JP2013194312A - 多元系のナノ粒子膜形成装置及びこれを用いたナノ粒子膜形成方法 - Google Patents
多元系のナノ粒子膜形成装置及びこれを用いたナノ粒子膜形成方法 Download PDFInfo
- Publication number
- JP2013194312A JP2013194312A JP2012065703A JP2012065703A JP2013194312A JP 2013194312 A JP2013194312 A JP 2013194312A JP 2012065703 A JP2012065703 A JP 2012065703A JP 2012065703 A JP2012065703 A JP 2012065703A JP 2013194312 A JP2013194312 A JP 2013194312A
- Authority
- JP
- Japan
- Prior art keywords
- nanoparticles
- component
- chamber
- metal material
- nanoparticle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002105 nanoparticle Substances 0.000 title claims abstract description 83
- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000000151 deposition Methods 0.000 title abstract description 8
- 239000007769 metal material Substances 0.000 claims abstract description 68
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000000112 cooling gas Substances 0.000 claims description 23
- 230000015572 biosynthetic process Effects 0.000 claims description 14
- 238000004891 communication Methods 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 7
- 238000005275 alloying Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 238000001704 evaporation Methods 0.000 abstract description 13
- 230000008021 deposition Effects 0.000 abstract description 2
- 239000002826 coolant Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 12
- 230000008020 evaporation Effects 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 239000011882 ultra-fine particle Substances 0.000 description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000002082 metal nanoparticle Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Abstract
【解決手段】複数の金属材料4a〜4cが配設され、ナノ粒子8a〜8cから多元系のナノ粒子9が生成する生成室2と、基板7が配設された成膜室3と、複数の金属材料4a〜4cごとに対応して生成室2内に配設された粒子化ユニット11a〜11cとを備え、粒子化ユニット11a〜11cは、金属材料4a〜4cを覆う容器12a〜12cと、容器12a〜12c内に配設されたヒータ15a〜15cと、容器12a〜12cに設けられてナノ粒子8a〜8cが流出する流出口13a〜13cと、容器12a〜12cに設けられて冷却ガスが導入される導入口14a〜14cとを有する。
【選択図】図1
Description
また、本発明では、前記粒子化ユニットごとに前記金属材料からナノ粒子を生成するナノ粒子生成工程と、前記生成室内で複数の前記ナノ粒子を結合させて多元系のナノ粒子を生成する合金化工程と、前記多元系のナノ粒子が前記連通管を通過し、前記成膜室内の前記基板に成膜する成膜工程とを備えたことを特徴とする多元系のナノ粒子膜形成装置を用いた多元系のナノ粒子膜形成方法も提供する。
また、ナノ粒子生成工程にて粒子化ユニットごとに金属材料を蒸発させてそれぞれのナノ粒子を生成させるので、各金属材料は互いの熱影響を受けず、また重さや蒸発圧の違いにかかわらずそれぞれの金属材料に適した条件でナノ粒子を発生させることができる。
まず、ナノ粒子生成工程を行う。この工程は、生成室2、より詳しくは各粒子化ユニット11a〜11c内で行われる。ここでは、粒子化ユニット11aを例にして説明するが、粒子化ユニット11b及び11cでも同様である。容器12a内に金属線からなる金属材料4aを配する。そして、冷却ガス導入ユニット10を駆動させて冷却ガス(ヘリウム又はアルゴンガスを含む冷却ガス)を導入口14aから容器12a内に導入するとともに、ヒータ15aにより金属材料4aを加熱する。そして、金属材料4aを蒸発させることによりナノ粒子8aを得る。このように、気相環境にてナノ粒子8aを生成するので、金属材料4aが例えばマグネシウム等の酸化されやすい金属である場合であっても、不要な酸化を防止できる。生成されたナノ粒子8aは、容器12aの流出口13aから流出する。
2 生成室
3 成膜室
4a〜4c 金属材料
5 排気ユニット
6 連通管
7 基板
8a〜8c ナノ粒子
9 多元系のナノ粒子
10 冷却ガス導入ユニット
11a〜11c 粒子化ユニット
12a〜12c 容器
13a〜13c 流出口
14a〜14c 導入口
15a〜15c ヒータ
Claims (4)
- 複数の金属材料が配設され、前記金属材料ごとのナノ粒子から多元系のナノ粒子が生成する生成室と、
前記多元系のナノ粒子が成膜されるべき基板が配設された成膜室と、
前記生成室と前記成膜室とを接続する連通管と、
前記成膜室を排気する排気ユニットと、
前記生成室に冷却ガスを導入する冷却ガス導入ユニットと、
前記複数の金属材料ごとに対応して前記生成室内に配設された粒子化ユニットと
を備え、
前記粒子化ユニットは、前記金属材料を覆う容器と、該容器内に配設されたヒータと、前記容器に設けられて前記ナノ粒子が流出する流出口と、前記容器に設けられて前記冷却ガスが導入される導入口とを有することを特徴とする多元系のナノ粒子膜形成装置。 - 前記金属材料ごとに前記容器内の容量及び前記流出口から前記連通管までの距離がそれぞれ異なることを特徴とする請求項1に記載の多元系のナノ粒子膜形成装置。
- 前記粒子化ユニットごとに前記金属材料からナノ粒子を生成するナノ粒子生成工程と、
