llc | Soft mold formulations for surface relief grating fabrication with imprinting lithography |
| US20220153693A1 (en) * | 2020-11-13 | 2022-05-19 | Facebook Technologies, Llc | Substituted mono- and poly-phenyl-core monomers and polymers thereof for volume bragg gratings |
| WO2024052256A1 (de) | 2022-09-07 | 2024-03-14 | Covestro Deutschland Ag | Spezielle benzopyryliumsalze als farbstoffe für photopolymerzusammensetzungen |
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| US8852829B2 (en) * | 2008-10-01 | 2014-10-07 | Bayer Materialscience Ag | Prepolymer-based polyurethane formulations for producing holographic media |
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| IL200995A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Polyether-based polyurethane formulations for the production of holographic media |
| IL200996A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Photopolymer formulations having a low crosslinking density |
| IL200722A0 (en) * | 2008-10-01 | 2010-06-30 | Bayer Materialscience Ag | Photopolymer compositions for optical elements and visual displays |
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| EP2218743A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Prepolymerbasierte Polyurethanformulierungen zur Herstellung holographischer Filme |
| EP2218744A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Methode zur Herstellung von holografischen Photopolymeren auf Polymerfolien |
| EP2218742A1 (de) * | 2009-02-12 | 2010-08-18 | Bayer MaterialScience AG | Photopolymerzusammensetzungen als verdruckbare Formulierungen |
| EP2219073B1 (de) | 2009-02-17 | 2020-06-03 | Covestro Deutschland AG | Holografische Medien und Photopolymerzusammensetzungen |
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| JP5638085B2 (ja) * | 2009-11-03 | 2014-12-10 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ | 異なった書込コモノマーを含有する感光性ポリマー組成物 |
| PL2317511T3 (pl) * | 2009-11-03 | 2012-08-31 | Bayer Materialscience Ag | Formulacje fotopolimerowe z nastawialnym mechanicznym modułem Guv |
| US8771903B2 (en) * | 2009-11-03 | 2014-07-08 | Bayer Materialscience Ag | Method for producing a holographic film |
| WO2011054796A1 (de) * | 2009-11-03 | 2011-05-12 | Bayer Materialscience Ag | Auswahlverfahren für additive in photopolymeren |
| JP5925686B2 (ja) * | 2009-11-03 | 2016-05-25 | バイエル・マテリアルサイエンス・アクチェンゲゼルシャフトＢａｙｅｒ ＭａｔｅｒｉａｌＳｃｉｅｎｃｅ ＡＧ | ホログラフィックフィルムの製造方法 |
| TWI489204B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 製造全像媒體之方法 |
| EP2496549B1 (de) * | 2009-11-03 | 2014-10-08 | Bayer Intellectual Property GmbH | Neue, nicht kristallisierende methacrylate, deren herstellung und verwendung |
| US8808946B2 (en) * | 2009-11-03 | 2014-08-19 | Bayer Materialscience Ag | Urethane acrylate having a high refractive index and reduced double bond density |
| TWI489209B (zh) * | 2009-11-03 | 2015-06-21 | Bayer Materialscience Ag | 在光聚合物配製物中作為添加劑的胺甲酸乙酯 |
| CN102667934B (zh) * | 2009-11-03 | 2015-09-09 | 拜尔材料科学股份公司 | 作为光聚合物制剂中的添加剂的氟代氨基甲酸酯 |
| JP6023592B2 (ja) * | 2010-02-02 | 2016-11-09 | バイエル・インテレクチュアル・プロパティ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングＢａｙｅｒ Ｉｎｔｅｌｌｅｃｔｕａｌ Ｐｒｏｐｅｒｔｙ ＧｍｂＨ | トリアジン系書込モノマー含有感光性ポリマー組成物 |
| CN102754026B (zh) * | 2010-02-02 | 2015-10-07 | 拜耳知识产权有限责任公司 | 具有酯基书写单体的光聚合物制剂 |
| EP2372454A1 (de) * | 2010-03-29 | 2011-10-05 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung sichtbarer Hologramme |
| CN102834773B (zh) * | 2010-04-09 | 2016-04-06 | Hoya株式会社 | 相移掩模坯料及其制造方法、以及相移掩模 |
| TWI541224B (zh) * | 2010-08-11 | 2016-07-11 | 拜耳材料科學股份有限公司 | 雙官能基之（甲基）丙烯酸酯之寫入單體 |
| EP2450387A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung für die Herstellung holographischer Medien |
| EP2450893A1 (de) * | 2010-11-08 | 2012-05-09 | Bayer MaterialScience AG | Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren |
| KR20140082692A (ko) * | 2011-10-12 | 2014-07-02 | 바이엘 인텔렉쳐 프로퍼티 게엠베하 | 폴리우레탄-기재 광중합체 제제에서의 사슬 전달 시약 |
| EP2766902A1 (de) * | 2011-10-12 | 2014-08-20 | Bayer Intellectual Property GmbH | Schwefelhaltige kettenübertragungsreagenzien in polyurethan-basierten photopolymer-formulierungen |
| US9195215B2 (en) * | 2011-11-29 | 2015-11-24 | Bayer Intellectual Property Gmbh | Holographic medium having a protective layer |
| PL2613318T3 (pl) * | 2012-01-05 | 2014-12-31 | Bayer Ip Gmbh | Struktura warstwowa z warstwą ochronną i naświetloną warstwą fotopolimerową |
| EP2613319A1 (de) * | 2012-01-05 | 2013-07-10 | Bayer MaterialScience AG | Schichtverbund aus einem Photopolymerfilm und einer Klebstoffschicht |
| US20140302425A1 (en) * | 2012-04-30 | 2014-10-09 | Bayer Intellectual Property Gmbh | Method for producing holographic media |
| TWI557187B (zh) * | 2012-05-03 | 2016-11-11 | 拜耳材料科學股份有限公司 | 用於光聚合物之新穎光起始劑 |
-
2009
- 2009-11-03 PL PL09013771T patent/PL2317511T3/pl unknown
- 2009-11-03 EP EP20090013771 patent/EP2317511B1/de active Active
- 2009-11-03 AT AT09013771T patent/ATE548730T1/de active
- 2009-11-03 ES ES09013771T patent/ES2381808T3/es active Active
-
2010
- 2010-10-29 CN CN201080060565.9A patent/CN102792377B/zh active Active
- 2010-10-29 RU RU2012122586/04A patent/RU2542975C9/ru not_active IP Right Cessation
- 2010-10-29 WO PCT/EP2010/066456 patent/WO2011054749A1/de active Application Filing
- 2010-10-29 BR BR112012010468A patent/BR112012010468A2/pt not_active IP Right Cessation
- 2010-10-29 US US13/505,501 patent/US8921012B2/en active Active
- 2010-10-29 JP JP2012537352A patent/JP5886751B2/ja active Active
- 2010-10-29 KR KR1020127014344A patent/KR101727352B1/ko active IP Right Grant
- 2010-11-02 TW TW099137568A patent/TWI494691B/zh active
-
2014
- 2014-11-18 US US14/543,963 patent/US9454130B2/en active Active
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