JP2013245387A - 樹脂容器用コーティング装置 - Google Patents
樹脂容器用コーティング装置 Download PDFInfo
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- JP2013245387A JP2013245387A JP2012121130A JP2012121130A JP2013245387A JP 2013245387 A JP2013245387 A JP 2013245387A JP 2012121130 A JP2012121130 A JP 2012121130A JP 2012121130 A JP2012121130 A JP 2012121130A JP 2013245387 A JP2013245387 A JP 2013245387A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45561—Gas plumbing upstream of the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45587—Mechanical means for changing the gas flow
- C23C16/45589—Movable means, e.g. fans
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
【解決手段】樹脂容器用コーティング装置10は、複数の樹脂容器が格納され、外部電極であるチャンバ40と、原料ガスが導かれるガス導通部51が形成され、チャンバ40に格納された複数の樹脂容器Bの内部にそれぞれ挿入される複数の内部電極50と、チャンバ40に原料ガスを供給するガス供給部70と、を備え、ガス供給部70は、原料ガス供給路P1と、原料ガス供給路P1から分岐して複数の内部電極50のガス導通部51にそれぞれ連通する複数のガス分岐路P2とを有し、原料ガス供給路P1には原料ガスの流量を調整するマスフローコントローラ74が設置され、複数のガス分岐路P2には原料ガスの流量を調整する流量調整弁78がそれぞれ設置されている。
【選択図】図5
Description
複数の樹脂容器が格納され、外部電極であるチャンバと、
電気的に接地されると共に筒状に形成され、内周部に原料ガスが導かれるガス導通部が形成され、前記チャンバに格納された複数の前記樹脂容器の内部にそれぞれ挿入される複数の内部電極と、
前記チャンバに原料ガスを供給するガス供給部と、を備え、
前記ガス供給部は、原料ガスの原料が貯留される原料貯留部と連通する原料ガス供給路と、該原料ガス供給路から分岐して複数の前記内部電極のガス導通部にそれぞれ連通する複数のガス分岐路とを有し、前記原料ガス供給路と複数の前記ガス分岐路と複数の前記内部電極のガス導通部とを介して前記チャンバに格納された複数の前記樹脂容器の内部に原料ガスをそれぞれ供給し、
前記原料ガス供給路には原料ガスの流量を調整する第1の流量調整部が設置され、複数の前記ガス分岐路には原料ガスの流量を調整する第2の流量調整部がそれぞれ設置されていることを特徴とするものである。
まず、チャンバ40のチャンバ蓋体45が外された状態で、樹脂容器Bがチャンバ本体41の貫通穴42に上部から挿入されて格納される。このとき、貫通穴42は樹脂容器Bの最大胴径よりわずかに大きい内径になっているため、樹脂容器Bは、貫通穴42内の所定の位置に保持される。また、内部電極50は、樹脂容器Bの口部から樹脂容器Bの内部にそれぞれ挿入配置される。その後、チャンバ40のチャンバ蓋体45が閉められ、チャンバ40の格納室S1が密封状態で形成される。
なお、水分透過率とは、樹脂容器Bを水で充填し、プラスチックキャップで樹脂容器Bを密閉状態にし、この状態の樹脂容器Bを38度の温度で一日間保管し、保管前後の質量変化の割合を算出したものである。表2の「流量調整無し」は、4つのガス分岐路P2上に流量調整弁を設けない状態で実験を行った場合の実験結果を示しており、「流量調整有り」は、4つのガス分岐路P2上に設けられた4つの流量調整弁の閉度を表1に示された閉度で個別に調整した場合の実験結果を示している。
Claims (3)
- 複数の樹脂容器が格納され、外部電極であるチャンバと、
電気的に接地されるとともに筒状に形成され、内周部に原料ガスが導かれるガス導通部が形成され、前記チャンバに格納された複数の前記樹脂容器の内部にそれぞれ挿入される複数の内部電極と、
前記チャンバに原料ガスを供給するガス供給部と、を備え、
前記ガス供給部は、原料ガスの原料が貯留される原料貯留部と連通する原料ガス供給路と、該原料ガス供給路から分岐して複数の前記内部電極のガス導通部にそれぞれ連通する複数のガス分岐路とを有し、前記原料ガス供給路と複数の前記ガス分岐路と複数の前記内部電極のガス導通部とを介して前記チャンバに格納された複数の前記樹脂容器の内部に原料ガスをそれぞれ供給し、
前記原料ガス供給路には原料ガスの流量を調整する第1の流量調整部が設置され、複数の前記ガス分岐路には原料ガスの流量を調整する第2の流量調整部がそれぞれ設置されていることを特徴とする樹脂容器用コーティング装置。 - 前記チャンバは、複数の前記樹脂容器を直線上にそれぞれ個別に格納する複数の格納室を有することを特徴とする請求項1に記載の樹脂容器用コーティング装置。
- 前記第2の流量調整部は、流量調整弁で構成されることを特徴とする請求項1または2に記載の樹脂容器用コーティング装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012121130A JP6047308B2 (ja) | 2012-05-28 | 2012-05-28 | 樹脂容器用コーティング装置 |
EP13796424.3A EP2857551B1 (en) | 2012-05-28 | 2013-05-14 | Resin container coating device |
US14/403,958 US20150136025A1 (en) | 2012-05-28 | 2013-05-14 | Resin container coating device |
PCT/JP2013/063370 WO2013179886A1 (ja) | 2012-05-28 | 2013-05-14 | 樹脂容器用コーティング装置 |
CN201380028064.6A CN104350177B (zh) | 2012-05-28 | 2013-05-14 | 树脂容器用涂敷装置 |
US16/397,078 US20190249304A1 (en) | 2012-05-28 | 2019-04-29 | Resin container coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2012121130A JP6047308B2 (ja) | 2012-05-28 | 2012-05-28 | 樹脂容器用コーティング装置 |
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JP2013245387A true JP2013245387A (ja) | 2013-12-09 |
JP6047308B2 JP6047308B2 (ja) | 2016-12-21 |
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JP2012121130A Expired - Fee Related JP6047308B2 (ja) | 2012-05-28 | 2012-05-28 | 樹脂容器用コーティング装置 |