前記生成室内で複数の前記ナノ粒子を結合させて多元系のナノ粒子を生成する合金化工程と、
前記多元系のナノ粒子が前記連通管を通過し、前記成膜室内の前記基板に成膜する成膜工程と
を備えたことを特徴とする請求項2に記載の多元系のナノ粒子膜形成装置を用いた多元系のナノ粒子膜形成方法。 - 前記ナノ粒子生成工程にて、前記ヒータによる加熱温度及び前記容器内に導入される前記冷却ガスの導入量は、前記粒子化ユニット内に配された前記金属材料ごとに異なるように調整されることを特徴とする請求項3に記載の多元系のナノ粒子膜形成方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012065703A JP6192894B2 (ja) | 2012-03-22 | 2012-03-22 | 多元系のナノ粒子膜形成装置及びこれを用いたナノ粒子膜形成方法 |
KR20147027957A KR20140136485A (ko) | 2012-03-22 | 2013-01-31 | 다원계 나노입자막 형성 장치 및 이를 이용한 나노입자막 형성 방법 |
CA2864994A CA2864994C (en) | 2012-03-22 | 2013-01-31 | System for forming multinary nanoparticle film and method for forming nanoparticle film using same |
EP13764419.1A EP2829634A4 (en) | 2012-03-22 | 2013-01-31 | APPARATUS FOR FORMING COMPLEX NANOPARTICLE FILM AND METHOD FOR FORMING NANOPARTICLE FILM USING THE SAME |
US14/379,726 US20150064352A1 (en) | 2012-03-22 | 2013-01-31 | System for forming multinary nanoparticle film and method for forming nanoparticle film using same |
PCT/JP2013/052197 WO2013140863A1 (ja) | 2012-03-22 | 2013-01-31 | 多元系のナノ粒子膜形成装置及びこれを用いたナノ粒子膜形成方法 |
CN201380015756.7A CN104204281A (zh) | 2012-03-22 | 2013-01-31 | 多元系的纳米粒子膜形成装置及使用该装置的纳米粒子膜形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012065703A JP6192894B2 (ja) | 2012-03-22 | 2012-03-22 | 多元系のナノ粒子膜形成装置及びこれを用いたナノ粒子膜形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013194312A true JP2013194312A (ja) | 2013-09-30 |
JP6192894B2 JP6192894B2 (ja) | 2017-09-06 |
Family
ID=49222330
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012065703A Active JP6192894B2 (ja) | 2012-03-22 | 2012-03-22 | 多元系のナノ粒子膜形成装置及びこれを用いたナノ粒子膜形成方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20150064352A1 (ja) |
EP (1) | EP2829634A4 (ja) |
JP (1) | JP6192894B2 (ja) |
KR (1) | KR20140136485A (ja) |
CN (1) | CN104204281A (ja) |
CA (1) | CA2864994C (ja) |
WO (1) | WO2013140863A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230021169A (ko) * | 2017-11-16 | 2023-02-13 | 어플라이드 머티어리얼스, 인코포레이티드 | 증착 소스를 냉각시키는 방법, 증착 소스를 냉각시키기 위한 챔버, 및 증착 시스템 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
JPH05339720A (ja) * | 1992-06-11 | 1993-12-21 | Mitsubishi Electric Corp | 薄膜形成装置 |
JPH09143697A (ja) * | 1995-11-20 | 1997-06-03 | Ishikawajima Harima Heavy Ind Co Ltd | 真空蒸着装置の成膜方法および真空蒸着装置 |
JP2000297361A (ja) * | 1999-04-09 | 2000-10-24 | Canon Inc | 超微粒子膜形成方法及び超微粒子膜形成装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59156996A (ja) * | 1983-02-23 | 1984-09-06 | Koito Mfg Co Ltd | 化合物結晶膜の製造方法とその装置 |
JP3452617B2 (ja) * | 1993-12-10 | 2003-09-29 | 真空冶金株式会社 | ガスデポジション装置 |
JP4828108B2 (ja) * | 2004-10-14 | 2011-11-30 | タマティーエルオー株式会社 | 物理蒸着装置 |
JP5179739B2 (ja) * | 2006-09-27 | 2013-04-10 | 東京エレクトロン株式会社 | 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法 |
-
2012
- 2012-03-22 JP JP2012065703A patent/JP6192894B2/ja active Active
-
2013
- 2013-01-31 EP EP13764419.1A patent/EP2829634A4/en not_active Withdrawn
- 2013-01-31 CA CA2864994A patent/CA2864994C/en active Active
- 2013-01-31 WO PCT/JP2013/052197 patent/WO2013140863A1/ja active Application Filing
- 2013-01-31 CN CN201380015756.7A patent/CN104204281A/zh active Pending
- 2013-01-31 KR KR20147027957A patent/KR20140136485A/ko active Search and Examination
