JP2013143390A5 - - Google Patents
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- Publication number
- JP2013143390A5 JP2013143390A5 JP2012001272A JP2012001272A JP2013143390A5 JP 2013143390 A5 JP2013143390 A5 JP 2013143390A5 JP 2012001272 A JP2012001272 A JP 2012001272A JP 2012001272 A JP2012001272 A JP 2012001272A JP 2013143390 A5 JP2013143390 A5 JP 2013143390A5
- Authority
- JP
- Japan
- Prior art keywords
- processing method
- plasma processing
- hard mask
- plasma
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003672 processing method Methods 0.000 claims 19
- 238000001020 plasma etching Methods 0.000 claims 8
- 239000000460 chlorine Substances 0.000 claims 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 4
- 229910052801 chlorine Inorganic materials 0.000 claims 4
- 239000007772 electrode material Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 239000007789 gas Substances 0.000 claims 3
- 239000011261 inert gas Substances 0.000 claims 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 2
- 229910010037 TiAlN Inorganic materials 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- 239000003990 capacitor Substances 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- 238000004380 ashing Methods 0.000 claims 1
- 229910052741 iridium Inorganic materials 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012001272A JP5924941B2 (ja) | 2012-01-06 | 2012-01-06 | プラズマ処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012001272A JP5924941B2 (ja) | 2012-01-06 | 2012-01-06 | プラズマ処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013143390A JP2013143390A (ja) | 2013-07-22 |
| JP2013143390A5 true JP2013143390A5 (enExample) | 2014-11-06 |
| JP5924941B2 JP5924941B2 (ja) | 2016-05-25 |
Family
ID=49039824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012001272A Active JP5924941B2 (ja) | 2012-01-06 | 2012-01-06 | プラズマ処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5924941B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10236186B2 (en) * | 2014-08-05 | 2019-03-19 | Tokyo Electron Limited | Methods for dry hard mask removal on a microelectronic substrate |
| JP6935352B2 (ja) * | 2015-07-03 | 2021-09-15 | ウシオ電機株式会社 | グリッド偏光素子 |
| CN108963001A (zh) * | 2018-07-02 | 2018-12-07 | 合肥工业大学 | 一种定位生长钙钛矿薄膜阵列的方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3122396B2 (ja) * | 1997-09-16 | 2001-01-09 | 松下電子工業株式会社 | 膜のパターニング方法 |
| JP2004241692A (ja) * | 2003-02-07 | 2004-08-26 | Oki Electric Ind Co Ltd | 強誘電体メモリ素子の製造方法 |
| JP2010080780A (ja) * | 2008-09-26 | 2010-04-08 | Fujitsu Microelectronics Ltd | 半導体装置の製造方法及び容量素子の製造方法 |
-
2012
- 2012-01-06 JP JP2012001272A patent/JP5924941B2/ja active Active
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