JP2013089594A - 誘導結合プラズマ源用の内部分割ファラデー・シールド - Google Patents
誘導結合プラズマ源用の内部分割ファラデー・シールド Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
- H01J37/32651—Shields, e.g. dark space shields, Faraday shields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
- H01J37/32504—Means for preventing sputtering of the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/0203—Protection arrangements
- H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/026—Shields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31749—Focused ion beam
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Abstract
【解決手段】集束荷電粒子ビーム・システム用の誘導結合プラズマ源200は、プラズマとの容量結合を低減させるため、プラズマ室102内に導電性シールド202を含む。この内部導電性シールドは、バイアス電極106またはプラズマ104によってプラズマ源と実質的に同じ電位に維持される。この内部シールドは、プラズマ室の外側においてより幅広いさまざまな冷却方法を使用することを可能にする。
【選択図】図2
Description
・プラズマを封じ込めるプラズマ室、
・プラズマ室内に高周波エネルギーを供給する導体、および
・高周波エネルギーを供給する導体とプラズマの間の容量結合を低減させる導電性シールドであり、プラズマ室内に配置された導電性シールドを含む
・プラズマ源と、
・プラズマ源からの荷電粒子を試料に集束させる1つまたは複数の集束レンズと
を備える。
・プラズマ室内のプラズマを維持するために、少なくとも1つの導電性コイルからプラズマ室内に高周波エネルギーを供給するステップと、
・高周波エネルギーの供給源とプラズマの間の容量結合を低減させるために、導電性シールドを設けるステップと、
・プラズマおよび導電性シールドをグランド電位とは異なる電位に維持するステップと、
・プラズマ室から荷電粒子を引き出すステップと、
・荷電粒子を集束させてビームとし、このビームを、加工物または前記加工物の近くに導くステップと
を含む。
104 プラズマ
200 プラズマ源
202 ファラデー・シールド
210 ビーム画定絞り
212 偏向器
214 レンズ
216 試料
Claims (21)
- プラズマを封じ込めるプラズマ室、
前記プラズマ室内に高周波エネルギーを供給する導体、および
高周波エネルギーを供給する前記導体と前記プラズマの間の容量結合を低減させる導電性シールドであり、前記プラズマ室内に配置された導電性シールド
を含むプラズマ源と、
前記プラズマ源からの荷電粒子を試料に集束させる1つまたは複数の集束レンズと
を備える荷電粒子ビーム・システム。 - 前記導電性シールドを所望の電圧に電気的にバイアスするバイアス電極をさらに備える、請求項1に記載の荷電粒子ビーム・システム。
- 前記導電性シールドが、前記プラズマ室の内壁を覆う層を含む、請求項1に記載の荷電粒子ビーム・システム。
- 前記導電性シールドが、前記プラズマ室内に挿入された薄い導体箔を含む、請求項1に記載の荷電粒子ビーム・システム。
- 前記プラズマ室の少なくとも一部分を取り囲んで熱接触している冷却流体をさらに含む、請求項1に記載の荷電粒子ビーム・システム。
- 前記冷却流体が空気または液体を含む、請求項5に記載の荷電粒子ビーム・システム。
- 前記導電性シールドが、プラズマ・シースの外側境界と実質的に同じ電圧に維持される、請求項1に記載の荷電粒子ビーム・システム。
- 前記導電性シールドが電気的に絶縁されており、動作時、前記導電性シールドがプラズマ・シースの外側境界と同じ電位にある、請求項1に記載の荷電粒子ビーム・システム。
- 前記導電性シールドが、500Vから100kVの間の大きさを有するある電圧に維持される、請求項1に記載の荷電粒子ビーム・システム。
- 前記導電性シールドが、5000Vから50000Vの間の大きさを有するある電圧に維持される、請求項1に記載の荷電粒子ビーム・システム。
- 前記プラズマが、500eVから100keVの間の前記荷電粒子の入射エネルギーを生み出すある電位にバイアスされる、請求項1に記載の荷電粒子ビーム・システム。
- 動作時、前記プラズマ室内の前記プラズマおよび前記導電性シールドがグランド電位とは異なる電位に維持される、請求項1に記載の荷電粒子ビーム・システム。
- 前記導電性シールドが分割ファラデー・シールドである、請求項1に記載の荷電粒子ビーム・システム。
- 前記プラズマ室内で円筒形の形状を形成するために、前記分割ファラデー・シールドが巻かれている、請求項13に記載の荷電粒子ビーム・システム。
- 前記プラズマの温度が、前記プラズマ室内での前記導電性シールドのスパッタリングを防ぐのに十分な低い温度に維持される、請求項1に記載の荷電粒子ビーム・システム。
- 前記導電性シールドが、前記プラズマから前記プラズマ室の内壁に熱を分配する、請求項1に記載の荷電粒子ビーム・システム。
- 前記プラズマ室内に高周波エネルギーを供給する前記導体が、冷却流体を通す内部通路を含む、請求項1に記載の荷電粒子ビーム・システム。
- プラズマ室を含む誘導結合プラズマ源を動作させる方法であって、
前記プラズマ室内のプラズマを維持するために、少なくとも1つの導電性コイルから前記プラズマ室内に高周波エネルギーを供給するステップと、
前記高周波エネルギーの供給源と前記プラズマの間の容量結合を低減させるために、導電性シールドを設けるステップと、
前記プラズマおよび前記導電性シールドをグランド電位とは異なる電位に維持するステップと、
前記プラズマ室から荷電粒子を引き出すステップと、
前記荷電粒子を集束させてビームとし、前記ビームを、加工物または前記加工物の近くに導くステップと
を含む方法。 - 前記プラズマ室を冷却するために冷却流体を供給するステップをさらに含む、請求項18に記載の方法。
- 導電性シールドを設ける前記ステップが、前記プラズマ室の内壁を導電性シールドで覆うステップを含む、請求項18に記載の方法。
- 導電性シールドを設ける前記ステップが、前記プラズマ室の内部に導電材料を挿入するステップを含む、請求項18に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/277,072 US20130098871A1 (en) | 2011-10-19 | 2011-10-19 | Internal Split Faraday Shield for an Inductively Coupled Plasma Source |
US13/277,072 | 2011-10-19 |
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JP2013089594A true JP2013089594A (ja) | 2013-05-13 |
JP2013089594A5 JP2013089594A5 (ja) | 2015-10-29 |
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US (2) | US20130098871A1 (ja) |
EP (1) | EP2584583A3 (ja) |
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Cited By (1)
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JP7476090B2 (ja) | 2020-12-16 | 2024-04-30 | 日本電子株式会社 | イオン源およびイオンビーム装置 |
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Also Published As
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EP2584583A2 (en) | 2013-04-24 |
EP2584583A3 (en) | 2013-08-28 |
US9818584B2 (en) | 2017-11-14 |
CN103107055A (zh) | 2013-05-15 |
US20150008213A1 (en) | 2015-01-08 |
US20130098871A1 (en) | 2013-04-25 |
CN103107055B (zh) | 2016-12-21 |
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