JP2013501375A5 - - Google Patents

Download PDF

Info

Publication number
JP2013501375A5
JP2013501375A5 JP2012523602A JP2012523602A JP2013501375A5 JP 2013501375 A5 JP2013501375 A5 JP 2013501375A5 JP 2012523602 A JP2012523602 A JP 2012523602A JP 2012523602 A JP2012523602 A JP 2012523602A JP 2013501375 A5 JP2013501375 A5 JP 2013501375A5
Authority
JP
Japan
Prior art keywords
field
pattern
template
polymerizable material
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012523602A
Other languages
English (en)
Japanese (ja)
Other versions
JP5728478B2 (ja
JP2013501375A (ja
Filing date
Publication date
Priority claimed from US12/846,211 external-priority patent/US20110031650A1/en
Application filed filed Critical
Publication of JP2013501375A publication Critical patent/JP2013501375A/ja
Publication of JP2013501375A5 publication Critical patent/JP2013501375A5/ja
Application granted granted Critical
Publication of JP5728478B2 publication Critical patent/JP5728478B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2012523602A 2009-08-04 2010-07-30 隣接するフィールドのアラインメント方法 Active JP5728478B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23118209P 2009-08-04 2009-08-04
US61/231,182 2009-08-04
US12/846,211 2010-07-29
US12/846,211 US20110031650A1 (en) 2009-08-04 2010-07-29 Adjacent Field Alignment
PCT/US2010/002136 WO2011016849A2 (en) 2009-08-04 2010-07-30 Adjacent field alignment

Publications (3)

Publication Number Publication Date
JP2013501375A JP2013501375A (ja) 2013-01-10
JP2013501375A5 true JP2013501375A5 (enExample) 2013-08-15
JP5728478B2 JP5728478B2 (ja) 2015-06-03

Family

ID=43534207

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012523602A Active JP5728478B2 (ja) 2009-08-04 2010-07-30 隣接するフィールドのアラインメント方法

Country Status (6)

Country Link
US (2) US20110031650A1 (enExample)
EP (1) EP2462487B8 (enExample)
JP (1) JP5728478B2 (enExample)
KR (1) KR101762213B1 (enExample)
TW (1) TWI556941B (enExample)
WO (1) WO2011016849A2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005120834A2 (en) * 2004-06-03 2005-12-22 Molecular Imprints, Inc. Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
JP5238742B2 (ja) * 2010-03-19 2013-07-17 株式会社東芝 加工方法および加工装置
JP5599356B2 (ja) 2011-03-31 2014-10-01 富士フイルム株式会社 シミュレーション方法、プログラムおよびそれを記録した記録媒体、並びに、それらを利用した液滴配置パターンの作成方法、ナノインプリント方法、パターン化基板の製造方法およびインクジェット装置。
US10549313B2 (en) * 2016-10-31 2020-02-04 Canon Kabushiki Kaisha Edge field imprint lithography
KR102730502B1 (ko) * 2017-01-23 2024-11-14 에스케이하이닉스 주식회사 임프린트 패턴 형성 방법
US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
US11429022B2 (en) * 2019-10-23 2022-08-30 Canon Kabushiki Kaisha Systems and methods for curing a shaped film
US11474441B2 (en) * 2020-06-25 2022-10-18 Canon Kabushiki Kaisha Systems and methods for generating drop patterns
US20230373137A1 (en) * 2020-08-05 2023-11-23 Shanghai North Ocean Photonics Co., Ltd. Integrally Formed Resin Diffusing Component, Doe, and Manufacturing Method Therefor
CN116917805A (zh) 2021-01-20 2023-10-20 应用材料公司 防滑印模降落环
JP2023083029A (ja) * 2021-12-03 2023-06-15 キヤノン株式会社 インプリント方法、パターン形成方法、インプリント装置、インプリント用モールドおよび物品の製造方法
US12136558B2 (en) 2022-06-30 2024-11-05 Canon Kabushiki Kaisha Generating edge adjusted drop patterns

