JP2013508999A - 分極抵抗型太陽電池 - Google Patents
分極抵抗型太陽電池 Download PDFInfo
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- 230000010287 polarization Effects 0.000 title abstract description 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 31
- 238000002161 passivation Methods 0.000 claims abstract description 28
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 21
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 21
- 229910052710 silicon Inorganic materials 0.000 claims description 21
- 239000010703 silicon Substances 0.000 claims description 21
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 20
- 239000001301 oxygen Substances 0.000 claims description 20
- 229910052760 oxygen Inorganic materials 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 abstract description 3
- 210000004027 cell Anatomy 0.000 abstract 4
- 239000010410 layer Substances 0.000 description 72
- 230000003667 anti-reflective effect Effects 0.000 description 15
- 238000000034 method Methods 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1868—Passivation
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
Description
本願は、2009年12月24日に出願された米国特許出願第12/647,201号、および2009年10月27日に出願された米国特許仮出願第61/279,842号の恩典を主張し、これらの開示は参照によりその全体が本明細書に組み入れられる。
本発明は、概して、太陽電池に関し、特に、分極抵抗型(polarization resistant)太陽電池設計に関する。
太陽電池と一般的に称される光起電力セルは、光子を電気エネルギーに変換する周知の半導体素子である。図1は、シリコンから構成されることの多い第1の導電型の基板101と、該基板上に形成されて、界面においてpn接合を形成している第2の導電型の層103とを含む、従来の太陽電池100の断面図を示す。太陽電池100はまた、基板101の少なくとも一部と接触している裏面電極105、および層103の少なくとも一部と接触している表面電極107も含む。太陽電池100に光が当たると、電子正孔対が作られ、太陽電池により電気エネルギーに変換される。
本発明は、電池の表面上に配置された二重層誘電体スタックを使用する、分極効果に抵抗する太陽電池を提供する。誘電体スタックは、電池表面に直接配置され、SiOxまたはSiONのいずれかから構成されたパッシベーション層、およびSiCNから構成される外部ARコーティングからなる。本発明の性質および利点をさらに理解することは、本明細書の残りの部分および図面を参照することにより実現され得る。
以下の本発明の詳細な説明においては、本明細書の一部を形成し、本発明が実施され得る特定の態様を例示的に示す添付の図面を参照する。これらの態様は、当業者が本発明を実施するのに十分な程度に詳細に記載されている。他の態様を利用してもよく、構造的、論理的、および電気的な変更が行われ得る。
A.第1の導電型のシリコンから構成される基板と、
該基板上に配置された第2の導電型のシリコンの層と、
該シリコンの層の上に配置され、酸化シリコンおよび酸窒化シリコンからなる群より選択される、パッシベーション層と、
該パッシベーション層上に配置され、炭窒化シリコン(SiCN)から構成される反射防止(AR)層と
を含む、太陽電池。
B.前記パッシベーション層が1〜100ナノメートルの厚みを有する、前記例のいずれか一つに記載の太陽電池。
C.前記パッシベーション層が1〜50ナノメートルの厚みを有する、前記例A〜Bのいずれか一つに記載の太陽電池。
D.前記パッシベーション層が2〜30ナノメートルの厚みを有する、前記例A〜Cのいずれか一つに記載の太陽電池。
E.前記AR層が1〜200ナノメートルの厚みを有する、前記例A〜Dのいずれか一つに記載の太陽電池。
F.前記AR層が20〜120ナノメートルの厚みを有する、前記例A〜Eのいずれか一つに記載の太陽電池。
G.前記AR層が40〜100ナノメートルの厚みを有する、前記例A〜Fのいずれか一つに記載の太陽電池。
H.前記パッシベーション層および前記AR層から構成される誘電体スタックが1.5〜2.4の範囲の屈折率を有する、前記例A〜Gのいずれか一つに記載の太陽電池。
I.前記パッシベーション層が前記SiONから構成され、該SiON層内の酸素および窒素の合計に対する該SiON層内の酸素の比率が0.01〜0.99の範囲内にある、前記例A〜Hのいずれか一つに記載の太陽電池。
J.前記パッシベーション層が前記SiONから構成され、該SiON層内の酸素および窒素の合計に対する該SiON層内の酸素の比率が0.1〜0.9の範囲にある、前記例A〜Iのいずれか一つに記載の太陽電池。
K.前記パッシベーション層が前記SiONから構成され、該SiON層内の酸素および窒素の合計に対する該SiON層内の酸素の比率が0.4〜0.9の範囲にある、前記例A〜Jのいずれか一つに記載の太陽電池。
L.前記AR層が水素化されている、前記例A〜Kのいずれか一つに記載の太陽電池。
M.前記基板の裏面に形成された第1の金属電極、および前記の第2の導電型の前記シリコン層と接触した第2の金属電極をさらに含む、前記例A〜Lのいずれか一つに記載の太陽電池。
