JP2013124992A5 - - Google Patents

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Publication number
JP2013124992A5
JP2013124992A5 JP2011275096A JP2011275096A JP2013124992A5 JP 2013124992 A5 JP2013124992 A5 JP 2013124992A5 JP 2011275096 A JP2011275096 A JP 2011275096A JP 2011275096 A JP2011275096 A JP 2011275096A JP 2013124992 A5 JP2013124992 A5 JP 2013124992A5
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JP
Japan
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light
test surface
test
measuring device
inclination
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JP2011275096A
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English (en)
Japanese (ja)
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JP2013124992A (ja
JP5954979B2 (ja
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Priority claimed from JP2011275096A external-priority patent/JP5954979B2/ja
Priority to JP2011275096A priority Critical patent/JP5954979B2/ja
Priority to EP12008019.7A priority patent/EP2604972A1/en
Priority to US13/711,289 priority patent/US9372068B2/en
Priority to CN201210543710XA priority patent/CN103162621A/zh
Priority to KR1020120145940A priority patent/KR20130069474A/ko
Publication of JP2013124992A publication Critical patent/JP2013124992A/ja
Publication of JP2013124992A5 publication Critical patent/JP2013124992A5/ja
Publication of JP5954979B2 publication Critical patent/JP5954979B2/ja
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Expired - Fee Related legal-status Critical Current
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JP2011275096A 2011-12-15 2011-12-15 多波長干渉計を有する計測装置 Expired - Fee Related JP5954979B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011275096A JP5954979B2 (ja) 2011-12-15 2011-12-15 多波長干渉計を有する計測装置
EP12008019.7A EP2604972A1 (en) 2011-12-15 2012-11-29 Measuring apparatus including multi-wavelength interferometer
US13/711,289 US9372068B2 (en) 2011-12-15 2012-12-11 Measuring apparatus including multi-wavelength interferometer
KR1020120145940A KR20130069474A (ko) 2011-12-15 2012-12-14 다파장 간섭계를 포함하는 계측 장치
CN201210543710XA CN103162621A (zh) 2011-12-15 2012-12-14 包括多波长干涉计的测量装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011275096A JP5954979B2 (ja) 2011-12-15 2011-12-15 多波長干渉計を有する計測装置

Publications (3)

Publication Number Publication Date
JP2013124992A JP2013124992A (ja) 2013-06-24
JP2013124992A5 true JP2013124992A5 (enExample) 2015-02-05
JP5954979B2 JP5954979B2 (ja) 2016-07-20

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Family Applications (1)

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JP2011275096A Expired - Fee Related JP5954979B2 (ja) 2011-12-15 2011-12-15 多波長干渉計を有する計測装置

Country Status (5)

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US (1) US9372068B2 (enExample)
EP (1) EP2604972A1 (enExample)
JP (1) JP5954979B2 (enExample)
KR (1) KR20130069474A (enExample)
CN (1) CN103162621A (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103718209B (zh) * 2011-08-10 2015-12-16 三菱电机株式会社 调整装置以及光学部件安装装置
JP6273127B2 (ja) 2013-11-14 2018-01-31 キヤノン株式会社 計測装置、および物品の製造方法
WO2016151368A1 (en) * 2015-03-24 2016-09-29 Forus Health Private Limited An apparatus for multi-mode imaging of eye
US9709383B2 (en) * 2015-04-30 2017-07-18 Nidek Co., Ltd. Optical coherence tomography apparatus
CN106323163B (zh) * 2015-07-10 2019-03-08 上海微电子装备（集团）股份有限公司 一种表面3d检测装置及检测方法
CN105387800B (zh) * 2016-01-04 2018-02-09 湖北工业大学 一种多波长干涉测量起点位置对齐方法
CN106093956B (zh) * 2016-07-01 2019-04-30 北方民族大学 一种激光测距系统
CN105974428B (zh) * 2016-07-29 2019-04-30 北方民族大学 一种激光测距系统
JP6513619B2 (ja) * 2016-09-28 2019-05-15 Ckd株式会社 三次元計測装置
US11892292B2 (en) 2017-06-06 2024-02-06 RD Synergy Ltd. Methods and systems of holographic interferometry
US10725428B2 (en) * 2017-06-06 2020-07-28 RD Synergy Ltd. Methods and systems of holographic interferometry
CN112969899B (zh) 2018-10-30 2023-03-10 Rd 辛纳基有限公司 全息干涉法的系统和方法
CN111811394B (zh) * 2020-06-02 2021-11-05 上海大学 基于3ccd或3cmos的动态三波长数字全息测量方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2808136B2 (ja) * 1989-06-07 1998-10-08 キヤノン株式会社 測長方法及び装置
JPH07113533B2 (ja) * 1990-11-30 1995-12-06 浜松ホトニクス株式会社 光学的変形量測定装置
IL100655A (en) * 1991-02-08 1994-11-28 Hughes Aircraft Co Profile gauge for interferometric laser
JP3005698B2 (ja) 1991-09-10 2000-01-31 株式会社小野測器 スペックルノイズの除去装置
DE19524036C2 (de) * 1995-01-24 2002-04-11 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur interferometrischen Erfassung der Form und/oder Formveränderung von Prüflingen
US5811826A (en) * 1996-02-07 1998-09-22 Massachusetts Institute Of Technology Methods and apparatus for remotely sensing the orientation of an object
JP3501605B2 (ja) 1996-12-27 2004-03-02 キヤノン株式会社 干渉計及び形状測定装置
JP3796363B2 (ja) * 1998-10-30 2006-07-12 キヤノン株式会社 位置検出装置及びそれを用いた露光装置
JP2001264036A (ja) * 2000-03-22 2001-09-26 Ricoh Co Ltd 面形状測定装置及び測定方法
CN1180222C (zh) 2002-06-07 2004-12-15 清华大学 双频共焦台阶高度显微测量装置
US7286238B2 (en) * 2004-09-22 2007-10-23 Corning Incorporated Feature isolation for frequency-shifting interferometry
JP4885154B2 (ja) 2007-01-31 2012-02-29 国立大学法人東京工業大学 複数波長による表面形状の測定方法およびこれを用いた装置
DE102007055665A1 (de) * 2007-11-21 2009-05-28 Dr. Johannes Heidenhain Gmbh Interferometeranordnung und Verfahren zu deren Betrieb
GB2472059B (en) * 2009-07-23 2012-09-19 Univ Loughborough Apparatus for the absolute measurement of two dimensional optical path distributions using interferometry
AU2010333031B2 (en) * 2009-12-14 2013-02-07 Leica Geosystems Ag Method for speckle mitigation in an interferometric distance meter and corresponding distance meter
WO2011134111A1 (en) * 2010-04-30 2011-11-03 Siemens Aktiengesellschaft Optical spectrometer and method for enhancing signal intensity for optical spectroscopy
JP5882674B2 (ja) * 2011-10-24 2016-03-09 キヤノン株式会社 多波長干渉計、計測装置および計測方法

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