KR101762213B1 - 인접 필드 얼라인먼트 - Google Patents

인접 필드 얼라인먼트 Download PDF

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Publication number
KR101762213B1
KR101762213B1 KR1020127003861A KR20127003861A KR101762213B1 KR 101762213 B1 KR101762213 B1 KR 101762213B1 KR 1020127003861 A KR1020127003861 A KR 1020127003861A KR 20127003861 A KR20127003861 A KR 20127003861A KR 101762213 B1 KR101762213 B1 KR 101762213B1
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South Korea
Prior art keywords
field
template
substrate
polymerizable material
pattern
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Korean (ko)
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KR20120044362A (ko
Inventor
이안 매튜 맥맥킨
웨슬리 마르틴
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캐논 나노테크놀로지즈 인코퍼레이티드
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020127003861A 2009-08-04 2010-07-30 인접 필드 얼라인먼트 Active KR101762213B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23118209P 2009-08-04 2009-08-04
US61/231,182 2009-08-04
US12/846,211 US20110031650A1 (en) 2009-08-04 2010-07-29 Adjacent Field Alignment
US12/846,211 2010-07-29
PCT/US2010/002136 WO2011016849A2 (en) 2009-08-04 2010-07-30 Adjacent field alignment

Publications (2)

Publication Number Publication Date
KR20120044362A KR20120044362A (ko) 2012-05-07
KR101762213B1 true KR101762213B1 (ko) 2017-07-27

Family

ID=43534207

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127003861A Active KR101762213B1 (ko) 2009-08-04 2010-07-30 인접 필드 얼라인먼트

Country Status (6)

Country Link
US (2) US20110031650A1 (enExample)
EP (1) EP2462487B8 (enExample)
JP (1) JP5728478B2 (enExample)
KR (1) KR101762213B1 (enExample)
TW (1) TWI556941B (enExample)
WO (1) WO2011016849A2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1768846B1 (en) * 2004-06-03 2010-08-11 Molecular Imprints, Inc. Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
JP5238742B2 (ja) * 2010-03-19 2013-07-17 株式会社東芝 加工方法および加工装置
JP5599356B2 (ja) 2011-03-31 2014-10-01 富士フイルム株式会社 シミュレーション方法、プログラムおよびそれを記録した記録媒体、並びに、それらを利用した液滴配置パターンの作成方法、ナノインプリント方法、パターン化基板の製造方法およびインクジェット装置。
US10549313B2 (en) * 2016-10-31 2020-02-04 Canon Kabushiki Kaisha Edge field imprint lithography
KR102730502B1 (ko) * 2017-01-23 2024-11-14 에스케이하이닉스 주식회사 임프린트 패턴 형성 방법
US11209730B2 (en) * 2019-03-14 2021-12-28 Canon Kabushiki Kaisha Methods of generating drop patterns, systems for shaping films with the drop pattern, and methods of manufacturing an article with the drop pattern
US11429022B2 (en) * 2019-10-23 2022-08-30 Canon Kabushiki Kaisha Systems and methods for curing a shaped film
US11474441B2 (en) * 2020-06-25 2022-10-18 Canon Kabushiki Kaisha Systems and methods for generating drop patterns
WO2022027925A1 (zh) * 2020-08-05 2022-02-10 上海鲲游光电科技有限公司 一体成型的树脂匀光元件和doe及其制造方法
US11567417B2 (en) 2021-01-20 2023-01-31 Applied Materials, Inc. Anti-slippery stamp landing ring
JP2023083029A (ja) * 2021-12-03 2023-06-15 キヤノン株式会社 インプリント方法、パターン形成方法、インプリント装置、インプリント用モールドおよび物品の製造方法
US12136558B2 (en) 2022-06-30 2024-11-05 Canon Kabushiki Kaisha Generating edge adjusted drop patterns

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080018875A1 (en) * 2006-07-18 2008-01-24 Asml Netherlands B.V. Imprint lithography
JP2008183732A (ja) * 2007-01-26 2008-08-14 Toshiba Corp パターン形成方法及びパターン形成用モールド

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
KR20030040378A (ko) * 2000-08-01 2003-05-22 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피를 위한 투명한 템플릿과 기판사이의고정확성 갭 및 방향설정 감지 방법
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6936194B2 (en) * 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) * 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US20040065252A1 (en) * 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US7179396B2 (en) * 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) * 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) * 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
DE10330456B9 (de) * 2003-07-05 2007-11-08 Erich Thallner Vorrichtung zum Erstellen einer Oberflächenstruktur auf einem Wafer
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
EP1768846B1 (en) * 2004-06-03 2010-08-11 Molecular Imprints, Inc. Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US20060266916A1 (en) * 2005-05-25 2006-11-30 Molecular Imprints, Inc. Imprint lithography template having a coating to reflect and/or absorb actinic energy
US20070005409A1 (en) * 2005-06-30 2007-01-04 International Business Machines Corporation Method and structure for overriding calendar entries based on context and business value
US8011916B2 (en) * 2005-09-06 2011-09-06 Canon Kabushiki Kaisha Mold, imprint apparatus, and process for producing structure
US7579137B2 (en) * 2005-12-24 2009-08-25 International Business Machines Corporation Method for fabricating dual damascene structures
KR101232051B1 (ko) * 2006-06-29 2013-02-12 엘지디스플레이 주식회사 게이트 펄스 변조신호 발생회로
US20090014917A1 (en) * 2007-07-10 2009-01-15 Molecular Imprints, Inc. Drop Pattern Generation for Imprint Lithography
JP5473266B2 (ja) * 2007-08-03 2014-04-16 キヤノン株式会社 インプリント方法および基板の加工方法、基板の加工方法による半導体デバイスの製造方法
JP5274128B2 (ja) * 2007-08-03 2013-08-28 キヤノン株式会社 インプリント方法および基板の加工方法
JP4908369B2 (ja) * 2007-10-02 2012-04-04 株式会社東芝 インプリント方法及びインプリントシステム
US8119052B2 (en) * 2007-11-02 2012-02-21 Molecular Imprints, Inc. Drop pattern generation for imprint lithography
JP2010076219A (ja) * 2008-09-25 2010-04-08 Canon Inc ナノインプリントによる基板の加工方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080018875A1 (en) * 2006-07-18 2008-01-24 Asml Netherlands B.V. Imprint lithography
JP2008183732A (ja) * 2007-01-26 2008-08-14 Toshiba Corp パターン形成方法及びパターン形成用モールド

Also Published As

Publication number Publication date
WO2011016849A3 (en) 2011-04-14
US20190294041A1 (en) 2019-09-26
JP2013501375A (ja) 2013-01-10
TWI556941B (zh) 2016-11-11
US11199772B2 (en) 2021-12-14
WO2011016849A2 (en) 2011-02-10
TW201114584A (en) 2011-05-01
EP2462487A2 (en) 2012-06-13
JP5728478B2 (ja) 2015-06-03
EP2462487B8 (en) 2014-10-08
KR20120044362A (ko) 2012-05-07
US20110031650A1 (en) 2011-02-10
EP2462487B1 (en) 2014-07-23

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