Claims (13)
- 第1の導電型のシリコンから構成される基板と、
該基板上に配置された第2の導電型のシリコンの層と、
該シリコンの層の上に配置され、酸化シリコンおよび酸窒化シリコンからなる群より選択される、パッシベーション層と、
該パッシベーション層上に配置され、炭窒化シリコン(SiCN)から構成される反射防止(AR)層と
を含む、太陽電池。 - 前記パッシベーション層が1〜100ナノメートルの厚みを有する、前記請求項のいずれか一項記載の太陽電池。
- 前記パッシベーション層が1〜50ナノメートルの厚みを有する、前記請求項のいずれか一項記載の太陽電池。
- 前記パッシベーション層が2〜30ナノメートルの厚みを有する、前記請求項のいずれか一項記載の太陽電池。
- 前記AR層が1〜200ナノメートルの厚みを有する、前記請求項のいずれか一項記載の太陽電池。
- 前記AR層が20〜120ナノメートルの厚みを有する、前記請求項のいずれか一項記載の太陽電池。
- 前記AR層が40〜100ナノメートルの厚みを有する、前記請求項のいずれか一項記載の太陽電池。
- 前記パッシベーション層および前記AR層から構成される誘電体スタックが1.5〜2.4の範囲の屈折率を有する、前記請求項のいずれか一項記載の太陽電池。
- 前記パッシベーション層が前記SiONから構成され、該SiON層内の酸素および窒素の合計に対する該SiON層内の酸素の比率が0.01〜0.99の範囲内にある、前記請求項のいずれか一項記載の太陽電池。
- 前記パッシベーション層が前記SiONから構成され、該SiON層内の酸素および窒素の合計に対する該SiON層内の酸素の比率が0.1〜0.9の範囲にある、前記請求項のいずれか一項記載の太陽電池。
- 前記パッシベーション層が前記SiONから構成され、該SiON層内の酸素および窒素の合計に対する該SiON層内の酸素の比率が0.4〜0.9の範囲にある、前記請求項のいずれか一項記載の太陽電池。
- 前記AR層が水素化されている、前記請求項のいずれか一項記載の太陽電池。
- 前記基板の裏面に形成された第1の金属電極、および前記の第2の導電型の前記シリコン層と接触した第2の金属電極をさらに含む、前記請求項のいずれか一項記載の太陽電池。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US27984209P | 2009-10-27 | 2009-10-27 | |
US61/279,842 | 2009-10-27 | ||
US12/647,201 | 2009-12-24 | ||
US12/647,201 US20110094574A1 (en) | 2009-10-27 | 2009-12-24 | Polarization Resistant Solar Cell Design Using SiCN |
PCT/US2010/002845 WO2011056201A2 (en) | 2009-10-27 | 2010-10-27 | Polarization resistant solar cell |
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JP2013508999A true JP2013508999A (ja) | 2013-03-07 |
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JP2012536791A Pending JP2013508999A (ja) | 2009-10-27 | 2010-10-27 | 分極抵抗型太陽電池 |
JP2012536790A Pending JP2013508998A (ja) | 2009-10-27 | 2010-10-27 | 酸素富化界面を有する分極抵抗型太陽電池 |
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US (2) | US9166071B2 (ja) |
EP (2) | EP2494607B1 (ja) |
JP (2) | JP2013508999A (ja) |
KR (2) | KR20120087944A (ja) |
CN (2) | CN102668103A (ja) |
BR (2) | BR112012009877A2 (ja) |
TW (2) | TW201125136A (ja) |
WO (2) | WO2011056201A2 (ja) |
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KR101846444B1 (ko) * | 2017-01-13 | 2018-04-06 | 엘지전자 주식회사 | 태양 전지 |
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WO2011056200A3 (en) | 2011-08-11 |
US9166071B2 (en) | 2015-10-20 |
KR20120087946A (ko) | 2012-08-07 |
KR20120087944A (ko) | 2012-08-07 |
TW201125137A (en) | 2011-07-16 |
EP2494607B1 (en) | 2015-07-01 |
US20110094575A1 (en) | 2011-04-28 |
WO2011056201A2 (en) | 2011-05-12 |
BR112012009877A2 (pt) | 2016-08-09 |
EP2494607A2 (en) | 2012-09-05 |
JP2013508998A (ja) | 2013-03-07 |
CN102668103A (zh) | 2012-09-12 |
TW201125136A (en) | 2011-07-16 |
US20110094574A1 (en) | 2011-04-28 |
BR112012009883A2 (pt) | 2018-03-20 |
WO2011056200A2 (en) | 2011-05-12 |
CN102668102A (zh) | 2012-09-12 |
WO2011056201A3 (en) | 2011-08-11 |
EP2494606A2 (en) | 2012-09-05 |
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