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
EP1309897A2 (en) * 2000-08-01 2003-05-14 Board Of Regents, The University Of Texas System Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) * 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) * 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
DE10330456B9 (de) * 2003-07-05 2007-11-08 Erich Thallner Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
WO2005120834A2 (en) * 2004-06-03 2005-12-22 Molecular Imprints, Inc. Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
US20070005409A1 (en) * 2005-06-30 2007-01-04 International Business Machines Corporation Method and structure for overriding calendar entries based on context and business value
US8011916B2 (en) * 2005-09-06 2011-09-06 Canon Kabushiki Kaisha Mold, imprint apparatus, and process for producing structure
US7579137B2 (en) * 2005-12-24 2009-08-25 International Business Machines Corporation Method for fabricating dual damascene structures
KR101232051B1 (ko) * 2006-06-29 2013-02-12 엘지디스플레이 주식회사 게이트 펄스 변조신호 발생회로
US8707890B2 (en) * 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
JP4922774B2 (ja) * 2007-01-26 2012-04-25 株式会社東芝 パターン形成方法及びパターン形成用モールド
US20090014917A1 (en) * 2007-07-10 2009-01-15 Molecular Imprints, Inc. Drop Pattern Generation for Imprint Lithography
JP5274128B2 (ja) * 2007-08-03 2013-08-28 キヤノン株式会社 インプリント方法および基板の加工方法
JP5473266B2 (ja) * 2007-08-03 2014-04-16 キヤノン株式会社 インプリント方法および基板の加工方法、基板の加工方法による半導体デバイスの製造方法
JP4908369B2 (ja) * 2007-10-02 2012-04-04 株式会社東芝 インプリント方法及びインプリントシステム
US8119052B2 (en) * 2007-11-02 2012-02-21 Molecular Imprints, Inc. Drop pattern generation for imprint lithography
JP2010076219A (ja) * 2008-09-25 2010-04-08 Canon Inc ナノインプリントによる基板の加工方法

Similar Documents

Publication Publication Date Title
JP2013501375A5 (enExample)
RU2011129810A (ru) Способы изготовления панелей и изготавливаемая такими способами панель
US20220317567A1 (en) Method for texturing discrete substrates
WO2009004560A3 (en) A method for forming a patterned layer on a substrate
EP2505344B1 (en) Method for manufacturing a film product using thermal roll imprinting and blade coating, and security film and film-integrated electric device using same
WO2017139493A3 (en) Electronic label-free dna and genome sequencing
JP2011524288A5 (enExample)
WO2010070485A3 (en) Methods for manufacturing panels
WO2009014858A9 (en) Method and apparatus for selectively patterning free standing quantom dot (fsqdt) polymer composites
WO2006062930A3 (en) Method and system for fast filling of templates for imprint lithography using on template dispense
JP5728478B2 (ja) 隣接するフィールドのアラインメント方法
WO2009123721A3 (en) Large area roll-to-roll imprint lithography
JP2010507261A5 (enExample)
WO2017076872A3 (de) Verfahren und applikationsvorrichtung zum applizieren einer übertragungslage einer folie auf ein substrat
JP2007502715A5 (enExample)
WO2004013693A3 (en) Scatterometry alignment for imprint lithography
JP2009037023A5 (enExample)
US9360751B2 (en) Imprinting stamp and nano-imprinting method using the same
JP2014069575A5 (enExample)
JP2008046580A5 (enExample)
WO2014024161A3 (en) Method for producing duplicates of an object having a three-dimensional decorative surface
CN107710072B (zh) 光掩模、包括光掩模的层压体、光掩模制备方法、图案形成装置和图案形成方法
US20160318330A1 (en) Blanket, printing device, printing method, and blanket manufacturing method
KR20090007011U (ko) 보릿대를 이용하여 제조된 장식판
BRPI0812868A2 (pt) Método para obter um revestimento (manta de impressão com parte posterior metálica) de um rolo de impressão tipográfico com folha plástica adesiva, e mata de impressão com parte posterior metálica assim obtida.