Country Status (5)
Country | Link |
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US (2) | US20150136025A1 (ja) |
EP (1) | EP2857551B1 (ja) |
JP (1) | JP6047308B2 (ja) |
CN (1) | CN104350177B (ja) |
WO (1) | WO2013179886A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101954354B (zh) * | 2010-10-21 | 2012-11-07 | 徐礼学 | 料块自动分拣标记装置 |
CN114540788A (zh) * | 2022-04-02 | 2022-05-27 | 等离子体装备科技(广州)有限公司 | 密封件镀膜装置及密封件镀膜方法 |
Citations (8)
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JPH08509166A (ja) * | 1994-02-16 | 1996-10-01 | ザ・コカ−コーラ・カンパニー | プラズマ補助表面反応又は表面上の重合による不活性又は不浸透性内部表面を有する中空容器 |
JPH10258825A (ja) * | 1997-03-14 | 1998-09-29 | Kirin Brewery Co Ltd | 炭素膜コーティングプラスチック容器の製造装置および製造方法 |
WO2003085165A1 (fr) * | 2002-04-11 | 2003-10-16 | Mitsubishi Shoji Plastics Corporation | Appareil de formation d'un film cvd plasma et procede de fabrication d'un conteneur plastique de revetement de film cvc |
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JP2004068091A (ja) * | 2002-08-07 | 2004-03-04 | Matsushita Electric Ind Co Ltd | 成膜処理装置および成膜処理方法 |
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JP2005531688A (ja) * | 2002-05-24 | 2005-10-20 | ショット アーゲー | ワークピースの処理装置および処理方法 |
JP2010084785A (ja) * | 2008-09-29 | 2010-04-15 | Horiba Stec Co Ltd | ガス供給システム |
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-
2012
- 2012-05-28 JP JP2012121130A patent/JP6047308B2/ja not_active Expired - Fee Related
-
2013
- 2013-05-14 CN CN201380028064.6A patent/CN104350177B/zh not_active Expired - Fee Related
- 2013-05-14 US US14/403,958 patent/US20150136025A1/en not_active Abandoned
- 2013-05-14 WO PCT/JP2013/063370 patent/WO2013179886A1/ja active Application Filing
- 2013-05-14 EP EP13796424.3A patent/EP2857551B1/en not_active Not-in-force
-
2019
- 2019-04-29 US US16/397,078 patent/US20190249304A1/en not_active Abandoned
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH08509166A (ja) * | 1994-02-16 | 1996-10-01 | ザ・コカ−コーラ・カンパニー | プラズマ補助表面反応又は表面上の重合による不活性又は不浸透性内部表面を有する中空容器 |
JPH10258825A (ja) * | 1997-03-14 | 1998-09-29 | Kirin Brewery Co Ltd | 炭素膜コーティングプラスチック容器の製造装置および製造方法 |
WO2003085165A1 (fr) * | 2002-04-11 | 2003-10-16 | Mitsubishi Shoji Plastics Corporation | Appareil de formation d'un film cvd plasma et procede de fabrication d'un conteneur plastique de revetement de film cvc |
JP2004002905A (ja) * | 2002-04-17 | 2004-01-08 | Kirin Brewery Co Ltd | ロータリー型量産用cvd成膜装置及びプラスチック容器内表面へのcvd膜成膜方法 |
JP2005531688A (ja) * | 2002-05-24 | 2005-10-20 | ショット アーゲー | ワークピースの処理装置および処理方法 |
JP2004068091A (ja) * | 2002-08-07 | 2004-03-04 | Matsushita Electric Ind Co Ltd | 成膜処理装置および成膜処理方法 |
WO2005035825A1 (ja) * | 2003-09-26 | 2005-04-21 | Mitsubishi Shoji Plastics Corporation | Cvd成膜装置及びcvd膜コーティングプラスチック容器の製造方法 |
JP2010084785A (ja) * | 2008-09-29 | 2010-04-15 | Horiba Stec Co Ltd | ガス供給システム |
Also Published As
Publication number | Publication date |
---|---|
EP2857551A4 (en) | 2015-12-02 |
CN104350177A (zh) | 2015-02-11 |
US20190249304A1 (en) | 2019-08-15 |
US20150136025A1 (en) | 2015-05-21 |
EP2857551B1 (en) | 2020-09-30 |
WO2013179886A1 (ja) | 2013-12-05 |
JP6047308B2 (ja) | 2016-12-21 |
CN104350177B (zh) | 2017-08-25 |
EP2857551A1 (en) | 2015-04-08 |
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