- 2013-01-31 US US14/379,726 patent/US20150064352A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
JPH05339720A (ja) * | 1992-06-11 | 1993-12-21 | Mitsubishi Electric Corp | 薄膜形成装置 |
JPH09143697A (ja) * | 1995-11-20 | 1997-06-03 | Ishikawajima Harima Heavy Ind Co Ltd | 真空蒸着装置の成膜方法および真空蒸着装置 |
JP2000297361A (ja) * | 1999-04-09 | 2000-10-24 | Canon Inc | 超微粒子膜形成方法及び超微粒子膜形成装置 |
Non-Patent Citations (1)
Title |
---|
JPN6015045233; B.L.Halpern: 'Jet Vapor Deposition of Single and Multicomponent Thin Films' Metal Finishing , 1992, 37-41 * |
Also Published As
Publication number | Publication date |
---|---|
JP6192894B2 (ja) | 2017-09-06 |
CN104204281A (zh) | 2014-12-10 |
KR20140136485A (ko) | 2014-11-28 |
WO2013140863A1 (ja) | 2013-09-26 |
CA2864994C (en) | 2019-08-06 |
EP2829634A4 (en) | 2015-10-28 |
CA2864994A1 (en) | 2013-09-26 |
US20150064352A1 (en) | 2015-03-05 |
EP2829634A1 (en) | 2015-01-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101301967B1 (ko) | 플라즈마 나노 분말 합성 및 코팅 장치 와 그 방법 | |
US20070207266A1 (en) | Method and apparatus for coating particulates utilizing physical vapor deposition | |
US20160207113A1 (en) | Apparatus for producing fine particles and method for producing fine particles | |
EP2199425A1 (fr) | Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II) | |
CN102950290B (zh) | 纳米级镍锰合金粉的生产方法 | |
JP2018501642A5 (ja) | ||
CN106835048A (zh) | 一种核壳结构Cu/Ag纳米合金的气相制备方法 | |
JPS59208006A (ja) | 合金微粉末の製造方法 | |
CN102950289B (zh) | 纳米级铜锰合金粉的生产方法 | |
JP6192894B2 (ja) | 多元系のナノ粒子膜形成装置及びこれを用いたナノ粒子膜形成方法 | |
JP2013510243A (ja) | ナノ粒子の製造方法およびナノ粒子の製造装置 | |
Yang et al. | A study of CVD growth kinetics and morphological evolution of rhenium from ReCl5 | |
CN103468989A (zh) | 一种纳米级镍铝合金粉的生产方法 | |
CN101318219A (zh) | 纳米粉体机 | |
CN102950292A (zh) | 亚微米级铜锰镍合金粉的生产方法 | |
US9993841B2 (en) | Particulate film laminating system and particulate film laminating method using same | |
JP2023541654A (ja) | 蒸発装置、蒸着装置、及び蒸発方法 | |
JP2011179023A (ja) | ナノ粒子製造装置及びナノ粒子製造方法 | |
US20090008842A1 (en) | Method and apparatus for producing metallic ultrafine particles | |
JP2014185382A (ja) | ナノ粒子の分別装置 | |
KR102190714B1 (ko) | 다양한 합금조성 및 클러스터 구조 제어를 위한 클러스터 소스 장치 | |
KR20230108535A (ko) | 금속분말 제조장치 및 이를 이용한 금속분말 제조방법 | |
Akraiam et al. | Production of Fe clusters by collisions of metal vapour with supersonic argon beams |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20150220 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151111 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160106 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20160302 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160523 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20160531 |
|
A912 | Re-examination (zenchi) completed and case transferred to appeal board |
Free format text: JAPANESE INTERMEDIATE CODE: A912 Effective date: 20160624 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170608 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170809 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6192894 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313532 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |